CN101979450B - 研磨液、研磨液的制备方法和使用该研磨液的研磨方法 - Google Patents
研磨液、研磨液的制备方法和使用该研磨液的研磨方法 Download PDFInfo
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- CN101979450B CN101979450B CN 200910236733 CN200910236733A CN101979450B CN 101979450 B CN101979450 B CN 101979450B CN 200910236733 CN200910236733 CN 200910236733 CN 200910236733 A CN200910236733 A CN 200910236733A CN 101979450 B CN101979450 B CN 101979450B
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
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CN 200910236733 CN101979450B (zh) | 2009-11-05 | 2009-11-05 | 研磨液、研磨液的制备方法和使用该研磨液的研磨方法 |
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CN 200910236733 CN101979450B (zh) | 2009-11-05 | 2009-11-05 | 研磨液、研磨液的制备方法和使用该研磨液的研磨方法 |
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CN101979450A CN101979450A (zh) | 2011-02-23 |
CN101979450B true CN101979450B (zh) | 2013-10-23 |
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Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102335855A (zh) * | 2011-06-02 | 2012-02-01 | 湖北东光电子股份有限公司 | 一种49u/s石英晶片倒边工艺 |
CN102774831B (zh) * | 2012-07-30 | 2014-07-23 | 新疆天科合达蓝光半导体有限公司 | 一种从碳化硅晶体打磨废料中提取金刚石磨料的方法 |
CN105385412A (zh) * | 2015-10-16 | 2016-03-09 | 珠海东锦石英科技有限公司 | 研磨液、研磨液制备工艺及研磨液的使用添加方法 |
CN108342184A (zh) * | 2017-01-22 | 2018-07-31 | 东莞新科技术研究开发有限公司 | 半导体基板的研磨方法及研磨液 |
CN111469042A (zh) * | 2020-04-16 | 2020-07-31 | 浙江西亚特电子材料有限公司 | 一种超纯气体的气瓶处理系统及其处理方法 |
CN112980391A (zh) * | 2021-03-02 | 2021-06-18 | 河北思瑞恩新材料科技有限公司 | 一种用于碳化硅晶片加工的粗磨液及其制备方法 |
CN113388366A (zh) * | 2021-06-28 | 2021-09-14 | 德阳精研科技(深圳)有限公司 | 一种研磨液组合物及其生产工艺 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1651544A (zh) * | 2005-01-07 | 2005-08-10 | 清华大学 | 一种用于存储器硬盘磁头背面研磨的研磨液 |
CN101186804A (zh) * | 2007-11-21 | 2008-05-28 | 北京国瑞升科技有限公司 | 水性金刚石研磨液及其制备方法和用途 |
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CN1651544A (zh) * | 2005-01-07 | 2005-08-10 | 清华大学 | 一种用于存储器硬盘磁头背面研磨的研磨液 |
CN101186804A (zh) * | 2007-11-21 | 2008-05-28 | 北京国瑞升科技有限公司 | 水性金刚石研磨液及其制备方法和用途 |
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Address after: 100190, room 1, building 66, No. 2005 East Zhongguancun Road, Beijing, Haidian District Patentee after: TANKEBLUE SEMICONDUCTOR Co.,Ltd. Patentee after: INSTITUTE OF PHYSICS, CHINESE ACADEMY OF SCIENCES Address before: 100190, room 1, building 66, No. 2005 East Zhongguancun Road, Beijing, Haidian District Patentee before: TANKEBLUE SEMICONDUCTOR Co.,Ltd. Patentee before: INSTITUTE OF PHYSICS, CHINESE ACADEMY OF SCIENCES |
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Effective date of registration: 20200103 Address after: Room 301, Building 9, Tianrong Street, Daxing Biomedical Industry Base, Zhongguancun Science and Technology Park, Daxing District, Beijing 102600 Patentee after: TANKEBLUE SEMICONDUCTOR Co.,Ltd. Address before: 100190, room 1, building 66, No. 2005 East Zhongguancun Road, Beijing, Haidian District Co-patentee before: INSTITUTE OF PHYSICS, CHINESE ACADEMY OF SCIENCES Patentee before: TANKEBLUE SEMICONDUCTOR Co.,Ltd. |
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Application publication date: 20110223 Assignee: Shenzhen Reinvested Tianke Semiconductor Co.,Ltd. Assignor: TANKEBLUE SEMICONDUCTOR Co.,Ltd. Contract record no.: X2023990000683 Denomination of invention: Preparation method of grinding fluid, grinding fluid, and grinding method using the same Granted publication date: 20131023 License type: Common License Record date: 20230725 |