CN102031065B - 无磨料的化学机械抛光组合物 - Google Patents

无磨料的化学机械抛光组合物 Download PDF

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Publication number
CN102031065B
CN102031065B CN2010102981564A CN201010298156A CN102031065B CN 102031065 B CN102031065 B CN 102031065B CN 2010102981564 A CN2010102981564 A CN 2010102981564A CN 201010298156 A CN201010298156 A CN 201010298156A CN 102031065 B CN102031065 B CN 102031065B
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CN
China
Prior art keywords
weight
methacrylic acid
acid
composition
acidic polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CN2010102981564A
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English (en)
Chinese (zh)
Other versions
CN102031065A (zh
Inventor
王红雨
S·A·伊比特森
T·高希
M·R·温克勒
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ROHM AND HAAS ELECTRONIC MATER
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ROHM AND HAAS ELECTRONIC MATER
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Publication of CN102031065A publication Critical patent/CN102031065A/zh
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/04—Aqueous dispersions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/403—Chemomechanical polishing [CMP] of conductive or resistive materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
CN2010102981564A 2009-09-25 2010-09-21 无磨料的化学机械抛光组合物 Expired - Fee Related CN102031065B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/586,642 2009-09-25
US12/586,642 US20110073800A1 (en) 2009-09-25 2009-09-25 Abrasive-free chemical mechanical polishing compositions

Publications (2)

Publication Number Publication Date
CN102031065A CN102031065A (zh) 2011-04-27
CN102031065B true CN102031065B (zh) 2013-09-11

Family

ID=43779265

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010102981564A Expired - Fee Related CN102031065B (zh) 2009-09-25 2010-09-21 无磨料的化学机械抛光组合物

Country Status (5)

Country Link
US (1) US20110073800A1 (https=)
JP (1) JP2011082512A (https=)
KR (1) KR20110033786A (https=)
CN (1) CN102031065B (https=)
TW (1) TW201127924A (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102022139B1 (ko) * 2012-03-16 2019-09-17 가부시키가이샤 후지미인코퍼레이티드 연마용 조성물
KR102155205B1 (ko) * 2012-08-31 2020-09-11 가부시키가이샤 후지미인코퍼레이티드 연마용 조성물 및 기판의 제조 방법
US20140308814A1 (en) * 2013-04-15 2014-10-16 Applied Materials, Inc Chemical mechanical polishing methods and systems including pre-treatment phase and pre-treatment compositions
CN104002252B (zh) * 2014-05-21 2016-06-01 华侨大学 超细磨料生物高分子柔性抛光膜及其制备方法
US10181408B2 (en) * 2017-01-31 2019-01-15 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing method for tungsten using polyglycols and polyglycol derivatives
CN113969173B (zh) * 2021-09-23 2022-05-13 易安爱富(武汉)科技有限公司 一种ITO/Ag/ITO复合金属层薄膜的蚀刻液

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1455784A (zh) * 1999-04-30 2003-11-12 综研化学株式会社 丙烯酸类聚合物的制造方法
US20060110924A1 (en) * 2004-11-24 2006-05-25 Tirthankar Ghosh Abrasive-free chemical mechanical polishing compositions and methods relating thereto

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001300285A (ja) * 2000-04-18 2001-10-30 Sanyo Chem Ind Ltd 研磨用砥粒分散剤及び研磨用スラリー
BR0113999A (pt) * 2000-09-21 2003-08-12 Rohm & Haas Processo para preparar uma dispersão polimérica aquosa nanocompósita de argila, dispersão nanocompósita aquosa, espessador, dispersante, aglutinante, composição de tinta flexográfica, verniz de sobre impressão, modificador de pó de cimento seco, semente polimérica nanocompósita de argila, composição polimérica nanocompósita de argila, e, método para preparar uma pluralidade de partìculas poliméricas nanocompósitas de argila ocas
US6433061B1 (en) * 2000-10-24 2002-08-13 Noveon Ip Holdings Corp. Rheology modifying copolymer composition
US7288616B2 (en) * 2002-01-18 2007-10-30 Lubrizol Advanced Materials, Inc. Multi-purpose polymers, methods and compositions

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1455784A (zh) * 1999-04-30 2003-11-12 综研化学株式会社 丙烯酸类聚合物的制造方法
US20060110924A1 (en) * 2004-11-24 2006-05-25 Tirthankar Ghosh Abrasive-free chemical mechanical polishing compositions and methods relating thereto

Also Published As

Publication number Publication date
TW201127924A (en) 2011-08-16
CN102031065A (zh) 2011-04-27
US20110073800A1 (en) 2011-03-31
JP2011082512A (ja) 2011-04-21
KR20110033786A (ko) 2011-03-31

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Granted publication date: 20130911

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