CN102109765A - Rotating platform - Google Patents

Rotating platform Download PDF

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Publication number
CN102109765A
CN102109765A CN2009102009442A CN200910200944A CN102109765A CN 102109765 A CN102109765 A CN 102109765A CN 2009102009442 A CN2009102009442 A CN 2009102009442A CN 200910200944 A CN200910200944 A CN 200910200944A CN 102109765 A CN102109765 A CN 102109765A
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China
Prior art keywords
worktable
vertical
universal stage
substrate
rotation center
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CN2009102009442A
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Chinese (zh)
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CN102109765B (en
Inventor
周清华
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Shanghai Micro Electronics Equipment Co Ltd
Shanghai Micro and High Precision Mechine Engineering Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
Shanghai Micro and High Precision Mechine Engineering Co Ltd
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Priority to CN 200910200944 priority Critical patent/CN102109765B/en
Publication of CN102109765A publication Critical patent/CN102109765A/en
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  • Details Of Measuring And Other Instruments (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The invention discloses a rotating platform. The rotating platform comprises a workbench, a base plate, a vertical supporting mechanism, a rotation center positioning mechanism and a driving mechanism. The vertical supporting mechanism supports the workbench on the base plate and the height of the workbench can be adjusted. The rotation center positioning mechanism makes the workbench rotate along the vertical direction and determines the rotation center. The driving mechanism converts the linear motion of a linear electric motor into rotation motion. The intermediate links of the rotating platform provided by the invention are few, response speed is high and positioning accuracy is high.

Description

A kind of universal stage
Technical field
The present invention relates to integrated circuit and make the field, relate in particular to a kind of universal stage that is used for photoetching process carrying silicon chip.
Background technology
The development of microelectric technique has promoted the update of computer technology, the communication technology and other electronic information technology, plays important guide and basic role in the information industry revolution.Production equipment is being played the part of very important role in whole microelectronic industry, and in the manufacturing equipment of microelectronic component, what invest maximum, effect most critical is lithographic equipment.Along with the raising of integrated circuit integrated level, the positioning accuracy request of litho machine is more and more higher, and in the detent mechanism of litho machine, universal stage plays a part very crucial.On August 13rd, 2008, disclosed " but 6 freedom degree precision positioning station of compensating Z-direction position " (publication number CN101241314A) disclosed a kind of universal stage structure, and its version is that electric rotating machine adds the sucker of screw mechanism driving absorption silicon chip around a hinge through.But this structure adopts electric rotating machine to add screw mechanism and drives, and intermediate link is many, influences precision, and does not disclose concrete structure.Along with the raising of litho machine bearing accuracy, traditional electric rotating machine is added the requirement that an actuating device of the linear motion that overlaps the mapping device composition far can not satisfy modern control system.
Therefore, how to provide the universal stage that a kind of response speed is fast, precision is high to become the technical matters that industry needs to be resolved hurrily.
Summary of the invention
The object of the present invention is to provide a kind of universal stage, electric rotating machine adds the problem that universal stage intermediate link is many, response speed is slow, bearing accuracy is low that screw mechanism drives in the photoetching process to solve.
For addressing the above problem, the present invention proposes a kind of universal stage, described universal stage comprises substrate, vertical supporting mechanism, is supported on worktable, rotation center detent mechanism and driving mechanism on the described substrate by vertical supporting mechanism, described rotation center detent mechanism connects described substrate and worktable, and worktable is rotated around the relative substrate in its center, described driving mechanism comprises linear electric motors, and the rectilinear motion of linear electric motors is converted into rotatablely moving of worktable.
Optionally, described vertical supporting mechanism comprises the backing plate that is fixed on the described substrate, and with a contacted steel ball roller of described backing plate and a double-screw bolt, described double-screw bolt is set in described steel ball roller outside, and screws in the described worktable.
Optionally, be provided with vertical preloading spring between described substrate and the described worktable, described vertical preloading spring partly is pressed on the roller of described steel ball roller on the described backing plate, and described steel ball roller freely rolls in the horizontal direction.
Optionally, described double-screw bolt and described worktable are by being threaded, to regulate the height of supporting mechanism.
Optionally, the quantity of described vertical supporting mechanism is three covers.
Optionally, described rotation center detent mechanism is made up of vertical reed and the round reed that is positioned at above the vertical reed, and the top of described rotation center detent mechanism is fixed on the worktable, and the bottom is fixed on the substrate.
Optionally, the quantity of described vertical reed is four, and described four vertical reeds are pressed the cross arranged in form, when described worktable vertically rotated, described vertical reed twisted, and determines rotation center, produce the micrometric displacement of vertical direction simultaneously, this micrometric displacement is by described round reed compensation.
Optionally, described driving mechanism also comprises Cam Follower and push pedal, described Cam Follower and described push pedal are coupled, described push pedal is connected with described worktable, described Cam Follower makes the push pedal campaign under the driving of linear electric motors, and drives described worktable and rotate around the center of rotation center detent mechanism.
Optionally, described Cam Follower and described push pedal are coupled by a horizontal pretension extension spring.
Optionally, described driving mechanism also comprises a guide rail, described linear electric motors comprise mover and stator, described stator and described guide rail are installed on the described substrate, described mover is installed on the described guide rail through a mover card extender, described Cam Follower is installed on the described mover, and with mover along described guide rail moving linearly.
Optionally, described universal stage also comprises a measuring mechanism, and described measuring mechanism is that the vertical sense of rotation of worktable is measured the grating chi, and the rule of described measurement grating chi partly is installed on the worktable, and its read head partly is installed on the substrate.
The present invention makes it compared with prior art owing to adopted above-mentioned technical scheme, has following advantage and good effect:
1, directly the rectilinear motion of linear electric motors is changed into by Cam Follower, spring and guide rail and rotatablely move, intermediate link is few, and response speed is fast;
2, vertical supporting mechanism is threaded with worktable, can regulate the height of supporting mechanism easily, thereby regulates the true altitude and the levelness of worktable, reduces processing and assembly difficulty, improves assembly precision;
3, the rotation center detent mechanism is made by compliant mechanism, and therefore very close to each other, the displacement good linearity can realize high-precision micrometric displacement.
Description of drawings
Figure 1A is the stereographic map of universal stage provided by the invention;
Figure 1B is the fundamental diagram of universal stage provided by the invention;
Fig. 2 is the structural drawing of the vertical supporting mechanism of universal stage provided by the invention;
Fig. 3 is the structural drawing of the rotation center detent mechanism of universal stage provided by the invention;
Fig. 4 is the structural drawing of the driving mechanism of universal stage provided by the invention.
Embodiment
Below in conjunction with the drawings and specific embodiments the universal stage that the present invention proposes is described in further detail.According to the following describes and claims, advantages and features of the invention will be clearer.It should be noted that accompanying drawing all adopts very the form of simplifying and all uses non-ratio accurately, only in order to convenient, the purpose of the aid illustration embodiment of the invention lucidly.
Core concept of the present invention is, a kind of universal stage is provided, and this universal stage is by being coupled Cam Follower and push pedal, and push pedal links to each other with worktable, by Cam Follower the rectilinear motion of linear electric motors is changed into and to rotatablely move, thereby cut down the number of intermediate links, improve response speed, its rotation center detent mechanism is made by compliant mechanism simultaneously, therefore very close to each other, the displacement good linearity can realize high-precision micrometric displacement, improves bearing accuracy.
Please refer to Figure 1A and Figure 1B, wherein, Figure 1A is the stereographic map of universal stage provided by the invention, Figure 1B is the fundamental diagram of universal stage provided by the invention, shown in Figure 1A, this universal stage comprises substrate 100, worktable 101, vertical supporting mechanism 200, rotation center detent mechanism 300, driving mechanism 400 and measuring mechanism 500, described substrate 100 is arranged on the orlop of this universal stage, and described worktable 101 is arranged on the superiors of this universal stage, described worktable 101 is supported on the substrate 100 by the vertical supporting mechanism 200 of three covers, described rotation center detent mechanism 300 makes worktable 101 rotate around the center of described rotation center detent mechanism, and described driving mechanism 400 provides power, described measuring mechanism 500 feedback position signals.Shown in Figure 1B, described driving mechanism 400 comprises a straight line motor 401, and described driving mechanism 400 is converted to rotatablely moving of worktable with the rectilinear motion of linear electric motors 401.
To describe vertical supporting mechanism 200 below in detail, the structure of rotation center detent mechanism 300 and driving mechanism 400, thus make principle of the present invention more clear.
Please refer to Fig. 2, Fig. 2 is the structural drawing of the vertical supporting mechanism of universal stage provided by the invention, as shown in Figure 2, this vertical supporting mechanism 200 comprises steel ball roller 203, is sheathed on the outer double-screw bolt 201 of steel ball roller, is used to lock the locknut 202 of double-screw bolt, backing plate 205, and vertical pretension extension spring 206.Described backing plate 205 is fixed on the substrate 100, described double-screw bolt 201 screws in the worktable 101, the upper end of described vertical pretension extension spring 206 is fixed on the worktable 101, the lower end is fixed on the substrate 100, elastic force effect by described vertical pretension extension spring 206 makes the roller part 204 contact backing plates 205 of described steel ball roller 203, and steel ball roller 203 in level to can freely rolling.Therefore worktable can freely rotate, and vertical direction is very stable.And therefore described double-screw bolt 201 and worktable 101 can regulate the height of three cover supporting mechanisms easily by being threaded, thereby the true altitude and the levelness of regulating worktable 101 reduce processing and assembly difficulty, improve assembly precision.
Please continue with reference to figure 3, Fig. 3 is the structural drawing of the rotation center detent mechanism of universal stage provided by the invention, as shown in Figure 3, rotation center detent mechanism 300 is made up of vertical reed 301 and circle reed 302, described round reed 302 is positioned at the top of described vertical reed 301, the lower end of described vertical reed is fixed on the substrate 100, and its upper end is fixed on the worktable 101 with described round reed.Wherein vertically the quantity of reed 301 is 4, and these 4 vertical reeds 301 are arranged together by the cross form, can reverse by low-angle, and assurance level again is to having high stiffness simultaneously.Circle reed 302 can have a micrometric displacement vertical, and level is to high rigidity.When worktable when vertical direction rotates, vertically reed 301 reverses, and determines rotation center, vertically reed 301 terminations produce the micrometric displacement of vertical direction simultaneously, this micrometric displacement is by 302 compensation of circle reed.This rotation center detent mechanism is to be made by compliant mechanism, and therefore very close to each other, the displacement good linearity can realize high-precision micrometric displacement.
Please continue with reference to figure 4, Fig. 4 is the structural drawing of the driving mechanism of universal stage provided by the invention, as shown in Figure 4, this driving mechanism 400 mainly comprises linear electric motors 401, guide rail 403, Cam Follower 404, horizontal pretension extension spring 405 and push pedal 406, the stator of described linear electric motors 401 is installed on the substrate 100, the mover of described linear electric motors 401 is installed on the described guide rail 403 through mover card extender 402, and described guide rail 403 is installed on the substrate 100.Described Cam Follower 404 is installed on the mover of linear electric motors 401 by middleware, and described Cam Follower 404 is coupled by the elastic force and the push pedal 406 of horizontal pretension extension spring 405, described push pedal 406 links to each other with worktable 101, so just make Cam Follower 404 under the driving of linear electric motors 401, make push pedal 406 motion, and drive described worktable 101 and rotate around the center of rotation center detent mechanism 300.In addition, be rolling friction between Cam Follower 404 Internal and external cycles, therefore do not have additional friction power and produce.
In addition, as shown in Figure 4, one measuring mechanism 500 also has been installed on the described universal stage, described measuring mechanism 500 is that the vertical sense of rotation of worktable is measured grating chi 501, the rule of described measurement grating chi 501 partly is installed on the worktable 101, and read head partly is installed on the substrate 100, therefore directly measures the rotation arc length that worktable 101 rotates around vertical direction, thereby measure the anglec of rotation, realize position feedback.
In sum, the invention provides a universal stage, the worktable of described universal stage is supported on the substrate by three covers vertical supporting mechanism in the vertical direction as shown in Figure 2, rotation center detent mechanism restraint of labour platform by as shown in Figure 3 rotates around its center, and the drive unit by as shown in Figure 4 is converted to rotatablely moving of worktable with the rectilinear motion of linear electric motors simultaneously.The intermediate link of described universal stage is few, and response speed is fast, the bearing accuracy height.
Obviously, those skilled in the art can carry out various changes and modification to invention and not break away from the spirit and scope of the present invention.Like this, if of the present invention these are revised and modification belongs within the scope of claim of the present invention and equivalent technologies thereof, then the present invention also is intended to comprise these changes and modification interior.

Claims (11)

1. universal stage, it is characterized in that, comprise substrate, vertical supporting mechanism, be supported on worktable, rotation center detent mechanism and driving mechanism on the described substrate by vertical supporting mechanism, described rotation center detent mechanism connects described substrate and worktable, and worktable is rotated around the relative substrate in the center of described rotation center detent mechanism, described driving mechanism comprises linear electric motors, and the rectilinear motion of linear electric motors is converted into rotatablely moving of worktable.
2. universal stage as claimed in claim 1, it is characterized in that described vertical supporting mechanism comprises the backing plate that is fixed on the described substrate, with a contacted steel ball roller of described backing plate and a double-screw bolt, described double-screw bolt is set in described steel ball roller outside, and screws in the described worktable.
3. universal stage as claimed in claim 2, it is characterized in that, be provided with vertical preloading spring between described substrate and the described worktable, described vertical preloading spring partly is pressed on the roller of described steel ball roller on the described backing plate, and described steel ball roller freely rolls in the horizontal direction.
4. universal stage as claimed in claim 2 is characterized in that, described double-screw bolt and described worktable are by being threaded, to regulate the height of supporting mechanism.
5. universal stage as claimed in claim 2 is characterized in that, the quantity of described vertical supporting mechanism is three covers.
6. universal stage as claimed in claim 1, it is characterized in that, described rotation center detent mechanism is made up of vertical reed and the round reed that is positioned at above the vertical reed, and the top of described rotation center detent mechanism is fixed on the worktable, and its bottom is fixed on the substrate.
7. universal stage as claimed in claim 6, it is characterized in that, the quantity of described vertical reed is four, described four vertical reeds are pressed the cross arranged in form, when described worktable when vertical direction rotates, described vertical reed twists, and produces the micrometric displacement of vertical direction simultaneously, and this micrometric displacement is by described round reed compensation.
8. universal stage as claimed in claim 1, it is characterized in that, described driving mechanism also comprises Cam Follower and push pedal, described Cam Follower and described push pedal are coupled, described push pedal is connected with described worktable, described Cam Follower makes the push pedal campaign under the driving of linear electric motors, and drives described worktable and rotate around the center of rotation center detent mechanism.
9. universal stage as claimed in claim 8 is characterized in that, described Cam Follower and described push pedal are coupled by a horizontal pretension extension spring.
10. universal stage as claimed in claim 8, it is characterized in that, described driving mechanism also comprises a guide rail, described linear electric motors comprise mover and stator, described stator and described guide rail are installed on the described substrate, described mover is installed on the described guide rail through a mover card extender, and described Cam Follower is installed on the described mover, and with mover along described guide rail moving linearly.
11. universal stage as claimed in claim 1, it is characterized in that, also comprise a measuring mechanism, described measuring mechanism is that the vertical sense of rotation of worktable is measured the grating chi, the rule of described measurement grating chi partly is installed on the worktable, and its read head partly is installed on the substrate.
CN 200910200944 2009-12-25 2009-12-25 Rotating platform Active CN102109765B (en)

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Application Number Priority Date Filing Date Title
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CN102109765B CN102109765B (en) 2012-08-29

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103386674A (en) * 2013-07-29 2013-11-13 吴江迈为技术有限公司 High-precision rotating platform
CN104049471A (en) * 2014-06-18 2014-09-17 中国科学院光电技术研究所 Radial zero-additional-force turntable
CN104678721A (en) * 2015-03-20 2015-06-03 浙江欧视达科技有限公司 Alignment mechanism and exposure machine with same
CN105116835A (en) * 2015-06-24 2015-12-02 苏州光宝康电子有限公司 Angle rotation correction device for LCD machining platform
CN107101793A (en) * 2017-06-14 2017-08-29 苏州直为精驱控制技术有限公司 Multi-direction motion platform
CN110767555A (en) * 2018-07-27 2020-02-07 奇景光电股份有限公司 Glue sealing equipment and glue sealing method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100405222C (en) * 2005-02-23 2008-07-23 上海微电子装备有限公司 Seven freedom positioning mechanism
CN101241307A (en) * 2007-12-21 2008-08-13 上海微电子装备有限公司 Levelling focusing mechanism possessing great stroke control function

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103386674A (en) * 2013-07-29 2013-11-13 吴江迈为技术有限公司 High-precision rotating platform
CN103386674B (en) * 2013-07-29 2016-08-10 苏州迈为科技股份有限公司 A kind of high-precision rotary platform
CN104049471A (en) * 2014-06-18 2014-09-17 中国科学院光电技术研究所 Radial zero-additional-force turntable
CN104049471B (en) * 2014-06-18 2016-08-31 中国科学院光电技术研究所 A kind of radially zero additional force turntable
CN104678721A (en) * 2015-03-20 2015-06-03 浙江欧视达科技有限公司 Alignment mechanism and exposure machine with same
CN104678721B (en) * 2015-03-20 2017-12-22 浙江欧视达科技有限公司 A kind of positioning mechanism and the exposure machine provided with the positioning mechanism
CN105116835A (en) * 2015-06-24 2015-12-02 苏州光宝康电子有限公司 Angle rotation correction device for LCD machining platform
CN107101793A (en) * 2017-06-14 2017-08-29 苏州直为精驱控制技术有限公司 Multi-direction motion platform
CN110767555A (en) * 2018-07-27 2020-02-07 奇景光电股份有限公司 Glue sealing equipment and glue sealing method

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Address after: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525

Co-patentee after: Shanghai Micro And High Precision Mechine Engineering Co., Ltd.

Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd

Address before: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525

Co-patentee before: Shanghai Micro And High Precision Mechine Engineering Co., Ltd.

Patentee before: Shanghai Micro Electronics Equipment Co., Ltd.