CN102084421B - 光信息记录介质用反射膜 - Google Patents
光信息记录介质用反射膜 Download PDFInfo
- Publication number
- CN102084421B CN102084421B CN200980125743.9A CN200980125743A CN102084421B CN 102084421 B CN102084421 B CN 102084421B CN 200980125743 A CN200980125743 A CN 200980125743A CN 102084421 B CN102084421 B CN 102084421B
- Authority
- CN
- China
- Prior art keywords
- reflectance coating
- recording medium
- information recording
- optical information
- base alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
- C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
- G11B7/2585—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on aluminium
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (2)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008-228902 | 2008-09-05 | ||
JP2008228902A JP5042174B2 (ja) | 2008-09-05 | 2008-09-05 | 光情報記録媒体用反射膜および光情報記録媒体反射膜形成用スパッタリングターゲット |
PCT/JP2009/065431 WO2010027026A1 (ja) | 2008-09-05 | 2009-09-03 | 光情報記録媒体用反射膜および光情報記録媒体反射膜形成用スパッタリングターゲット |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102084421A CN102084421A (zh) | 2011-06-01 |
CN102084421B true CN102084421B (zh) | 2014-03-12 |
Family
ID=41797192
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200980125743.9A Expired - Fee Related CN102084421B (zh) | 2008-09-05 | 2009-09-03 | 光信息记录介质用反射膜 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20110165016A1 (zh) |
JP (1) | JP5042174B2 (zh) |
CN (1) | CN102084421B (zh) |
TW (1) | TWI404061B (zh) |
WO (1) | WO2010027026A1 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102369571A (zh) | 2009-04-14 | 2012-03-07 | 株式会社神户制钢所 | 光信息记录媒体、形成光信息记录媒体的反射膜用的溅射靶 |
CN105154799A (zh) * | 2015-09-07 | 2015-12-16 | 基迈克材料科技(苏州)有限公司 | 用于tft平板显示器的超高纯铝板细晶靶材的制备方法 |
CN110468312B (zh) * | 2019-09-26 | 2021-03-23 | 常州斯威克新材料科技有限公司 | 一种光伏反光膜用耐腐蚀铝合金靶材及其制备方法和铝合金薄膜 |
JP7412183B2 (ja) | 2020-01-10 | 2024-01-12 | 山陽特殊製鋼株式会社 | スパッタリングターゲット材 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5643650A (en) * | 1991-09-09 | 1997-07-01 | Shin-Etsu Chemical Co., Ltd. | Magneto-optical recording medium |
US6291047B1 (en) * | 1998-04-03 | 2001-09-18 | Kabushiki Kaisha Toshiba | Information recording medium and method of manufacturing resinous substrates for use in the recording medium |
US6451402B1 (en) * | 1998-06-22 | 2002-09-17 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
CN1612243A (zh) * | 2003-10-30 | 2005-05-04 | 株式会社神户制钢所 | 光信息记录用铝合金反射膜及其形成用靶材、记录介质 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05198026A (ja) * | 1991-09-09 | 1993-08-06 | Shin Etsu Chem Co Ltd | 光磁気記録媒体 |
JPH07130007A (ja) * | 1993-11-04 | 1995-05-19 | Sony Corp | 光学素子、情報記録媒体及び情報記録/再生装置 |
JP4068308B2 (ja) * | 2000-02-10 | 2008-03-26 | Tdk株式会社 | 光情報媒体 |
JP2001312840A (ja) * | 2000-04-28 | 2001-11-09 | Tosoh Corp | 表面読み出し型光記録媒体 |
KR100399021B1 (ko) * | 2001-01-31 | 2003-09-19 | 한국과학기술연구원 | 비정질 반사막을 이용한 고밀도 광 디스크 |
JP4441376B2 (ja) * | 2003-10-30 | 2010-03-31 | 株式会社神戸製鋼所 | レーザーマーキング用の光情報記録用Al合金反射膜、光情報記録媒体および光情報記録用Al合金反射膜の形成用のAl合金スパッタリングターゲット |
JP2009076129A (ja) * | 2007-09-19 | 2009-04-09 | Kobe Steel Ltd | 読み出し専用の光情報記録媒体 |
-
2008
- 2008-09-05 JP JP2008228902A patent/JP5042174B2/ja not_active Expired - Fee Related
-
2009
- 2009-09-03 US US13/062,384 patent/US20110165016A1/en not_active Abandoned
- 2009-09-03 WO PCT/JP2009/065431 patent/WO2010027026A1/ja active Application Filing
- 2009-09-03 CN CN200980125743.9A patent/CN102084421B/zh not_active Expired - Fee Related
- 2009-09-04 TW TW098129885A patent/TWI404061B/zh not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5643650A (en) * | 1991-09-09 | 1997-07-01 | Shin-Etsu Chemical Co., Ltd. | Magneto-optical recording medium |
US6291047B1 (en) * | 1998-04-03 | 2001-09-18 | Kabushiki Kaisha Toshiba | Information recording medium and method of manufacturing resinous substrates for use in the recording medium |
US6451402B1 (en) * | 1998-06-22 | 2002-09-17 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
CN1612243A (zh) * | 2003-10-30 | 2005-05-04 | 株式会社神户制钢所 | 光信息记录用铝合金反射膜及其形成用靶材、记录介质 |
Also Published As
Publication number | Publication date |
---|---|
TWI404061B (zh) | 2013-08-01 |
TW201013666A (en) | 2010-04-01 |
WO2010027026A1 (ja) | 2010-03-11 |
JP2010061770A (ja) | 2010-03-18 |
US20110165016A1 (en) | 2011-07-07 |
CN102084421A (zh) | 2011-06-01 |
JP5042174B2 (ja) | 2012-10-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CI01 | Publication of corrected invention patent application |
Correction item: Inventor Correct: Jiko Norihiro|Zhong Jing, Yi Yi| Tachi Yuki False: Jiko Norihiro|Nakai Junichi|Tachi Yuki Number: 22 Volume: 27 |
|
CI02 | Correction of invention patent application |
Correction item: Inventor Correct: Jiko Norihiro|Zhong Jing, Yi Yi|Tachi Yuki False: Jiko Norihiro|Nakai Junichi|Tachi Yuki Number: 22 Page: The title page Volume: 27 |
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GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140312 Termination date: 20160903 |
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