TW201015213A - Pellicle frame, pellicle and method for using pellicle frame - Google Patents

Abstract

Provided is a pellicle frame wherein the frame is not distorted when a pellicle film is stretched and pasted, and the pellicle frame itself follows up flexure caused by the weight of a mask even after a pellicle is pasted to the mask. A rectangular pellicle frame has a distortion factor α of 0.06% or less, the followability β of each side of the pellicle frame expressed by the general expression (1) is 3 mm or more, the followability β of the long side of the pellicle frame is 32 mm or less, the long side of the pellicle frame has a length of 1400-2100 mm, and the area on the inside of the pellicle frame is 15000 cm<SP>2</SP> or more. β=(1/flexure of pellicle)thicknesswidth (1).

Description

[Technical Field] The present invention relates to a frame which is a component of a photomask cover for preventing LSI (Large Scale Integration) and constituting a liquid crystal display (LCD) , a thin film transistor (TFT ' Thin Film Transistor) or a color filter (CF, Color Filter), etc., used in the lithography step of the manufacturing process, such as a reticle or a reticle attached to a foreign object, and In particular, the invention relates to a reticle protective film frame which is a component of an ultra-large reticle protective film having a long side length exceeding 14 〇〇 mm, a reticle protective film using a reticle protective film frame, and a reticle protective cover frame. Instructions. [Prior Art] The present invention relates to a technique of a frame member and a mask film which are constituent members of a mask film, and first, a mask film will be described. In the past, in the manufacture of semiconductor circuit patterns and the like, a dustproof mechanism called a mask film has been generally used to prevent foreign matter from adhering to the mask or the marking line. The 4° mask film is attached to, for example, a mask. Or a shape of a reticle having a shape having a uniform shape and a thickness of about several millimeters, and a transparent polymer film having a thickness of not more than 2 μΓΠ or a cellulose derivative or a vaporized polymer (such as a vaporized polymer) Hereinafter, it is called a reticle film, and an adhesive material is applied under the frame, and the protective film is adhered to the adhesive material with a specific adhesive force. The adhesive material is used to fix the reticle film to the reticle or the reticle. The protective film is attached to the _ material for the point of the attached material to maintain the adhesion of the adhesive material. 143170.doc 201015213 In general, such a reticle film is supplied by the manufacturer of the reticle film to the manufacturer of the reticle or reticle, and after the reticle film is adhered to the reticle or reticle , and then to manufacturers of semiconductor manufacturers, panel manufacturers and other lithography processing. In recent years, with the spread of various multimedia, a large-color TFT LCD (Thin Film Transist, Liquid Crystal Display, and a thin film transistor) capable of high-definition/high-definition display is required. Accordingly, there is a need for a large reticle film that can be applied to a large reticle or reticle used in the photolithography step. As a frame of a reticle film which can be applied to a large reticle or a reticle used in a photolithography step of a large TFT LCD (Thin Film Transistor Liquid Crystal Display), generally has a long side and a short side. Rectangular. If the mask film is attached to the frame, the side of the frame may be deformed inward due to the tension of the mask film, and the effective exposure area of the mask or the reticle may be caused by the deformation. This becomes smaller as the expanded area of the reticle film becomes larger (the reticle film becomes larger). The above-described phenomenon can be solved by increasing the rigidity of the mask cover frame in a state in which the area inside the frame of the mask film is maintained as much as possible (hereinafter referred to as an effective area) (for example, refer to Patent Document 1) ). [PRIOR ART DOCUMENT] [Patent Document 1] [Patent Document 1] JP-A-2001-109135 [Summary of the Invention] [Problems to be Solved by the Invention] 143170.doc 201015213 However, in recent years, with the further development of large-scale , a new problem has arisen. The above-mentioned new problem means that the development of the large-scale in recent years requires that the reticle or the reticle (hereinafter referred to as the reticle) itself is also large-sized, and the reticle that has no problem in the enlargement of the reticle has been further large by itself. This causes the mask itself to bend due to its own weight. That is, there is a problem in that, since the photomask film is used in a state of being attached to the photomask, when the photomask film cannot follow the mask, the photomask and the photomask are attached. The surface will be peeled off, resulting in the use of the photo-protective film. In particular, the reticle film after the adhesion = cover or the like is often operated in the operation step by holding the short side of the reticle to operate each reticle film, so that the frame of the reticle film can be followed. The change of the mask on the long side and the like. As described above, in the case of increasing the size of the mask film, the problem of not changing the mask film itself is to improve the rigidity of the mask film. However, the mask film is used as a solution. Further enlargement (very large-scale ginseng) requires not only the improvement of the rigidity of the reticle film but also the bending of the reticle itself caused by the enlargement of the reticle itself attached to the reticle film, especially It is able to follow the bending of the long side in the work step. In other words, for the oversized reticle film, both rigidity and flexibility are required. As described above, the ultra-large size of the photomask has created a new problem for the super-large photomask film used therein. The present invention is for solving a new problem caused by the increase in size of the mask film, and the problem of solving the mask film frame of the first invention is that the mask film is 143170.doc 201015213. When the mask is protected, the frame body is not deformed. Further, after the mask film is attached to the mask, the mask film frame itself can follow the bending of the mask itself due to its own weight. Further, in the case of the ultra-large reticle film, it is also required to have a property in which the frame body is not deformed until the reticle film is adhered to the reticle cover frame until it is attached to the reticle. The problem of the photomask cover film of the second aspect of the invention is that the frame of the photomask cover does not deform when the photomask cover is unfolded, and the cover film is spread and adhered to the cover film frame. After that, the frame body will not be deformed until the operation of attaching to the reticle. Further, after the reticle film is attached to the reticle, the reticle cover itself can follow the self-weight of the reticle itself. Bending. [Means for Solving the Problems] In order to solve the above problems, the inventors of the present invention have found that the above problem can be solved by limiting the deformability 〇1 and the followability p of the frame of the super-large reticle film. The first invention of the present invention has been completed. Moreover, the inventors of the present invention have found that the above problem can be solved by widening the width Wb of the short side lb of the mask cover frame by a specific ratio with respect to the width Wa of the long side la, thereby completing the second aspect of the present invention. invention. That is, the present invention is as follows. (1) A reticle cover film frame which is a rectangular reticle cover film frame, and the deformability α of the reticle cover film frame is 0.06% or less, which is represented by the following general formula (1) The followability β of each side of the mask film frame is 3 mm or more, and the followability β of the long side of the mask is 32 mm or less and the long side of the frame is 1400 mm or more. 2100 mm or less, and the area of the inner side of the 143170.doc 201015213 of the reticle housing is 15 000 cm 2 or more, β = (1/bending of the mask film) x thickness χ width (丨). (2) The mask film casing of (1), wherein the width of the short side of the mask film frame is 1.05 times or more and 150 times or less the width of the long side.

(3) A reticle cover film frame, which is a rectangular reticle cover film frame, and the width of the long side of the reticle cover film frame is 3 or more and 3 〇〇 mln or less. The ratio of the width Wb of the short side to the width Wa of the long side is 丨〇5 or more and 1.50 or less, the length of the long side is 14 〇〇 or more and 2100 mm or less, and the area inside the casing is 16 〇〇〇cm 2 or more. (4) The reticle casing according to any one of (1) to (3), wherein the material constituting the reticle casing is aluminum or an alloy thereof. (5) The reticle cover film frame according to any one of (1) to (4), wherein the surface of the reticle film C body is formed by acid treatment, blackening treatment and alumite treatment The opening of the hole is subjected to a sealing process and is substantially free of microcracks. (8) A reticle film </ RTI> which is obtained by spreading the reticle film on the reticle casing of any one of (1) to (7). (7) - The timing method of the fresh Wei frame, which holds at least the light-shielding film described in (6) and the reticle retaining body (4) at least - at each of the short sides of the group short side The cover film is attached to the photomask, and then the photomask to which the photomask cover is attached is used for exposure processing. [Effects of the Invention] The reticle protective film frame of the present invention has moderate rigidity and flexibility. Therefore, when the reticle protective medium is unfolded and adhered to the reticle protective film frame, the frame body is not deformed, and is not reduced. The effective exposure area indicated by the inner area of the small mask film is 143170.doc 201015213 The domain and then the 'Si δ蒦 film is attached to the mask, and can also follow the mask of the mask. Therefore, the mask and the mask cover There is no air path on the adhesive surface. Further, when the mask 2 is applied to the mask cover after the mask is applied, the frame is not deformed until the operation is performed until the mask is attached. Furthermore, the 'photomask cover frame of the present invention' is also effective in the case of super-large reticle protection. Specifically, in the case of an ultra-large reticle film having an effective area of 15 _ coffee 2 or more , has a significant effect. [Embodiment] Hereinafter, embodiments for carrying out the invention will be described. The following embodiments are for illustrating the examples of the present invention and are not intended to be limited to the following. The shape of the reticle shield frame of the present invention is a shape similar to that of the reticle. The long side of the mask film (4) refers to the longest side of the frame, and the short side of the mask film frame refers to the shortest side of the frame. More specifically, in the case of a rectangular shape, the longer side of the two sides is the long side, and the shorter side is the short side 'the square material, and the four sides are equal lengths. When you are in a square, you can define either side as the long side and the short side. The deformability α is represented by the following formula (7). This deformability reading was measured by the following method. Hereinafter, a method of measuring the deformation fineness will be described with reference to Figs. 4A, 4, and 4C. First, the length (the length of the initial state) L1 (shown in Fig. 4A) of the side of the photomask film frame to be deformed is measured. Thereafter, as shown in Fig. 5, it is not necessary to measure the deformability of the mask cover frame i by the seat 20, and the lower side of the two sides (not in contact with the upper side). At this time, from the lower branch 143170.doc 201015213, the entire edge of the deformability α is not required, so that the end of the mask cover i is up! 5 Li has been supported. For example, when facing the reticle cover frame! When the short side is measured, the entire long side is supported by the base 20 from below so that the long side does not bend. When the long side of the reticle cover is measured, the base 20 supports the entire short side from below. In this state, it is guaranteed for four minutes (as shown in Fig.), and then the support is stopped. The reticle is placed on the flat platform, and the length of one side needs to be measured after 10 minutes. After the support (after the force generated by the self-weight), L2 (as shown in Fig. 4C) is measured again, and the elongation of the length L2 after the support relative to the initial state L1 is calculated as the deformation according to the following formula. Sex α. The temperature at the time of measurement was 23.8 ° C, and the relative humidity was 74% RH, [(the length after support L2 / the length of the initial state l 1 ) · 丨] x 丨〇〇 (%) (2). Furthermore, since there are four sides in the rectangular mask film frame, the same measurement is performed on each side, and the deformability (the maximum value of 1 is used as the deformability α of the mask film frame. When the width of the middle side of the bottom surface is different, the deformability α is measured such that the width of the side φ is wide. The lower limit of the deformability α of the mask film casing is 〇% or more, and the upper limit is 〇〇6. % or less is preferably 0.02% or less, and most preferably 〇〇1% or less. Further, 'the followability of the reticle shield frame to the follower of the reticle is represented by the following general formula (1) The lower limit of β of each side of the cover film frame is 3, and more preferably 4 mm or more, and the upper limit of the followability of the long side of the cover film frame is 32 mm or less, preferably 25 mm. The follow-up of the short side of the reticle cover is preferably 100 mm or less, more preferably 80 mm or less 'excellently 50 mm or less, 143170.doc 201015213 β=(ι/mask protection The amount of bending of the film) x thickness x width (1) The method of measuring the followability β is as follows. First, as shown in Fig. 5, the follow-up property is not measured in the mask guard frame. The lower side of the two sides of the cymbal is supported by the pedestal 2 。. At this time, the entire side of the follow-up (4) is not measured from the bottom, and the end of the reticle shield i is raised to 15 mm. For example, when measuring the short side of the reticle cover frame, the entire long side is supported by the pedestal 20 from below so that the long side does not bend. When the long side of the reticle shield frame i is When the measurement is performed, the entire short side is supported from the lower side by the pedestal 2, and after maintaining for 1 () minutes in this state, as shown in Fig. 4B, the change of the most curved portion of the side to be measured with respect to the initial shape is measured. The amount 'this amount of change is used as the bending amount ΔT of the mask film. Then 'the reciprocal of the bending amount is multiplied by the thickness and width of the side to be measured' as the follow-up property. The follow-up measurement system is for the mask film. f. All sides are performed. Also, when the width of the upper side and the bottom side are different, 'the width of the side is wide, and the side of the width is facing downward. (4) The measurement of the follow-up property of the follow-up is performed simultaneously with the above deformation (1 measurement) «Hai follow-up beta system means flexible refers to the system of ......"...Heil flexible means reticle cover film frame The extent to which the body chord can follow the reticle (4). Therefore, the value is higher, but when the follow-up is too high, the reticle film is creased when it is unfolded, so the followability must be in the above range. Also, the lower limit of the thickness of the light-grass protective film frame Zhao is preferably 40 or more, more preferably 5.0 _ or more, particularly preferably 6 〇 or more. The other side: 2: preferably 10 mm Hereinafter, it is more preferably 8 _ or less, and further preferably 疋 7 or less, particularly preferably 6.5 mm or less. 14317 〇.d〇c 201015213 The width of the mask to the frame is preferably 13 mm or more. More preferably, it is Μ mm or more, and more preferably 16 mm or more. On the other hand, the upper limit is preferably 疋30 mm or less, more preferably 25 mm or less, and even more preferably μ mm or less. Furthermore, in terms of width, the width of either side of the long side and the short side may be equal or may be independent widths. Furthermore, the width of the side of the reticle casing is as shown in Figs. 2 and 3, and refers to the maximum width of each side such as Wa and Wb. _ The cross-sectional shape of each side of the mask film casing is rectangular, Η-shaped, τ-type, etc., and is not particularly limited, but is preferably a rectangular shape. The profile can be a hollow structure. The more the reticle cover frame of the present invention is super-large, the more remarkable the effect is. Specifically, when the length of the long side of the reticle cover is 14 〇〇 or more, especially 1700 mm or more and 21 〇 〇mm or less, and the effective area of the reticle protective film is 16,000 cm2 or more, 24000 cm2 or more, especially 25000 cm2 or more, which has a remarkable effect. Further, the photomask cover of the present invention has a significant effect if it is large, but the upper limit of the effective area of 35,000 cm2 is sufficient according to the size required for the photomask used in the manufacture of the TFTLCD. . In the case of a large reticle film having a long side length of 1400 mm or more, in order to improve the degree of freedom in the operation step, it is preferable to hold only the side of the short side and the side of the long side of the short side. Performing the operation ' Especially when considering the work efficiency, it is preferable to hold the short side of the two sides of the holding method. If the ratio of the width wb of the short side of the mask film frame to the width Wa of the long side is Wb/W_i (^, when the operation is performed by the holding method of the short side 2 sides, the rigidity can be generally high. Holding the side, which can suppress the production of sensitive folding during operation 143170.doc •II- 201015213 Raw 6 When the mask film can be operated from the short side of the width, the grip portion when holding is changed In view of the improvement of the operability, it is particularly preferable to form the convex portion and the concave portion for gripping on the short side of the mask cover frame. Further, if Wb/Wa is 1.50 or less. Even if the mask cover frame is erected (the long side is perpendicular to the ground and the short side is parallel to the ground), the deformation on the long side can be suppressed, so that the occurrence of the enemy pleats can be suppressed. In the ultra-large reticle protective film whose effective area of the reticle protective film reaches 16,000 cm2 or more, in terms of work efficiency, it is preferable to rotate the reticle protective film and perform foreign matter inspection on the surface of the reticle protective film. The step of erecting the mask cover frame is performed, but if Wb/Wa is 1.50 or less, it can be suppressed. The deformation of the side surface can suppress the slight occurrence of the flaw of the mask film in the foreign matter inspection step, etc. The width Wb of the short side lb of the mask film casing 1 is specifically the width Wb of the short side lb. The ratio of the width Wa of the long side la (Wb/Wa) is preferably 1.05 or more, more preferably 1.1 or more, and the upper limit is preferably 1.50 or less, more preferably 1.25 or less, and particularly preferably 1.2 or less. Examples of the material constituting the reticle casing of the present invention include carbon steel for mechanical construction (SC series, etc.), and tool steel (carbon tool steel SK series, high speed tool steel SKH series, alloy tool steel SKS series). , SKD series, SKT series, etc., Ma Tian loose iron series stainless steel series (SUS403, SUS410, SUS410S 'SUS420J1 'SUS420J2, SUS429J1 'SUS440A, SUS3 04, etc.), Ming, aluminum alloy (5 000 series, 6000 series, 7000 series, etc.) ) such as metals; ceramics (SiC, AIN, A1203, etc.); composite materials of ceramics and metals (Al-SiC, A1-A1N, A1_A1203, etc.), of which aluminum or its combination 143170.doc -12- 201015213 2 ' More specifically, 'can be listed with the alloy of the town, Shao and magnesium and strontium Alloy, aluminum, alloy of zinc and magnesium. - Furthermore, each of the above-mentioned steel materials is a magnetic material, so that it can be solidified by a magnet, especially in the case of a frame of a large reticle film, and the processing operation is good. It can also be used for the blackening of black ore, black acid, black, etc. on the surface of the mask frame. Among them, the black alumite treatment will be explained. • It is used as a mask film. The support frame, in general, the aluminum alloy of the 5_ series is used, and therefore, the aluminum alloy is taken as an example for description. In the ordinary black acid-resistant process, after the mask cover is formed by using the alloy, the acid-resistant treatment is performed, and the micropores generated by the treatment are filled with a blackening agent, and then the plugging is performed. The sealing treatment of micropores is carried out by black acid and acid treatment. However, when the surface of the support frame produced by the conventional method as described above was observed by an electron microscope, the occurrence of fine cracks (microcracks) was confirmed. Such microcracks are further developed in the Φ micronization of the pattern, and the wiring width is further narrowed, and the fall of the extremely small foreign matter entering the crack will also become a problem. Therefore, as a method for preventing the occurrence of the above microcracks, it is preferred to employ the method described below. First, the surface of the reticle shield frame is subjected to an alumite treatment. The acid-resistant aluminum treatment is carried out in a range of a sulfuric acid concentration of 1 Torr to 2 〇%, a current density of 1 to 2 A/dm 2 , an electrolyte temperature of 15 to 3 Torr, and an energization time of 10 to 30 minutes. At this time, a large number of micropores (diameter 50 to 200 A, pitch 500 to 1500 A) are regularly formed on the surface of the alloy. After that, the hole is used for blackening. The blackening process is implemented to prevent light from the frame from being reflected. 143170.doc -13- 201015213 is not limited to black, and #includes dark colors such as full black or dark blue. Examples of the blackening treatment include dyeing, electrolytic coloring, and the like. The dyeing is a method of obtaining a chromaticity by immersing a dye in a liquid in which a black dye is dissolved in a liquid in which a black dye is dissolved, and electrolytic dyeing is performed by electrically depositing a metal element in the pore to obtain a chromaticity. The dyeing can be carried out, for example, under the conditions of a dye concentration of 3 to 10 g/L and a dyeing liquid temperature of 5 to 65 〇c. Then, a sealing treatment for sealing the hole is performed. In this treatment, for example, a Hard Wall 3 (trade name) sealing aid 6 to 12 g/L of a water-filled porch manufactured by Rihua Chemical Industry Co., Ltd., which is called a low-temperature sealing agent, is used. The micropores on the surface of the alumite film are filled by the sealing holes at this time, so that the acid-resistant aluminum film is continuously densified, but the temperature at the sealing hole is slightly less than 1 Torr. The temperature of the crucible is, for example, 70 to 95. (:, more preferably 80 to 9 (sealing treatment under rc, it is possible to produce a mask film frame having extremely uniform surface properties and substantially no micro-cracks. Moreover, the presence or absence of micro-cracks is judged by The surface of the support frame is magnified to 1000 times by an electron microscope, and a line of 10 cm (actual size 〇 1 mm) is drawn, and the number of cracks intersecting the line is calculated. The width of the crack is shown by the electron microscope photograph. The crack width is 〇. i μιη or more. The higher the value, the higher the density of cracks can be judged. It can also be applied to the inner wall surface or the entire surface of the reticle casing as needed. Adhesive materials (acrylic, vinyl acetate, Shiki, rubber, etc.) or lubricating oils (polyoxygen, fluorine, etc.) for capturing foreign matter. The micro-holes inside and outside the body 'eliminate the inner and outer air pressure of the space formed by the mask film and the reticle 143170.doc 14 201015213 The difference 'can prevent the film from expanding or sag. Also, at this time, if the micro-hole Outside installation of foreign matter removal The sputum's not only can adjust the air pressure, but also prevent foreign matter from intruding into the space formed by the reticle protective film, so it is better. When the space formed by the reticle protective film and the reticle is large, if When a plurality of such holes or filters are provided, the expansion of the film due to the change in the gas pressure or the recovery time of the concave is shortened, so that it is preferable that the reticle cover of the present invention can satisfy the above-mentioned necessity. The condition is both rigid and flexible. Therefore, there is no deformation of the frame caused by the deployment of the mask film, and it can not only follow the bending when the mask film is separately operated, but also follow the subsequent attachment to the mask. In the operation after the reticle, the reticle itself is bent. As a result, wrinkles are not generated on the reticle film, and the reticle can be bent, so that an excellent effect of the air path is not obtained. The reticle shield frame of the present invention has been described. However, the reticle shield frame of the present invention can further improve the reliability of the reticle cover film frame by having the following structure. 1, Figure 2 and Figure 3 When the widths of the long side la and the short side lb of the photomask cover film are the same Wa and Wb, the widths Wc and Wd of the contact surface lal and lb1 of the photomask film 2 can be formed. The structure of the relationship of Wa=Wb&gt;Wc=Wd, as described above, if the width of the mask cover is used

When the Wa and Wb are larger than the width Wc and Wd of the attachment surface, the adhesive of the mask film 2 and the mask cover 1 can be quantitatively performed by an adhesive application device such as a χγ automatic dispenser. The coating is applied so that the adhesive can be applied uniformly over the entire attachment surface. Further, by setting the attachment width to a width of 143170.doc -15-201015213 in the width of the frame 1, the coating unevenness and coating residue of the adhesive can be suppressed, and as a result, uneven coating can be prevented. The space in which the residual portion is coated deposits foreign matter. Further, if Wc = Wd, it is preferable to coat all the sides without changing the coating amount on the long side and the short side. As described above, as a method of fabricating a structure having a relationship of sWa=Wb&gt;Wc=Wd, as long as an inclined surface is formed on the surface of the mask cover of the mask cover film, the step can be formed without a step. An inclined surface is formed. Furthermore, the inclined surface may also be curved. Since the difference between the width of the cover film cover and the width of the cover film attachment surface is as described above, the difference between Wa=Wb&gt;Wc=Wd is also provided, so that the adhesive is prevented from adhering to the film of the frame 1. The attached surface lbl overflows to the frame! The effect of hanging drops in the inner circumference. Further, although the case of Wa=Wb2 has been described, even if the long side la and the short side lb of the mask cover 1 are not Wa and wb having the same width, as long as Wa &gt; Wc, Wb &gt; Wd, Obtain the above effects, and if

Wc = Wd, so that it is possible to coat all the edges without changing the coating amount on the long side and the short side, so that it is preferable. In particular, the photomask cover film according to the first aspect of the invention preferably has a length of the long side of the mask which is longer than the length of the long side of the mask cover and a length of the long side of the mask cover + 150 mm or less. The length of the short side of the cover is longer than the short side length of the cover film frame and the short side of the cover film frame is less than 2 mm. The thickness of the photomask can be used to withstand the weight of the reticle casing (without damaging the reticle) after attaching the reticle casing. In addition, as the material of the mask, lime glass, alkali-free glass, low-alkali glass, quartz glass, etc. can be considered, but regardless of the material of the mask, the photomask cover of the invention is 143170.doc • 16 · 201015213 It is better to follow the mask. The configuration of the photomask cover film of the first invention has been described above. Next, the second invention of the present invention will be described. The width of the photomask cover 丨 of the second invention will be described. The lower limit of the width Wa2 of the long side la of the mask cover 1 shown in Fig. 2 is 13 or more, preferably 14.0 mm or more, and most preferably 16 (7) or more. It is 30.0 or less, preferably 25. 〇mm or less, more preferably 19.0 mm or less. Further, the width of the side of the mask film casing, as shown in Figs. 2 and 3, refers to the maximum width of each side such as the widths Wa and Wb. The width Wb&amp; of the short side lb of the reticle casing 1 shown in Fig. 3 is required to be at least larger than the width Wa of the long side u, specifically, the ratio of the width of the long side lb to the width Wa of the long side la (Wb) The lower limit of /Wa) is 丨·05 or more, preferably 疋1.1 or more, and the upper limit is 15 〇 or less, preferably 丨25 or less, and most preferably 1.2 or less. Therefore, the width of the short side of the reticle cover frame is ❹ 13.65 mra or more and 45.0 mm or less. Large-size reticle film with a long side length of 1400 mm or more, in order to improve the freedom of operation steps, it is better to hold only the short side 2 sides or the long side 2 sides to operate, especially When the work efficiency is taken into consideration, it is preferable to hold the gripping method on the short side 2 sides. If the ratio Wb/WaJM 〇5 or more of the width wb of the short side of the mask film frame to the width Wa of the length of the long side is used, when the operation is performed by the holding method of the two sides of the short side, it is usually The grip is held on the side of 1±, so that wrinkles during operation can be suppressed. &quot;The visor film can be operated from the wide side of the width. When holding, 143170.doc -17- 201015213 ❹ The hand grip is wider and the convenience is improved. From the viewpoint of improving the operability, it is preferable that the convex portion and the concave portion for holding are formed on the short side of the cover film frame. In addition, when the boundary 13/Jia 3 is 1_50 or less, even when the mask cover frame is erected (the long side is perpendicular to the ground and the short side is flush with the ground), the long side can be suppressed. The deformation is such that the generation of wrinkles can be suppressed. In the ultra-large visor film with an effective area of the reticle film of 16,000 cm2 or more, in terms of work efficiency, it is preferable to rotate the reticle film to perform foreign matter inspection on the surface of the reticle film. In this case, the step of making the mask of the photomask is carried out, but if the doctor is 丨5G or less, the deformation of the long side can be suppressed, and the wrinkle of the mask can be suppressed in the foreign matter inspection step or the like. produce. Further, the thickness of the frame 1 is preferably 4·0 _ or more, more preferably 5.0 匪 or more, and more preferably 6 G or more. The upper limit is preferably .0.0_ or less, more preferably 8·〇_ or less, and further preferably less than mm, and most preferably less than 6 5 mm. * The cross-sectional shape of each side of the mask film frame may be rectangular, Η-shaped, T-shaped or the like, and is not particularly limited, but it is preferably one-sided in a rectangular shape. The larger the size of the photomask cover 1 of the present invention, the more significant the effect. Specifically, when the length U of the long side of the photomask cover is U or more, it is more than 1700 mm. 21 以下 coffee or less, at this time, the effective area of the mask enamel film is 16000 (10) 2 or more, 24 _ 1 or more, especially a

- The above has a significant effect. Further, the second protective film frame 1 of the present invention has a remarkable effect if it is large, but the upper limit of the effective area is required according to the size required for the photomask used in the manufacture of the TFT LCD 143170.doc -18- 201015213. It is enough for 35,000 cni. However, in the large reticle film with a long side length of 14 〇〇mm or more, in the operation of attaching the reticle film to the reticle, in the operation step, in most cases, the reticle is not only held short. At the same time, the visor is held together with the reticle, at least at the opposite side of each of the short sides lb of the set of short sides lb of the protective film frame 1, thereby improving work efficiency. The mask is produced by its own weight. The distortion is not the same for the long side and the short side. Specifically, the curvature of the mask in the direction of the long side la in the opposite direction which is not gripped becomes large. Therefore, it is required that the curvature of the mask cover frame follows the bending of the long side direction. The reticle cover of the second invention can also sufficiently follow the curvature of the reticle having such a special feature. The photomask cover frame of the present invention can have appropriate rigidity and flexibility by satisfying the above requirements, so that the frame body is not deformed by the deployment of the mask film, and can not only follow the operation of the mask film alone. Bending, and can also follow the curvature of the reticle itself in the operation after it is attached to the reticle. As a result, since the effective area of the reticle protective film is not reduced due to deformation of the reticle protective film frame which is generated when the reticle protective film is unfolded on the reticle protective film frame, the reticle can be followed. Bending 'and thus achieves an excellent effect of the air path. Further, since the short side is wider than the long side, it is easy to hold the short side of the mask cover when the mask is operated. As a result, since it is easy to operate the mask film from the same side as the grip portion when the mask is operated, the work efficiency is improved. In the mask cover 1 of the present invention, the frame body is made Long side la and short 143170.doc •19· 201015213 The edge lb of the mask s vine film 2 of the attachment surface lal, lbl width Wc, Wd is roughly equal is also a preferred form. The widths Wc and Wd of the attachment faces 1 al and 1 b 1 of the long-side 丨 a and the short-side enamel cover film are substantially equal, and are attached to the film of the long side la and the short side lb. The difference between the widths Wc and Wdi of the faces iia and lbl is smaller than the difference between the widths Wa and Wb of the long side la and the short side lb. That is, referring to the cross-sectional views of Figs. 2 and 3, wb-Wa &gt; Wd-Wc is shown. Usually, the adhesive film of the photomask film 2 and the photomask cover is coated with an adhesive application device such as an X-Y automatic dispenser or the like. At this time, the adhesive amount of each unit length of the long side la and the new side lb is equal, so if Wc &lt; Wd , the mask film 2 is attached to the mask cover 1 Sometimes, the adhesive amount of the long side la is large, so that the adhesive adheres to the inner surface of the frame from the surface of the frame. Moreover, the adhesive amount in the short side lb is insufficient to uniformly spread to the entire surface of the film attachment surface Ib1, and on the inner side, a narrow gap is formed between the photomask film 2 and the photomask frame body, and the gap is formed. Sometimes there are foreign objects inside. From the above viewpoints, as described above, by making the widths Wc and Wd of the film attachment surfaces 1a1 and 1b1 of the long side 1b and the short side 1b substantially equal, even if a simple adhesive applicator of the prior art is used, A better reticle film is available. As a method of making the long side la and the short side lb of the film attachment surfaces lal and 1 Μ the widths Wc and wd substantially equal to each other, if the mask cover film body is at least the long side a of the frame 1 of the mask enamel film 2 The inclined surface is formed on the side of the attachment surface, so that no step difference can be prevented (4) to prevent foreign matter from depositing on the mask cover. Moreover, the inclined surface may be curved. 143170.doc -20- 201015213 Furthermore, by setting the inclined surface, the size of the inclined surface of the viscous agent to the inside of the frame H can be prevented from being substantially affected by the rigidity of the reticle frame. Flexible. Then, the mask cover film is adhered to the inside of the mask cover body of the first invention and the second invention of the present invention, and the area of the cover of the mask cover is 16 or more. The ultra-large reticle film obtained can be made in the following manner, and therefore will be described below. ❹ As the mask 5, a cellulose SS material, a cellulose, a cellulose acetate, a cellulose acetate propionate, a cellulose acetate butyrate, or the like, or a mixture of two or more thereof may be used. Polymer (tetraethylene-diethylene-diethylene-hexa-propylene ternary copolymer, polymer with a cyclic structure in the main chain, Teflon AF (trade name) manufactured by DuPont, Xu Shi Xiaozi Company Manufactured

Cyt〇P (trade name), Aig〇fi〇n (product name (4), etc., manufactured by Ausimont Co., Ltd., etc. The mask film can be a film formed of, for example, a polymer solution. The film has a tension. On the other hand, it is necessary to have the tension so as not to bend or wrinkle the reticle film. If the reticle film is bent or wrinkles, when the foreign matter on the reticle film is removed by the air blower, The reticle protective film will generate large vibrations and it is difficult to remove foreign matter. Moreover, since the height of the reticle protective film varies depending on the place, the foreign matter inspection machine of the reticle protective film cannot function normally. The measurement of the optical height of the cover film causes errors and the like. As far as the ultra-high pressure mercury lamp is used as the light source, it is better to use 143170.doc in terms of light resistance and cost. -21- 201015213 The film thickness of cellulose acetate propionate or cellulose acetate butyrate beta mask is preferably about 0 5 μηη~10 μιη, in the case of the large mask film of the present invention, the mask The strength of the film and the uniformity of the film are easy to manufacture It is preferable that the film thickness is preferably 2 μm to 8 μm. The polymer can be made into a polymer solution by using a solvent (ketone system, ester system, alcohol system, fluorine system, etc.) which is suitable for each of the above polymers. In the case of cellulose propionate or cellulose acetate butyrate, an ester system such as ethyl oxalate is preferred. The polymer solution can be filtered by a depth filter, a membrane, or the like as needed. The method includes a spin coating method, a roll coating method, a knife coating method, a cast coating method, etc., and from the viewpoint of self-sufficiency and foreign matter management, a spin coating method is preferred. A film formation method is formed by spin coating. After the above, the solvent can be dried by using a hot plate, a dust-free oven, (far) infrared heating, etc., thereby forming a uniform film. At this time, the film-forming substrate can be made of synthetic quartz, fused silica, alkali-free glass, and low. Alkali glass, soda lime glass, etc. The substrate for film formation of the large-sized photomask film of the present invention has a large size, and thus the film formation substrate may be broken due to temperature unevenness during drying. To prevent this phenomenon, Thermal expansion of the substrate for film formation The smaller the expansion coefficient, the better. Especially, 0. (:~300. (The linear expansion coefficient is 5〇xl〇-7m/(&gt;c or less. Also on the surface of the substrate for film formation, The mold release treatment is performed in advance by using a material such as polyoxygen or fluorine. Further, a layer having a lower refractive index than the mask film may be formed on one side or both sides of the mask film (that is, Antireflection layer) is preferred to improve the transmittance for exposure light. As a material of the antireflection layer, a fluorine-based polymer (tetrafluoroethylene-bias 143170.doc -22-201015213 sulphur/, fluoropropane) can be used. A dilute binary copolymer and a polymer having a cyclic structure in the main chain, that is, a Tienium AF (trade name) manufactured by DuPont, a Cytop (trade name) manufactured by Asahi Glass Co., Ltd., and a (4) ι〇η manufactured by Ausim〇nt (trade name) polyfluorinated propionate vinegar, etc.), or gasification word, 1 town, 1 (4) material with a lower refractive index. When the antireflection layer is a polymer, it can be formed by the same spin coating method as described above. When the antireflection layer is an inorganic material, it can be formed by a film formation method such as vacuum distillation or sputtering. From the viewpoint of foreign matter, a spin coating method of a polymer solution is preferred. The Teflon AF (trade name) manufactured by DuPont and the Α_ηη (trade name) manufactured by Ausim〇na f have a small refractive index, so the antireflection effect is south, so it is preferable. The mask film formed on the film formation substrate by the above method may also be peeled off from the flag substrate by reattaching the adhesive material to a template obtained from the alloy, stainless steel, resin, or the like, and reattached to the substrate. Required on the reticle cover. Further, the desired photomask cover can be peeled off from the film formation substrate after the desired photomask cover is adhered to the film formation substrate. The large reticle film obtained by the above method is attached to the reticle casing by the action of the tension by the adhesive. If the tension of the film is within an appropriate range, the large reticle film can be inhibited from expanding or recessing m toward the sag of the large reticle film due to its own weight or the difference in pressure between the inside and outside of the large reticle flag. Thereby preventing #光光. ^" can solve the problem that when the foreign matter attached to the reticle film is removed by the air blower, the reticle film generates a large vibration and it is difficult to remove the foreign matter H, thereby solving the problem that the height of the reticle film varies with the place. The difference between the mask and the film 143170.doc -23- 201015213 The object inspection machine can not function properly. 7 This problem can solve the error caused by the optical orientation measurement of the mask film. In addition, it can ensure the follow-up performance of the air pressure fluctuation inside and outside the large reticle film. It is used to adhere to the reticle film and the reticle. The film adhesive for the film frame can be appropriately selected according to the material of the reticle film and the material of the reticle film. For example, an epoxy-based, acrylic acid, phthalocyanine, polyfluorene-based or fluorine-based adhesive can be used. Further, the curing method of the adhesive may be a curing method (thermosetting, photohardening, anaerobic hardening, etc.) suitable for each adhesive. From the viewpoints of dusting, cost, and workability, it is preferred to use an acrylic ultraviolet curable adhesive. For the reticle adhesive material used to attach the glazed 5 vine membrane frame to the reticle, it is possible to use a thermal solution having a self-adhesive force (a rubber-based or a acryl-based small substrate) coated with The adhesive tape of the adhesive material (the substrate may be a sheet of acrylic acid, PVC (P〇lyvinyl chloride), or a foamed material such as a rubber type, a polyolefin type, or a polyamine (four), and the adhesive material may be used. A rubber-based, acrylic-based, or polyoxygen-based adhesive material or the like is used. In the large-sized photomask film of the present invention, the photomask is adhered to the photomask with a low load and a uniform load, and the photomask is adhered. It is preferred to use a relatively soft hot melt material or foam. When a foam is used, it can be prevented spontaneously by covering its cross-section with an acrylic or vinyl acetate-based adhesive material or a non-adhesive material. The thickness of the blister adhering material is usually 0.2 mm or more, but in order to uniformly adhere to the reticle, it is preferably 丨mm or more. In order to make the viscous adhesive material adhere to the 143170.doc -24· 201015213 The attachment is protected during attachment to the mask and can be used A polyester film which is subjected to mold release treatment by agglomeration of oxygen or fluorine. The system for transporting the reticle film is made of acrylic, abs (acrylcmitrile-butadiene-styrene, acrylonitrile-butylene styrene). PVC, PET (P〇lyethylene Terephthalate, polyethylene terephthalate) and other materials are produced by injection molding or vacuum forming. These materials are antistatic and can be kneaded with antistatic agents. A polymer having an antistatic electrostatic structure (BAY0N (trademark) manufactured by Kureha, ADION (trademark) manufactured by Asahi Kasei Co., Ltd.). The casing for the ultra-large reticle film of the present invention is preferably a lid of the casing. The flange structure is provided on the tray or both to prevent the deformation of the casing during transportation to damage the mask film in the casing, thereby improving the resistance of the external force. In addition, it is required not only that it can be reliably gripped, but also that the frame body can be removed without being bent or twisted when the mask film is taken out from the storage container. Moreover, especially for the mask film itself Large and difficult to operate The mask film is required to be gripped not only during storage, transportation, and storage, but also when it is taken out from the container, and can be taken out from the interface between the protective film and the adhesive material, and the mask film is not deformed and bent for removal. After that, it can be directly attached to a mask or the like. Therefore, it is also possible to form a convex portion or a concave portion for gripping on all sides of the frame of the mask film without being restrained by the mask. In the second invention, since the width of the short side is larger than that of the long side, it is easy to use 143170.doc -25- 201015213 The short side forms a convex portion and a concave portion for holding. The mask cover film of the second invention can particularly preferably follow the length of the long side of the mask as the length of the long side of the mask cover and the length of the long side of the mask cover + 150 mm or less, and the mask is short. The length of the edge is the mask of the short side of the mask film frame and the short side of the mask film frame is less than 200 mm. The thickness of the photomask can be substantially increased by the weight of the reticle casing (without damaging the reticle) after attaching the reticle casing. Moreover, the material of the reticle can use limestone glass, alkali-free glass, low alkali glass, quartz glass, etc., but regardless of the material of the reticle, the reticle shield frame of the second invention can preferably follow the reticle. . The present invention will be more specifically described by the following examples. [Examples] (Examples of the first invention) [Examples 1 to 99, Comparative Examples 1 to 71] The frame for the ultra-large mask film used has the length (La) and the short side lb of the long side la The length (Lb), the area inside the frame (effective area), and the thickness of the frame are as shown in Tables 1 to 9. Further, the width (Wa) of the long side 1&amp; and the width (wb) of the short side lb of the mask film frame are shown in Table 9. Furthermore, the material of the reticle cover frame is made of aluminum alloy, and the cross-sectional shape of the frame is a rectangular shape. Moreover, the household cover film frame system is treated with black acid-resistant aluminum without micro-cracks. Therefore, the performance of the actual reticle film is evaluated using the above-described frame. The details are as follows. 143l70.doc 26· 201015213 As a photomask, the polymer solution (4) is coated on the hypo-glass, and the main film is formed by spin coating. Then, a fluorinated polymer solution was also applied onto the film by spin coating to form a photomask film having an antireflection layer having a thickness of 4 μm. The obtained mask film is unfolded and attached to the mask film casing. Here, the presence or absence of wrinkles generated when the reticle film was adhered to the reticle casing was evaluated (the result of wrinkles at the time of film development). The evaluation results are shown in Tables 1 to 9. In the mark of the evaluation result, "〇" indicates a state in which no wrinkles are completely formed, "△" indicates a state in which the film is slightly undulated under close observation, and "X" indicates a state in which wrinkles are slightly present. Then, the mask cover film to which the mask film is adhered is attached to the quartz glass. At this time, the reticle adhesive material is made of a rubber-based hot-melt adhesive material of styrene-ethylene-butylene-styrene having a thickness of 12 mm, and the hot-melt adhesive material is applied to the mask of the reticle protective film frame. Adhesive surface, and attached to the special position of quartz glass. Furthermore, each component has been subjected to ultrasonic cleaning before use. Moreover, the size of the quartz glass is set to the long side length of the photomask cover film attached to the long side of the quartz glass +50 mm, and the short side length of the photomask cover film attached to the short side of the quartz glass is +100 mm ^ The dimensions and thickness of the quartz glass are shown in Table 17. Further, the flexibility of the mask film frame can be evaluated by measuring the followability of the mask film to the mask. The reticle attached to the reticle is placed in such a state that the follow-up property of the reticle film following the crease due to its own weight is evaluated, and the state is such that the reticle guard 143170 is attached. Doc •27- 201015213, “Looking down” 2 short sides of the light sheet are suspended in the air. Attached:::=. The basis for the evaluation of follow-up is to slightly produce slightly in the light leather:: When the change is made, it is evaluated as ".". If the material of the adhesive (4) is "△", the gas path is evaluated as _] °, and Using a mask having the same specifications as the above-mentioned mask, the specimen of the adhesive mask is unfolded under the same conditions as in the test (4), and the long side is held with the above-mentioned measurement conditions 追 and followability β for sheet metal. ._ ^^ α * ' Ί,, σ fruit combination is shown in Tables 1 to 9. In the comprehensive assessment, "彳έ _ ω ^ &quot; evaluation result of follow-up" "When the wrinkle of the film unfolding results I is free of "gentlemen", it is recorded as "◎", if one of them When △ appears, it is recorded as "〇, and the basin is derogatory" and one of them appears as "χ". (Embodiment of the second invention) First, the method for evaluating the reticle frame of the present invention will be described. The photoprotective film frame system of the present invention has both rigidity and flexibility. The evaluation is performed by visually judging whether or not the wrap film is formed on the fresh film (4), and whether or not wrinkles are generated during the operation of the photomask film, and the flexible system is attached to the light. The light film on the cover is placed in the following state and evaluated whether the mask is following the mask due to the self-surface*. The upper (4) (4) is used to stick the time I, the face of the mold is facing down, and the handle is held. The two short sides of the mask are suspended in the air. [Examples 100 to 197, Comparative Examples 72 to 141] The frame for the ultra-large mask film used in the examples and the comparative examples! Medium length 143170.doc -28· 201015213 The length of the side la (La), the length of the short side lb (Lb), and the area inside the frame (effective area) are shown in Tables 10 to 16. Further, the width (Wa) of the long side la of the mask film frame, the width (Wb) of the short side lb, and the thickness of the mask film casing are also shown in Tables 10 to 16. Further, the material of the photomask cover can be made of an aluminum alloy, and the cross-sectional shape of the frame is a rectangular shape. Moreover, the reticle shield frame system used is treated with black alumite without microcracking. Therefore, the performance of the frame for the photomask film using the above specifications is actually evaluated. The mask film coats the polymer solution of the cellulose ester on the low alkali glass. The main film is formed by spin coating. Then, the fluorinated polymer solution was applied by spin coating on the film to form a film cover having a thickness of 4 pm of the antireflection layer. The obtained mask film is unfolded and attached to the mask film casing. Furthermore, the operation of the photomask frame is carried out by holding a part of each side of a set of short sides. Here, it is evaluated whether or not wrinkles are generated when the mask film is adhered to the mask film casing (the result of wrinkles when the film is unfolded). The evaluation results are shown in Tables 10 to 16. In the mark of the evaluation result, "〇" indicates the state of completely invincible pleats. '△' indicates that the film is slightly undulating under careful observation. "xj indicates a state in which wrinkles are slightly present. Then 'will be spread with a mask. The photomask cover is attached to the quartz glass. At this time, the reticle adhesive material is made of a rubber-based hot-melt adhesive material of styrene·ethylene-butylene-styrene having a thickness of 2 mm. Adhesive 143170.doc •29· 201015213 The material is applied to the specific position of the light of the reticle frame. 1 ^ Soap sticky surface, and attached to the special position of quartz glass. Ultrasonic cleaning. In addition, the size of the Shiyang glass is set to the film, the length of the long side of the mask with the long side of the quartz glass +50 mm and attached ^ ^ Λ 1 stone center glass The short side of the reticle cover film has a short side length of +100 mm. The stone used is shown in Fig. 17. The size and thickness of the sloping sill are attached to the reticle film attached to the hood on the hood. The surface of the film of the reticle 1 is observed, and the film is also unfolded and adhered to the film by the (4) film. Until the retaining member is attached to the rear until the reticle plurality Xi _ '&quot;, step spy series Have negative assessment pleats (wrinkles arising from the operation result produced Bu

Here, the '-series operation steps refer to the steps of the assembly step (the unfolding and bonding of the reticle film), the step of the inspection, the step of unpacking, the step of unloading, the step of shipping, the step of taking out, the operation of attaching the reticle. step. In the transport step after the assembly step, using the carrier for transport in the step, the α-mask cover film does not fall to the gripping degree, and the photomask is held near the four corners on the short side of the mask cover. The film is transported to the inspection step. At this time, the mask film is transported to the inspection step with the long side parallel to the ground and the short side perpendicular to the ground. In the inspection step, the mask film is rotated up and down about the horizontal axis for one week and rotated around the vertical axis for one week, and the center of the mask film is rotated 90 degrees on the mask surface of the mask to perform inspection. The mask film is transported to the wrapping step with the long side of the mask film parallel to the ground and the short side perpendicular to the ground. In the packing step, the mask film is stored in the mask film storage container in the state of the carrier for carrying in the step. Thereafter, the carrier for transport in the step is removed in the storage container, and only the mask film is housed in the container 143170.doc -30-201015213. In the shipping step, the normal delivery is carried out on the assumption of truck transportation. At this time, the storage container is maintained at a level. In the taking-out step, the mask film is taken out from the container in a state where the light frame and the floor are horizontal. When removing, hold the vicinity of the four corners on the short side of the film frame with the holding force of the mask film not falling. In the attaching step to the reticle, in the state of the reticle protective film frame and the ground level, the short side of the reticle protective film frame is held by the holding force of the reticle protector not falling. Near the four corners, the reticle film is directly attached to the reticle by the reticle adhesive of the reticle film. The attaching force is attached tightly to the outer shape of the reticle protective film. = The results of the evaluation are shown in Table Π) to Table 16 and the evaluation criteria are the same as when the adhesive film is attached to the reticle casing. Further, the flexibility was evaluated by the evaluation conditions of the follow-up property of the photomask film to the mask. The results of the evaluation are shown in Tables 1 to 16 (the results of the follow-up evaluation). The follow-up evaluation criteria is based on the photomask guard attached to the reticle. 'Place the reticle film in the following state' within one year. No change is evaluated as "〇". Evaluation when the ridge is slightly raised in the adhesive portion When "air" is generated for "△", it is evaluated as "Xj. The state of the mask is such that the surface of the mask is attached downward, and the two short sides of the mask are held so that the county is in the air. In the assessment, "the result of the follow-up evaluation", "the result of the wrinkle at the time of film development" and "the result of the wrinkle generated by the operation" are all "〇", and one of them has a △" For "〇", one of them appears as "X" when X appears. 143170.doc •31 · 201015213 Comprehensive evaluation XXX 〇 ◎ ◎ ◎ ◎ ◎ Results of wrinkles when deciduous film is unfolded XXX &lt; Evaluation results of 〇〇〇〇〇〇 follow-up 〇〇〇〇〇〇〇〇〇 &lt; 3 Effective area cm2 |27651.5| 127651.51 127651 ·51 |27651.5| |27651.51 |27651.5| |27651.5 |27651.5 127651.5 27651.5 i Short-edge follow-up β (mm) 〇(N CS CN in c5 &lt;N (N CN 寸卜οό § Long-edge follow-up β (mm) CN 〇t&gt; o r-; m cn 卜 CN o ON inch rn 〇\ CN CN SIS 〇os c5 oooo 〇〇ooo c&gt; ο ο Ο Ο Short side width Wb (mm ) 〇〇〇o 00 o 〇6 o 00 o od o od o 00 1-H o od ο ΟΟ ο ΟΟ length of the short side Lb (mm) | 1600.0 1 1600.0 1600.0 | 1600.0 j | 1600.0 I 1600.0 | 1600.0 1600.0 1600.0 1600.0 The width of the long side Wa (mm) 〇so 〇SO 〇〇o 〇o vd 〇Ο Ο The length of the long side La (mm) 1 1800.0 1 | 1800.0 I 1800.0 | 1800.0 I | 1800.0 I 1800.0 | 1800.0 | 1800.0 1800.0 1800.0 Ο CN o cn 〇〇in ov〇o 〇oo Ο ΟΝ Ο Ο 1 Comparative Example l 1 |Comparative Example 2 I Comparative Example 3 |Example 1" |Example 2 1 |Example 3 1Example 4 I |Example 5 1Example 6" Example 7 -32- 143170.doc 201015213 tCNId Comprehensive Evaluation XXX ◎ ◎ ◎ ◎ ◎ XXXXX ◎ ◎ ◎ ◎ ◎ 皱 X film wrinkle generation result XXX 〇〇〇〇〇〇〇 XXX 〇〇〇〇〇〇〇 follow-up evaluation results〇〇〇〇〇〇〇 〇XX 〇〇〇〇〇〇〇〇&lt; X effective area cm2 1 21270.4 1 21270.4 | | 21270.4 I | 21270.4 j 1 21270.4 1 1 21270.4 1 1 21270.4 1 1 21270.4 ] 21270.4 1 1 21270.4 1 1 21505.0 1 1 21505.0 1 [21505.0 1 21505.0 j 21505.0 1 21505.0 1 21505.0 ι_ [21505.0 1 21505.0 1 21505.0 Short-edge follow-up β (mm) 〇 inch (N 卜 in CN r-Η τ-Η CO ON 弍 00 Vjj 00 v〇ο α\ τ—Η — Ο σ\ 1—Η Ο α\ 弍 v vd m CN Η in ♦—4 Ο Long-edge follow-up β (mm) 〇 〇 m 〇 (N CTn vS (Ν Ο ο rn CN (Ν 戈 inch) (Ν m ο ο inch CN Ον ο ν〇CN 00 οο 00 vd &lt;Ν 卜 llg 〇〇〇S 〇ο ο Ο Ο ο ο Ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο ο VD ο ο ό ο Ο ο ο ο Ο ο νο ^ ^ i 1400.0 "1400.0 I "1400.0 1400.0 1400.0 "1400.0 1 "1400.0 1 "1400.0 "1400.0" "1400.0" "1400.0 [1400.0 1 1400.0 \ 1400.0 1 1400.0 Γ 1400.0 1 \ 1400.0 1 1400.0 \ 1400.0 1 "1400.0 1 The width of the long side Wa (mm) 〇00 〇00 〇00 ο 00 Ο CC ο οο Ο οό Ο ΟΟ 00 00 Ο 00 Ο ο Ο Ο Ο ο Ο 2Ϊ ο Ο ο Length of the long side La (mm) | 1600.0 I 1600.0 ] | 1600.0 I [1600.0 1 1 1600.0 ) 1 1600.0 i 1 1600.0 1 1 1600.0 1 1 1600.0 1 1 1600.0 1 1 1600.0 1 1 1600.0 1 1 1600.0 1 I 1600.0 1 1 。 。 。 。 。 。 。 。 。 。 。 。 ο ι&gt; ο οό Ο 〇 \ ο ο Comparative Example 4 | Comparative Example 5 1 | Comparative Example 6 Example 8 1 Example 9 1 Example 10 1 Example ι 1 1 Example 12 1 1 Comparative Example 7 1 Comparative Example 8 Comparative Example 9 Comparative Example 10 Comparative Example 11 1 Example 13 1 Example 14 Example 15 Example 16 Example 17 Example 18 Comparative Example 12 143170.doc -33 - 201015213 [εί 综合 综合 综合 综合 综合 综合 综合 综合 综合 综合 综合 综合 综合 综合 综合Evaluation result〇〇〇〇〇〇〇&lt;3 XX 〇〇〇〇〇〇〇XXX effective area cm2 21153.6 1 21153.6 1 | 21153.6 I 1 21153.6 1 | 21153.6 | 121153.6 J | 21153.6 I | 21153.6 ] | 21153.6 I | 21153.6 ! ! 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 20 —H ON 00 00 120.8 Long-edge follow-up β (mm) inch Ο inch cn cn $ 〇oo ON CN 00 〇oo CN (N 00 (N inch · 〇oo r4 CN m oo V〇112 ο o S 〇oooooooo 〇 o O oooo cJ S 〇oo 〇〇oo 〇o 〇ooooo width of short side Wb (mm) ο (Ν o CN &lt;N o (N CS o (N (N o (N (N o &lt;N (N o CN CN o (N CN o (N CN o CN CN oooooooooow 1 1400.0 1 | 1400.0 I | 1400.0 I | 1400.0 I | 1400.0 I | 1400.0 | | 1400.0 I | 1400.0 I | 1400.0 I | 1400.0 I | 1400.0 | 1400.0 | 1400.0 | 1400.0 | 1400.0 | 1400.0 1400.0 | 1400.0 1400.0 1400.0 The width of the long side Wa (mm) ο Ο &lt;Ν 〇o 〇〇〇〇oooo in (N o in 〇in CN 〇in &lt;N o &lt;n (N 〇&lt;N o wS &lt;N o CN o in (N o length of the long side La (mm) 1 1600.0 1 | 1600.0 1 | 1600.0 I | 1600.0 I | 1600.0 | 1600.0 I | 1600.0 | 1600.0 I | 1600.0 1600.0 1600.0 1600.0 1600.0 1600.0 1600.0 1600.0 1600.0 1600.0 1600.0 1600.0 Thickness (mm) ο o cn po 〇in VO 〇o 00 o 〇\ 〇〇〇(N 〇ΓΟ 〇—〇〇in 〇b^ 〇00 〇ON 〇c? rH Comparative Example 13 | Comparative Example 14 | Example 19 Example 20 | Example 21 1 | Example 22 I | Example 23 i | Example 24 I | Comparative Example 15 I | Comparative Example 16! Comparative Example 17; Comparative Example 18 Example 25 Example 26 Example 27 Example 28 Example 29 Comparative Example 19 Comparative Example 20 Comparative Example 21 eΘ 143170.doc -34- 201015213

Comprehensive evaluation XXXX ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ Results of wrinkles during film development XXXX 〇〇〇〇〇〇 XXX &lt;3 评估 Follow-up evaluation results〇〇〇 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇 effective area cm2 1 34566.4 1 | 34566.4 I | 34566.4 I 1 34566.4 1 | 34566.4 I | 34566.4 I 1 34566.4 1 1 34566.4 1 1 34566.4 1 j 34566.4 I [34865.0] | 34865.0 I [34865.0 1 | 34865.0 1 1 34865.0 1 [34865.0 1 | 34865.0 | | 34865.0 I | 34865.0 I 1 34865.0 1 Short-edge follow-up β (mm) mo ON 〇 (N rH l &gt; 〇 CTS &lt; N fH 00 〇\ CN 00 r4 cn CN 〇卜Ο cn cn 卜 (N I&gt; o ON inch rn ON C4 v〇cs Long-edge follow-up β (mm) CN 〇in O (N inch CN (N m vd 〇 &gt; cK m as o inch ο Ο rH O) (N CO CN t&gt;l&gt; 〇T-H oa C〇^ em 卜 O s 〇_〇ο go Ο o cn so 〇〇oooo O 〇〇〇ο oo Ο oo ο oo 〇ooooooo 〇〇〇ο oo ο oo ο oooooooo mouth (four) g 宕宕o (N 宕宕宕 宕宕宕 vd νο vd v〇vd ooo 〇〇ο oo 1800.0 oo ο ooo 〇ooooogoo 〇〇ο oooo ο g Η oo 〇〇oooo § 1—H Lessons &amp; 00 00 〇〇00 00 Oo 00 TH 00 00 oo 00 00 00 00 oo oo oo ooo 〇〇ο oo Ο oo ο ooo 〇oooo tempo &amp; 00 00 00 00 00 00 00 00 00 οό 00 inch · — inch · ^ O' 抑 | ooo 〇〇 ο oo oo oo oo oooooooooo (N ooo 〇〇ο oo ο oo ο oooooooo inj^ 'Hf 宕o (N 宕宕宕宕宕沄宕沄宕宕o CN 宕宕宕oop 〇〇po ο Os ooo &lt;N ο cn oo uo oo l&gt; o 00 o Os o rn VO 00 o (N (N m (N VO (N m (N m C^imm VO &lt;N oo (NC\ (N \〇P: 00 CO ro oi—H ¥ 苳 苳--JJJ ik IK ΐΚ IK *i2 λ3 Jj Κ Ik IK Κ ΐΚ -35- 143170.doc 201015213 [s&lt;] Comprehensive evaluation XXXX ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ 〇 When the membrane is unfolded Wrinkle production result XXXX 〇〇〇〇〇〇XXX 〇〇〇〇〇〇〇 Follow-up evaluation result 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇&lt; effective area cm2 34417.6 34417.6 34417.6 1 | 34417.6 I | 34417.6 I | 34417.6 I 1 34417.6 1 1 34417.6 i 1 34417.6 34417·61 | 34047.0 1 1 34047.0 1 34047.0 34047.0 34047.0 34047.0 34047.0 34047.0 34047.0 34047.0 Short-edge follow-up β (mm) ο Ο τ-Η Cn (Ν 〇〇12.4 1 1 18·4 1 1 26.3 1 | 36.0 | 寸Ο (Ν ΟΟ CN Os »—Η Η 15.2 22.6 32.2 44.2 Long-edge follow-up β (mm) (Ν Ο ο Η 卜CN 〇\丨 丨 ii_〇1 1 15.7 j | 21.5 ] &lt;N Ο Ο Ο r-; inch rn ΟΟ (Ν 13.8 19.6 26.9 deformability α (%) 0.73 0.15 1 1 0.05 1 | 〇.〇〇| | 〇. 〇〇| | 〇.〇〇| 1 o.oo 1 | o.oo | 1 o.oo 1 0.00 1 0.73 j 1 0.15 1 1 0.05 0.00 0.00 0.00 0.00 0.00 0.00 0.00 Width of the short side Wb (mm) 22.0 22.0 22.0 1 22.0 | | 22.0 I | 22.0 I 1 22.0 j | 22.0 | 1 22.0 22.0 27.0 1 27.0 27.0 27.0 27.0 27.0 2 7.0 27.0 27.0 27.0 Length of short side Lb (mm) 1800.0 1800.0 1 1800.0 1 | 1800.0 I 1800.0 1800.0 1 1800.0 1 | 1800.0 I 1800.0 1800.0 1 1800.0 1 1800.0 1 1 1800.0 1800.0 1800.0 1800.0 1800.0 1800.0 1800.0 1800.0 Width of long side Wa ( Mm) 20.0 20.0 20.0 20.0 20.0 20.0 I 1 20.0 1 | 20.0 I 20.0 20.0 J 1 25.0 1 1 25.0 25.0 25.0 25.0 25.0 25.0 25.0 25.0 25.0 Length of the long side La (mm) 2000.0 2000.0 2000.0 | 2000.0 I 2000.0 | 2000.0 I 2000.0 | 2000.0 I 1 2000.0 1 2000.0 1 2000.0 1 1 2000.0 j 2000.0 1 2000.0 2000.0 2000.0 1 2000.0 2000.0 2000.0 2000.0 Thickness (mm) Ο (Ν Ο cn p inch · 〇〇vd ο \&gt;· o οό Ο On | 10.0 | ο (Ν ο rn Ο · · Ο in Ο vd Ο ό οό Ο 10.0 Comparative Example 30 Comparative Example 31 1 Comparative Example 32 I Comparative Example 33 1 Example 42 I 1 Example 43 1 1 Example 4 Color] | Example 45 1 1 Embodiment 46 j | Example 47 I Comparative Example 34 1 Comparative Example 35 I Comparative Example 3 6 Example 48 Example 49 Example 50 Example 51 Example 52 Example 53 Example 54 Θe 143170.doc - 36-201015213

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t XX ◎ ◎ ◎ ◎ 〇 XXXXX ◎ ◎ ◎ ◎ ◎ XXX Film wrinkles when unfolding results XX 〇〇〇〇〇〇〇〇 XX 〇〇〇〇〇〇〇〇 Follow-up evaluation results〇〇〇〇〇 〇&lt;] XXX 〇〇〇〇〇〇〇 XXX effective area cm2 | 15822.4 I 1 15822.4 1 | 15822.4 | | 15822.4 I | 15822.4 I 1 15822.4 1 [15822.4 I 1 15822.4 1 | 15822.4 I | 15822.4 I 1 16025.0 1 16025.0 1 16025.0 1 1 16025.0 1 1 16025.0 1 16025.0 1 16025.0 | 1 16025.0 1 | 16025.0 I 16025.0 Short-edge follow-up β (mm) 寸 inch · 00 ON as O) OO Ό ΓΟ *Τ) 00 VO 卜 inch in Ο ) [132.7 1 o H in m JT; v〇z (N 00 (Ν ms VO ON v〇Ο (N (N 04 1-H inch r-Η VO (N VO t&gt; Ο 00 ιη CN to r&quot; H !&gt;; o CN CN rH 00 g 〇1-H ΓΛ »—Η CN oi m (N v〇治 S令00 1-Η S TH oo 〇oooo 00 s ι—Η ο Ο _〇〇o 〇 〇ο 〇ooooooo c5 〇ο Ο c5 ο ooo 〇o ,X ο ooooooooo 〇ο ο ο ο ooooo胷 _ 1 铋 铋 w 宕宕宕宕沄宕宕宕沄 ό ό 'Ο \ό v〇&lt;5 1 1200.0 1 ooooooooo 〇ο ο ο ο o 〇oooo Q oooooo _〇Q ο ο ο ο ooooo rj CNj CN N CN CN (N CN Γν| ΓΝ| ΓΝ | CS CN (N rvj CN rs 1 σί Ο o 〇ooooooo 〇ο ο ο ο oooo O 崞铋w 00 od 00 od od od i-H 00 00 TH 00 oo — inch · ¥ inch' — — — ο ooooooooo 〇ο ο ο ο ο ο ooooo ο ο 1—Η ooooooooo 〇〇ο ο ο ooooo ui^ inch 2 inch 2 2 inch inch inch inch inch inch inch ο (Ν o rn ooo \ ό a vd oo 00 o On oo 〇(Ν ο ο ^ι· ο ΙΟ ο ν〇vd oo 00 o Os oot-H &lt;Ν 00 (N 00 m oo zk〇VO 00 ιη 00 νο 00 00 00 〇\ 00 ON ^T) S ¥ ¥ ¥ 军 军 军 军 军 军 军 军 军 军 军 军 馨 漠 Ο Ο Ο Ο Ο j j j j j j j 3 jl3 143170.doc -39- 201015213 [6&lt;] Comprehensive evaluation XX ◎ ◎ ◎ ◎ 〇 XXXX 〇◎ ◎ ◎ ◎ XXXX Results of wrinkles when the film is unfolded XX 〇〇〇〇〇〇〇〇X &lt; Evaluation results of 〇〇〇〇〇〇〇〇 follow-up 〇〇〇〇〇〇&lt; XXX 〇〇〇〇〇〇XXXX is effective Area cm2 15721.6 15721.6 15721.6| 15721.6| 15721.61 |15721.6| |15721.6| |15721.6| |15721.6 |15721.6| |15471.0| 115471.0 |15471.0 15471.0 15471.0 15471.0 15471.0 15471.0 15471.0 15471.0 Short-edge follow-up β (mm) 寸 inch · r-; T—H oo (N inch 〇\ m &lt;N inch Ο cn cn | 182.4 | QO 1-H 〇CO 〇00 (N inch v〇OO 114.6 CN a 223.9 Long-edge follow-up β (mm) Bu 〇 inch ( N 卜rj CO On v〇 00 mv〇cK 00 ON oo rn CN 卜^ 〇 inch · 窆 inch OO mmv〇00 111.9 ||g 〇〇〇〇»—H ooo c5 〇〇〇o Ο ο ο ο oooo Oo o 艺 o 〇oooooooo c3 oooo 〇〇 short side width Wb (mm) 〇 (N (N 〇(N rs o &lt;N (N o cs (N 〇(N CN o CN (N ο &lt;Ν CN ο (Ν &lt;Ν o (N (N o r4 &lt;N ooooooooo 〇 嵝 3 1200.0 | 1200.0 1200.0 | 1200.0 I 1200.0 I | 1200.0 I 1 1200.0 1 1200.0 | 1200.0 I | 1200.0 I | 1200.0 I | 1200.0 I | 1200.0 I 1 1200.0 I | 1200.0 | 1200.0 1200.0 _1 | 1200.0 | 1200.0 1200.0 Width of the long side Wa (mm) 〇Ο oooo Ο Ο 〇oo CN o CN o CN o wS rs 〇CN o CN o CN o (N o uS CN 〇in (N length of the long side La (mm) 1400.0 1400.0 1400.0 1400.0 I | 1400.0 I 1400.0 1 1400.0 1 1 1400.0 1 | 1400.0 I 1400.0 | 1400.0 I | 1400.0 I | 1400.0 I 1400.0 1400.0 1400.0 1400.0 ___1 1400.0 1400.0 1400.0 〇(N Ο rn 〇rr 〇o ο ο οο o On ooo CN o rn o 〇〇V〇in &lt;5 oo OO o ON oo 1 - H Comparative Example 62 Comparative Example 63 | Example 90 1 | Example 91 1 | Example 92 I Example 93 1 Example 94 1 Comparative Example 64 Comparative Example 65 Comparative Example 66 Comparative Example 67 | Example 95 | 丨 Example 96j | Example 97 Example 98 Example 99 Comparative Example 68 Comparative Example 69 Comparative Example 70 Comparative Example 71 0 ο 143170.doc -40- 201015213 [01嵴] Comprehensive evaluation ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ XXXXXXXXXX Hu 4 tJ lit t J 111 M ^ mz Disadvantages % 0 ^ 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇XXXXXXXXXX The result of wrinkles when the film is unfolded〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇评估Follow-up evaluation result〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇effective area cm2 1 21305 1 1 21305 1 1 21305 1 1 21305 1 1 21305 1 1 21192 1 1 21192 1 1 21192 1 | 21192 | Γ 21192 | "21051 | | 21051 | | 21051 | | 21051 | | 21051 | 1 20939 1 1 20939 1 1 20939 1 1 20939 1 ί 20939 1 1 21389 1 21389 1 21389 1 21389 丨21389 Wb/Wa 1 1.05 1 "1.05] 1 1.05 1 1 1.05 1 1 1.05 ! Γ 1·25 1 1 1.25 1 丨1.25 | | 1.25 | [1-25 1 1-H un ϊ&gt; τ-Η 卜τ— ι&gt;&lt;ό Ο ΟΝ Ο ΟΝ c&gt; Ο 宽度 Short side width Wb (mm) 丨18.9 | 1 18.9 1 丨18·9 1 丨18.9 1 1 18.9 1 1 22.5 1 1 22.5 1 1 22.5 1 1 22-5 1 1 22.5 | 1 30.6 π 1 30.6 1 1 30.6 1 1 30.6 1 1 30.6 1 \ 16.2 1 [16.2 1 1 16.2 j 1 16.2 1 丨16.2 1 Length of short side Lb (mm) 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 Width of long side Wa (mm) 00 t —Η 〇〇00 00 00 00 00 00 00 〇〇 00 00 00 00 ΟΟ 00 00 00 00 ΟΟ ΟΟ 00 ΟΟ Length of the long side La (mm) 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 thickness (mm) v 〇Ο 00 00 00 in 卜 卜 00 ν ο ΟΟ 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 丨 丨 丨 丨 丨 丨 丨 丨 105 105 105 105 105 Example 106 丨 Example 107 Example 108 〇ί • 8 实施 Example 110 Example 111 Example 112 Example 113 Τ Τ - Η Comparative Example 72 Comparative Example 73 Comparative Example 74 Comparative Example 75 Comparative Example 76 Comparative Example 77 Comparative Example 78 Comparative Example 79 Comparative Example 80 Comparative Example 81 143170.doc •41 · 201015213 [11嵴] Comprehensive evaluation ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ XXXXXXXXXX t-il.l Thin θ Μ 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇XXXXXXXXXX Wrinkles when the film is unfolded Evaluation results of 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇 effective area cm2 21546 21546 21546 21546 1 1 21546 1 | 21458 | | 21458 | 1 21458 1 1 21458 ! | 21458 | | 21348 | | 21348 | | 21348 | | 21348 | 21348 | 21260 21260 21260 21260 21260 21612 21612 21612 21612 21612 Wb/Wa SS ο s τ-Η in CS in CN τ-^ &lt;Ν r· ^ un (N in 't-η »〇T-H 卜卜r*»H ON 〇OS 〇Ο Ο Ο Ο ON Ο Short side width Wb (mm) Bu - Bu - Bu ΙΤϊ &lt;N r^ 3 〇〇&lt;N oo &lt;N OO &lt;N 00 &lt;ri ίΝ OO CO &lt;N (N CN ν〇r4 (Ν \D (Ν 〇 inch inch ο Ο ο Ο inch inch inch inch inch inch inch寸ο ο oo 〇〇o inch oo inch inch Ο Ο ο 〇 inch 〇〇 inch inch inch ο inch Ο Ο inch long side Width Wa (mm) inch inch inch inch inch inch inch inch inch inch inch inch inch inch inch length La(mm) 〇〇Ό ο ο ν〇ο 〇\〇〇ο ν〇Ο § ο o VO o Ό o ο v 〇o ο Ό ο § ο § Ο Ο o Ό Ο Ο ο § Ο Ο ο Ό «η ν〇卜 00 ^Τ) oo yn 'O iT) v〇卜00 Ό \Ti vd 卜 00 00 ^« c 卜 Α £) 00 ON V: A&amp;) Κ CS CN CS 雀 ( (N 寸 Ϊ oo ϊ V V V V V V V V 82 82 82 82 82 82 82 82 82 82 82 82 82 82 83 83 82 83 83 83 83 83 83 83 83 83 83 83 83 83 83 83 83 83 83 83 83 83 83 83 83 83 83 85 Comparative Example 86 i Comparative Example 87 Comparative Example 88 Comparative Example 89 Comparative Example 90 Comparative Example 91 143170.doc -42- 201015213

[(ΝΙ^Ι——I Comprehensive evaluation ◎ ◎ ◎ ◎ 〇 ◎ ◎ ◎ ◎ 〇 ◎ ◎ ◎ ◎ 〇XXXXXXXXXX 瘅ΘKey 0 -iH 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇XXXXXXXXXX Membrane expansion The result of the wrinkle is the result of the follow-up evaluation 〇〇〇〇&lt;3 〇〇〇〇&lt;] 〇〇〇〇&lt;] 〇〇〇〇〇〇〇〇〇〇 effective area cm2 1 21185 1 21185 ! 1 21185 1 1 21185 1 I 21185 | 1 21060 21060 1 21060 1 21060 21060 20904 1 20904 1 20904 20904 20904 | 20779 1 | 20779 | I 20779 ! | 20779 | | 20779 | | 21278 | [21278 | 1 21278 | ί 21278 1 21278 | Wb/Wa sss CN iTi CN in (Ν (N «Ο (Ν r~ in ι—* 1 卜卜1&gt; - 〇ON 〇〇\ 〇〇\ 〇〇\ 〇 Short side width Wb (mm) (N (N &lt;N (Ν ^Τ) CN in (Ν (N yn CN 00 〇〇 00 00 00 I 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 1400 Width of long side Wa (mm) Length of long side La (mm) 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 1600 Thickness (mm) ^T) VO 00 00 00 00 00 Ο 00 00 v〇m 00 〇ΓΠ Example 131 CN Ik cn 宾 宾 νη m ϊ νο m »—η cn i 00 m ϊ Q\ m Κ Κ ο ϊ Κ Κ Κ Ϊ Ϊ Ϊ Ϊ Ϊ Ϊ Ϊ Ϊ Ϊ Ϊ Ϊ Ϊ Ϊ Ϊ Ϊ 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 92 201015213 [ει &lt;]

143170.doc • 44- 201015213 [Inch 1&lt;] Comprehensive evaluation ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ XXXXXXXXXX ββ硝® Μ 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇 〇XXXXXXXXX Wrinkle production results when the film is unfolded 评估Follow-up evaluation results〇〇〇〇〇〇〇〇〇〇 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇 effective area cm2 1 34916 1 1 34916 1 1 34916 1 1 34916 1 1 34916 1 34806 34806 34806 34806 34806 34668 34668 34668 34668 1 34668 1 1 34557 1 1 34557Π丨34557 | 1 34557 1 | 34557 | | 34999 | 34999 1 1 34999 1 1 34999 1 1 34999 π Wb/Wa s S s S s CN Τ—Η in CN (N 1-H cs TH cs vrj TH 卜 1— Η 1—Η 卜 1-Η ON 〇ON Ο ON Ο Ο ο Short side width Wb (mm) 卜 — 寸 inch I-; — ι&gt; un in (&gt; CN 00 &lt;Ν 00 cs 00 cn CN 00 — &lt;N 〇〇&lt;Ν VO CN c4 v〇( γ γ 1 00 00 00 00 00 00 00 00 o 00 o oo o 00 〇 oo o 00 〇 00 o 00 00 00 00 00 00 00 00 00 00 00 00 00 00 00 ο 00 Ο OO Ο οο The width of the long side Wa (mm) inch inch inch inch 2 inch inch inch inch inch inch inch inch inch inch inch inch inch inch length of the length La (mm) 2000 2000 2000 2000 2000 2000 2000 2000 2000 2000 2000 2000 2000 2000 2000 2000 2000 2000 2000 2000 2000 2000 2000 2000 1 2000 Thickness (mm) VO 00 VO 卜 00 i 〇 'O 00 Ο d vd 00 in VO vd 实施 Embodiment 160 Embodiment 161 Example 162 mv 〇ϊ Ik Example 164 Example 165 Example 166 丨 Example 167 Example 168 1 Example 169 Example 170 IK 1 Example 172 Example 173 1 Comparative Example 112 1 Comparative Example 113 Comparative Example 114 Comparative Example 115 Comparative Example 116 Comparative Example 117 Comparison Example 118 Comparative Example 119 Comparative Example 120 Comparative Example 121 143170.doc ·45· 201015213

143170.doc -46 - 201015213 斗91 ΐ Comprehensive evaluation 〇 ◎ ◎ ◎ ◎ ◎ 〇〇XXXXXXXXXX MM €絜蝌毋蘧垅^ Q Μ θ Μ &lt;〇〇〇〇〇&lt; 〇XXXXX 0 XXXX When the film is unfolded Wrinkle production result 〇〇〇〇〇〇〇〇X 〇〇〇〇〇〇〇〇〇 follow-up evaluation result 〇〇〇〇〇〇〇&lt;] 〇〇〇〇〇X 〇〇〇〇 effective area cm2 1 27816 1 27712 | 27688 | | 27649 I | 27551 I | 27449 I | 27104 I 1 26619 1 1 28025 j 1 27927 1 1 27793 1 1 27695 1 1 27597 1 | 27144 I | 27509 I | 27326 I 1 27144 1 26963 | Wb/Wa 1 1.08 1 1 1-291 | 1.06 | CO | 1.06 I Γΐ·22] rH 丨l17 1 1 0.92 1 1 0.86 1 1 0.88 1 1 0.83 1 oo ο | 0.67 j Bu 1&gt; Width Wb (mm) 1 15.12 1 [18.06 1 | 16.96 | | 18.08 I | 19.08 I "21.96 | Ο 1 35·ί 1 CN inch VO | 23.8 I | 27.2 j | 30.6 I Short side length Lb (mm) 1600 1600 1600 | 1600 | | 1600 I 1600 1600 1 1600 1 1600 1600 1600 1600 1600 1600 | 1600 I 1600 1600 1600 The width of the long side Wa (mm) inch r · ^ inch 00 00 CN inch 00 20 long side length La (mm) 1800 1800 1800 1800 1800 | 1800 I 1800 1800 1800 1800 1800 1800 1800 1800 1800 1800 1800 1800 thickness ( Mm) Ό Ό v〇VO Example 190 1 Example 191" | Example 192 I Example 193 | Example 194 1 Example 195J 1 Example 196] 1 Example 197 1 Comparative Example 132 1 Comparative Example 133 1 Comparison Example 134 1 Comparative Example 135" Comparative Example 136 | Comparative Example 137J Comparative Example 138 1 Comparative Example 139 1 Comparative Example 140 Comparative Example 141 143170.doc -47- 201015213 [Table 17] Photomask film size Short side length x long side Length (mm) Quartz glass size Short side length x Long side length (mm) Quartz glass thickness (mm) 1800x2000 1900x2050 22 1600x1800 1700x1850 18 1400x1600 1500x1650 14 1200x1400 1300x1450 11 [Industrial availability] If the photomask of the present invention is used The method of using the film frame, the mask film, and the mask film frame can be applied to the light of a large-color TFT LCD (thin film transistor liquid crystal display) that can be developed in recent years for high-quality/high-definition display. Large reticle or reticle used in the lithography step. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view showing a configuration of a photomask cover film of the present invention and a photomask cover film using the same; FIG. 2 is a view showing a length of a long side of the photomask cover of FIG. FIG. 3 is a cross-sectional view of the short side of the reticle shield frame of FIG. 1 perpendicular to the longitudinal direction thereof; FIG. 4A is a view showing the initial length of the measuring edge of the reticle shield frame FIG. 4B is an explanatory view showing a state in which the mask cover frame is supported and bent; FIG. 4C is an explanatory view showing a length after the measurement side of the mask cover is supported; and FIG. An explanatory view showing a state in which the reticle shield frame is supported by the pedestal. 143170.doc -48- 201015213 [Description of main components] 1 Photomask cover 1 a long side 2a short side lal, lbl attached surface la2, lb2 flat inclined surface 2 photomask 10 large mask Protective film 143170.doc -49-

Claims (1)

201015213 VII. Patent application scope: 1. A reticle protective film frame, which is a rectangular reticle protective film frame, and the deformability α of the reticle protective film frame is 0.06°/. In the following, the followability β of each side of the mask blank according to the following general formula (1) is 3 mm or more, and the followability β of the long side of the mask film frame is 32 mm or less. Moreover, the length of the long side of the frame body is 丨4〇〇mm or more and 2100mm or less, and the area of the inner side of the film frame is 15000 cm2 or more, β=(1/mask film The amount of bending) x thickness X width. A 2_ The photomask cover film of claim 1, wherein the width of the short side of the photomask cover is 1.05 times or more and 1, 50 times or less the width of the long side. 3. A reticle cover film frame which is a rectangular reticle cover film frame, and the width W of the long side of the reticle cover film frame is 13.0 mm or more and 30.0 mm&amp; The ratio Wb/Wa of Wb to the width Wa of the long side is 1.05 or more and 1.50 or less. The length of the long side is 1400 mm or more and 2100 mm or less, and the area inside the casing is 16,000 cm2 or more. The reticle shield frame according to any one of claims 1 to 3, wherein the material constituting the reticle frame is aluminum or an alloy thereof. 5. The reticle shield frame according to any one of claims 1 to 4, wherein the surface of the light cover film frame is microporous formed by an alumite treatment, a blackening treatment and an alumite treatment. The opening is subjected to a plugging process and is substantially free of microcracks. 6. A reticle film which is obtained by unfolding a reticle film on a reticle casing of any one of claims 1-5. 7. A method of using a reticle shield frame, each of which is provided with a short side of a reticle cover film as opposed to a reticle shield frame as claimed in claim 6 143170.doc 201015213 At least one of the short sides, the reticle film is attached to the reticle, and then the reticle to which the reticle film is attached is used for exposure processing. 143170.doc