KR101287700B1 - Pellicle frame, pellicle and method for using pellicle frame - Google Patents

Abstract

The present invention provides a pellicle frame in which the frame is not distorted when the pellicle frame is stretched and adhered to the pellicle film, and the pellicle frame itself follows the bending caused by the mask's own weight even after the pellicle is adhered to the mask.
The pellicle frame of the present invention is a rectangular pellicle frame, wherein the pellicle frame has a distortion α of 0.06% or less, and the following β of each side of the pellicle frame represented by Equation 1 is 3 mm or more, and the following β of the long side of the pellicle frame Is 32 mm or less, and the length of the long side of the frame is 1400 mm or more and 2100 mm or less, and the area inside the pellicle frame is 15000 cm 2 or more.
&Quot; (1) "

Description

How to use pellicle frame, pellicle and pellicle frame {PELLICLE FRAME, PELLICLE AND METHOD FOR USING PELLICLE FRAME}

The present invention is used to prevent foreign matter from adhering to a photomask or reticle used in a lithography process when manufacturing a thin film transistor (TFT), a color filter (CF), or the like forming an LSI, a liquid crystal display (LCD). A frame that is a constituent member of a pellicle, and more particularly, relates to a pellicle frame which is a constituent member of an extra large pellicle having a long side length exceeding 1400 mm, and a method of using a pellicle frame and a pellicle frame.

The present invention relates to a frame and a pellicle which are constituent members of the pellicle, but first, the pellicle will be described.

Background Art Conventionally, in the manufacture of semiconductor circuit patterns and the like, the use of dustproof means called pellicles is generally used to prevent foreign matter from adhering to a photomask or reticle. The pellicle is, for example, a transparent polymer film such as nitrocellulose or cellulose derivative or fluoropolymer having a thickness of 10 μm or less on a top surface of a frame of several millimeters in thickness having a shape suitable for the shape of a photomask or a reticle (hereinafter referred to as a pellicle film). The adhesive film is stretched (extended) and the adhesive is applied to the lower surface of the frame, and the protective film is adhered to the adhesive by a predetermined adhesive force.

The adhesive material is for fixing the pellicle to the photomask or reticle, and the protective film protects the adhesive surface of the adhesive material in order to maintain the adhesive force of the adhesive material until the adhesive material is provided for its use.

Such pellicles are generally supplied from the manufacturer making the pellicle to the manufacturer making the photomask or the reticle, and therefore, after the pellicle is attached to the photomask or the reticle, the pellicle is supplied to the manufacturer performing lithography such as semiconductor manufacturers, panel manufacturers, and the like. .

In recent years, due to the widespread use of various multimedia, a large color TFT LCD (thin film transistor liquid crystal display) capable of high-quality and high-precision display has been demanded. Accordingly, a large sized pellicle that can be applied to a large size photomask or reticle used in a photolithography process is desired.

As a frame of a pellicle which can be applied to a large photomask or a reticle used in a photolithography process such as a large size TFT LCD (thin-film transistor liquid crystal display), it is generally a rectangle having a long side and a short side. When the pellicle film is affixed to the frame, distortion occurs in the side of the frame due to the tension of the pellicle film, and the distortion may reduce the effective exposure area of the photomask or the reticle, and the unfolded area of the pellicle film becomes large. As the pellicle film becomes larger, the phenomenon becomes remarkable. This phenomenon was solved by increasing the rigidity of the pellicle frame while maintaining the inner area of the pellicle frame (hereinafter referred to as an effective area) as much as possible (see Patent Document 1, for example).

Japanese Patent Laid-Open No. 2001-109135

However, new problems have arisen in recent years due to the larger size.

This is because the recent larger size is required to enlarge the photomask or the reticle (hereinafter, simply referred to as a mask) itself, and the mask itself by the larger size of the mask itself, which has not been a problem in the large size of the mask up to now, It is a matter of bending due to its own weight.

That is, since the pellicle is used in close contact with the mask, when the pellicle cannot follow the bending of the mask, the abutment surfaces of the mask and the pellicle are peeled off, and an air path is generated therebetween, resulting in the effect of using the pellicle. Not being obtained is a problem. Particularly, since the pellicle after adhering to a mask or the like is often handled for each pellicle by gripping the short side of the mask in the working process, it is required to follow the pellicle frame to warpage of the mask on the long side. .

As described above, in the increase in size of the pellicle, the solution has been to improve the stiffness of the pellicle in order to prevent the pellicle itself from bending, but the sizing of the pellicle is not only improved in the stiffness. It is required to follow the bending of the mask itself by the enlargement of the mask itself which affixes the pellicle, especially the bending of the long side in a work process. In other words, it can be said that the pellicle of ultra-large size requires characteristics of both rigidity and flexibility.

In this way, the super-size of the mask generates new problems for the super-large pellicle used therein.

The present invention is to solve the new problem caused by the super-size of the pellicle, the first invention is the frame itself is not distorted when the pellicle frame is stretched and bonded to the pellicle film, and even after the pellicle adheres to the mask It is a problem to follow the pellicle frame itself against bending due to its own weight.

In addition, the ultra-large pellicle is also required to have a characteristic that the frame is not distorted even when handling until the pellicle film is stretched and adhered to the pellicle frame and adhered to the mask. According to the second invention, the frame is not distorted when the pellicle frame is stretched and bonded to the pellicle film, and the frame is not distorted during handling until the pellicle frame is stretched and bonded to the pellicle frame and then adhered to the mask. Even after sticking a pellicle to a mask, it is a problem to follow the pellicle frame itself with respect to the bending by the weight of the mask itself.

MEANS TO SOLVE THE PROBLEM In order to solve the said subject, as a result of earnestly examining, the present inventors discovered that the said subject can be solved by specifying the frame distortion α and the following β of a super-large pellicle, and came to complete the 1st invention of this invention.

In addition, the present inventors have found that the above-mentioned problem can be solved by widening the width Wb of the short side 1b of the pellicle frame at a specific ratio with respect to the width Wa of the long side 1a, thereby completing the second invention of the present invention. Reached.

That is, the present invention is as follows.

(1) A rectangular pellicle frame, wherein the stiffness α of the pellicle frame is 0.06% or less, the followability β of each side of the pellicle frame represented by the following formula (1) is 3 mm or more, and the followability β of the long side of the pellicle frame is 32 mm The length of the long side of a frame is 1400 mm or more and 2100 mm or less, and the inside area of the said pellicle frame is 15000 cm <2> or more.

(2) The pellicle frame according to (1), wherein the width of the short side of the pellicle frame is 1.05 times or more and 1.50 times or less the width of the long side.

(3) A rectangular pellicle frame, wherein the width Wa of the long side of the pellicle frame is 13.0 mm or more and 30.0 mm or less, the width Wb of the short side is Wb / Wa of 1.05 or more and 1.50 or less with respect to the long side width Wa, and the length of the long side is A pellicle frame having an area of 1400 mm or more and 2100 mm or less and an inner surface of the frame of 16000 cm 2 or more.

(4) The pellicle frame according to any one of (1) to (3), wherein the material constituting the pellicle frame is aluminum or an alloy thereof.

(5) In any one of said (1)-(4), the surface of a pellicle frame is given the sealing process of the opening part of the micro hole formed by the alumite treatment, the blackening process, and the alumite treatment, Pellicle frame without micro cracks.

(6) A pellicle obtained by expanding and adhering a pellicle film so as to cover the pellicle frame according to any one of (1) to (5).

(7) The pellicle is adhered to the mask by holding at least one of the short sides of the pair of short sides of the pellicle frame of the pellicle according to the above (6), and the pellicle is adhered to the mask. How to use the pellicle frame.

Since the pellicle frame of the present invention has appropriate rigidity and flexibility, the frame is not distorted when the pellicle film is stretched and adhered to the pellicle frame, and the effective exposure area represented by the inner area of the pellicle is not reduced. In addition, since the mask can follow the bending of the mask even after the pellicle is adhered to the mask, an air path does not occur in the adhesive surface between the mask and the pellicle.

In addition, according to the second invention, the frame is not distorted even during handling until the pellicle film is stretched and adhered to the pellicle frame and adhered to the mask.

In addition, the effect of the pellicle frame of the present invention is remarkable in the case of a very large pellicle, and specifically in the case of a very large pellicle having an effective area of 15000 cm 2 or more.

1 is a perspective view showing the configuration of a pellicle frame and a pellicle using the same according to the present invention.
FIG. 2 is a cross-sectional view of a surface perpendicular to the longitudinal direction of the long side of the pellicle frame of FIG. 1.
It is sectional drawing of the surface perpendicular | vertical to the longitudinal direction of the short side of the pellicle frame of FIG.
It is explanatory drawing which shows the initial length of the measuring side of a pellicle frame.
4B is an explanatory diagram showing a state where the pellicle frame is supported and bent.
It is explanatory drawing which shows the length after support of the measurement side of a pellicle frame.
5 is an explanatory diagram showing a state in which a pellicle frame is supported by a pedestal.

EMBODIMENT OF THE INVENTION Hereinafter, the form for implementing this invention is demonstrated. The following embodiment is an illustration for demonstrating this invention, and is not limited to the following content.

The shape of the pellicle frame of the present invention is a rectangle similar to the mask shape. The long side of the pellicle frame refers to the longest side of the frame, and the short side of the pellicle frame refers to the shortest side of the frame. More specifically, in the case of a rectangle, a long side is a long side and a short side is a short side among two orthogonal sides, and in a square case, all four sides are the same length. In the case of square, arbitrary sides can also be defined as a long side or a short side.

The distortion α is represented by the following equation. This distortion α is measured as follows. Hereinafter, the measuring method of the distortion (alpha) is demonstrated using FIG. 4A, FIG. 4B, FIG. 4C, FIG.

First, the length (length of initial state) L1 (shown in FIG. 4A) of one side of the pellicle frame 1 to which the distortion α is to be measured is measured. Then, as shown in FIG. 5, the base 20 supports the lower surface (not touching the upper surface) of two opposite sides which do not measure the distortion α in the pellicle frame 1. At this time, the whole side of the side which does not measure the distortion (alpha) is supported from below, and is supported from the tip of the pellicle frame 1 to the 15 mm location. For example, when measuring the short side of the pellicle frame 1, the whole long side is supported by the base 20 from below so that a long side may not bend. When measuring the long side of the pellicle frame 1, the whole short side is supported by the base 20 from below. After holding for 10 minutes in this state (shown in Fig. 4B), the support is stopped, and the pellicle frame is allowed to stand on a flat pedestal, and after 10 minutes, the length of one side to be measured (after supporting (force by its own weight) After addition, the length) L2 (shown in FIG. 4C) is measured again, and the elongation with respect to the length L2 of the initial state of the length L2 after the support is calculated from the following equation to be a distortion α. The temperature at the time of measurement is 23.8 degreeC, and relative humidity is 74% RH.

In addition, since four sides exist in a rectangular pellicle frame, the same measurement is performed about each side, and it is set as the distortion α of a pellicle frame with the largest distortion α. In addition, when the width | variety of a side differs in an upper surface and a bottom surface, the distortion (alpha) is measured with the surface of the wider side more downward. The lower limit is 0% or more, but the upper limit is 0.06% or less, preferably the distortion limit α of the pellicle frame is preferably 0.02% or less, and most preferably 0.01% or less.

In addition, the followability β showing the followability to the mask of the pellicle frame is represented by the following formula (1), and the lower limit of β of each side of the pellicle frame is 3 mm or more, more preferably 4 mm or more, and the long side of the pellicle frame The upper limit of the followability is 32 mm or less, preferably 25 mm or less. The followability of the short side of the pellicle frame is preferably 100 mm or less, more preferably 80 mm or less, particularly preferably 50 mm or less.

&Quot; (1) &quot;

The measuring method of followable β is as follows.

First, as shown in FIG. 5, the lower surface of the two opposite sides which do not measure the followability (beta) in the pellicle frame 1 is supported by the pedestal 20. As shown in FIG. At this time, the whole side of the side which does not measure followability (beta) is supported from below, and it supports to the point of 15 mm from the tip of the pellicle frame (1). For example, when measuring the short side of the pellicle frame 1, the whole long side is supported by the base 20 from below so that a long side may not bend. When measuring the long side of the pellicle frame 1, the whole short side is supported by the base 20 from below. After holding for 10 minutes in this state, as shown in Fig. 4B, the amount of change from the position of the initial state of the most bent portion of the side to be measured is measured, and the amount of change is defined as the amount of warp ΔT of the pellicle. Then, the inverse of the warp amount ΔT is multiplied by the thickness and the width of the side to be measured to be the followability β. This followability beta is measured for all sides of the pellicle frame 1. In addition, when the width | variety of a side differs in an upper surface and a bottom surface, the followability (beta) is measured by making the surface of the side with a wider side more downward.

The measurement of the followability β is performed simultaneously with the measurement of the distortion α.

This followability beta is an index indicating flexibility indicating how much the warp of the pellicle frame can follow the warp of the mask. Therefore, the smaller the numerical value, the higher the followability. However, if the followability is too high, wrinkles will occur at the time of pellicle unfolding and handling.

In addition, the thickness of the pellicle frame is preferably at least 4.0 mm, more preferably at least 5.0 mm, particularly preferably at least 6.0 mm. On the other hand, an upper limit becomes like this. Preferably it is 10 mm or less, More preferably, it is 8 mm or less, More preferably, it is 7 mm or less, Especially preferably, it is 6.5 mm or less.

Preferably the width of a pellicle frame is 13 mm or more, More preferably, it is 14 mm or more, More preferably, it is 16 mm or more. On the other hand, an upper limit becomes like this. Preferably it is 30 mm or less, More preferably, it is 25 mm or less, More preferably, 19 mm or less is preferable. In addition, the width may be the same on both the long side and the short side, or may be independent widths, respectively.

In addition, the width | variety of the side of a pellicle frame means the largest width of each side, such as width Wa and Wb, as shown to FIG. 2, FIG.

Although the cross-sectional shape of each side of a pellicle frame is not specifically limited, such as a rectangle, an H type, and a T type, a rectangular shape is most preferable. The cross section may be a hollow structure.

The pellicle frame of the present invention exhibits a remarkable effect as it becomes extra large, specifically, the length of the long side of the pellicle frame is 1400 mm or more, particularly 1700 mm or more and 2100 mm or less, and the pellicle effective area is 16000 cm 2 or more and 24000 cm 2 or more. In particular, it exhibits a remarkable effect when it is 25000 cm 2 or more.

In addition, although the pellicle frame of this invention exhibits a remarkable effect when large, it is sufficient that the upper limit of an effective area is 35000 cm <2> from the magnitude | size required for the mask etc. which are used for manufacture of TFT LCD.

By the way, in the large sized pellicle whose long side is 1400 mm or more, in order to improve the freedom degree in a handling process, it is preferable to handle by holding only one side of two short sides or two long sides, especially considering work efficiency. In this case, a gripping method for holding two short sides is preferable. When the width Wb of the short side of the pellicle frame has a Wb / Wa of 1.05 or more with respect to the width Wa of the long side, when handled by a gripping method of gripping two short sides, it is possible to always grip on the side with high rigidity. Wrinkles can be suppressed. The fact that handling of the pellicle can be made in a wider short side direction increases the convenience of the handle portion at the time of gripping. It is especially preferable to form the convex part and the recessed part for holding on the short side of a pellicle frame from a viewpoint of handling property improvement. In addition, when Wb / Wa is 1.50 or less, even when the pellicle frame is erected (when the long side is perpendicular to the ground and the short side is parallel to the ground), the distortion on the long side can be suppressed, so that wrinkles can be suppressed. Can be. In the super-large pellicle whose pellicle effective area becomes 16000 cm <2> or more, it is preferable to perform a foreign material test on the surface of a pellicle membrane by rotating a pellicle for work efficiency. At this time, the pellicle frame is erected, but if the Wb / Wa is 1.50 or less, the distortion on the long side can be suppressed, and the occurrence of wrinkles in the pellicle film can be suppressed in the foreign matter inspection step or the like.

As for the width Wb of the short side 1b of the pellicle frame 1, specifically, the ratio (Wb / Wa) of the width Wb of the short side 1b with respect to the width Wa of the long side 1a is preferably 1.05 or more, and more preferably. Preferably it is 1.1 or more, and an upper limit is 1.50 or less, More preferably, it is 1.25 or less, Especially preferably, it is 1.2 or less.

Materials constituting the pellicle frame of the present invention include, for example, carbon steel for machine structures (SC series, etc.), tool steel (carbon tool steel SK series, high speed tool steel SKH series, alloy tool steel SKS series, SKD series, SKT series, etc.) site-based stainless steel series metal such as (SUS403, SUS410, SUS410S, SUS420J1, SUS420J2, SUS429J1, SUS440A, SUS304, etc.), aluminum, an aluminum alloy (such as 5000 series, 6000 series, 7000-based), ceramic (SiC, AlN, Al ₂ O ₃ , and the like, and composite materials of ceramics and metals (Al-SiC, Al-AlN, Al-Al ₂ O _3, etc.), among which aluminum and alloys thereof may be mentioned. Alloys of magnesium, alloys of aluminum and magnesium and silicon, alloys of aluminum and zinc and magnesium.

In addition, each of the steels described above can be fixed by a magnet due to the magnetic material, and particularly in the case of a frame of a large pellicle, the machining operation is good and is preferably used. The surface of a pellicle frame can also be blackened, such as black chromium plating, black alumite, and black coating.

Among these, black alumite treatment is further demonstrated.

Since a pellicle support frame generally uses a 5000 series aluminum alloy, it demonstrates taking an aluminum alloy as an example.

In general, black anodize treatment is performed by molding a pellicle support frame from an aluminum alloy, followed by anodizing, sealing the fine pores generated by this treatment with a blackening agent, and performing a sealing process to block the fine pores. Is done. However, when the surface of the support frame made by the general method in this way is observed with an electron microscope, the occurrence of minute cracks (micro cracks) is confirmed. Such micro cracks also cause problems of falling of very small foreign matters contained in the cracks as the pattern width progresses and the wiring width is further narrowed. Therefore, it is preferable to take the following methods as a method of preventing the occurrence of such micro cracks.

First, the surface of the pellicle frame is anodized. This alumite treatment is performed in the range of 10 to 20% of sulfuric acid concentration, 1 to 2 A / dm 2 of current density, 15 to 30 ° C of electrolyte temperature, and 10 to 30 minutes of energization time. At this time, many micro holes (diameter 50-200 mm, pitch 500-1500 mm) are formed in the alloy surface regularly. After that, the blackening process is performed using this hole. Since the blackening process is performed to prevent reflection of light from the frame, the blackening process is not limited to black, but also includes dark colors such as black and dark blue. Dyeing, electrolytic coloring, etc. are mentioned to a blackening process. Dyeing is a method of adsorbing a dye into this hole by immersing it in a solution in which black dye is dissolved to obtain a color tone, and electrolytic coloring is a method of depositing a metallic element electrically in this hole to obtain a color tone. Dyeing is carried out, for example, at a dye concentration of 3 to 10 g / l and a dyeing solution temperature of 50 to 65 ° C.

Subsequently, sealing is performed to close this hole. For this treatment, boiling water which added 6-12 g / L of Nikka Kagaku Kogyo Co., Ltd. hardwall 3 (brand name) sealing aid called a low temperature sealing agent is used, for example.

At this time, the hole is filled with fine pores on the surface of the alumite membrane, and the alumite membrane becomes dense, but the sealing temperature is sealed at a temperature slightly lower than 100 ° C, for example, 70 to 95 ° C, more preferably 80 to 90 ° C. By having a very uniform surface properties, it is possible to make a pellicle frame substantially free of micro cracks.

In addition, the determination of the presence or absence of micro cracks draws a straight line 10 cm (actual dimension 0.1 mm) in the photograph which enlarged the support frame surface 1000 times with the electron microscope, and calculates the number of cracks which cross | intersect the straight line. The width of a crack counts what can be observed from the electron micrograph, ie, the crack width is 0.1 micrometer or more. It is judged that the more this number is, the denser the crack exists.

If necessary, an adhesive (acrylic, vinyl acetate, silicone, rubber, etc.) or grease (silicone, fluorine, etc.) for replenishing foreign matter may be applied to the inner wall surface or the entire surface of the pellicle frame.

Further, if necessary, a small hole penetrating the inside and the outside of the pellicle frame is drilled so that the pressure difference between the inside and outside of the space formed by the pellicle and the photomask is eliminated.

In this case, attaching the foreign matter removal filter to the outside of the minute hole is preferable because not only the air pressure can be adjusted, but also foreign matter can be prevented from entering the space formed by the pellicle and the photomask.

In the case where the space volume formed by the pellicle and the photomask is large, a plurality of holes or filters are provided, which is preferable because the expansion time of the membrane due to the air pressure fluctuation and the recovery time of the concave portion are shortened.

Since the pellicle frame of the present invention can have appropriate rigidity and flexibility by satisfying the above requirements, there is no distortion of the frame due to the stretching of the pellicle film, as well as the warping in the case of handling the pellicle alone. After affixing to a mask, it is also possible to follow the bending of the mask itself in handling. As a result, since the pellicle does not generate wrinkles and can follow the bending of the mask, it has an excellent effect that an air pass does not occur.

As mentioned above, although the pellicle frame of this invention was demonstrated, the reliability as a pellicle frame can be improved more by setting it as the following structure.

For example, when the long side 1a and the short side 1b of the pellicle frame 1 shown in FIG. 1, FIG. 2, and FIG. 3 have the same width Wa and Wb, the adhesive surface 1a1 of the pellicle film 2 And a structure satisfying a relationship of Wa = Wb> Wc = Wd between the widths Wc and Wd of (1b1). Thus, when the width Wa and Wb of the pellicle frame 1 use a structure larger than the width Wc and Wd of an adhesive surface, the adhesive agent of the pellicle film 2 and the pellicle frame 1 is an adhesive coating apparatus, for example, Since it can apply quantitatively using XY dispenser robot etc., an adhesive agent can be apply | coated uniformly to the whole adhesive surface. In addition, by setting the adhesion width to be narrower than the width of the frame 1, it is possible to suppress the coating unevenness and the coating residue of the adhesive, and as a result, it is possible to prevent foreign matter from being deposited in the space of the coating unevenness and the coating remaining portion. Moreover, if Wc = Wd, since the whole side can be apply | coated, without changing an application quantity to a long side and a short side, it is preferable.

As a method of manufacturing a structure that satisfies the above-described relationship of Wa = Wb> Wc = Wd, when the inclined surface is formed on the adhesive surface side of the pellicle film of the pellicle frame 1, the inclined surface can be formed without a step. In addition, this inclined surface can also be made into a curved surface.

As mentioned above, by providing the difference of Wa = Wb> Wc = Wd between the width | variety of the pellicle frame 1 and the width | variety of a pellicle film adhesion surface, an adhesive agent leaves the film adhesion surface 1b1 of the frame 1, and makes a frame There is also an effect of preventing the sagging of the inner periphery of (1). In addition, although the case of Wa = Wb was demonstrated, even if the long side 1a and short side 1b of the pellicle frame 1 are not the same width Wa and Wb, the said effect can be acquired if Wa> Wc and Wb> Wd, If Wc = Wd, since the whole side can be apply | coated, without changing an application quantity to a long side and a short side, it is preferable.

In the pellicle frame of the first invention, the length of the photomask long side is equal to or greater than the pellicle frame long side length, and the length of the pellicle frame long side +150 mm or less, and the length of the photomask short side is equal to or greater than the pellicle frame short side length and the pellicle frame short side length +200 mm or less. The photomask can be particularly preferably followed. The thickness of the photomask is sufficient to be able to withstand the weight of the pellicle frame after attaching the pellicle frame (so that the photomask is not destroyed). In addition, although soda-lime glass, an alkali free glass, a low alkali glass, quartz glass, etc. are considered as a material of a photomask, since the pellicle frame of 1st invention does not depend on the material of a photomask, it can follow suitably.

In the above, the structure of the pellicle frame of 1st invention was demonstrated.

Next, the second invention of the present invention will be described.

The width of the pellicle frame 1 in 2nd invention is demonstrated. The lower limit of the width Wa of the long side 1a of the pellicle frame 1 shown in FIG. 2 is preferably 13.0 mm or more, preferably 14.0 mm or more, and most preferably 16.0 mm or more. On the other hand, an upper limit is 30.0 mm or less, Preferably an upper limit is 25.0 mm or less, More preferably, an upper limit is 19.0 mm or less.

In addition, the width of a pellicle frame side means the maximum width of each side, such as width Wa and Wb, as shown to FIG. 2, FIG.

The width Wb of the short side 1b of the pellicle frame 1 shown in FIG. 3 needs to be at least wider than the width Wa of the long side 1a, and specifically, of the short side 1b with respect to the width Wa of the long side 1a. The lower limit of the ratio Wb / Wa of the width Wb is 1.05 or more, preferably 1.1 or more, and the upper limit is 1.50 or less, preferably 1.25 or less, and most preferably 1.2 or less. Therefore, the width Wb of the short side of a pellicle frame takes the value of 13.65 mm or more and 45.0 mm or less.

In a large pellicle having a long side length of 1400 mm or more, in order to improve the degree of freedom in the handling process, it is preferable to handle by holding only one side of the two sides or the two sides of the long side, especially in consideration of work efficiency. It is preferable that it is a holding | gripping method which grips two short sides. When the width Wb of the short side of the pellicle frame has a Wb / Wa of 1.05 or more with respect to the width Wa of the long side, when handled by a gripping method of gripping two short sides, it is possible to always grip on the side with high rigidity. Wrinkles can be suppressed. The fact that handling of the pellicle can be made in a wider short side direction improves the convenience of the handle portion at the time of gripping. It is especially preferable to form the convex part and the recessed part for holding on the short side of a pellicle frame from a viewpoint of handling property improvement. In addition, when Wb / Wa is 1.50 or less, even when the pellicle frame is erected (when the long side is perpendicular to the ground and the short side is parallel to the ground), the distortion on the long side can be suppressed, so that wrinkles can be suppressed. Can be. In the super-large pellicle whose pellicle effective area becomes 16000 cm <2> or more, it is preferable to perform a foreign material test on the surface of a pellicle membrane by rotating a pellicle for work efficiency. At that time, the pellicle frame is raised, but when the Wb / Wa is 1.50 or less, distortion on the long side can be suppressed, and wrinkles of the pellicle film can be suppressed in the foreign matter inspection step or the like.

Moreover, about the thickness of the frame 1, Preferably it is 4.0 mm or more, More preferably, it is 5.0 mm or more, More preferably, it is 6.0 mm or more. The upper limit is preferably 10.0 mm or less, more preferably 8.0 mm or less, still more preferably 7.0 mm or less, and most preferably 6.5 mm or less.

Although the cross-sectional shape of each side of a pellicle frame is not specifically limited, such as a rectangle, an H type, and a T type, a rectangular shape is most preferable. The cross section may be a hollow structure.

The pellicle frame 1 of the present invention exhibits a remarkable effect as it becomes larger. Specifically, the length La of the long side 1a of the pellicle frame 1 is 1400 mm or more, particularly 1700 mm or more and 2100 mm or less. When the effective area of the pellicle is 16000 cm 2 or more, 24000 cm 2 or more, especially 25000 cm 2 or more, the effect is remarkable. In addition, the pellicle frame 1 of the present invention exhibits a remarkable effect if it is large. However, the upper limit of the effective area is sufficient if the upper limit of the effective area is sufficient because it is required for a mask or the like used for manufacturing a TFT LCD.

By the way, in the case of a large sized pellicle having a long side length of 1400 mm or more, the handling after the pellicle affixing to the mask is not performed by holding only the short side of the mask in the working process, It is understood that the working efficiency often increases when holding at least one portion of each short side 1b together with the mask, and in that case, the warpage due to the weight of the mask itself differs between the long side and the short side. Specifically, the warpage of the mask in the direction of the opposing long side 1a that is not gripped becomes large. For this reason, it is required to follow the bending of the pellicle frame against the bending in the long side direction. The pellicle frame in 2nd invention can fully follow the curvature of the mask with such specificity.

Since the pellicle frame of the present invention can have appropriate rigidity and flexibility by satisfying the above requirements, there is no distortion of the frame due to the expansion of the pellicle film, and the handle of the pellicle alone can bend as well as the following. After affixing to a mask, it is also possible to follow the bending of the mask itself in handling.

As a result, because the pellicle frame is distorted when the pellicle film is stretched on the pellicle frame, the pellicle effective area can be tracked without lowering the pellicle effective area. Thus, an excellent effect that an air path does not occur is exhibited.

In addition, since the short side is wider than the long side, the short side of the pellicle frame is easily gripped at the time of handling the pellicle. As a result, the pellicle can be easily handled on the same side as the gripping portion when the mask is handled, thereby improving the work efficiency.

In the pellicle frame 1 of the present invention, the widths Wc and Wd of the adhesive surfaces 1a1 and 1b1 of the pellicle film 2 of the long side 1a and the short side 1b of the frame 1 are approximately equal. It is also a preferred embodiment. The fact that the widths Wc and Wd of the adhesive surfaces 1a1 and 1b1 of the pellicle film of the long side 1a and the short side 1b described here are approximately equal to each other, and the film adhesion surface 1a1 of the long side 1a and the short side 1b. ) Means that the difference between the widths Wc and Wd of (1b1) is smaller than the difference between the widths Wa and Wb of the long side 1a and the short side 1b. That is, referring to the sectional views of FIGS. 2 and 3, it means that Wb-Wa> Wd-Wc.

Usually, the adhesive agent of the pellicle film 2 and the pellicle frame 1 is apply | coated using an adhesive application device, for example, an X-Y dispenser robot. In this case, since the adhesive application amount per unit length in the long side 1a and the short side 1b is the same, when Wc <Wd, when the pellicle film 2 is affixed to the pellicle frame 1, in the long side 1a, A large amount may cause an adhesive agent to protrude the film adhesion surface 1a1 of the frame 1, and to hang on the inner peripheral part of the frame 1.

Moreover, in the short side 1b, adhesive amount is insufficient and it does not spread uniformly on the whole surface of the film adhesive surface 1b1, but a narrow clearance gap arises between the pellicle film 2 and the pellicle frame 1 inside, and this clearance gap is generated. Foreign objects may get caught in the product.

As mentioned above from this viewpoint, even if the width | variety Wc and Wd of the film adhesion surfaces 1a1 and 1b1 of the long side 1a and the short side 1b are made substantially equal, even if the conventional simple adhesive agent application apparatus is used, , A more preferable pellicle is obtained.

A method of making the widths Wc and Wd of the film adhesion surfaces 1a1 and 1b1 of the long side 1a and the short side 1b approximately equal, the pellicle film of the long side 1a of the at least frame 1 of the pellicle frame ( If the inclined surface is formed on the adhesive surface side of 2), the inclined surface can be formed without a step, and foreign matters can be prevented from being deposited on the pellicle frame. In addition, this inclined surface can also be made into a curved surface.

Moreover, by providing this inclined surface, it can prevent that an adhesive agent hangs in the inner peripheral part of a frame. It is preferable that the inclined surface is large enough not to affect the rigidity and flexibility of the pellicle frame.

Subsequently, the super-large pellicle obtained by spreading and adhering a pellicle film to an extra-large pellicle frame having an inner surface of the pellicle frame according to the first and second inventions of the present invention of 16000 cm 2 or more will be described as follows. .

Examples of the pellicle film include cellulose derivatives (nitrocellulose, cellulose acetate, cellulose acetate propionate, cellulose acetate butyrate, and the like or a mixture of two or more thereof) and fluorine polymers (tetrafluoroethylene-vinylidene fluoride-hexafluoropropylene). A ternary copolymer, Teflon AF (brand name) by Dupont which is a polymer which has a cyclic structure in a principal chain, Saitop (brand name) by Asahi Glass Co., Ltd., and AGOFLON (brand name) by Ojimont (AUSIMONT) company Polymers, etc.) are used.

As the pellicle film, for example, a thin film formed from a polymer solution is used. Tension exists in this thin film. On the other hand, this tension is necessary to prevent the pellicle film from bending or wrinkles.

If the pellicle film is bent or wrinkled, the pellicle film vibrates greatly and is difficult to remove when the foreign matter adhering to the pellicle film is removed by air blow. In addition, since the height of the pellicle film varies with the place, the foreign matter inspector of the pellicle film does not function normally. In addition, problems such as an error in optical height measurement of the pellicle film occur.

About the ultrahigh pressure mercury lamp which is a light source of the batch exposure liquid crystal exposure machine currently used, a cellulose acetate propionate and a cellulose acetate butyrate are used preferably from a light resistance and a cost point.

The film thickness of the pellicle film is preferably about 0.5 µm to 10 µm, and in the large sized pellicle according to the present invention, since the strength of the pellicle membrane or the uniform film is easy to be formed, the thickness is preferably 2 µm to 8 µm. Said polymer is made into a polymer solution by the solvent (ketone system, ester system, alcohol system, fluorine system, etc.) suitable for each.

About said cellulose acetate propionate and cellulose acetate butyrate, ester type, such as ethyl lactate, is preferable. The polymer solution is filtered by a depth filter, a membrane filter, or the like as necessary.

Although the film-forming method of a polymer solution includes a spin coating method, the roll coating method, the knife coating method, the casting method, etc., a spin coating method is preferable from a uniformity and a foreign material management viewpoint. After film-forming on the film-forming board | substrate by a spin coating method, a uniform film | membrane is formed by drying a solvent by a hotplate, a clean oven, (far) infrared heating etc. as needed. Synthetic quartz, fused quartz, alkali free glass, low alkali glass, soda lime glass, etc. can be used as a film-forming substrate at this time.

Since the size of the film formation substrate of the large pellicle according to the present invention is large, the film formation substrate may be broken due to temperature unevenness during drying. In order to prevent this, the smaller the thermal expansion coefficient of the film forming substrate, the better. In particular, it is preferable that the linear expansion coefficient in 0 degreeC-300 degreeC is 50x10 <^-7> m / degrees C or less.

In addition, the surface of the film-forming substrate may be subjected to a release treatment in advance by a material such as silicon or fluorine. Further, by forming a layer (ie, an antireflection layer) having a lower refractive index than the pellicle film on one or both of the above pellicle films, the transmittance with respect to the exposure light beam can be increased, which is preferable.

As the material of the antireflection layer, a fluoropolymer (tetrafluoroethylene-vinylidene fluoride-hexafluoropropylene terpolymer, Teflon AF (trade name) manufactured by DuPont, which is a polymer having a cyclic structure in the main chain), Asahi Glass A low refractive index material such as Cytop (trade name) manufactured by Ojimont Corporation, Argoflon (trade name) manufactured by Ojimont Co., Ltd., polyfluoroacrylate, etc.), calcium fluoride, magnesium fluoride, barium fluoride and the like are used.

In the case of a polymer, an antireflection layer can be formed by the spin coating method similar to the above-mentioned, and in the case of an inorganic substance, it can be formed by thin film formation methods, such as vacuum deposition and sputtering. In view of foreign matters, a spin coating method using a polymer solution is preferable. Teflon AF (trade name) manufactured by DuPont Corporation and Argoflon (trade name) manufactured by Ojimont Co., Ltd. are preferable because they have a high refractive index and high antireflection effect.

The pellicle film formed on the film-forming substrate as described above may be peeled off from the film-forming substrate by a temporary frame affixed with an adhesive such as aluminum alloy, stainless steel, resin, or the like to be attached to a desired pellicle frame. Moreover, after sticking a desired pellicle frame on a film-forming board | substrate, you may peel from a film-forming board | substrate.

The large pellicle film thus obtained is applied with an adhesive by applying tension to the pellicle frame.

When the tension of the film is in an appropriate range, it is possible to prevent the large pellicle film from swelling or dent in the vertical direction of the membrane surface of the large pellicle film due to its own weight or air pressure difference in and out of the large pellicle film. In addition, when the foreign matter attached to the pellicle film is removed by air blow, the pellicle film may vibrate so that it is difficult to remove the foreign matter. Since the height of the pellicle film varies depending on the location, the foreign material inspection device of the pellicle film may not function normally. Problem can be solved, and the problem of an error in the optical height measurement of the pellicle film can be solved. In addition, it can secure the following performance against the air pressure fluctuations in and out of the large pellicle.

The film adhesive for adhering to a pellicle film and a pellicle frame is suitably selected according to the material of a pellicle film and the material of a pellicle frame. For example, adhesives, such as epoxy type, acryl type, silicone type, and fluorine type, are used.

In addition, the hardening method (adhesive hardening, light hardening, anaerobic hardening, etc.) suitable for each adhesive agent is employ | adopted for the hardening method of an adhesive agent. In view of oscillation, cost, and workability, acrylic ultraviolet curable adhesives are preferred.

In the mask adhesive for attaching the pellicle frame to the photomask, a hot melt system (rubber system, acrylic system) with adhesive force in itself, a tape system (acrylic system, PVC system sheet or the like) coated with adhesive material on both sides of the substrate or Foams such as rubber, polyolefin, urethane, and the like can be used, and pressure-sensitive adhesives such as rubber, acrylic, and silicone are applied as the adhesive.

In the large sized pellicle according to the present invention, since the pellicle is uniformly affixed to the photomask as a mask adhesive in a low weight, a relatively soft hot melt material or foam is preferable. In the case of a foam, the cross-section can be prevented from dusting by foaming an acrylic or vinyl acetate-based adhesive material or non-tacky material.

The thickness of the mask adhesive is usually 0.2 mm or more, but for uniform adhesion to the photomask, it is preferably 1 mm or more. In order to protect the adhesive surface of the said mask adhesive material from affixing on a photomask, the polyester film release-processed with silicone or fluorine is used.

The case for transporting the pellicle is manufactured by injection molding or vacuum molding materials such as acrylic, ABS, PVC, PET, and the like. These materials may be kneaded with an antistatic agent in order to prevent the charging, or a polymer having an antistatic structure (Kureha BAYON (trademark), Asahi Kasei ADION (trademark)) may be used.

In the case for a super-large pellicle according to the present invention, it is preferable that a rib structure is provided on a cover, a tray, or both of the case so that the case does not damage the pellicle in the distortion case during transportation, and the resistance to external force is increased.

In addition, there is a demand for a method in which the frame of the pellicle can be reliably gripped and can be taken out without causing bending or torsion in the frame at the time of taking out the pellicle from the storage container. And especially in the large pellicle which becomes difficult to handle because the pellicle itself becomes large, the pellicle is removed from the interface of the protective film and the adhesive so that it is not only securely gripped during storage, transportation and storage, but also directly attached to a mask or the like after taking out from the storage container. There is a need for a method of taking out without generating torsional bending.

Therefore, it is also possible to achieve gripping of a large pellicle having a longest side length of 1.4 m to 2.1 m by forming gripping convex portions or concave portions on all sides of the frame of the pellicle so as not to be restricted from the photomask. .

In particular, in the second invention, since the short side is wider than the long side, it is easy to form the convex portion and the concave portion for holding on the short side.

In the pellicle frame of the second invention, the length of the long side of the photomask is greater than or equal to the length of the pellicle frame, and the length of the long side of the pellicle is less than or equal to +150 mm, and the length of the photomask short side is greater than or equal to the pellicle frame. It is particularly preferable to follow the photomask. The thickness of the photomask is sufficient to be able to withstand the weight of the pellicle frame after attaching the pellicle frame (so that the photomask is not destroyed). Moreover, although soda-lime glass, an alkali free glass, a low alkali glass, quartz glass, etc. are considered as a material of a photomask, the pellicle frame of 2nd invention does not differ according to the material of a photomask, and can follow suitably.

Hereinafter, the present invention will be described in more detail with reference to Examples.

<Examples>

(Example according to the first invention)

[Examples 1-99, Comparative Examples 1-71]

The frame 1 for an extra large pellicle has the length La of the long side 1a, the length Lb of the short side 1b, the area (effective area) of the inner side of the frame, and the thickness of the frame shown in Tables 1 to 9 below. It was used. In addition, the width Wa of the long side 1a and the width Wb of the short side 1b of the pellicle frame were shown in Tables 1-9.

In addition, as a material of a pellicle frame, all used aluminum alloy, and the cross-sectional shape of the frame used the thing of rectangular shape. The pellicle frame used was free of microcracks subjected to black alumite treatment.

Therefore, the performance of actual pellicle was evaluated using the frame as mentioned above.

Specific contents are shown below.

As a pellicle film, the polymer solution of a cellulose ester is apply | coated on low alkali glass, and a main film is formed by spin coating.

Subsequently, the pellicle film of 4 micrometers in thickness which formed the anti-reflective layer by apply | coating a fluoropolymer solution on the film | membrane by spin coating is used similarly. The obtained pellicle film is stretched and adhered to the pellicle frame.

Here, the presence or absence of wrinkles generated when the pellicle film was stretched and adhered to the pellicle frame was evaluated (when the film was stretched, the wrinkle generation result). Evaluation results are shown in Tables 1-9. In the description of the evaluation results, "○" is a state without wrinkles at all, "△" is a state in which a wave is slightly seen when the membrane is viewed in detail, and "×" is a state in which wrinkles are generated.

Subsequently, the pellicle frame spread out and adhere | attached was affixed on the quartz glass. At this time, a rubber-based hot melt adhesive of styrene ethylene butylene styrene having a thickness of 1.2 mm was used as the mask adhesive, and this hot melt adhesive was applied to the mask adhesive surface of the pellicle frame, and affixed at a predetermined position of quartz glass. In addition, each member was ultrasonically cleaned before use.

In addition, the magnitude | size of quartz glass was made into the long side length +50 mm of the pellicle which sticks the long side of quartz glass, and the short side length +100 mm of the pellicle which sticks the short side of quartz glass. The size and thickness of the used quartz glass are shown in Table 17 below.

In addition, the flexibility of the pellicle frame was evaluated by measuring the followability of the pellicle to the mask. The pellicle affixed to the mask is left in the air while the two short sides of the mask are held face down with the pellicle affixed down, and the pellicle tracks whether the pellicle follows the bending caused by the mask's own weight. Evaluated.

The evaluation results are shown in Tables 1-9. The evaluation criteria of followability evaluated "(circle)" when the case where there was no change within 1 year after mask adhesion, "(triangle | delta)" for the case where a little lift | fever generate | occur | produced in the adhesion part, and "x" for the case where an air path occurred.

Further, using a pellicle frame having the same specifications as described above, a sample was prepared by spreading and adhering the pellicle film under the same conditions as described above, and gripping the long side using the sample to change the same side using the measurement conditions described above. Distortion α and followability β were measured, and the results were shown in Tables 1 to 9.

Comprehensive evaluation was "◎" when both "the evaluation result of followability" and the "wrinkle generation | occurrence | production crease occurrence result" were "(circle)", and if there was △, "○", and if there was ×, it was set as "X". .

(Example according to the second invention)

First, the evaluation method of the pellicle frame of this invention is demonstrated.

The pellicle frame of the present invention combines appropriate stiffness and flexibility, but the rigidity of the pellicle frame is determined by visually judging the presence or absence of wrinkles occurring when the pellicle film is stretched on the pellicle frame and the wrinkles generated when handling the pellicle. For the flexibility, the pellicle attached to the mask was left in the air with the two lateral sides of the mask held down with the pellicle affixed to the bottom, and the pellicle followed the bending due to the mask's own weight. It was evaluated as followability.

[Examples 100 to 197, Comparative Examples 72 to 141]

The length (La) of the long side (1a), the length (Lb) of the short side (1b), and the area (effective area) of the inside of the frame of the super-large pellicle frame (1) used in Examples and Comparative Examples are shown in Tables 10 to 10 below. Table 16 shows. In addition, the width Wa of the long side 1a of the pellicle frame, the width Wb of the short side 1b, and the thickness of the pellicle frame were also shown in Tables 10-16.

In addition, as a material of a pellicle frame, all used aluminum alloy, and the cross-sectional shape of the frame used the thing of rectangular shape. The pellicle frame used was free of microcracks subjected to black alumite treatment.

Therefore, performance evaluation was actually performed using the pellicle frame of the above-mentioned standard.

As a pellicle film, the polymer solution of cellulose ester was apply | coated on the low alkali glass, and the main film was formed by spin coating.

Subsequently, the pellicle film of 4 micrometers in thickness which applied the fluoropolymer solution by spin coating on the film | membrane and formed the anti-reflective layer was used similarly. The obtained pellicle film was stretched and adhered to the pellicle frame. In addition, the handling of the pellicle frame was carried out by holding a part of each side of a set of short sides altogether.

Here, the presence or absence of wrinkles generated when the pellicle film was stretched and adhered to the pellicle frame was evaluated (when the film was stretched, the wrinkle generation result). Evaluation results are shown in Tables 10-16. In the description of the evaluation results, "○" is a state without wrinkles at all, "△" is a state in which a wave is slightly seen when the membrane is viewed in detail, and "×" is a state in which wrinkles are generated.

Subsequently, the pellicle frame spread out and adhere | attached was affixed on the quartz glass. At this time, a rubber-based hot melt adhesive of styrene ethylene butylene styrene having a thickness of 1.2 mm was used as the mask adhesive, and this hot melt adhesive was applied to the mask adhesive surface of the pellicle frame, and affixed at a predetermined position of quartz glass. In addition, each member was ultrasonically cleaned before use.

In addition, the magnitude | size of quartz glass was made into the long side length +50 mm of the pellicle which sticks the long side of quartz glass, and the short side length +100 mm of the pellicle which sticks the short side of quartz glass. Table 17 shows the size and thickness of the used quartz glass.

The pellicle film surface of the pellicle affixed to the photomask thus obtained was observed, and the presence or absence of wrinkles generated in a series of handling steps from the stretching and bonding of the pellicle frame to the pellicle frame to the photomask affixation was also evaluated ( Wrinkles resulting from handling).

Here, a series of handling processes refer to the handling process which consists of a conveyance process, an inspection process, a packing process, a shipment process, a take-out process, and a sticking process to a photomask after a granulation (expanding and bonding of a pellicle film) process. In the conveyance process after an assembling process, it uses the holding holder for in-process transport, is gripped by the grasp force so that a pellicle does not fall near four corners of a pellicle frame short side, and a pellicle is moved to an inspection process. At this time, the pellicle moves the long side to the inspection process in a state where the short side is perpendicular to the ground in parallel with the ground. In a test | inspection process, it examines through one vertical rotation about the horizontal axis of a pellicle, one left-right rotation about a vertical axis, and one 90-degree rotation on the pellicle film plane centering on a pellicle film center. In the packing step, the pellicle is moved in a state where the long side of the pellicle is parallel to the ground and the short side is perpendicular to the ground. In a packing process, a pellicle is accommodated in a pellicle storage container in the state which attached the holder for conveyance in a process. Thereafter, the in-process transport holder is removed in the storage container, and only the pellicle is stored in the storage container. In the shipping step, normal transportation assuming transport of tracks is performed. At this time, the storage container is kept horizontal. In the takeout process, the pellicle is taken out from the storage container in a state where the pellicle frame is horizontal to the ground. At the time of taking out, the gripper is gripped so that the pellicle does not fall near four corners of the pellicle frame short side. In the sticking process to the photomask, while the pellicle frame is horizontal to the ground, the pellicle frame is gripped with a grip force such that the pellicle does not fall near the corners on the short side of the pellicle frame. do. The sticking force is firmly affixed by the sticking force which does not change the external appearance of a pellicle after sticking.

Evaluation results are shown in Tables 10-16. In addition, the evaluation criteria are the same as when stretched and bonded to the pellicle frame.

In addition, flexibility was evaluated using the evaluation conditions of the followability of the pellicle to the mask described above. The evaluation results are shown in Tables 10 to 16 (evaluation results of followability). The evaluation criteria of followability are that when the pellicle is adhered to the mask, the pellicle is attached to the bottom and the two lateral sides of the mask are held in the air in a state where it is held in the air and there is no change within one year. "△" and the case where an air path | occurence generate | occur | produced the case where the floating part arose in the adhesive part were evaluated as "x".

Comprehensive evaluation is "◎" when "the evaluation result of followability", "wrinkle occurrence result at the time of film expansion", and "wrinkle generation result by handling" are "◎", and if there is any △, "○", one If there was x, it was set as "x".

By using the method of using the pellicle frame, the pellicle, the pellicle frame of the present invention, a large-scale photomask or reticle used in the photolithography process of a large color TFT LCD (thin-film transistor liquid crystal display) capable of high-definition and high-precision display that has been recently developed. Applicable

1l pellicle frame
1a: long side
2a: short side
1a1, 1b1: adhesive face
1a2, 1b2: sloped plane
2: pellicle film
10: large pellicle

Claims (7)

As the rectangular pellicle frame, the stiffness α of the pellicle frame is 0.06% or less, the followability β of each side of the pellicle frame represented by the following formula (1) is 3 mm or more, and the followability β of the long side of the pellicle frame is 32 mm or less, The length of the long side of the frame is 1400 mm or more and 2100 mm or less, the inside area of the pellicle frame is 15000 cm 2 or more, and the width of the short side of the pellicle frame is 1.05 times or more and 1.50 times or less the width of the long side.
&Quot; (1) &quot;

As a rectangular pellicle frame, the width Wa of the long side of the said pellicle frame is 13.0 mm or more and 30.0 mm or less, the width Wb of the short side is Wb / Wa 1.05 or more and 1.50 or less with respect to the long side width Wa, and the length of the long side is 1400 mm The pellicle frame whose inner area of a frame is 2100 mm or less and 16000 cm <2> or more. The pellicle frame according to claim 1 or 2, wherein the material constituting the pellicle frame is aluminum or an alloy thereof. The surface of the said pellicle frame is subjected to the sealing process of the opening of the micro hole formed by the alumite treatment, the blackening process, and the alumite treatment, and is substantially free of a micro crack. A pellicle frame characterized by. The pellicle obtained by extending | stretching and bonding a pellicle film | membrane so that the pellicle frame of Claim 1 or 2 may be covered. A pellicle is attached to a mask by holding at least one of each of the short sides of a set of opposite short sides of the pellicle frame of the pellicle according to claim 5, and the pellicle-attached mask is then used for the exposure treatment. How to use the pellicle frame. delete

Images