CN102132210A - Pellicle frame, pellicle and method for using pellicle frame - Google Patents
Pellicle frame, pellicle and method for using pellicle frame Download PDFInfo
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- CN102132210A CN102132210A CN2009801334929A CN200980133492A CN102132210A CN 102132210 A CN102132210 A CN 102132210A CN 2009801334929 A CN2009801334929 A CN 2009801334929A CN 200980133492 A CN200980133492 A CN 200980133492A CN 102132210 A CN102132210 A CN 102132210A
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- Prior art keywords
- pellicle
- pellicle member
- framework
- mask
- member framework
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Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
- H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention provides a pellicle frame, a pellicle and a method for using the pellicle frame, wherein the pellicle frame is not distorted when a pellicle film is stretched and pasted, and the pellicle frame itself follows up flexure caused by the weight of a mask even after a pellicle is pasted to the mask. A rectangular pellicle frame has a distortion factor alpha of 0.06% or less, the followability beta of each side of the pellicle frame expressed by the general expression (1) is 3 mm or more, the followability beta of the long side of the pellicle frame is 32 mm or less, the long side of the pellicle frame has a length of 1400-2100 mm, and the area on the inside of the pellicle frame is 15000 cm2 or more, wherein beta =(1/flexure of pellicle)*thickness*width (1).
Description
Technical field
The present invention relates to as the framework of the member of formation of pellicle member (pellicle), particularly as long edge lengths greater than the pellicle member framework of the member of formation of the ultra-large type pellicle member of 1400mm and used the pellicle member of pellicle member framework and the using method of pellicle member framework, above-mentioned pellicle member is used to prevent adhere to foreign matter on used photomask such as the photo-mask process when making the thin film transistor (TFT) (TFT) that constitutes LSI, LCD (LCD), color filter (CF) etc., the reticle mask (reticle).
Background technology
The present invention relates to the technology as the framework of the member of formation of pellicle member and pellicle member, at first instruction card film structural component.
In the past, when making semiconductor circuit pattern etc., used the dust proof member that is commonly referred to as the pellicle member to prevent that foreign matter is attached on photomask, the reticle mask.The pellicle member is to form like this: be complementary in the shape of shape and for example photomask or reticle mask, thickness is to sprawl on the upper surface of framework of several millimeter and bonding thickness is transparent polymeric membrane such as cellulose nitrate below the 10 μ m or cellulose derivative (cellulosederivative) or fluorine based polymer etc. (below be called " pellicle "); and adhesive material on the lower surface of this framework; and, thereby form the pellicle member with bonding force bonding diaphragm on this jointing material of regulation.
Above-mentioned jointing material is used for the pellicle member is adhered to photomask or reticle mask, and in addition, diaphragm is used to protect the bonding plane of this jointing material, to keep the bonding force of this jointing material before being used to such use at this jointing material.
Usually; this kind pellicle member is supplied to the manufacturer who makes photomask or reticle mask by the manufacturer who makes the pellicle member, and the manufacturer of photomask or reticle mask is supplied to semiconductor manufacturers, panel manufacturer etc. to carry out the manufacturer of photoetching treatment after sticking on the pellicle member on photomask or the reticle mask again.
In recent years, along with various multimedia popularizations, the large-scale colored TFTLCD (Thin Film Transistor-LCD) that need high image quality, can show accurately.Correspondingly, people wish to develop the large-scale pellicle member of a kind of large-scale photomask that can be applied to use, reticle mask in photo-mask process.
As the large-scale photomask that can be applied in the photo-mask process of large-scale TFTLCD (Thin Film Transistor-LCD) etc., use, the framework of pellicle member in the reticle mask, normally has the framework of the rectangle of long limit and minor face.When pellicle being sticked on this framework, the limit of framework is out of shape to the inside because of the tension force of this pellicle, this distortion makes the effective exposure area of photomask, reticle mask reduce sometimes, along with the increase (it is big that pellicle becomes) of the spreading area of pellicle, the phenomenon that above-mentioned effective exposure area reduces is all the more obvious.At this phenomenon, under the state of the inboard area of doing one's utmost to be maintained pellicle member framework (below be called useful area), improve the rigidity of pellicle member framework, can prevent that above-mentioned phenomenon from (for example with reference to patent documentation 1) taking place.
Patent documentation 1: the spy of Japan opens the 2001-109135 communique
But, along with in recent years further maximization and produced new problem.
This problem is: further maximization in recent years requires photomask, reticle mask (hereinafter to be referred as making mask) itself also to maximize, occurred thus in the past mask maximizes, not constituting problem, cause mask that the problem of deflection takes place because of self weight increase because of mask itself further maximizes.
Promptly, since the pellicle member with the tight state of contact of mask under use, therefore, can not follow at the pellicle member under the situation of deflection of mask, the stickup face of mask and pellicle member is peeled off, produce the gas passage between mask and pellicle member, existence can not obtain to want to utilize the effect of pellicle member acquisition.Particularly, aspect operational sequence,, in most cases be to control the short brink part of mask and the his-and-hers watches film structural component is handled at being bonded in the pellicle member after going up such as mask, therefore require the framework of pellicle member to follow the deflection of the mask etc. of long side.
As mentioned above, in the maximization of in the past pellicle member, at this problem that prevents pellicle member self deflection, to improve the rigidity of pellicle member as solution, but the further maximization (large) of pellicle member not only needs to improve the rigidity of pellicle member, the deflection of self that the mask that needs that also the pellicle member is followed and be pasted with this pellicle member causes because of maximization itself, particularly follows the deflection of long side on operational sequence.In other words, we can say the pellicle member that requires large have concurrently rigidity and flexibility the two.
Like this, the large of mask makes the ultra-large type pellicle member that is applied to this kind mask produce new problem.
Summary of the invention
The objective of the invention is to solve new problem by the large generation of pellicle member, the purpose of first technical scheme is the pellicle member framework that provides such: this framework can be out of shape in the time of on pellicle being sprawled and is adhered to pellicle member framework, in addition, after sticking on the pellicle member on the mask, pellicle member framework self also can be followed the deflection that mask produces because of self weight.
In addition, in ultra-large type pellicle member, simultaneously also seek following characteristic: carrying out from pellicle is sprawled and is bonded in back on the pellicle member framework to the pellicle member is pasted on the mask during in processing the time, framework can be out of shape yet.The purpose of second technical scheme is the pellicle member framework that provides such: in the time of on pellicle being sprawled and is bonded in pellicle member framework, framework can be out of shape, and carry out from pellicle is sprawled and is bonded on the pellicle member framework back to this pellicle member is pasted on the mask during in processing the time, framework can be out of shape yet, this is external stick on the pellicle member on the mask after, pellicle member framework self also can be followed the deflection that mask produces because of self weight.
In order to achieve the above object, the inventor concentrates on studies, and found that by what limit ultra-large type pellicle member framework to answer variation α, degree of following β, can achieve the above object, and has proposed first technical scheme among the present invention thus.
In addition, the inventor finds can to achieve the above object by with respect to the width W a of the long limit 1a of the pellicle member framework width W b with the ratio increase minor face 1b of appointment, has proposed second technical scheme among the present invention thus.
That is, the present invention is as described below.
(1) a kind of pellicle member framework, it is a rectangle, the variation α that answers of this pellicle member framework is below 0.06%, degree of the following β on each limit of this pellicle member framework shown in the following general form (1) is more than the 3mm, degree of the following β on the long limit of this pellicle member framework is below the 32mm, and the long edge lengths of framework is 1400mm～2100mm, and the inboard area of this pellicle member framework is 15000cm
2More than.
β=(deflection of 1/ pellicle member) * thickness * width (1)
(2) according to the described pellicle member of (1) technical scheme framework, the minor face width of this pellicle member framework is 1.05 times～1.50 times of long hem width degree.
(3) a kind of pellicle member framework, it is a rectangle, and the long hem width degree Wa of this pellicle member framework is 13.0mm～30.0mm, and minor face width W b and the ratio Wb/Wa of long hem width degree Wa are 1.05～1.50, long edge lengths is 1400mm～2100mm, and the inboard area of framework is 16000cm
2More than.
(4) according to any described pellicle member framework in (1)～(3) technical scheme, the material that constitutes this pellicle member framework is an aluminum or aluminum alloy.
(5) according to any described pellicle member framework in (1)～(4) technical scheme, the surface of his-and-hers watches film structural component framework is implemented aluminum passivation processing, black processing and sealing of hole and is handled, it is to handling the processing of the peristome enforcement in the small hole that forms because of having carried out aluminum passivation that this sealing of hole is handled, thereby does not in fact have micro-crack (micro-crack) on this surface.
(6) a kind of pellicle member, it is this pellicle member that obtains on any described pellicle member framework in (1)～(5) technical scheme by pellicle is spread over.
(7) a kind of using method of pellicle member framework, control at least one place of each minor face in the one group of relative minor face described pellicle member of (6) technical scheme, pellicle member framework respectively, the pellicle member is sticked on the mask, and the mask that will be pasted with this pellicle member afterwards is used in exposure-processed.
Pellicle member framework of the present invention have the appropriateness rigidity and flexibility, therefore, in the time of on pellicle being sprawled and is bonded in pellicle member framework, framework can be out of shape, nor can reduce the pellicle member with the areametric effective exposure area in inboard.In addition, because the pellicle member also can be followed the deflection of mask after the pellicle member being sticked on the mask, so can on the bonding plane of mask and pellicle member, not produce the gas passage yet.
In addition, adopt second technical scheme, after carrying out on pellicle being sprawled and is bonded in pellicle member framework to the pellicle member is pasted on the mask during in processing the time, framework can be out of shape yet.
In addition, pellicle member framework of the present invention effect under the situation of ultra-large type pellicle member is remarkable, specifically, is 15000cm at useful area
2Under the situation of above ultra-large type pellicle member, pellicle member framework of the present invention can play significant effect.
Description of drawings
Fig. 1 is the stereographic map of the structure of expression pellicle member framework of the present invention and the pellicle member that has used this framework.
Fig. 2 is the cut-open view of the vertical face of the length direction with long limit of pellicle member framework of Fig. 1.
Fig. 3 is the cut-open view of the pellicle member of Fig. 1 face vertical with length direction minor face framework.
Fig. 4 A is the key diagram of initial length on the measurement limit of expression pellicle member framework.
Fig. 4 B is that expression pellicle member framework is supported and the key diagram of the state of deflection taken place.
Fig. 4 C is the key diagram of the length after being supported of measurement limit of expression pellicle member framework.
Fig. 5 is the key diagram that expression is bearing in pellicle member framework the state on the platform.
Embodiment
Below, illustrate to be used to implement embodiments of the present invention.Following embodiment is to be used to illustrate illustration of the present invention, is not to mean the present invention to be defined in following content.
The shape of pellicle member framework of the present invention is the rectangle similar to the shape of mask.The long limit of pellicle member framework is meant the longest edge of framework, and the minor face of pellicle member framework is meant the minor face of framework.More specifically, be under the rectangular situation in pellicle member framework, the relatively long limit in two limits of quadrature is long limit, and relatively short limit is a minor face, is under the foursquare situation in pellicle member framework, and 4 limits are equal length.In pellicle member framework is under the foursquare situation, limit arbitrarily can be defined as long limit, and the limit is defined as minor face arbitrarily.
Answer variation α to represent with following general form (2).This answers variation α to measure with following method.Below, the measuring method of using Fig. 4 A, Fig. 4 B, Fig. 4 C, Fig. 5 explanation to answer variation α.
At first, length (length of the original state) L 1 (shown in Fig. 4 A) to the one side that will measure the pellicle member framework 1 of answering variation α measures.Then, as shown in Figure 5, utilize the lower surface (not contacting upper surface) of the two opposite edges of not measuring strain degree α of platform 20 supporting pellicle member frameworks 1.At this moment, do not measure the whole length on the limit of strain degree α, and support the position apart from end 15mm of pellicle member framework 1 from the below supporting.For example, when the minor face of meter film structural component framework 1,, utilize the whole length of platform 20 from the long limit of supporting, below for fear of long limit deflection.When the long limit of meter film structural component framework 1, utilize the whole length of platform 20 from below supporting minor face.Under this state, keep 10 minutes (shown in Fig. 4 B), stop supporting afterwards, pellicle member framework is rested on the smooth platform as the crow flies, measure length (being supported the length of back (being applied with after the power that produces by the deadweight)) L2 (shown in Fig. 4 C) on the one side that will measure after 10 minutes once more, calculate length L 2 after being supported with respect to the length growth rate of the length L 2 of original state according to following formula, with this length growth rate as answering variation α.Temperature during measurement is 23.8 ℃, and relative humidity is 74%RH.
[(length L 1 of length L 2/ original state after being supported)-1] * 100 (%) (2)
In addition,, therefore adopt identical method to measure each limit, answer variation α as pellicle member framework with the numerical value of answering variation α maximum because the pellicle member framework of rectangle has 4 limits.In addition, when the width on limit under the upper surface situation different with the bottom surface, the face of the relative broad of width on limit is placed the below and measure and answer variation α.As long as the lower limit of answering variation α of pellicle member framework is more than 0%, on be limited to below 0.06%, be preferably below 0.02%, most preferably be below 0.01%.
In addition, expression pellicle member framework represents that with following general form (1) the following of the β on each limit of pellicle member framework is limited to more than the 3mm, more preferably more than the 4mm to the degree of following of the following β of mask, be limited to below the 32mm on the degree of following on the long limit of this pellicle member framework, be preferably below the 25mm.The degree of following of the minor face of pellicle member framework is preferably below the 100mm, more preferably below the 80mm, is preferably below the 50mm especially.
β=(deflection of 1/ pellicle member) * thickness * width (1)
The measuring method of degree of following β is as described below.
At first, as shown in Figure 5, utilize the lower surface of the two opposite edges of not measuring degree of following β of platform 20 supporting pellicle member frameworks 1.At this moment, do not measure the whole length on the limit of degree of following β, and support the position apart from end 15mm of pellicle member framework 1 from the below supporting.For example, when the minor face of meter film structural component framework 1,, utilize the whole length of platform 20 from the long limit of supporting, below for fear of long limit deflection.When the long limit of meter film structural component framework 1, utilize the whole length of platform 20 from below supporting minor face.Under this state, kept 10 minutes, and afterwards shown in Fig. 4 B, the maximum deflection part on the limit that measure was measured with respect to the variable quantity of the position of original state, the deflection Δ T of this variable quantity note tabulation film structural component.Then, multiply by the thickness and the width on the limit that will measure, draw degree of following β with the inverse of this deflection Δ T.Degree of the following β on all limits of meter film structural component framework 1.In addition, when the width on limit under the upper surface situation different with the bottom surface, the face of the relative broad of width on limit is placed the below and measures degree of following β.Above-mentionedly measure degree of following β when answering variation α measuring.
This degree of following β is that expression embodies the index of flexibility that pellicle member framework can be followed the deflection of mask with which kind of degree.Thereby, we can say that numerical value is more little, degree of following is high more, but spends when high following, and when sprawling pellicle, can produce fold when handling, therefore must be controlled in the above-mentioned scope by degree of following β.
In addition, the lower limit of the thickness of pellicle member framework is preferably more than the 4.0mm, more preferably is limited to more than the 5.0mm down, is preferably more than the 6.0mm especially.On the other hand, the upper limit of this thickness is preferably below the 10mm, more preferably below the 8mm, more preferably below the 7mm, is preferably below the 6.5mm especially.
The width of pellicle member framework is preferably more than the 13mm, more preferably more than the 14mm, more preferably more than the 16mm.On the other hand, the upper limit of this width is preferably below the 30mm, more preferably below the 25mm, more preferably below the 19mm.In addition, long limit can be identical width with minor face, also can be different respectively width.
In addition, for example as Fig. 2, shown in Figure 3, the width on the limit of pellicle member framework is meant the breadth extreme on each limit that width W a, Wb are such.
Cross sectional shape as each limit of pellicle member framework is not particularly limited, and can be rectangle, H font, T font etc., but rectangle most preferably.The cross section also can be a hollow structure.
Pellicle member framework of the present invention is ultra-large type, and effect is obvious more, specifically, in the long edge lengths of pellicle member framework is more than the 1400mm, is 16000cm in particular for the useful area of 1700mm～2100mm, pellicle member
2More than, 24000cm
2More than, in particular for 25000cm
2Under the above situation, can play remarkable result.
In addition, can play significant effect more,, be limited to 35000cm on the useful area of framework from being used to make the desired sizes such as mask of TFTLCD though pellicle member framework of the present invention is that the pellicle member is large-scale more
2Just enough.
In addition, in long edge lengths is large pellicle member more than the 1400mm, in order to improve the degree of freedom in the treatment process, the limit of any one party on two limits of preferred two limits only controlling short brink or long side and handling, particularly consider operating efficiency, preferably control the holding method on two limits of short brink.At the ratio Wb/Wa of the minor face width W b of pellicle member framework and long hem width degree Wa is 1.05 when above, when handling with the holding method on two limits controlling short brink, can control from the high avris of rigidity all the time, produce fold when handling thereby can be suppressed at.Can carry out the processing of this pellicle member from the short side direction of the wide cut of pellicle member, the handle portion broad when controlling also can improve convenience.From improving the viewpoint of the property handled, control protuberance, the recess of usefulness particularly preferably in the short brink formation of pellicle member framework.In addition, when Wb/Wa is 1.50 when following, even under the situation that erects pellicle member framework (make long side perpendicular to the ground, make short brink situation parallel to the ground),, therefore also can suppress to produce fold owing to can suppress the long side distortion.Useful area at the pellicle member is 16000cm
2More than in such ultra-large type pellicle member, in order to improve operating efficiency, preferably make the pellicle member rotate inspection of foreign substance carried out on the pellicle surface.When the time comes, though, when Wb/Wa 1.50 can suppress the long side distortion when following, can be suppressed at therefore that pellicle produces fold in the inspection of foreign substance operation etc. via the operation that erects pellicle member framework.
The width W b of the minor face 1b of pellicle member framework 1, specifically the width W b of minor face 1b is preferably more than 1.05 with respect to the ratio (Wb/Wa) of the width W a of long limit 1a, more preferably more than 1.1, be limited to below 1.50 on preferred this ratio, more preferably below 1.25, be preferably below 1.2 especially.
As the material that constitutes pellicle member framework of the present invention, for example can enumerate mechanical realization with metal, pottery (SiC, AlN, Al such as carbon steels (S C series etc.), tool steel (carbon tool steel SK series, high speed tool steel SKH series, alloy tool steel SKS series, SKD series, SKT series etc.), martensitic stainless steel series (SUS403, SUS410, SUS410S, SUS420J1, SUS420J2, SUS429J1, SUS440A, SUS304 etc.), aluminium, aluminium alloy (5000 be, 6000 be, 7000 be etc.)
2O
3Deng), compound substance (Al-SiC, Al-AlN, the Al-Al of pottery and metal
2O
3Deng), preferably use aluminium, aluminium alloy, more specifically can use the alloy of alloy, aluminum and zinc and the magnesium of alloy, aluminium and the magnesium of aluminium and magnesium and silicon.
In addition,, therefore, can utilize magnet to fix this each steel, particularly under the situation of large pellicle member framework, can process operation well because above-mentioned each steel are magnetic materials, therefore preferred.Black processing such as black chromium plating, black passivation aluminium, black application are implemented on surface that also can his-and-hers watches film structural component framework.
Wherein, further specify black passivation aluminium in the above-mentioned processing.
Supporting frame as the pellicle member is used uses 5000 aluminium alloys that are usually mostly, is that example describes with the aluminium alloy therefore.
Common black passivation aluminium is handled like this and is implemented: utilizing aluminium alloy to be shaped behind the pellicle member supporting frame, carrying out aluminum passivation handles, utilize black agent that the minute aperture that is produced by this processing is enclosed processing, the sealing of hole of implementing then this minute aperture is closed is handled.But,, find to have fine crackle (micro-crack) when utilizing electron microscope observation above-mentioned such when adopting supporting frame that usual method makes surperficial.In the continuous miniaturization of the pattern of this micro-crack, when wiring width is narrower, the falling of minimum foreign matter that enters into this crackle also constitutes problem.Method as preventing that this kind micro-crack from producing preferably adopts following method.
At first, the aluminum passivation processing is carried out on the surface of his-and-hers watches film structural component framework.With sulfuric acid concentration be 10～20%, current density is 1～2A/dm
2, electrolyte temperature be 15～30 ℃, conduction time the condition in 10～30 minutes scope carry out this aluminum passivation and handle.When the time comes, be formed with regularly on the surface of alloy many small holes (diameter is 50～
Spacing is 500～
).Afterwards, utilize this hole to carry out the black processing.Because the purpose of black processing is to prevent that light from reflecting from frame, therefore be not limited to black, also comprise the dark colors such as dark brown, purplish blue look that approach black.The black processing can be enumerated dyeing, electrolytic coloring etc.Dyeing is the method that makes this hole absorbing dye obtain tone thus in the liquid that is dissolved with black dyes by framework is immersed in, and in addition, electrolytic coloring is to make this hole precipitating metal element obtain the method for tone by energising.Dyeing is that 3～10g/L, dyeing liquor temperature are to carry out under 50～65 ℃ the condition at dye strength for example.
Next, carrying out sealing of hole that this hole is closed handles.In this is handled, use be the boil water of Hardwall3 (Ha one De ウ オ one Le) (trade name) sealing of hole auxiliary agent that is added with solar corona chemical industry (strain) system that for example is known as the low temperature pore sealing agent of 6～12g/L.
Utilize sealing of hole at this moment to handle the minute aperture of landfill passivation aluminium film surface, thereby make passivation aluminium film become more and more finer and close, but, then can form the pellicle member framework that has superficiality extremely uniformly, in fact do not have micro-crack if can be with than 100 ℃ of low slightly temperature, for example 70～95 ℃, more preferably 80～90 ℃ temperature is carried out sealing of hole and handled.
In addition, adopt following method to judge whether to exist micro-crack: the straight line of 10cm (physical size is 0.1mm) of drawing on the photo that obtains after utilizing electron microscope that supporting frame surface is amplified 1000 times, calculate the quantity of the crackle that intersects with this straight line.The quantity of crackle is for seeing on this electron micrograph, be that the crackle width is that crackle more than the 0.1 μ m is added up and drawn to the width of crackle.This numerical value is big more, judges that crackle exists to high-density.
Also can be according to need on the internal face of pellicle member framework or whole surface, applying jointing material (acrylic acid series, vinyl acetate system, silicon system, rubber system etc.), the railway grease (silicon system, fluorine system etc.) that is used to catch foreign matter.
In addition, thus when offering the inside and outside minute aperture that runs through pellicle member framework according to needing and eliminate inner and outer air pressure difference in the space that forms by pellicle member and photomask, can prevent that film from bloating, caving in.
In addition, except adjusting air pressure, can also prevent that foreign matter from entering into the space that is formed by pellicle member and photomask if in the outside of minute aperture the removal foreign body filter is installed this moment, therefore preferably installs in the outside of minute aperture and remove foreign body filter.
Under the bigger situation of the volume in the space that forms by pellicle member and photomask, when a plurality of above-mentioned holes, filtrator are set, can shorten the release time that bloats, caves in of the film that causes by barometric fluctuation, therefore a plurality of above-mentioned holes, filtrator preferably are set.
Pellicle member framework of the present invention can have the rigidity and the flexibility of appropriateness concurrently by satisfying above-mentioned important document, therefore can not make the framework distortion because of sprawling pellicle, certainly, this pellicle member can deflection yet when separately this pellicle member being handled, and after stick on this pellicle member on the mask after processing in this pellicle member can also follow the deflection of mask self.As a result, the pellicle member fold can not occur, and can also follow the deflection of mask, therefore can also play to produce this excellent effect of gas passage.
Pellicle member framework of the present invention more than has been described, but, can have further improved reliability as pellicle member framework by pellicle member framework of the present invention is formed following structure.
For example, form under the situation of identical width W a, Wb with minor face 1b at long limit 1a, can obtain to satisfy between width W c, the Wd of bonding plane 1a1,1b1 of pellicle 2 structure of the relation of Wa=Wb＞Wc=Wd Fig. 1, Fig. 2 and pellicle member framework 1 shown in Figure 3.Like this, at the width W a, the Wb that adopt pellicle member framework 1 during than the wide structure of width W c, the Wd of bonding plane, can utilize bonding agent coating unit, for example X-Y dispensation machines people (dispenser robot) etc. to apply the bonding agent of pellicle 2 and pellicle member framework 1 quantitatively, therefore bonding agent can be coated on whole bonding plane equably.In addition, by adhesion width being set narrower than the width of framework 1, coating inequality, the coating that can suppress bonding agent are residual, and the result can prevent that foreign matter is deposited in and applies inequality, applies in the corresponding space of residual fraction.In addition, when Wc=Wd, not be used in long limit and minor face change coated weight and just can apply all limits, therefore preferred Wc=Wd.
As the method for the structure of making the relation that satisfies Wa=Wb＞Wc=Wd as described above,, just can not form formation dip plane, step ground as long as form the dip plane in the bonding plane side of the pellicle of pellicle member framework 1.In addition, this dip plane also can be the curved surface shape.
Like that between the width of the width of pellicle member framework 1 and the bonding plane of pellicle, design the stand out that can reach Wa=Wb＞Wc=Wd by above-mentioned, can obtain also to prevent that bonding agent from overflowing the film bonding plane 1b1 of framework 1 and hanging down into the effect of the interior perimembranous of framework 1.In addition, more than explanation is the situation of Wa=Wb, even but the long limit 1a of pellicle member framework 1 is not identical width W a, Wb with minor face 1b, as long as satisfy the relation of Wa＞Wc, Wb＞Wd, then can obtain above-mentioned effect, in addition, when Wc=Wd, not be used in long limit and minor face change coated weight and just can apply all limits, therefore preferred Wc=Wd.
The pellicle member framework of first technical scheme can preferably be followed this kind photomask: the long edge lengths of photomask be the long edge lengths of pellicle member framework above and below the long edge lengths+150mm of pellicle member framework and the bond length of photomask be more than the bond length of pellicle member framework and below the bond length+200mm of pellicle member framework.The thickness of photomask is so long as can bear the degree of the weight (not damaging the such degree of photomask) of pellicle member framework and get final product after having pasted pellicle member framework.As the material of photomask, can use soda-lime glass, alkali-free glass, glass with lower alkali content, quartz glass etc., no matter which kind of material photomask is, the pellicle member framework of first technical scheme can both be followed this photomask well.
The structure of the pellicle member framework of first technical scheme more than has been described.
Next, second technical scheme of the present invention is described.
The width of the pellicle member framework 1 of second technical scheme at first is described.The following of width W a of the long limit 1a of pellicle member framework 1 shown in Figure 2 is limited to more than the 13.0mm, and preferred lower limit is more than the 14.0mm, most preferably to be more than the 16.0mm.On the other hand, be limited on this width below the 30.0mm, preferred upper limit is below the 25.0mm, is limited to below the 19.0mm on more preferably.
In addition, for example as Fig. 2, shown in Figure 3, the width on the limit of pellicle member framework is meant the breadth extreme on each limit that width W a, Wb are such.
The width W b of the minor face 1b of pellicle member framework 1 shown in Figure 3 must be wideer than the width W a of long limit 1a at least, specifically, the width W b of minor face 1b is limited to more than 1.05 with the following of ratio (Wb/Wa) of the width W a of long limit 1a, be preferably more than 1.1, be limited to below 1.50 on this ratio, be preferably below 1.25, most preferably be below 1.2.Thereby the minor face width W b of pellicle member framework is the interior value of scope of 13.65mm～45.0mm.
In long edge lengths is large pellicle member more than the 1400mm, in order to improve the degree of freedom in the treatment process, the limit of any one party on two limits of preferred two limits only controlling short brink or long side and handling, particularly consider operating efficiency, preferably control the holding method on two limits of short brink.At the ratio Wb/Wa of the minor face width W b of pellicle member framework and long hem width degree Wa is 1.05 when above, when handling with the holding method on two limits controlling short brink, can control from the high avris of rigidity all the time, produce fold when handling thereby can be suppressed at.In the time can carrying out the processing of this pellicle member from the short side direction of the wide cut of pellicle member, the handle portion broad when controlling also can improve convenience.From improving the viewpoint of handlability, control protuberance, the recess of usefulness particularly preferably in the short brink formation of pellicle member framework.In addition, when Wb/Wa is 1.50 when following, even under the situation that erects pellicle member framework (make long side perpendicular to the ground, make short brink situation parallel to the ground),, therefore can suppress to produce fold owing to can suppress the long side distortion.Useful area at the pellicle member is 16000cm
2More than in such ultra-large type pellicle member, in order to improve operating efficiency, preferably make the rotation of pellicle member and inspection of foreign substance carried out on the pellicle surface.When the time comes, though, owing to 1.50 can suppress the long side distortion when following as Wb/Wa, so in inspection of foreign substance operation etc., also can suppress pellicle generation fold via the operation that erects pellicle member framework.
In addition, the thickness of preferred framework 1 is more than the 4.0mm, more preferably more than the 5.0mm, more preferably more than the 6.0mm.In addition, preferably this thickness on be limited to below the 10mm, more preferably below the 8mm, more preferably below the 7mm, most preferably be below the 6.5mm.
Cross sectional shape as each limit of pellicle member framework is not particularly limited, and can be rectangle, H font, T font etc., but rectangle most preferably.The cross section also can be a hollow structure.
Pellicle member framework of the present invention 1 is large-scale, and effect is obvious more, specifically, at the length L a of the long limit 1a of pellicle member framework 1 is more than the 1400mm, is 16000cm in particular for the useful area of 1700mm～2100mm and pellicle member when the time comes
2More than, 24000cm
2More than, in particular for 25000cm
2Under the above situation, can play remarkable result.In addition, though pellicle member framework 1 of the present invention is large-scalely more can play significant effect more,, be limited to 35000cm on the useful area of framework from being used to make the desired sizes such as mask of TFTLCD
2Just enough.
In addition, in long edge lengths is large pellicle member more than the 1400mm, for the processing after the pellicle member being sticked on the mask, on flow chart, most cases be not only control the minor face of mask but control mask together and one group of relative minor face 1b of pellicle member framework 1 in, at least one place of each minor face 1b, can improve operating efficiency when such operation, the deflection that is produced by the deadweight of mask in this case is different on long limit and minor face.The bending deformation of the mask on the relative long limit 1a direction of specifically, not controlling is big.Therefore, require the deflection of pellicle member framework to follow the deflection of long side direction.The pellicle member framework of second technical scheme also can be followed the deflection with this species specific mask fully.
Pellicle member framework of the present invention can have the rigidity and the flexibility of appropriateness concurrently by satisfying above-mentioned important document, therefore can not make the framework distortion because of sprawling pellicle, certainly, this pellicle member can deflection yet when separately this pellicle member being handled, and after stick on this pellicle member on the mask after processing in this pellicle member can also follow the deflection of mask self.
The result, the distortion of the pellicle member framework that can produce because of on pellicle being spread over pellicle member framework the time reduces the useful area of pellicle member, this pellicle member can also be followed the deflection of mask, therefore can also play this excellent effect that can not produce the gas passage.
In addition, the width by making minor face can be easy to control the short brink of pellicle member framework greater than the width on long limit when the processing list film structural component.As a result, can be easy to from the identical side processing list film structural component of grip portion when handling mask, thereby can improve operating efficiency.
In pellicle member framework 1 of the present invention, width W c, the Wd of bonding plane 1a1, the 1b1 of the long limit 1a of also preferred above-mentioned framework 1 and the pellicle 2 of minor face 1b are about equally.Long limit 1a described here and the film bonding plane 1a1 of minor face 1b, width W c, the Wd of 1b1 be meant about equally, the difference of width W c, Wd of film bonding plane 1a1,1b1 that makes long limit 1a and minor face 1b poor less than width W a, the Wb of long limit 1a and minor face 1b.That is, shown in the cut-open view of Fig. 2 and Fig. 3, refer to Wb-Wa＞Wd-Wc.
Usually, utilize bonding agent coating unit, for example X-Y dispensation machines people etc. to apply the bonding agent of pellicle 2 and pellicle member framework 1.In this case, because the bonding agent coated weight of long limit 1a and the per unit length of minor face 1b is identical, therefore, if Wc＜Wd, when pellicle 2 being sticked on the pellicle member framework 1, bonding dosage on the long limit 1a is more, and bonding agent overflows the film bonding plane 1a1 of framework 1 sometimes and hangs down into the interior perimembranous of framework 1.
In addition, the bonding dosage on the minor face 1b is abundant inadequately, and bonding agent can not evenly extend on the whole surface of film bonding plane 1b1, produces narrow gap in the inboard, between pellicle 2 and pellicle member framework 1, and foreign matter is sandwiched in this gap sometimes.
From this viewpoint, width W c, the Wd of film bonding plane 1a1,1b1 by making long limit 1a and minor face 1b as mentioned above like that about equally, even adopt such in the past simple bonding agent coating unit, the pellicle member that also can obtain to be more preferably.
Width W c, Wd method about equally as the film bonding plane 1a1, the 1b1 that make long limit 1a and minor face 1b, as long as bonding plane side formation dip plane at the pellicle 2 of the long limit 1a of the framework at least 1 of pellicle member framework, just can not form step ground and form the dip plane, thereby can prevent that foreign matter is deposited in the pellicle member framework.In addition, this dip plane also can be the curved surface shape.
In addition, by this dip plane is set, can prevent that bonding agent from hanging down into the interior perimembranous of framework.The preferred angled face is to influence the rigidity of pellicle member framework, the size of the such degree of flexibility.
Next, being described as follows the described inboard area of making like that in the pellicle member framework of first technical scheme of the invention described above and second technical scheme is 16000cm
2Sprawl on the above ultra-large type pellicle member framework and bonding pellicle and the ultra-large type pellicle member that obtains.
As pellicle, can use cellulose derivative (NC Nitroncellulose, cellulose acetate, cellulose acetate propionate, acetylbutyrylcellulose etc., or the potpourri more than 2 kinds in these), fluorine based polymer polymkeric substance such as (polymkeric substance that has ring texture in tetrafluoroethene-biasfluoroethylene-hexafluoropropylene terpolymer, the main chain are Teflon AF (trade name), the CYTOP (trade name) of Asahi Glass corporate system, the Algoflon (trade name) of ア ウ ジ モ Application ト corporate system etc. of DUP ONT corporate system) etc.
Pellicle for example uses by polymer solution and becomes film formed film.This film has tension force.On the other hand, in order to prevent the pellicle deflection or produce fold that this tension force is essential.
If pellicle deflection or produce fold, when wanting will remove attached to the foreign matter on the pellicle by air blast, this pellicle can vibrate significantly, is difficult to the above-mentioned foreign matter of removal.In addition, because the height of pellicle is different in different positions, so the foreign body checking machine of pellicle can not normally play a role.Produce problems such as error when in addition, having height with the optical method for measuring pellicle.
Light source for now used single exposure liquid crystal exposure machine is an extra-high-pressure mercury vapour lamp, from improving photostability, cost-effective viewpoint, preferably uses cellulose acetate propionate, acetylbutyrylcellulose.
The thickness of pellicle is preferably about 0.5 μ m～10 μ m, and in large pellicle member of the present invention, from the intensity of pellicle, the making difficulty aspect of uniform film, the thickness of preferred pellicle is 2 μ m～8 μ m.Utilize above-mentioned polymkeric substance the solvent (ketone system, fat system, ethanol class, fluorine system etc.) that is suitable for respectively this polymkeric substance is formed polymer solution.
With respect to above-mentioned cellulose acetate propionate, acetylbutyrylcellulose, preferably use ester systems such as ethyl lactate.According to utilizing deep filter (depth filter), membrane filter (membrane filter) etc. to filter polymer solution.
The one-tenth embrane method of polymer solution has spin-coating method, roll coating process, scraper cladding process, casting Tu Fa etc., from the aspect of homogeneity, management foreign matter, and preferred spin-coating method.When utilize spin-coating method on substrate for film deposition film forming after, according to need utilizing dry out solvent such as heating plate (hotplate), cleaning oven (clean oven), the heating of (far) infrared ray, thereby form uniform film.As the substrate for film deposition of this moment, utilize synthetic quartz, fused quartz, alkali-free glass, glass with lower alkali content, soda lime glass etc.
Because the film forming of large pellicle member of the present invention is bigger with the size of substrate, therefore make the substrate for film deposition fracture sometimes because the temperature during oven dry is uneven.In order to prevent that this situation from taking place, preferred film forming is the smaller the better with the thermal expansivity of substrate.Particularly, preferred 0 ℃～300 ℃ linear expansion coefficient is 50 * 10
-7Below m/ ℃.
In addition, utilize the material of silicon system, fluorine system etc. that film forming is implemented the somatotype processing better in advance with the surface of substrate.In addition, preferably form the low layer (being anti-reflection layer) of this pellicle of refractive index ratio, thereby can improve transmitance with respect to exposure light in the one-sided or both sides of above-mentioned pellicle.
As the material of anti-reflection layer, can use the material of low-refractions such as fluorine based polymer (polymkeric substance that has ring texture in tetrafluoroethene-biasfluoroethylene-hexafluoropropylene terpolymer, the main chain is Algoflon (trade name), polyfluoroacrylate of CYTOP (trade name), the ア ウ ジ モ Application ト corporate system of Teflon AF (trade name), the Asahi Glass corporate system of DUPONT corporate system etc.), calcium fluoride, magnesium fluoride, barium fluoride.
At anti-reflection layer is under the situation of polymkeric substance, can adopt above-mentioned spin-coating method to form this anti-reflection layer equally, is under the situation of inorganics at anti-reflection layer, can adopt film forming methods such as vacuum evaporation, sputter to form this anti-reflection layer.Consider foreign matter, preferably adopt the spin-coating method of polymer solution.The Algoflon (ア Le go Off ロ Application) (trade name) that preferred teflon AF (テ Off ロ Application AF) (trade name), the Ao Simeng company (ア ウ ジ モ Application De society) that uses E.I.Du Pont Company (デ ユ Port Application society) to produce produces, this is because the refractive index of these materials is little, so anti-reflection effect is good.
The pellicle that the template that can utilize stickup jointing material on aluminium alloy, stainless steel, resin etc. and form will utilize said method to be formed on the substrate for film deposition peels from substrate for film deposition, changes on the pellicle member framework that is attached to expectation.In addition, peel this pellicle member framework from substrate for film deposition after also can being adhered on the substrate for film deposition in pellicle member framework with expectation.
The large pellicle his-and-hers watches film structural component framework of Huo Deing applies tension force and is adhered on the framework under the effect of bonding agent like this.
When in the scope of tension force in appropriateness of film, can suppress large pellicle because of the inner and outer air pressure difference of deadweight, large pellicle along the vertical on the film surface of large pellicle expand, depression, thereby can prevent ill-exposed.In addition, can solve when removing attached to the foreign matter on the pellicle by air blast, this pellicle vibrates the such problem of removal foreign matter that is difficult to significantly, the height of pellicle can also solve owing to, can also solve the such problem of generation error when with the height of optical method for measuring pellicle because of the foreign body checking machine of different these pellicles that caused of difference of position such problem that can not normally play a role.In addition, can guarantee the performance of following with respect to the inside and outside barometric fluctuation of large pellicle member.
The film bonding agent that is used for bonding pellicle and pellicle member framework is suitably selected according to the material of the material of pellicle and pellicle member framework.For example, can use bonding agents such as epoxy system, propylene system, silicon system, fluorine system.
In addition, the method for curing of bonding agent can adopt the method for curing (thermmohardening, photo-hardening, anaerobism sclerosis etc.) that various bonding agent is suitable for.From sending out the aspect of dirt, cost, operability, preferably use the UV cured type bonding agent of propylene system.
As being used for pellicle member framework is sticked on mask jointing material on the photomask, can application itself have hot melt system (rubber system, propylene system) material of bonding force, the band class material that forms at the coated on both sides jointing material of base material (as base material, can use foams such as sheet materials such as propylene system, PVC system or rubber system, polyolefin, polyurethane series etc., as jointing material, can application of rubber system, jointing material such as propylene system, silicon system) etc.
In large pellicle member of the present invention,,, preferably use soft hot melt material, foam in order can the pellicle member to be sticked on the mask equably with underload as the jointing material of mask.Under the situation of using foam, utilize the adhesive material of propylene system, vinyl acetate system or the cross section that non-adhesive material covers this foam, thereby can prevent to send out dirt from foam.
The thickness of the jointing material of mask is generally more than the 0.2mm, but for the pellicle member being sticked on the photomask equably, preferably this thickness is more than the 1mm.For the bonding plane of the jointing material of protection aforementioned mask in during before the pellicle member is pasted on photomask, use mylar after handling with silicon system, fluorine based material somatotype as the jointing material of mask.
The housing that is used to carry the pellicle member by the material to propylene system, ABS system, PVC system, PET system etc. carry out injection molded, vacuum forming is made.Charged in order to prevent above-mentioned material, can be in above-mentioned material mixingly go into anti-live agent, also can use polymkeric substance (ADION (trade mark) that the BAYON (trade mark) that Network レ Ha company produces, company of Asahi Chemical Industry produce) with anti-charged structure.
Damage the pellicle member in the housing in order to prevent housing to be out of shape in course of conveying, the housing that ultra-large type pellicle member of the present invention is used preferably is provided with the reinforcement structure in the both sides of lid, dish or the housing of housing, to improve the repellence to external force.
In addition, need a kind of method that can realize following purpose: except can controlling pellicle member framework reliably, can also after when accommodating container takes out the pellicle member, do not make framework deflection, the method for taking-up framework with reversing.And; the large pellicle member particularly big, that processing is also comparatively difficult for pellicle member itself; need a kind of method that can realize following purpose: can take in, carry, control reliably when taking care of this pellicle member this pellicle member; and when taking out this pellicle member from accommodating container; can not make that the pellicle member deforms from the interface of diaphragm and jointing material, deflection ground takes out this pellicle member, thereby can after the taking-up this pellicle member directly be pasted on the mask etc.
So in order not to be subjected to the restriction of photomask, by form the protuberance or the recess of controlling usefulness respectively in all limit portions of pellicle member framework, the length that can control longest edge is the large pellicle member of 1.4m～2.0m.
Particularly, in second technical scheme, because the width of short brink greater than the width of long side, therefore is easy to form protuberance, the recess of controlling usefulness at short brink.
The pellicle member framework of second technical scheme can preferably be followed down such photomask, the long edge lengths of this photomask is that the long edge lengths of pellicle member framework is above and below the long edge lengths+150mm of pellicle member framework, the bond length of this photomask is the above and photomask below the bond length+200mm of pellicle member framework of the bond length of pellicle member framework.The thickness of photomask is so long as can bear the thickness of degree of the weight (not damaging the such degree of photomask) of pellicle member framework and get final product after having pasted pellicle member framework.As the material of photomask, can use soda lime silicate glass, alkali-free glass, glass with lower alkali content, quartz glass etc., but no matter which kind of material photomask is, the pellicle member framework of second technical scheme can both be followed the deflection of this photomask well.
Next, utilize embodiment that the present invention is described in further detail.
Embodiment
The embodiment of first technical scheme
Embodiment 1～99, comparative example 1～71
The inboard area (useful area) of the length (La) of the long limit 1a of ultra-large type pellicle member usefulness framework 1, the length (Lb) of minor face 1b, framework and the thickness of framework are shown in table 1～table 9.In addition, the width (Wb) of the width (Wa) of the long limit 1a of pellicle member framework, minor face 1b is shown in table 1～table 9.
In addition, the material of pellicle member framework is all used aluminium alloy, and the cross sectional shape of framework is a rectangle.And used pellicle member framework is to have implemented the framework that does not have micro-crack that the black aluminum passivation is handled.
Use framework as described above to estimate the performance of actual pellicle member.
Detailed content is as described below.
As pellicle, the polymer solution of cellulose esters is coated on the glass with lower alkali content, utilize spin-coating method to form main film.
Then, similarly use on this main film, utilize spin-coating method to apply fluorine based polymer solution and be formed with anti-reflection layer, thickness is the pellicle of 4 μ m.The pellicle that obtains is sprawled and is bonded on the above-mentioned pellicle member framework.
Whether produce fold (fold during spread film bears results) when having estimated on pellicle being sprawled and is bonded in pellicle member framework here.Evaluation result is shown in table 1～table 9.In the mark of evaluation result, " zero " expression does not have the state of fold fully, and " △ " is illustrated in the state of finding to have a small amount of ripple when examining film, and " * " expression has the state of a small amount of fold.
Then, the pellicle member framework of sprawling and be bonded with pellicle is sticked on the quartz glass.The equal used thickness of mask jointing material of this moment is that the rubber of the styrene ethylene butylene styrene multipolymer of 1.2mm is hot-melt adhesive material, on the mask bonding plane of pellicle member framework, apply this hot-melt adhesive material, then pellicle member framework is sticked on the assigned position of quartz glass.In addition, each member has carried out ultrasonic cleaning before use.
In addition, the size of quartz glass is: the long limit of quartz glass is the long edge lengths+50mm of bonding pellicle member, and the minor face of quartz glass is the bond length+100mm of bonding pellicle member.The size and the thickness of used quartz glass are shown in table 17.
In addition, about the flexibility of pellicle member framework, the degree of following of mask is estimated by the meter film structural component.Make the pellicle member that sticks on the mask be suspended in aerial with being pasted with facing down of pellicle member under the state of two minor faces of controlling mask that make mask and place, the evaluation table film structural component is followed the degree of following of the deflection that mask produces because of deadweight.
Evaluation result is shown in table 1～table 9.The metewand of degree of following is, the average evaluation that will not have to change in will a year after being pasted on mask is " zero ", with bonding portion a little the average evaluation of perk be " △ ", be " * " with the average evaluation that has produced the gas passage.
In addition, use with the pellicle member framework of above-mentioned framework same size and pellicle is sprawled and is bonded in the sample that forms on this framework with the other making of the condition identical with above-mentioned condition, use this sample, control long border district and answer variation α and degree of following β with what above-mentioned measuring condition had been measured same edge, the result is comprehensively with reference to table 1～table 9.
In the comprehensive evaluation, will " evaluation result of degree of following ", " fold during spread film bears results " be " zero " average evaluation for " ◎ " even, will have a average evaluation to be " zero " in above-mentioned two, even there is one to be that the average evaluation of " * " is " * " in will above-mentioned two for " △ ".
The embodiment of second technical scheme
The evaluation method of pellicle member framework of the present invention at first, is described.
Pellicle member framework of the present invention has the rigidity and the flexibility of appropriateness concurrently, about rigidity, by the mode with range estimation whether produced when judging on pellicle being spread over pellicle member framework fold and after whether produced fold evaluation during the processing list film structural component, about flexibility, make the pellicle member that sticks on the mask be suspended in aerial with being pasted with facing down of pellicle member under the state of two minor faces of controlling mask that make mask and place, the evaluation table film structural component is followed the degree of following of the deflection that mask produces because of deadweight.
Embodiment 100～197, comparative example 72～141
The inboard area (useful area) of the length (La) of the long limit 1a of the ultra-large type pellicle member usefulness framework 1 that embodiment and comparative example are used, the length (Lb) of minor face 1b, framework is shown in table 10～table 16.In addition, the thickness of the width (Wb) of the width (Wa) of the long limit 1a of pellicle member framework, minor face 1b and pellicle member framework is also shown in table 10～table 16.
In addition, the material of pellicle member framework is all used aluminium alloy, and the cross sectional shape of framework is a rectangle.And used pellicle member framework is the framework that does not have micro-crack of having implemented black passivation aluminium.
The pellicle member that uses above-mentioned such specification is with the framework performance of having come actual evaluation.
As pellicle, the polymer solution of cellulose esters is coated on the glass with lower alkali content, utilize spin-coating method to form main film.
Then, similarly use on this main film, utilize spin-coating method to apply fluorine based polymer solution and be formed with anti-reflection layer, thickness is the pellicle of 4 μ m.The pellicle that obtains is sprawled and is bonded on the above-mentioned pellicle member framework.In addition, the processing of pellicle member framework all is to implement by a part of controlling one group of each limit in the minor face.
Whether produced fold (fold during spread film bears results) when having estimated on pellicle being sprawled and is bonded in pellicle member framework here.Evaluation result is shown in table 10～table 16.In the mark of evaluation result, " zero " expression does not have the state of fold fully, and " △ " is illustrated in the state of finding to have a small amount of ripple when examining film, and " * " is illustrated in the state that a small amount of fold is arranged on the film.
Then, the pellicle member framework of sprawling and be bonded with pellicle is sticked on the quartz glass.The equal used thickness of mask jointing material of this moment is that the rubber of the styrene ethylene butylene styrene multipolymer of 1.2mm is hot-melt adhesive material, on the mask bonding plane of pellicle member framework, apply this hot-melt adhesive material, then pellicle member framework is sticked on the assigned position of quartz glass.In addition, each member has carried out ultrasonic cleaning before use.
In addition, the size of quartz glass is: the long limit of quartz glass is the long edge lengths+50mm of bonding pellicle member, and the minor face of quartz glass is the bond length+100mm of bonding pellicle member.The size and the thickness of used quartz glass are shown in table 17.
Observe the surface of above-mentioned such pellicle that is secured at the pellicle member on the photomask that obtains, also estimated back on pellicle being sprawled and is bonded in pellicle member framework to this pellicle member sticked on the photomask during in a series of treatment process whether produced fold (bearing results of the fold that produces because of processing).
Here, a series of treatment process is meant by conveying operation → the inspections operation → packaging process → operation of the dispatching from the factory → taking-up operation after assembling (pellicle sprawl, the bonding) operation → pellicle member the is sticked on treatment process of the operation formation on the photomask.In the conveying operation behind assembling procedure, use the in-process carrying to control near 4 angles of short brink of pellicle member framework part can not make the drop hold of such degree of pellicle member, the pellicle member is carried to the inspection operation with the maintenance body.At this moment, the state that long limit is parallel to the ground, minor face is perpendicular to the ground with the pellicle member is carried to the inspection operation with this pellicle member.In checking operation, through once around the rotation up and down of the horizontal axis of pellicle member, once around the left rotation and right rotation of vertical axis, once be that 90 degree on the plane of pellicle of axis are checked rotatably at center with pellicle.The state that long limit is parallel to the ground, minor face is perpendicular to the ground with the pellicle member is transported to packaging process with the pellicle member.In packaging process, with the state that keeps body the pellicle member is accommodated in the accommodating container of pellicle member to attach the in-process carrying.Then, unload in-process carrying maintenance body in the inside of accommodating container, thereby only the pellicle member is accommodated in the accommodating container.In the operation of dispatching from the factory, carry to estimate the common mode of movement that adopts truck to carry.At this moment, accommodating container is maintained horizontality.In taking out operation, in accommodating container, take out the pellicle member with the state of pellicle member framework and ground level.When taking out the pellicle member, control near 4 angles of short brink of pellicle member framework part can not make the drop hold of such degree of pellicle member.In the operation that this pellicle member is sticked on the photomask, under the state of pellicle member framework and ground level can not make the drop hold of such degree of pellicle member control near 4 angles of short brink of pellicle member framework part, keep this state by the mask bonding agent of pellicle member the pellicle member to be sticked on the mask unchangeably.After sticking on the pellicle member on the mask, still the such adherence force that changes with the profile that can not make the pellicle member is pasted securely.
Evaluation result is shown in table 10～table 16.In addition, metewand with pellicle is sprawled and is bonded in pellicle member framework on the time metewand identical.
In addition, with above-mentioned his-and-hers watches film structural component the appreciation condition of the degree of following of mask has been estimated flexibility.Evaluation result is (evaluation result of degree of following) shown in table 10～table 16.The metewand of degree of following is: after sticking on the pellicle member on the mask, under the state of two minor faces of controlling mask that make mask, make the pellicle member that sticks on the mask be suspended in aerial with being pasted with facing down of pellicle member and place, the average evaluation that will not have to change in 1 year is " zero ", with bonding portion a little the average evaluation of perk be " △ ", the average evaluation that has produced the gas passage is " * ".
In the comprehensive evaluation, will " evaluation result of degree of following ", " fold during spread film bears results ", " bearing results of the fold that produces because of processing " average evaluation of being " zero " is " ◎ ", even will have in above-mentioned three a average evaluation to be " zero ", be " * " even in will above-mentioned three an average evaluation for " * " be arranged for " △ ".
Table 1
Table 2
Table 3
Table 4
Table 5
Table 6
Table 7
Table 8
Table 9
Table 10
Table 11
Table 12
Table 13
Table 14
Table 15
Table 16
Table 17
Table 17
Industrial applicibility
Adopt the using method of pellicle member framework of the present invention, pellicle member, pellicle member framework, in the used large-scale photomask of the photo-mask process of the large-scale colored TFTLCD (Thin Film Transistor-LCD) that can be applied in recent years exploited high image quality gradually, can show accurately, the reticle mask.
Description of reference numerals
1, pellicle member framework; 1a, long limit; 2a, minor face; 1a1,1b1 bonding plane; 1a2,1b2, plane inclined plane; 2, pellicle; 10, large pellicle member.
Claims (7)
1. pellicle member framework, it is a rectangle, the variation α that answers of this pellicle member framework is below 0.06%, degree of the following β on each limit of this pellicle member framework shown in the following general form (1) is more than the 3mm, degree of the following β on the long limit of this pellicle member framework is below the 32mm, and the long edge lengths of framework is 1400mm～2100mm, and the inboard area of this pellicle member framework is 15000cm
2More than.
β=(deflection of 1/ pellicle member) * thickness * width (1)
2. pellicle member framework according to claim 1 is characterized in that,
The minor face width of this pellicle member framework is 1.05 times～1.50 times of long hem width degree.
3. pellicle member framework, it is a rectangle, and the long hem width degree Wa of this pellicle member framework is 13.0mm～30.0mm, and minor face width W b and the ratio Wb/Wa of long hem width degree Wa are 1.05～1.50, long edge lengths is 1400mm～2100mm, and the inboard area of framework is 16000cm
2More than.
4. according to any described pellicle member framework in the claim 1～3, wherein,
The material that constitutes this pellicle member framework is an aluminum or aluminum alloy.
5. according to any described pellicle member framework in the claim 1～4, it is characterized in that,
Aluminum passivation processing, black processing and sealing of hole are implemented in the surface of above-mentioned pellicle member framework to be handled, thereby in fact do not have micro-crack on this surface, it is to handling the processing of the peristome enforcement in the small hole that forms because of having carried out aluminum passivation that this sealing of hole is handled.
6. a pellicle member obtains this pellicle member by pellicle being spread in the claim 1～5 on any described pellicle member framework.
7. the using method of a pellicle member framework, control at least one place of each minor face in one group of relative minor face of pellicle member framework of the described pellicle member of claim 6 respectively, the pellicle member is sticked on the mask, and the mask that will be pasted with this pellicle member afterwards is used in exposure-processed.
Applications Claiming Priority (5)
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| JP2008235388 | 2008-09-12 | ||
| JP2008-235599 | 2008-09-12 | ||
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| JP2008235599 | 2008-09-12 | ||
| PCT/JP2009/065919 WO2010029997A1 (en) | 2008-09-12 | 2009-09-11 | Pellicle frame, pellicle and method for using pellicle frame |
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| JP (2) | JP4886070B2 (en) |
| KR (2) | KR101287700B1 (en) |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104102089A (en) * | 2013-04-15 | 2014-10-15 | 信越化学工业株式会社 | Dust-proofing thin film assembly frame and dust-proofing thin film assembly using the same |
| CN105652587A (en) * | 2014-12-01 | 2016-06-08 | 信越化学工业株式会社 | Antidust pellicle frame and antidust pellicle assmbly therewith |
| CN107087359A (en) * | 2016-02-16 | 2017-08-22 | 联想（新加坡）私人有限公司 | The manufacture method of framework part, electronic equipment and framework part |
| CN112969964A (en) * | 2018-09-12 | 2021-06-15 | 美商福昌公司 | Protective film for flat panel display photomask |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011129378A1 (en) * | 2010-04-13 | 2011-10-20 | 旭化成イーマテリアルズ株式会社 | Self-supporting film, self-supporting structure, method for manufacturing self-supporting film, and pellicle |
| JP5411200B2 (en) * | 2011-04-26 | 2014-02-12 | 信越化学工業株式会社 | Pellicle for lithography |
| JP5746662B2 (en) * | 2012-05-11 | 2015-07-08 | 信越化学工業株式会社 | Pellicle frame |
| JP5822401B2 (en) * | 2012-12-25 | 2015-11-24 | 信越化学工業株式会社 | Pellicle for lithography |
| JP6460778B2 (en) * | 2014-12-25 | 2019-01-30 | 日本特殊陶業株式会社 | Pellicle frame and method for manufacturing pellicle frame |
| TWI576657B (en) * | 2014-12-25 | 2017-04-01 | 台灣積體電路製造股份有限公司 | Photomask cleaning apparatus and method |
| JP6491472B2 (en) * | 2014-12-25 | 2019-03-27 | 日本特殊陶業株式会社 | Pellicle frame and method for manufacturing pellicle frame |
| CN113721420A (en) * | 2015-02-03 | 2021-11-30 | Asml荷兰有限公司 | Mask assembly and associated method |
| US9658526B2 (en) | 2015-06-30 | 2017-05-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Mask pellicle indicator for haze prevention |
| KR101970059B1 (en) * | 2016-04-05 | 2019-04-17 | 아사히 가세이 가부시키가이샤 | Pellicle |
| US10007176B2 (en) | 2016-09-01 | 2018-06-26 | Taiwan Semiconductor Manufacturing Co., Ltd | Graphene pellicle for extreme ultraviolet lithography |
| JP6729233B2 (en) * | 2016-09-20 | 2020-07-22 | 日本軽金属株式会社 | Pellicle support frame, pellicle, and manufacturing method thereof |
| US10162258B2 (en) | 2016-12-15 | 2018-12-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Pellicle fabrication methods and structures thereof |
| TWI618975B (en) * | 2016-12-28 | 2018-03-21 | Micro Lithography Inc | Photomask dustproof frame structure |
| JP6861596B2 (en) * | 2017-08-07 | 2021-04-21 | 信越化学工業株式会社 | Pellicle frame and pellicle |
| EP3764161A4 (en) * | 2018-03-05 | 2021-12-01 | Mitsui Chemicals, Inc. | Pellicle, exposure master, exposure device and method for manufacturing semiconductor device |
| KR102408849B1 (en) * | 2018-10-29 | 2022-06-13 | 구뎅 프리시젼 인더스트리얼 코포레이션 리미티드 | Reticle Retention System |
| JP7063962B2 (en) * | 2020-09-23 | 2022-05-09 | 信越化学工業株式会社 | Pellicle frame and pellicle |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001109135A (en) * | 1999-07-30 | 2001-04-20 | Asahi Kasei Electronics Co Ltd | Frame for large-sized pellicle and large-sized pellicle |
| CN1737689A (en) * | 2004-08-18 | 2006-02-22 | 信越化学工业株式会社 | Pellicle frame and pellicle for photolithography using the same |
| JP2006178434A (en) * | 2004-11-25 | 2006-07-06 | Asahi Kasei Electronics Co Ltd | Large pellicle |
| CN101086612A (en) * | 2006-06-09 | 2007-12-12 | 信越化学工业株式会社 | Protection film components containing vessel and manufacturing method thereof |
| US20070292775A1 (en) * | 2006-06-14 | 2007-12-20 | Shin-Etsu Chemical Co., Ltd | Pellicle |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4004188B2 (en) * | 1999-07-30 | 2007-11-07 | 旭化成エレクトロニクス株式会社 | Large pellicle frame |
| JP2001083691A (en) * | 1999-09-13 | 2001-03-30 | Asahi Kasei Electronics Co Ltd | Pellicle free from occurrence of dust |
| JP4043232B2 (en) * | 2001-01-26 | 2008-02-06 | 旭化成エレクトロニクス株式会社 | Large pellicle |
| KR101191055B1 (en) * | 2007-07-06 | 2012-10-15 | 아사히 가세이 이-매터리얼즈 가부시키가이샤 | Frame of large pellicle and grasping method of frame |
| JP5051840B2 (en) * | 2007-11-22 | 2012-10-17 | 信越化学工業株式会社 | Method for storing a pellicle in a pellicle storage container |
-
2009
- 2009-09-11 JP JP2010528762A patent/JP4886070B2/en active Active
- 2009-09-11 TW TW103143952A patent/TWI537674B/en active
- 2009-09-11 CN CN201210410055.0A patent/CN102944973B/en active Active
- 2009-09-11 CN CN200980133492.9A patent/CN102132210B/en active Active
- 2009-09-11 WO PCT/JP2009/065919 patent/WO2010029997A1/en active Application Filing
- 2009-09-11 KR KR1020117004478A patent/KR101287700B1/en active IP Right Grant
- 2009-09-11 KR KR1020137010747A patent/KR101390007B1/en active IP Right Grant
- 2009-09-11 TW TW098130810A patent/TWI497197B/en active
-
2011
- 2011-11-14 JP JP2011248866A patent/JP5284445B2/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001109135A (en) * | 1999-07-30 | 2001-04-20 | Asahi Kasei Electronics Co Ltd | Frame for large-sized pellicle and large-sized pellicle |
| CN1737689A (en) * | 2004-08-18 | 2006-02-22 | 信越化学工业株式会社 | Pellicle frame and pellicle for photolithography using the same |
| JP2006178434A (en) * | 2004-11-25 | 2006-07-06 | Asahi Kasei Electronics Co Ltd | Large pellicle |
| CN101086612A (en) * | 2006-06-09 | 2007-12-12 | 信越化学工业株式会社 | Protection film components containing vessel and manufacturing method thereof |
| US20070292775A1 (en) * | 2006-06-14 | 2007-12-20 | Shin-Etsu Chemical Co., Ltd | Pellicle |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104102089A (en) * | 2013-04-15 | 2014-10-15 | 信越化学工业株式会社 | Dust-proofing thin film assembly frame and dust-proofing thin film assembly using the same |
| CN105652587A (en) * | 2014-12-01 | 2016-06-08 | 信越化学工业株式会社 | Antidust pellicle frame and antidust pellicle assmbly therewith |
| CN105652587B (en) * | 2014-12-01 | 2019-12-06 | 信越化学工业株式会社 | Dustproof pellicle assembly frame and dustproof pellicle assembly using same |
| CN107087359A (en) * | 2016-02-16 | 2017-08-22 | 联想（新加坡）私人有限公司 | The manufacture method of framework part, electronic equipment and framework part |
| CN112969964A (en) * | 2018-09-12 | 2021-06-15 | 美商福昌公司 | Protective film for flat panel display photomask |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20130049837A (en) | 2013-05-14 |
| TW201510638A (en) | 2015-03-16 |
| CN102132210B (en) | 2013-01-23 |
| JP5284445B2 (en) | 2013-09-11 |
| TWI537674B (en) | 2016-06-11 |
| TWI497197B (en) | 2015-08-21 |
| CN102944973A (en) | 2013-02-27 |
| JP2012068667A (en) | 2012-04-05 |
| KR20110034032A (en) | 2011-04-04 |
| TW201015213A (en) | 2010-04-16 |
| KR101390007B1 (en) | 2014-04-29 |
| CN102944973B (en) | 2015-01-21 |
| KR101287700B1 (en) | 2013-07-24 |
| JP4886070B2 (en) | 2012-02-29 |
| WO2010029997A1 (en) | 2010-03-18 |
| JPWO2010029997A1 (en) | 2012-02-02 |
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