JP2006178434A - Large pellicle - Google Patents

Large pellicle Download PDF

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JP2006178434A
JP2006178434A JP2005337941A JP2005337941A JP2006178434A JP 2006178434 A JP2006178434 A JP 2006178434A JP 2005337941 A JP2005337941 A JP 2005337941A JP 2005337941 A JP2005337941 A JP 2005337941A JP 2006178434 A JP2006178434 A JP 2006178434A
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pellicle
film
frame
large pellicle
adhesive
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Yasushi Kaneko
金子  靖
Yukihiko Uchi
幸彦 内
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Asahi Kasei Electronics Co Ltd
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Asahi Kasei Electronics Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a large pellicle having a deformation range preventing a pellicle film from touching a substrate on blowing air. <P>SOLUTION: The large pellicle 21 comprises a large pellicle frame 23 having ≥1,000 mm diagonal inner size, a large pellicle film 22 stretched with an adhesive 26 over one edge face of the large pellicle frame 23, a pressure-sensitive adhesive 24 applied on opposite edge face to the edge face where the large pellicle film 22 is stretched, so as to stick the frame to a mask, and a liner to protect the adhesive, layered in this order, wherein the deformation degree representing deforming tendency of the large pellicle frame 23 is specified to ≤4.2 mm/N. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は大型ペリクルに係り、詳しくは、液晶ディスプレイ(LCD)を構成する薄膜トランジスタ(TFT)やカラーフィルター(CF)を製造する際に、リソグラフ工程で使用されるフォトマスクに異物が付着することを防止するための大型ペリクルに関するものである。   The present invention relates to a large pellicle, and more particularly, when a thin film transistor (TFT) or a color filter (CF) constituting a liquid crystal display (LCD) is manufactured, foreign matter adheres to a photomask used in a lithographic process. The present invention relates to a large pellicle for prevention.

従来、LCDを構成するTFTを製造する際のリソグラフ工程において、フォトマスクにペリクルと称する防塵手段を載置して、該フォトマスクへの異物の付着を防止することが行われている。近年、LCDの大型化に伴い、LCDを製造するためのマスク、およびこれを保護するためのペリクルも大型化が進んでいる。   2. Description of the Related Art Conventionally, in a lithographic process when manufacturing a TFT constituting an LCD, dust prevention means called a pellicle is placed on a photomask to prevent foreign matter from adhering to the photomask. In recent years, with the increase in size of LCDs, masks for manufacturing LCDs and pellicles for protecting the masks are also increasing in size.

このような大型ペリクルでは、使用中あるいは保管中にペリクル膜に付着した異物をエアブローで除去しようとすると、膜がフォトマスク上に形成されているマスクパターンに接触してしまう問題が明らかになった。石英などのガラス基板上にクロムや酸化クロムで形成された数μmのマスクパターンは、静電気で破壊することがある。このため、静電気を発するおそれのある樹脂製のペリクル膜がマスクパターンに接触することは好ましくない。   In such a large pellicle, when the foreign matter adhering to the pellicle film is removed by air blow during use or storage, the problem that the film comes into contact with the mask pattern formed on the photomask has been clarified. . A mask pattern of several μm formed of chromium or chromium oxide on a glass substrate such as quartz may be destroyed by static electricity. For this reason, it is not preferable that the resin pellicle film that may generate static electricity comes into contact with the mask pattern.

ペリクル膜の張力によるペリクル枠の変形量が大きいと、結果として張力が緩んでしまう。大型ペリクル枠体の変形に関しての対策として、次のような技術がある。まず、有効露光領域を確保するために大型ペリクル膜の張力を考慮に入れて、大型ペリクル膜を展張して支持する大型ペリクル用枠体の長辺の幅を短辺の幅よりも大きくし、ペリクル膜展張による枠体長辺が内側に向かう撓みを抑制する方法である(例えば特許文献1)。また、一対の辺を枠体の外側に向かって突出するように形成し、これによってペリクル膜展張による枠体長辺の内側に向かう撓みを抑制する方法である(例えば特許文献2)。   When the deformation amount of the pellicle frame due to the tension of the pellicle film is large, the tension is loosened as a result. The following techniques are available as countermeasures for deformation of the large pellicle frame. First, taking into account the tension of the large pellicle film in order to secure an effective exposure area, the width of the long side of the large pellicle frame for supporting the stretched large pellicle film is larger than the width of the short side, This is a method of suppressing the bending of the long side of the frame body due to pellicle film stretching (for example, Patent Document 1). Moreover, it is a method of forming a pair of sides so as to protrude toward the outside of the frame body, thereby suppressing bending toward the inside of the long side of the frame body due to pellicle film expansion (for example, Patent Document 2).

ペリクル膜に初期歪み即ち張力を与える方法としては、ペリクル膜を基板表面から剥離するための支持枠を用いてペリクル膜を均等に伸延させる方法がある(例えば特許文献3)。   As a method of applying initial strain, that is, tension to the pellicle film, there is a method of uniformly extending the pellicle film using a support frame for peeling the pellicle film from the substrate surface (for example, Patent Document 3).

面積が144cm以上のペリクル膜に対して、ペリクル枠に変形がなく、かつペリクル膜にしわやたるみの無いペリクルを提供する方法がある(例えば特許文献4)。具体的には、ペリクル枠の変形を抑える方法として、ペリクル膜を加熱してペリクル膜の張力を緩和する方法が記載されている。 For a pellicle film having an area of 144 cm 2 or more, there is a method of providing a pellicle in which the pellicle frame is not deformed and the pellicle film does not wrinkle or sag (for example, Patent Document 4). Specifically, as a method for suppressing the deformation of the pellicle frame, a method for heating the pellicle film to relieve the tension of the pellicle film is described.

特開2001−109135JP 2001-109135 A 特開2002−296763JP 2002-296863 A 特開平10−339944JP 10-339944 A 特開平11−65092JP-A-11-65092

しかし、特許文献1及び特許文献2の技術は、枠体の変形を制御するものであって、ペリクル膜のエアブローによる変形防止には不十分である。   However, the techniques of Patent Document 1 and Patent Document 2 control the deformation of the frame, and are insufficient for preventing the deformation of the pellicle film by air blow.

また、特許文献3の技術の目的はしわや緩みの無いペリクル膜の製造を目標とするため、その張力はエアブローによる変形防止、特に大型ペリクルには必ずしも十分ではない。   In addition, since the purpose of the technique of Patent Document 3 is to produce a pellicle film free from wrinkles and slack, its tension is not always sufficient for preventing deformation by air blow, particularly for a large pellicle.

また、特許文献4の実施例は、高々ペリクル枠の外寸120mm角、幅2mm(内径対角寸法が164mm)のものが挙げられているだけであり、かつ、ペリクル枠の剛性とペリクル膜の初期歪の関係に関しての記載は無い。具体的には、ペリクル膜を加熱してペリクル膜の張力を緩和することは、しわやたるみの無いペリクル膜を製造できたとしても、エアブローによる変形防止の効果は得られない。   In addition, in the example of Patent Document 4, only a pellicle frame having an outer dimension of 120 mm square and a width of 2 mm (inner diameter diagonal dimension is 164 mm) is mentioned, and the rigidity of the pellicle frame and the pellicle film There is no description regarding the relationship of initial strain. Specifically, heating the pellicle film to relieve the tension of the pellicle film does not provide the effect of preventing deformation by air blow even if a pellicle film without wrinkles or sagging can be produced.

このように、前記従来技術では、大型ペリクルの寸法が大きくなるにつれて、エアブローによるペリクル膜の変形を十分に抑える事は難しい。これはエアブローでペリクル膜が基板に接触しない程度に十分な張力をペリクル膜に与え、それをペリクル枠体に貼り付けた際に枠体自身がその張力によって撓み、その事が逆に実質的な張力を小さくしエアブローによるペリクル膜の変位を十分に抑える事が出来ない事も大きな要因と思われる。   As described above, in the prior art, it is difficult to sufficiently suppress the deformation of the pellicle film due to air blow as the size of the large pellicle increases. This is because sufficient tension is applied to the pellicle film so that the pellicle film does not come into contact with the substrate by air blow, and when the frame is attached to the pellicle frame, the frame itself bends due to the tension, which is substantially It seems to be a major factor that the tension cannot be reduced and the displacement of the pellicle film due to air blow cannot be sufficiently suppressed.

本発明の目的は、ペリクル枠体の変位度と、膜の初期歪みとを適切に制御する事によって、エアブロー時にペリクル膜が基板に接触しないような変形範囲を持つ大型ペリクルを提供することである。   An object of the present invention is to provide a large pellicle having a deformation range in which the pellicle film does not contact the substrate during air blowing by appropriately controlling the degree of displacement of the pellicle frame and the initial strain of the film. .

十分な張力を与えるに必要な初期歪み量と張力に応じて枠体が変形しづらい枠体の条件を鋭意検討した結果、本発明を完成するに至った。すなわち、本願発明は以下の構成を有する。   The present invention has been completed as a result of earnestly examining the conditions of the frame body in which it is difficult for the frame body to be deformed according to the initial strain amount and tension required to give sufficient tension. That is, the present invention has the following configuration.

(1)内径の対角寸法が1000mm以上である大型ペリクル枠体と、該大型ペリクル枠体の一方の縁面に接着剤を介して展張された大型ペリクル膜と、該大型ペリクル膜を展張した縁面と対向する縁面にマスクに貼り付けるために設けられた粘着材と、それを保護するためのライナーとが順に積層された大型ペリクルにおいて、前記大型ペリクル枠体の変形しやすさを示す変位度が4.2mm/N以下であることを特徴とする大型ペリクル。 (1) A large pellicle frame having an inner diameter of 1000 mm or more, a large pellicle film stretched on one edge surface of the large pellicle frame via an adhesive, and the large pellicle film stretched In a large pellicle in which an adhesive material provided for adhering to a mask on an edge surface opposite to the edge surface and a liner for protecting the same are laminated in order, the large pellicle frame body is easily deformed. A large pellicle having a displacement degree of 4.2 mm / N or less.

(2)前記ペリクル膜に予め初期歪みを付与し、前記ペリクル枠体に接着剤を介して接着した時、張力を有することを特徴とする上記(1)記載の大型ペリクル。 (2) The large pellicle according to (1), wherein an initial strain is applied to the pellicle film in advance and tension is applied when the pellicle film is bonded to the pellicle frame through an adhesive.

(3)前記初期歪みの大きさを表す歪み度が0.7×10−3〜3.3×10−3N/mmであることを特徴とする上記(1)又は(2)に記載の大型ペリクル。 (3) The degree of distortion representing the magnitude of the initial strain is 0.7 × 10 −3 to 3.3 × 10 −3 N / mm, as described in (1) or (2) above Large pellicle.

本発明は、上記のような構成を有する。すると、ペリクル膜の初期歪みによって枠体が容易に撓むことを抑制し、ペリクル膜張力が緩むことを抑制する。このため、エアブローによる膜の変形を受けやすくなることを抑えることができる。こうして、ペリクル膜にエアブローをする際に、ペリクル膜下方の基板に接触しないようにすることができる。具体的には、ペリクル膜にエアブローをした際のペリクル膜のマスク方向への変形量を7mm以下にする事が可能になる。   The present invention has the configuration as described above. Then, the frame body is prevented from being easily bent by the initial distortion of the pellicle film, and the pellicle film tension is prevented from being loosened. For this reason, it is possible to suppress the film from being easily deformed by air blow. Thus, when air is blown to the pellicle film, it is possible to prevent the pellicle film from coming into contact with the substrate below the pellicle film. Specifically, the amount of deformation of the pellicle film in the mask direction when air is blown to the pellicle film can be reduced to 7 mm or less.

以下、図を用いて本発明による大型ペリクル枠体を説明する。尚、本発明はこれらに限定されるものではない。図1は大型ペリクルの斜視図であり、図2は大型ペリクルの断面図である。   Hereinafter, a large pellicle frame according to the present invention will be described with reference to the drawings. In addition, this invention is not limited to these. FIG. 1 is a perspective view of a large pellicle, and FIG. 2 is a cross-sectional view of the large pellicle.

図1及び図2に示すように、本実施形態に係るペリクル21は、内径の対角寸法が1000mm以上である大型ペリクル枠体23と、大型ペリクル枠体23の一方の縁面に接着剤26を介して展張された大型ペリクル膜22と、大型ペリクル膜22を展張した縁面と対向する縁面にマスクに貼り付けるために設けられた粘着材24と、それを保護するための保護ライナー25から成る。   As shown in FIGS. 1 and 2, a pellicle 21 according to the present embodiment includes a large pellicle frame body 23 having a diagonal dimension of 1000 mm or more and an adhesive 26 on one edge surface of the large pellicle frame body 23. A large pellicle film 22 stretched through the adhesive, an adhesive material 24 provided for adhering to the mask on the edge surface opposite to the edge surface on which the large pellicle film 22 is stretched, and a protective liner 25 for protecting it Consists of.

また、図1に示すように、大型ペリクル枠体23には、枠体23を構成する長辺23aと枠体23を構成する短辺23bとを有する。   Further, as shown in FIG. 1, the large pellicle frame body 23 has a long side 23 a constituting the frame body 23 and a short side 23 b constituting the frame body 23.

(ペリクル膜の詳細構成、及びペリクル膜の製造方法)
ペリクル膜22を構成するポリマーとしては、ニトロセルロース、セルロースジアセテート、セルローストリアセテート、セルロースアセテートプロピオネート、セルロースプロピオネート、セルロースアセテートブチレート、エチルセルロース、シアノエチルセルロース、セルロースカーボネートなどのセルロース誘導体ポリマー;アセチル化プルラン、シアノエチルプルランなどのプルラン誘導体ポリマー;ポリ乳酸ポリマー;ポリフツ化ビニリデン、テトラフロロエチレン−弗化ビニリデン共重合体、テトラフルオロエチレン−ヘキサフルオロプロピレン共重合体、エチレン−テトラフルオロエチレン共重合体、テトラフルオロエチレン−パーフルオロアルキルビニルエーテル共重合体、テトラフルオロエチレン−ヘキサフルオロプロピレン−パーフルオロアルキルビニルエーテル共重合体、ポリクロロトリフルオロエチレン、エチレン−クロロトリフルオロエチレン共重合体、クロロトリフルオロエチレン−フツ化ビニリデン共重合体又はポリフツ化ビニル、主鎖に環構造を有する含弗素ポリマー(CYTOP(旭硝子(株)製、商品名)、TEFLON AF(DuPont社製、商品名)など)などのフッ素ポリマー;ポリビニルブチラール、ポリビニルプロピオナールなどのポリビニルアセタールポリマー;4−メチル−1−ペンテン系共重合ポリマーなどが使用できる。ポリマーの分子量は、ペリクル膜22の強度、弾性率や露光光線に対する耐久性、溶媒への溶解性などを考慮し選択する。
(Detailed configuration of pellicle film and manufacturing method of pellicle film)
Examples of polymers constituting the pellicle membrane 22 include cellulose derivative polymers such as nitrocellulose, cellulose diacetate, cellulose triacetate, cellulose acetate propionate, cellulose propionate, cellulose acetate butyrate, ethyl cellulose, cyanoethyl cellulose, and cellulose carbonate; Pullulan derivative polymers such as fluorinated pullulan and cyanoethyl pullulan; polylactic acid polymer; polyvinylidene fluoride, tetrafluoroethylene-vinylidene fluoride copolymer, tetrafluoroethylene-hexafluoropropylene copolymer, ethylene-tetrafluoroethylene copolymer, Tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer, tetrafluoroethylene-hexafluoropropylene -Perfluoroalkyl vinyl ether copolymer, polychlorotrifluoroethylene, ethylene-chlorotrifluoroethylene copolymer, chlorotrifluoroethylene-vinylidene fluoride copolymer or polyvinyl fluoride, containing a ring structure in the main chain Fluoropolymers such as fluorine polymers (CYTOP (trade name, manufactured by Asahi Glass Co., Ltd.), TEFLON AF (trade name, manufactured by DuPont); polyvinyl acetal polymers such as polyvinyl butyral and polyvinyl propional; 4-methyl-1- A pentene copolymer or the like can be used. The molecular weight of the polymer is selected in consideration of the strength of the pellicle film 22, the elastic modulus, durability against exposure light, solubility in a solvent, and the like.

これらを溶解する溶媒としては、アセトン、メチルエチルケトン、メチルイソブチルケトンなどのケトン系溶媒;酢酸エチル、酢酸ブチル、乳酸エチルなどのエステル系溶媒;メタノール、エタノール、イソプロパノール、ブタノールなどのアルコール系溶媒;プロピレングリコールモノメチルエーテルアセテート;パーフルオロアルキルアミン(FLUORINERTシリーズ(3M社製、商品名)、CT-Solvシリーズ(旭硝子(株)製、商品名)など)、パーフルオロアルキルフラン(FLUORINERTシリーズ(3M社製、商品名)など)、ハイドロフルオロエーテル(Novecシリーズ(3M社製、商品名))、パーフルオロエーテル(GALDEN(SOLVAY SOLEXIS社製、商品名))、ハイドロフルオロエーテル(H-GALDEN(SOLVAY SOLEXIS社製、商品名))などのフッ素系溶媒などが使用できる。これらの溶媒は単独で使用してもよいし、混合して使用してもよい。   Solvents that dissolve these include ketone solvents such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; ester solvents such as ethyl acetate, butyl acetate, and ethyl lactate; alcohol solvents such as methanol, ethanol, isopropanol, and butanol; propylene glycol Monomethyl ether acetate; perfluoroalkylamine (FLUORINERT series (made by 3M, trade name), CT-Solv series (trade name, made by Asahi Glass Co., Ltd.)), perfluoroalkyl furan (FLUORINERT series (made by 3M, product) Name)), hydrofluoroether (Novec series (manufactured by 3M, trade name)), perfluoroether (GALDEN (manufactured by SOLVAY SOLEXIS, trade name)), hydrofluoroether (H-GALDEN (manufactured by SOLVAY SOLEXIS, Fluorine solvents such as product name)) You can use. These solvents may be used alone or in combination.

ポリマーと溶媒の組合せは、異物やゲルを除去するための所望の口径によるろ過ができるように溶解性を考慮したり、所望のペリクル膜厚が得られるよう、成膜に最適な濃度−粘度特性や蒸発速度を考慮して選択する。   The combination of polymer and solvent is a concentration-viscosity characteristic that is optimal for film formation, taking into account solubility so that filtration can be performed with a desired diameter to remove foreign substances and gels, and obtaining a desired pellicle film thickness. Select with consideration of evaporation rate.

ペリクル膜22は単層でもよいし、光線透過率を高めるため、屈折率の異なるポリマーを積層し多層膜としても良い。   The pellicle film 22 may be a single layer or may be a multilayer film formed by laminating polymers having different refractive indexes in order to increase the light transmittance.

加熱、加圧、攪拌などの手段によりポリマーを溶媒に溶解しポリマー溶液とする。   The polymer is dissolved in a solvent by means of heating, pressurization, stirring, etc. to obtain a polymer solution.

ポリマー溶液は、乾燥空気、窒素などの不活性ガス、あるいはポンプなどで加圧ろ過し、溶液中の異物やゲルを取り除く。ろ過に使用するフィルターは、四フッ化エチレン、超高分子量ポリエチレン、ナイロン、ポリプロピレン製のメンブレンフィルターやデプスフィルターが挙げられる。   The polymer solution is pressure filtered with dry air, an inert gas such as nitrogen, or a pump to remove foreign substances and gel in the solution. Filters used for filtration include membrane filters and depth filters made of ethylene tetrafluoride, ultrahigh molecular weight polyethylene, nylon, and polypropylene.

ポリマー溶液を成膜用基板に滴下し、ペリクルの膜厚が所望の膜厚になるように成膜する。成膜方法としては、回転成膜法(スピンコート法)、スリットコート法、スリットアンドスピン法などがある。   A polymer solution is dropped onto a film formation substrate, and a film is formed so that a pellicle has a desired film thickness. Examples of the film forming method include a rotational film forming method (spin coating method), a slit coating method, and a slit and spin method.

成膜用基板としては、石英ガラス、低膨張ガラス、ソーダガラス、セラミックスなどの表面を研磨、洗浄したものを用いることができる。研磨方法としては、物理研磨、化学研磨等の方法がある。ガラスの表面は、ポリマー溶液の濡れ性や乾燥後の膜の剥離性を制御するために、表面処理を施しても良い。表面処理剤としては、パーフルオロアルキル基を有するシリコーン化合物やシラザンなどが挙げられる。   As the substrate for film formation, a substrate obtained by polishing and cleaning the surface of quartz glass, low expansion glass, soda glass, ceramics, or the like can be used. Examples of the polishing method include physical polishing and chemical polishing. The surface of the glass may be subjected to a surface treatment in order to control the wettability of the polymer solution and the peelability of the film after drying. Examples of the surface treating agent include a silicone compound having a perfluoroalkyl group and silazane.

ペリクルの膜厚が所望の値になるよう、ポリマー溶液の濃度、粘度、溶媒の沸点を適宜選択する。さらに、回転成膜法、スリットアンドスピン法では、回転数、回転時間、回転加速時間、スリットコート法、スリットアンドスピン法では、溶液吐出量、スリットの間隔、スリットの移動速度、スリットと成膜用基板との間の距離を調節する。   The concentration, viscosity, and boiling point of the solvent are appropriately selected so that the film thickness of the pellicle becomes a desired value. Furthermore, in the rotation film formation method and the slit and spin method, the number of rotations, the rotation time, the rotation acceleration time, and in the slit coating method and the slit and spin method, the solution discharge amount, the interval between the slits, the movement speed of the slit, and the film formation with the slit Adjust the distance to the substrate.

成膜を終了した基板は、乾燥により溶媒を蒸発させる。乾燥方法としては、ホットプレート、赤外線ランプ、クリーンオーヴンなどが挙げられる。   After the film formation, the solvent is evaporated by drying. Examples of the drying method include a hot plate, an infrared lamp, and a clean oven.

乾燥を終了した基板から、膜を剥離する。外形が基板とほぼ同形状で幅が10〜50mm程度、厚さが3〜20mm程度の金属製仮枠、あるいは樹脂製仮枠に、両面テープ、エポキシ等の接着剤を貼付または塗布し、基板上の膜に押圧・固定する。この枠を静かに起こし、基板から膜を仮枠に剥がし取る。   The film is peeled off from the dried substrate. Adhesive such as double-sided tape or epoxy is applied or applied to a metal temporary frame or resin temporary frame whose outer shape is almost the same shape as the substrate, width is about 10 to 50 mm, and thickness is about 3 to 20 mm. Press and fix to the upper membrane. This frame is gently raised and the film is peeled off from the substrate onto the temporary frame.

ペリクル枠体23の材質は、アルミニウム合金、工具鋼、ステンレススチール、セラミックス、ガラス等が使用できる。ペリクル枠体23表面でのマスク上異物検査光が反射しないよう、ペリクル枠体23の表面は、ステンレススチールビーズやガラスビーズなどでショットブラスト処理してもよい。また、ペリクル枠体23の表面の異物検査がしやすいよう、それぞれの材質に適切な方法で黒色化処理(たとえば、染料や2次電解着色による黒色アルマイト処理、黒クロム処理など)を行っても良い。   As the material of the pellicle frame 23, aluminum alloy, tool steel, stainless steel, ceramics, glass, or the like can be used. The surface of the pellicle frame 23 may be shot blasted with stainless steel beads or glass beads so that the foreign matter inspection light on the mask does not reflect on the surface of the pellicle frame 23. Also, in order to facilitate the inspection of foreign matter on the surface of the pellicle frame 23, blackening treatment (for example, black alumite treatment by dye or secondary electrolytic coloring, black chrome treatment, etc.) is performed by a method appropriate for each material. good.

ペリクルをマスクに貼り付けた後の膜の膨らみや凹みを防ぐため、ペリクル枠体23には1つあるいは複数の通気口を設けても良い。通気口には異物の混入を防ぐため、四フッ化エチレン製などのフィルターを取り付ける。   In order to prevent swelling and dent of the film after the pellicle is attached to the mask, the pellicle frame body 23 may be provided with one or a plurality of vent holes. Attach a filter made of ethylene tetrafluoride or the like to prevent foreign matter from entering the vent.

ペリクル枠体23の内壁面には、アクリル系やシリコーン系の粘着剤を塗布しても良い。   An acrylic or silicone adhesive may be applied to the inner wall surface of the pellicle frame body 23.

ペリクル枠体23の一方の縁面には、マスクに貼着するための粘着材を設置する。粘着材は、基材の両側に粘着剤を有する両面テープをペリクル枠体23とほぼ同形状に打ち抜いたものを貼り付けたり、ホットメルト系の粘着材をペリクル枠体23上に塗布する。両面テープの基材側面からの発塵を防ぐため、基材側面に粘着剤を塗布してもよい。   On one edge surface of the pellicle frame body 23, an adhesive material for adhering to the mask is installed. As the adhesive material, a double-sided tape having an adhesive on both sides of the base material, which is punched out in substantially the same shape as the pellicle frame body 23, is attached, or a hot-melt adhesive material is applied onto the pellicle frame body 23. In order to prevent dust generation from the side surface of the double-sided tape, an adhesive may be applied to the side surface of the base material.

粘着材には、マスクに貼り付けるまで粘着面を保護するために、粘着材から離型しやすいよう表面処理を施したポリエステルフィルムを貼り付けておく。   In order to protect the adhesive surface until it is applied to the mask, a polyester film that has been surface-treated so as to be easily released from the adhesive material is attached to the adhesive material.

次に、ペリクル枠体23のもう一方の縁面に接着剤を塗布し、仮枠に張設した膜を貼り合わせる。接着剤としては、ウレタンアクリレート系などのUV(紫外線)硬化型樹脂、エポキシ樹脂、ふっ素系ポリマーを溶媒に溶解したものなどが挙げられる。貼り合わせたのち、UV照射、赤外線やレーザー照射による加熱など、それぞれの接着剤に適した方法で接着する。   Next, an adhesive is applied to the other edge surface of the pellicle frame 23, and a film stretched on the temporary frame is bonded. Examples of the adhesive include UV (ultraviolet) curable resins such as urethane acrylate, epoxy resins, and fluorine polymers dissolved in a solvent. After pasting, they are bonded by a method suitable for each adhesive, such as heating by UV irradiation, infrared rays or laser irradiation.

膜を接着後、ペリクル枠体23の外周に沿って膜を切断、除去する。切断の方法としては、刃物などによる切断やペリクル膜22を溶解する溶媒滴下などの方法が挙げられる。   After the film is adhered, the film is cut and removed along the outer periphery of the pellicle frame body 23. Examples of the cutting method include cutting with a blade or the like and dropping of a solvent for dissolving the pellicle film 22.

このようにして、大型ペリクルが完成する。   In this way, a large pellicle is completed.

(ペリクル膜の枠体の変位度)
エアブローによる変位を抑えるのに必要なペリクル膜22の張力は、ペリクル膜22をペリクル枠体23に展張する前にペリクル膜22を伸張する事で発生する歪み、即ち初期歪みにより与えることが出来る。一方、この初期歪みに対して枠体23を変形しづらくするには枠体23の剛性を上げる事が必要となる。枠体23の剛性は次のような変数である変位度δで表すことができる。
(Pelicle membrane frame displacement)
The tension of the pellicle film 22 necessary for suppressing displacement due to air blow can be given by strain generated by stretching the pellicle film 22 before the pellicle film 22 is spread on the pellicle frame body 23, that is, initial strain. On the other hand, it is necessary to increase the rigidity of the frame body 23 in order to make it difficult to deform the frame body 23 against this initial strain. The rigidity of the frame body 23 can be expressed by a displacement degree δ which is the following variable.

変位度δとは、ペリクル膜22を展張していない枠体23のみの状態で、長辺23a又は短辺23bの中央に荷重をかけた時の長辺23aの変形量から、長辺23a及び短辺23bに同時に荷重をかけた時の長辺中央に於ける単位荷重当りの変位量を定義した値を言う。   The displacement degree δ is the state of only the frame body 23 where the pellicle film 22 is not extended, and the amount of deformation of the long side 23a when a load is applied to the center of the long side 23a or the short side 23b, A value that defines the amount of displacement per unit load at the center of the long side when a load is simultaneously applied to the short side 23b.

これまでの対角寸法が1000mm未満の中小型ペリクルのデータ及び安全率を考慮して、変位度δ=4.2mm/N以下が必要な条件と導いた。これ以上の変位度をもつ枠体は、膜を展張したときの枠体の撓みが大きくなり過ぎ、ペリクル膜22の初期歪みが減少する。   Taking into account the data and safety factor of medium and small pellicles with a diagonal size of less than 1000 mm so far, the degree of displacement δ = 4.2 mm / N or less was derived as a necessary condition. In a frame having a degree of displacement greater than this, the deflection of the frame when the film is stretched becomes too large, and the initial distortion of the pellicle film 22 is reduced.

具体的な変位度δの測定法を説明する。まず、図3のように、ペリクル枠体23の長辺23a側を床面に平行に配置し、床面側の下部の長辺23aの中央を下から支持部材32が接触するように支え、同時に枠体23がずれないように上部の長辺23aの両端を接触するように支える。   A specific method for measuring the degree of displacement δ will be described. First, as shown in FIG. 3, the long side 23a side of the pellicle frame body 23 is arranged in parallel to the floor surface, and the center of the lower long side 23a on the floor surface side is supported so that the support member 32 comes into contact with the bottom. At the same time, both ends of the upper long side 23a are supported so that the frame body 23 is not displaced.

次に上部の長辺23a中央に錘31を垂らしかけ、この時の長辺中央の移動量をdll[mm]とする。尚、ここで、dllはペリクル枠体23単体での長辺中央の移動量を示す。約100g単位を目途に錘31の重量w[g]を100g、200g、300g、400gと負荷をかけ、各負荷に対するdllを測定する。以上の測定結果より以下の数1式で示す原点を通るdllとwの一次式の比例定数llを決定する。   Next, the weight 31 is hung on the center of the upper long side 23a, and the amount of movement at the center of the long side at this time is dll [mm]. Here, dll indicates the amount of movement at the center of the long side of the pellicle frame 23 alone. The weight w [g] of the weight 31 is applied to 100 g, 200 g, 300 g, and 400 g with a unit of about 100 g as a target, and dll for each load is measured. From the above measurement results, a proportional constant ll of a linear expression of dll and w passing through the origin represented by the following formula 1 is determined.

[数1]
dll=ll×w×9.8/1000
[Equation 1]
dll = ll × w × 9.8 / 1000

次に、図4のようにペリクル枠体23の短辺23b側を床面に平行に配置し、床面側の下部短辺23bの中央を下から支持部材32が接触するように支え、同時に枠体23がずれないように上部の短辺23bの両端を接触するように支える。次に上部の短辺23b中央に錘31を垂らしかけ、この時の長辺23aの中央の移動量をdls[mm]とする。約100g単位を目途に、錘31の重量w[g]を100g、200g、300g、400gと負荷をかけ、各負荷に対するdlsを測定する。以上の測定結果より以下の数2式で示す原点を通るdlsとwの一次式の比例定数lsを決定する。   Next, as shown in FIG. 4, the short side 23b side of the pellicle frame body 23 is arranged in parallel to the floor surface, and the center of the lower short side 23b on the floor surface side is supported so that the support member 32 contacts from below, It supports so that the both ends of the upper short side 23b may contact so that the frame 23 may not slip | deviate. Next, the weight 31 is suspended from the center of the upper short side 23b, and the amount of movement at the center of the long side 23a at this time is defined as dls [mm]. Aiming at a unit of about 100 g, the weight w [g] of the weight 31 is loaded with 100 g, 200 g, 300 g, and 400 g, and dls for each load is measured. Based on the above measurement results, the linearity constant ls of dls and w passing through the origin represented by the following formula 2 is determined.

[数2]
dls=ls×w×9.8/1000
[Equation 2]
dls = ls × w × 9.8 / 1000

錘31を垂らしかけた辺中央の移動量dll、dlsは、長辺23aの変形が凹の時は正、凸の時は負とする。上記関係式より比例定数ll、ls [mm/N]を求め、以下の数3式により長辺23aと短辺23bに同時に荷重がかかった時の単位荷重当りの変位量を示す変位度δを得る事が出来る。尚、以下の数3式のai,biはそれぞれ図1に示す大型ペリクル枠体23の長辺23a、短辺23bの各枠内側の長さである。   The movement amounts dll and dl at the center of the side where the weight 31 is suspended are positive when the deformation of the long side 23a is concave, and negative when the deformation is convex. The proportionality constants ll and ls [mm / N] are obtained from the above relational expression, and the degree of displacement δ indicating the amount of displacement per unit load when a load is simultaneously applied to the long side 23a and the short side 23b by the following equation (3) I can get it. In the following equation (3), ai and bi are the inner lengths of the long side 23a and the short side 23b of the large pellicle frame 23 shown in FIG.

[数3]
δ=ll+ls×bi/ai
[Equation 3]
δ = ll + ls × bi / ai

(ひずみ度)
ひずみ度ε[N/mm]は次のように定義する。ペリクル膜22を展張する前の枠体長辺23a中央間の外寸距離を測定し、次に、ペリクル膜22を展張した後の枠体長辺23a中央間の外寸距離を測定し、その差を2で割った値を長辺中央の移動量dl[mm]とする(図5参照)。ここで、ペリクル膜22が展張された枠体長辺中央間の外寸距離を先に測定し、次に、ペリクル膜22の展張を解除したのち枠体長辺中央間の外寸距離を測定し、同様にdl[mm]を求めてもよい。
(Strain)
The degree of distortion ε [N / mm] is defined as follows. Measure the outer dimension distance between the center of the frame long side 23a before the pellicle film 22 is stretched, and then measure the outer dimension distance between the center of the frame long side 23a after the pellicle film 22 is stretched. The value divided by 2 is defined as the moving distance dl [mm] at the center of the long side (see FIG. 5). Here, the outer dimension distance between the long sides of the frame body on which the pellicle film 22 is stretched is measured first, and then the outer dimension distance between the centers of the long sides of the frame body is measured after releasing the stretching of the pellicle film 22, Similarly, dl [mm] may be obtained.

ひずみ度εは、dlを短辺23b中央内寸で正規化した変位dl/aiと変位度δの比とする。これは初期歪みを有する展張されたペリクル膜22と枠体23の剛性との関係を示す。   The degree of distortion ε is the ratio of the displacement dl / ai obtained by normalizing dl with the inner dimension of the short side 23b to the displacement degree δ. This shows the relationship between the stretched pellicle film 22 having an initial strain and the rigidity of the frame body 23.

この値の範囲はこれまでの対角寸法が1000mm未満の中小型ペリクルのデータより考慮して、0.7×10−3〜3.3×10−3N/mmが必要な条件と導いた。ひずみ度εは、以下の数4式で表す。 The range of this value was derived from the necessary conditions of 0.7 × 10 −3 to 3.3 × 10 −3 N / mm in consideration of the data of the medium and small pellicles with a diagonal size of less than 1000 mm. . The degree of distortion ε is expressed by the following equation (4).

[数4]
ε=(dl/ai)×(1/δ)
[Equation 4]
ε = (dl / ai) × (1 / δ)

ペリクル膜22の初期歪みは、ペリクル膜22の成膜にスピンコート法を用いる事で好適に得る事が出来る。また、必要に応じてスピンコート用の基板から剥離した後、伸張して更に初期歪みを与えた後ペリクル枠に展張する事でも得ることが出来る。具体的には、剥離後の仮枠を加熱、膨張させたり、仮枠を機械的に均等に半径方向に展張する。または、剥がし取ったペリクル膜22にペリクル枠体23を接着する際、ペリクル枠体23をペリクル膜22に押付けて展張した状態で接着剤を硬化することによって初期歪を与えても良い。   The initial strain of the pellicle film 22 can be suitably obtained by using a spin coat method for forming the pellicle film 22. It can also be obtained by peeling from the substrate for spin coating, if necessary, stretching and applying initial strain, and then stretching the pellicle frame. Specifically, the peeled temporary frame is heated and expanded, or the temporary frame is mechanically evenly expanded in the radial direction. Alternatively, when the pellicle frame body 23 is bonded to the peeled pellicle film 22, the initial strain may be applied by curing the adhesive in a state where the pellicle frame body 23 is pressed against the pellicle film 22 and stretched.

以下、本発明を実施例および比較例を挙げて具体的に説明する。   Hereinafter, the present invention will be specifically described with reference to Examples and Comparative Examples.

ぺリクル膜を構成するポリマーとして、セルロースアセテートプロピオネート(CAP 480-20、Eastman Chemical Company製)、溶媒として乳酸エチルを選択し、固形分濃度8重量%の溶液を作成した。この溶液を窒素で0.01MPaに加圧し、口径0.1μmのメンブレンフィルターを通してろ過を行った。   Cellulose acetate propionate (CAP 480-20, manufactured by Eastman Chemical Company) was selected as the polymer constituting the pellicle membrane, and ethyl lactate was selected as the solvent to prepare a solution having a solid content concentration of 8% by weight. This solution was pressurized to 0.01 MPa with nitrogen and filtered through a membrane filter having a diameter of 0.1 μm.

成膜用基板として、一辺が1400mmのソーダガラス表面を物理研磨後さらに化学研磨し、純水で洗浄したものを用意した。この基板をクリーンオーヴンで100℃、2時間加熱乾燥後、室温まで冷却した。次に、この基板とヘキサメチルジシラザン20ccを導入した直径5cmの上部が開放されたポリエチレンの容器を、清浄な金属製の箱に室温で30分間封入した。ガラス基板を取り出した後、クリーンオーヴンで100℃、2時間加熱した。   As a film-forming substrate, a soda glass surface having a side of 1400 mm was physically polished, further chemically polished, and washed with pure water. This substrate was dried by heating at 100 ° C. for 2 hours in a clean oven, and then cooled to room temperature. Next, a polyethylene container having an open top with a diameter of 5 cm into which 20 cc of this substrate and hexamethyldisilazane was introduced was sealed in a clean metal box for 30 minutes at room temperature. After the glass substrate was taken out, it was heated at 100 ° C. for 2 hours with a clean oven.

このようにして準備したガラス基板をクローズドカップ式のスピンコーターにセットし、先に準備したポリマー溶液をガラス基板上に約300g供給し、ガラス基板を350rpmで60sec間回転せしめた。   The glass substrate thus prepared was set on a closed cup type spin coater, about 300 g of the polymer solution prepared previously was supplied onto the glass substrate, and the glass substrate was rotated at 350 rpm for 60 seconds.

このガラス基板を60℃のホットプレート上に30分間載せて、溶媒を蒸発せしめた。   This glass substrate was placed on a hot plate at 60 ° C. for 30 minutes to evaporate the solvent.

外形の一辺が1396mm、幅が20mm、厚さが6mmのアルミニウム合金(6061)を黒色アルマイトおよび封孔処理した仮枠を用意し、エポキシ接着剤を塗布し、基板上の膜に押圧・固定する。該エポキシ接着剤が硬化した後、この枠を静かに起こし、基板から膜を仮枠に剥がし取る。   Prepare a temporary frame made of black anodized aluminum and sealed aluminum alloy (6061) with a side of 1396mm, width of 20mm and thickness of 6mm, apply epoxy adhesive, and press and fix to the film on the substrate . After the epoxy adhesive is cured, the frame is gently raised and the film is peeled off from the substrate onto the temporary frame.

ペリクル枠体23として、ヤング率70[GPa]のアルミニウム合金(5052)を、図1に示す内寸(ai×bi) 890.5mm×734mm、外側コーナーRo=10、内側コーナーRi=2、内径の対角寸法ci=1152.4mm、長辺枠幅aw=8mm、短辺枠幅bw=7mm、高さh=5.2mmで、各長辺中央部に口径1.5mmの貫通穴を1つずつ計2個開け、各長辺端部にアルマイト処理時の把持および電極用として口径2mm、深さ2mmの穴を2箇所ずつ計4箇所開け、さらに、両短辺の高さ方向の中央部に幅1.5mm、深さ2.3mmのハンドリング用溝を切る加工を、短辺の全長に渡り施した。この枠体表面をステンレススチールビーズでショットブラスト処理したのち、黒色アルマイトおよび封孔処理したものを用意した。   As the pellicle frame 23, an aluminum alloy (5052) with a Young's modulus of 70 [GPa] is used, the inner dimensions (ai × bi) 890.5 mm × 734 mm shown in FIG. 1, outer corner Ro = 10, inner corner Ri = 2, inner diameter Diagonal dimension ci = 1152.4 mm, long side frame width aw = 8 mm, short side frame width bw = 7 mm, height h = 5.2 mm, and a through hole with a diameter of 1.5 mm in the center of each long side Open a total of 2 holes each, and open a hole with a diameter of 2mm and a depth of 2mm at the end of each long side for alumite treatment and 2 holes for a total of 4 holes, and the center of both short sides in the height direction. The processing of cutting a handling groove with a width of 1.5 mm and a depth of 2.3 mm was performed over the entire length of the short side. After the surface of the frame was shot blasted with stainless steel beads, black anodized and sealed were prepared.

この枠体を用い、前記のように各辺の荷重と変位の関係式(数1式)、(数2式)を求め、その比例定数ll=1.47mm/N、ls=−0.44mm/Nを得た。これら比例定数と前記内寸を式(数3式)に代入して、変位度δ=1.1mm/Nを得た。   Using this frame body, the relational expressions (Equation 1) and (Equation 2) of the load and displacement of each side are obtained as described above, and the proportionality constant ll = 1.47 mm / N, ls = −0.44 mm. / N was obtained. By substituting these proportionality constants and the inner dimensions into the equation (Equation 3), the degree of displacement δ = 1.1 mm / N was obtained.

またペリクル枠体23の内壁面に、アクリル製の粘着剤を、厚さ約10μmに塗布した。通気口部には四フッ化エチレン製のメンブレンフィルターをアクリル系粘着剤で取り付けた。ペリクル枠体23の一方の縁面には、マスク粘着材として、SEBS(スチレン・エチレン・ブチレン・スチレンブロック共連合体)製のホットメルト樹脂を、幅6mm、高さ1.6mmになるよう、塗布、成型した。ホットメルト樹脂の表面を保護するための保護ライナーとして、シリコーン離型処理を施した、厚さ0.1mmのポリエステル製フィルムを貼り付けた。   An acrylic adhesive was applied to the inner wall surface of the pellicle frame 23 to a thickness of about 10 μm. A membrane filter made of ethylene tetrafluoride was attached to the vent hole portion with an acrylic adhesive. On one edge of the pellicle frame 23, as a mask adhesive material, a hot melt resin made of SEBS (styrene / ethylene / butylene / styrene block co-association) is 6 mm wide and 1.6 mm high. Application and molding. As a protective liner for protecting the surface of the hot melt resin, a polyester film having a thickness of 0.1 mm and subjected to silicone release treatment was attached.

ペリクル枠体23の先に粘着材を塗布した反対の縁面に、ウレタンアクリレート系の紫外線硬化型接着剤を塗布した。その後、先の仮枠に張設したペリクル膜22を載置し、紫外線を照射し該紫外線硬化型接着剤を硬化せしめ、膜を接着した。フレームの外周エッジ部に刃を沿わせて、余分な膜を切断、除去し、大型ペリクルを作成した。   A urethane acrylate-based UV curable adhesive was applied to the opposite edge surface of the pellicle frame 23 on which the adhesive material was applied. Thereafter, the pellicle film 22 stretched on the temporary frame was placed and irradiated with ultraviolet rays to cure the ultraviolet curable adhesive, and the membranes were adhered. A large pellicle was made by cutting and removing excess film along the outer edge of the frame.

ペリクル膜22展張前のペリクル枠体23長辺中央間の外寸は750mmであり、ペリクル膜22展張後のペリクル枠体23長辺中央間の外寸は747.7mmであった。これより、ペリクル枠体23長辺中央間の移動量dl=(750−747.7)/2=1.15mmとなった。dl=1.15mm、δ=1.1mm/N、ai=890.5mmを式(数4式)に代入し、歪み度ε=1.1×10−3N/mmを得た。 The outer dimension between the long side centers of the pellicle frame body 23 before the pellicle film 22 was stretched was 750 mm, and the outer dimension between the long side centers of the pellicle frame body 23 after the pellicle film 22 was stretched was 747.7 mm. As a result, the amount of movement between the long side centers of the pellicle frame body 23 was dl = (750−747.7) /2=1.15 mm. Substituting d1 = 1.15 mm, δ = 1.1 mm / N, and ai = 890.5 mm into the equation (Equation 4), the degree of distortion ε = 1.1 × 10 −3 N / mm was obtained.

この膜の中央付近を上方から、口径1mmのエアガンで、圧力0.15MPa、距離5cm、時間10secの条件でエアブローを行い、暗室内で膜の表面を高輝度ハロゲンランプで照らし、目視で膜表面にガラス表面のマスクパターンが接触した痕跡の無い事が確認できた。   Near the center of the membrane, air blow is performed from above with an air gun with a 1 mm aperture under the conditions of pressure 0.15 MPa, distance 5 cm, time 10 sec. The surface of the membrane is illuminated with a high-intensity halogen lamp in a dark room, and the membrane surface is visually observed. It was confirmed that there was no trace of contact with the mask pattern on the glass surface.

以上より変位度1.1mm/N、歪み度1.1×10−3N/mmで、エアガンで負荷をかけてもペリクル膜22がマスク表面に接触しない大型ペリクルを提供する事が出来る。 As described above, it is possible to provide a large pellicle having a displacement degree of 1.1 mm / N and a distortion degree of 1.1 × 10 −3 N / mm and in which the pellicle film 22 does not contact the mask surface even when a load is applied by an air gun.

尚、変位度は、枠体の断面の幅、高さ、材料のヤング率を適切に大きくする事で達成された。例えばヤング率を大きくするにはステンレスや工具鋼等も使うことが出来た。   The degree of displacement was achieved by appropriately increasing the width and height of the cross section of the frame and the Young's modulus of the material. For example, stainless steel or tool steel could be used to increase the Young's modulus.

前記実施例1と同様にペリクル膜22を構成する溶液を準備した。   As in Example 1, a solution for forming the pellicle film 22 was prepared.

成膜用基板として、一辺が1600mmのソーダガラス表面を物理研磨後さらに化学研磨し、純水で洗浄したものを用意した。この基板をクリーンオーヴンで100℃、2時間加熱乾燥後、室温まで冷却した。次に、この基板とヘキサメチルジシラザン20ccを導入した直径5cmの上部が開放されたポリエチレンの容器を、清浄な金属製の箱に室温で30分間封入した。ガラス基板を取り出した後、クリーンオーヴンで100℃、2時間加熱した。   As a substrate for film formation, a soda glass surface having a side of 1600 mm was physically polished, further chemically polished, and washed with pure water. This substrate was dried by heating at 100 ° C. for 2 hours in a clean oven, and then cooled to room temperature. Next, a polyethylene container having an open top with a diameter of 5 cm into which 20 cc of this substrate and hexamethyldisilazane was introduced was sealed in a clean metal box for 30 minutes at room temperature. After the glass substrate was taken out, it was heated at 100 ° C. for 2 hours with a clean oven.

このようにして準備したガラス基板をクローズドカップ式のスピンコーターにセットし、先に準備したポリマー溶液をガラス基板上に約500g供給し、ガラス基板を350rpmで60sec間回転せしめた。   The glass substrate thus prepared was set on a closed cup type spin coater, about 500 g of the polymer solution prepared previously was supplied onto the glass substrate, and the glass substrate was rotated at 350 rpm for 60 seconds.

このガラス基板を60℃のホットプレート上に30分間載せて、溶媒を蒸発せしめた。   This glass substrate was placed on a hot plate at 60 ° C. for 30 minutes to evaporate the solvent.

外形の一辺が1438mm、幅が20mm、厚さが8mmのアルミニウム合金(6061)を黒色アルマイトおよび封孔処理した仮枠を用意し、エポキシ接着剤を塗布し、基板上の膜に押圧・固定する。該エポキシ接着剤が硬化した後、この枠を静かに起こし、基板から膜を仮枠に剥がし取る。   Prepare an aluminum alloy (6061) aluminum frame (6061) with a side of 1438mm, a width of 20mm, and a thickness of 8mm. Prepare a temporary frame, apply epoxy adhesive, and press and fix it on the film on the substrate. . After the epoxy adhesive is cured, the frame is gently raised and the film is peeled off from the substrate onto the temporary frame.

ペリクル枠体23として、ヤング率70[GPa]のアルミニウム合金(5052)を、図1に示す内寸(ai×bi) 1314mm×761mm、外側コーナーRo=9、内側コーナーRi=2、内径の対角寸法ci=1516.8mm、長辺枠幅aw=12mm、短辺枠幅bw=12mm、高さh=5.6mmで、各長辺中央部に口径1.5mmの貫通穴を1つずつ計2個開け、各長辺端部にアルマイト処理時の把持および電極用として口径2mm、深さ2mmの穴を2箇所ずつ計4箇所開け、さらに、両短辺の高さ方向の中央部に幅1.5mm、深さ2.3mmのハンドリング用溝を切る加工を、短辺の全長に渡り施した。この枠体表面をステンレススチールビーズでショットブラスト処理したのち、黒色アルマイトおよび封孔処理したものを用意した。   As the pellicle frame body 23, an aluminum alloy (5052) having a Young's modulus of 70 [GPa] is used, an inner dimension (ai × bi) of 1314 mm × 761 mm, an outer corner Ro = 9, an inner corner Ri = 2, and a pair of inner diameters shown in FIG. Square dimension ci = 1516.8 mm, long side frame width aw = 12 mm, short side frame width bw = 12 mm, height h = 5.6 mm, one through hole with a diameter of 1.5 mm at the center of each long side Open a total of 2 holes, open 2 holes each with a diameter of 2mm and a depth of 2mm for gripping and electrodes at the end of each long side, a total of 4 holes, and in the center of both short sides in the height direction. Processing for cutting a handling groove having a width of 1.5 mm and a depth of 2.3 mm was performed over the entire length of the short side. After the surface of the frame was shot blasted with stainless steel beads, black anodized and sealed were prepared.

この枠体を用い、前記のように各辺の荷重と変位の関係式(数1式)、(数2式)を求め、その比例定数ll=1.09mm/N、ls=−0.21mm/Nを得た。これら比例定数と前記内寸を式(数3式)に代入して、変位度δ=0.97mm/Nを得た。   Using this frame, the relational expressions (Formula 1) and (Formula 2) of the load and displacement of each side are obtained as described above, and their proportionality constant ll = 1.09 mm / N, ls = −0.21 mm. / N was obtained. By substituting these proportionality constants and the above-mentioned internal dimensions into the formula (Formula 3), the degree of displacement δ = 0.97 mm / N was obtained.

またペリクル枠体23の内壁面に、アクリル製の粘着剤を、厚さ約10μmに塗布した。通気口部には四フッ化エチレン製のメンブレンフィルターをアクリル系粘着剤で取り付けた。ペリクル枠体23の一方の縁面には、マスク粘着材として、SEBS(スチレン・エチレン・ブチレン・スチレンブロック共連合体)製のホットメルト樹脂を、幅3.5mm、高さ1.4mmになるよう、塗布、成型した。ホットメルト樹脂の表面を保護するための保護ライナーとして、シリコーン離型処理を施した、厚さ0.1mmのポリエステル製フィルムを貼り付けた。   An acrylic adhesive was applied to the inner wall surface of the pellicle frame 23 to a thickness of about 10 μm. A membrane filter made of ethylene tetrafluoride was attached to the vent hole portion with an acrylic adhesive. On one edge surface of the pellicle frame 23, a hot melt resin made of SEBS (styrene / ethylene / butylene / styrene block co-association) as a mask adhesive is 3.5 mm in width and 1.4 mm in height. It was applied and molded. As a protective liner for protecting the surface of the hot melt resin, a polyester film having a thickness of 0.1 mm and subjected to silicone release treatment was attached.

ペリクル枠体23の先に粘着材を塗布した反対の縁面に、ウレタンアクリレート系の紫外線硬化型接着剤を塗布した。その後、先の仮枠に張設したペリクル膜22を載置し、紫外線を照射し該紫外線硬化型接着剤を硬化せしめ、膜を接着した。フレームの外周エッジ部に刃を沿わせて、余分な膜を切断、除去し、大型ペリクルを作成した。   A urethane acrylate-based UV curable adhesive was applied to the opposite edge surface of the pellicle frame 23 on which the adhesive material was applied. Thereafter, the pellicle film 22 stretched on the temporary frame was placed and irradiated with ultraviolet rays to cure the ultraviolet curable adhesive, and the membranes were adhered. A large pellicle was made by cutting and removing excess film along the outer edge of the frame.

ペリクル膜22展張前のペリクル枠体23長辺中央間の外寸は787.8mmであり、ペリクル膜22展張後のペリクル枠体23長辺中央間の外寸は783.7mmであった。これより、ペリクル枠体23長辺中央間の移動量dl=(787.8−783.7)/2=2.05mmとなった。dl=2.05mm、δ=0.97mm/N、ai=1314mmを式(数4式)に代入し、歪み度ε=1.6×10−3N/mmを得た。 The outer dimension between the long side centers of the pellicle frame body 23 before the pellicle film 22 was stretched was 787.8 mm, and the outer dimension between the long side centers of the pellicle frame body 23 after the pellicle film 22 was stretched was 783.7 mm. As a result, the amount of movement between the long side centers of the pellicle frame 23 was dl = (787.8−783.7) /2=2.05 mm. dl = 2.05 mm, δ = 0.97 mm / N, and ai = 1314 mm were substituted into the formula (Formula 4) to obtain a degree of distortion ε = 1.6 × 10 −3 N / mm.

前記実施例1と同様に、このようにして出来上がったペリクルのマスク粘着材を保護している保護ライナーを剥がし、大きさ850mm×1400mm、厚さ10mmの表面が平滑なガラスマスクに貼り付けた。   In the same manner as in Example 1, the protective liner protecting the pellicle mask adhesive thus produced was peeled off and attached to a glass mask having a size of 850 mm × 1400 mm and a thickness of 10 mm and a smooth surface.

この膜の中央付近を上方から、口径1mmのエアガンで、圧力0.15MPa、距離5cm、時間10secの条件でエアブローを行い、暗室内で膜の表面を高輝度ハロゲンランプで照らし、目視で膜表面にガラス表面のマスクパターンが接触した痕跡の無い事が確認できた。   Near the center of the membrane, air blow is performed from above with an air gun with a 1 mm aperture under the conditions of pressure 0.15 MPa, distance 5 cm, time 10 sec. The surface of the membrane is illuminated with a high-intensity halogen lamp in a dark room, and the membrane surface is visually observed. It was confirmed that there was no trace of contact with the mask pattern on the glass surface.

以上より変位度0.97mm/N、歪み度1.6×10−3N/mmで、エアガンで負荷をかけてもペリクル膜22がマスク表面に接触しない大型ペリクルを提供する事が出来た。 From the above, it was possible to provide a large pellicle having a displacement degree of 0.97 mm / N and a distortion degree of 1.6 × 10 −3 N / mm and in which the pellicle film 22 does not contact the mask surface even when a load is applied with an air gun.

ペリクル枠体23として、ヤング率70[GPa]のアルミニウム合金(5052)を、図1に示す内寸(ai×bi) 1342mm×1122mm、外側コーナーRo=9、内側コーナーRi=2、内径の対角寸法ci=1747.6mm、長辺枠幅aw=12mm、短辺枠幅bw=12mm、高さh=5.6mmとした以外は、実施例2と同様にして大型ペリクルを得た。   As the pellicle frame body 23, an aluminum alloy (5052) having a Young's modulus of 70 [GPa] is used, the inner dimensions (ai × bi) 1342 mm × 1122 mm, outer corner Ro = 9, inner corner Ri = 2, and inner diameter pair shown in FIG. A large pellicle was obtained in the same manner as in Example 2 except that the angular dimension ci = 1747.6 mm, the long side frame width aw = 12 mm, the short side frame width bw = 12 mm, and the height h = 5.6 mm.

この枠体を用い、前記のように各辺の荷重と変位の関係式(数1式)、(数2式)を求め、その比例定数ll=1.35mm/N、ls=−0.35mm/Nを得た。これら比例定数と前記内寸を式(数3式)に代入して、変位度δ=1.06mm/Nを得た。   Using this frame body, the relational expressions (Formula 1) and (Formula 2) of the load and displacement of each side are obtained as described above, and their proportional constants ll = 1.35 mm / N, ls = −0.35 mm. / N was obtained. By substituting these proportionality constants and the internal dimensions into the equation (Equation 3), the degree of displacement δ = 1.06 mm / N was obtained.

ペリクル膜22展張前のペリクル枠体23長辺中央間の外寸は1149.5mmであり、ペリクル膜22展張後のペリクル枠体23長辺中央間の外寸は1146.7mmであった。これより、ペリクル枠体23長辺中央間の移動量dl=(1149.5−1146.7)/2=1.4mmとなった。dl=1.4mm、δ=1.06mm/N、ai=1342mmを式(数4式)に代入し、歪み度ε=1.0×10−3N/mmを得た。 The outer dimension between the long side centers of the pellicle frame body 23 before the pellicle film 22 was stretched was 1149.5 mm, and the outer dimension between the long side centers of the pellicle frame body 23 after the pellicle film 22 was stretched was 1146.7 mm. As a result, the amount of movement between the long side centers of the pellicle frame body 23 was dl = (1149.5-1146.7) /2=1.4 mm. dl = 1.4 mm, δ = 1.06 mm / N, and ai = 1342 mm were substituted into the formula (Formula 4) to obtain a degree of distortion ε = 1.0 × 10 −3 N / mm.

前記実施例1と同様に、このようにして出来上がったペリクルのマスク粘着材を保護している保護ライナーを剥がし、大きさ1220mm×1400mm、厚さ10mmの表面が平滑なガラスマスクに貼り付けた。   In the same manner as in Example 1, the protective liner protecting the pellicle mask adhesive material thus obtained was peeled off and attached to a glass mask having a size of 1220 mm × 1400 mm and a thickness of 10 mm and a smooth surface.

この膜の中央付近を上方から、口径1mmのエアガンで、圧力0.15MPa、距離5cm、時間10secの条件でエアブローを行い、暗室内で膜の表面を高輝度ハロゲンランプで照らし、目視で膜表面にガラス表面のマスクパターンが接触した痕跡の無い事が確認できた。   Near the center of the membrane, air blow is performed from above with an air gun with a 1 mm aperture under the conditions of pressure 0.15 MPa, distance 5 cm, time 10 sec. The surface of the membrane is illuminated with a high-intensity halogen lamp in a dark room, and the membrane surface is visually observed. It was confirmed that there was no trace of contact with the mask pattern on the glass surface.

以上より変位度1.06mm/N、歪み度1.0×10−3N/mmで、エアガンで負荷をかけてもペリクル膜22がマスク表面に接触しない大型ペリクルを提供する事が出来た。 As described above, it was possible to provide a large pellicle having a displacement degree of 1.06 mm / N and a distortion degree of 1.0 × 10 −3 N / mm and in which the pellicle film 22 does not contact the mask surface even when a load is applied with an air gun.

本発明は、リソグラフ工程で使用されるフォトマスクに異物が付着することを防止するための大型ペリクルに利用することができる。   The present invention can be used for a large pellicle for preventing foreign matter from adhering to a photomask used in a lithographic process.

大型ペリクルの枠体全体図である。It is a whole frame view of a large pellicle. 大型ペリクルの断面図(図1のA−A断面図)である。It is sectional drawing (AA sectional drawing of FIG. 1) of a large sized pellicle. 変位度の測定方法を示す図である。It is a figure which shows the measuring method of a displacement degree. 変位度の測定方法を示す図である。It is a figure which shows the measuring method of a displacement degree. ひずみ度の測定方法を示す図である。It is a figure which shows the measuring method of a degree of distortion.

符号の説明Explanation of symbols

21…大型ペリクル
22…大型ペリクル膜
23…大型ペリクル枠体
23a…長辺
23b…短辺
24…粘着材
25…ライナー
26…接着剤
31…錘
32…支持部材
41・・・ペリクル膜を展張する前の枠体(またはペリクル膜を除去した後の枠体)
42・・・ペリクル膜を展張した後の枠体(またはペリクル膜が展張された状態での枠体)
21 ... Large pellicle
22 ... Large pellicle membrane
23 ... Large pellicle frame
23a ... long side
23b ... Short side
24 ... Adhesive
25 ... liner
26… Adhesive
31 ... Weight
32 ... Support member
41 ... Frame before spreading the pellicle film (or frame after removing the pellicle film)
42 ... Frame after the pellicle membrane is stretched (or the frame when the pellicle membrane is stretched)

Claims (3)

内径の対角寸法が1000mm以上である大型ペリクル枠体と、該大型ペリクル枠体の一方の縁面に接着剤を介して展張された大型ペリクル膜と、該大型ペリクル膜を展張した縁面と対向する縁面にマスクに貼り付けるために設けられた粘着材と、それを保護するためのライナーとが順に積層された大型ペリクルにおいて、
前記大型ペリクル枠体の変形しやすさを示す変位度が4.2mm/N以下であることを特徴とする大型ペリクル。
A large pellicle frame having an inner diameter of 1000 mm or more, a large pellicle film stretched on one edge surface of the large pellicle frame with an adhesive, and an edge surface on which the large pellicle film is stretched In a large pellicle in which an adhesive material provided for attaching to a mask on an opposing edge surface and a liner for protecting it are sequentially laminated,
A large pellicle having a displacement degree of 4.2 mm / N or less indicating ease of deformation of the large pellicle frame.
前記ペリクル膜に予め初期歪みを付与し、前記ペリクル枠体に接着剤を介して接着した時に張力を有する事を特徴とする請求項1に記載の大型ペリクル。 2. The large pellicle according to claim 1, wherein an initial strain is applied to the pellicle film in advance and tension is applied when the pellicle film is bonded to the pellicle frame via an adhesive. 前記初期歪みの大きさを表す歪み度が0.7×10−3〜3.3×10−3 N/mmであることを特徴とする請求項1又は2に記載の大型ペリクル。 3. The large pellicle according to claim 1, wherein a degree of distortion representing a magnitude of the initial strain is 0.7 × 10 −3 to 3.3 × 10 −3 N / mm.
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