CN101952482A - 多层涂覆的切削工具 - Google Patents
多层涂覆的切削工具 Download PDFInfo
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Abstract
本发明涉及一种切削工具,所述切削工具包括硬质合金、金属陶瓷、陶瓷、基于立方氮化硼的材料或高速钢的硬质合金主体,并在所述主体表面的至少一个功能部分上涂覆硬且耐磨的涂层。所述涂层包括以立方结构的(Ti1-xAlx)N层和立方结构的MeN层的重复形式...MeN/(Ti1-xAlx)N/MeN/(Ti1-xAlx)N/MeN/(Ti1-xAlx)N/MeN/(Ti1-xAlx)N...的金属氮化物化合物的多晶层状、多层结构,其中0.3<x<0.95,并且Me为金属元素Ti、Zr、Hf、V、Nb、Ta、Mo和Al的一种或多种。所述层状结构的重复周期λ为5nm≤20nm,层厚度关系为1/10<(dMeN/d(Ti、Al)N)<1/3,以及厚度dMeN≥1nm,在其最高达20μm的整个总厚度中所述重复周期λ基本不变。所述涂层作为纳米复合材料而硬化,从而在立方TiN和立方AlN区域中的(Ti1-xAlx)N发生亚稳态分解期间调整其强度,其中,另外的立方结构的MeN层提供了用于锁定主要的全部立方涂层结构的手段,因此抑制了六方AlN相的形成,从而导致了高温金属切削性能的提高。
Description
技术领域
本发明涉及一种通过排屑来用于加工的工具,所述工具包括硬质合金、金属陶瓷、陶瓷、基于立方氮化硼的材料或高速钢的硬质合金主体和硬且耐磨的金属氮化物涂层,所述涂层包括交替的立方结构的(Ti、Al)N层和立方结构的MeN层,其中Me为金属元素Ti、Zr、Hf、V、Nb、Ta、Mo和Al中的一种或多种。所述涂层通过物理气相沉积(PVD)生长,并优选通过阴极电弧蒸镀来生长。本发明在产生高温的金属切削应用,例如高温合金和不锈钢的加工中特别有用。
背景技术
自从二十世纪八十年代早期以来,TiN层已经被广泛用于表面保护应用。为了提高这些涂层的抗氧化性,在二十世纪八十年代中期开始向TiN中添加铝的工作[参见例如H.A.Jehn等,J.Vac.Sci.Technol.A 4,2701(1986)和O.Knotek等,J.Vac.Sci.Technol.A 4,2695(1986)]。发现这样形成的化合物,立方相(Ti、Al)N,具有优异的抗氧化性,并且其能够使得在加工期间具有更高的切削速度、延长工具寿命、加工更硬的材料并改善制造经济性。通过(Ti、Al)N的沉淀硬化,已经在金属切削应用中获得了改善的涂覆性能[参见例如A.等,Surf.Coat.Tech.191(2005)],并且还公开于US 7,083,868和US 7,056,602中。
通过应用如下不同的多层概念,也已经获得了涂层优化:交替的含Ti和Al的层(US 6,309,738)、含氧和不含氧的层(US 6,254,984)、堆叠在多层中的层中一个层自身由多层构成(US 6,077,596)、交替的氮含量(US 5,330,853)或使用一种准稳定化合物(US 5,503,912)或作为非周期性多层(US 6,103,357)。
JP 6136514公开了一种耐磨的多层硬质涂层结构,所述结构包括在工具表面上的交替的Ti(C、N)和(Al、Ti)(C、N)的层。在相对较低的温度下,通过PVD沉积所述涂层。
为了环境保护的干式加工工艺,即不使用切削液(润滑剂)的金属切削操作和利用改进工艺的加速加工速度的趋势,由于升高的工具切削刃的温度而对工具材料的特性提出了甚至更高的要求。特别地,在高温下的涂层稳定性,例如抗氧化性和耐磨性变得更加关键。
本发明的目的是提供一种涂覆的切削工具,其在高温下的金属切削应用中获得了改进的性能。
发明内容
我们已经惊奇地发现,通过在多层涂层中结合两种不同的立方结构的材料,导致了改进的高温金属切削性能。所述涂层作为纳米复合材料而硬化,从而在立方TiN和立方AlN区域中的(Ti、Al)N的亚稳态分解期间调整其强度,其中,另外的MeN层提供了用于锁定主要的全部立方涂层结构(通过X射线衍射测得)的手段,因此抑制了否则会发生的有害的六方AlN相的形成。
附图说明
图1a:示出(1)主体、(2)多层涂层、(3)MeN层、(4)(Ti、Al)N层和(5)重复周期的示意性涂层结构。
图1b:示出(1)主体、(2)现有技术的内部单-和/或多层涂层、(3)本发明的多层涂层和(4)现有技术的外部单-和/或多层涂层的示意性涂层结构。
图2a:示出(1)真空室、(2a)阴极材料A、(2b)阴极材料B、(3)固定装置、(4)用于偏压的供电电源、(5a)阴极电弧供电电源、(5b)阴极电弧供电电源、(6)用于工艺气体的进口和(7)用于真空泵的出口的沉积室的示意图(侧视图)。
图2b:示出(1)真空室、(2)用于不同阴极材料的四个位置和(3)固定装置的沉积室的示意图(俯视图)。
图3:(A)为具有TiN(明反差)和(Ti、Al)N(暗反差)的涂层的截面STEM显微照片,(B)为本发明的典型多层涂层的颗粒结构的示意图。
图4:从(A)纯(Ti、Al)N层和(B)本发明的多层TiN/(Ti、Al)N涂层获得的X射线衍射图。将衍射峰指示为(1)TiN、(2)(Ti、Al)N和(3)硬质合金。
图5:用于残余应力的设置(set-up)的示意图,所述残余应力通过XRD分析。
图6:TiN(2nm)和(Ti、Al)N(7.9nm)的TiN/(Ti、Al)N多层涂层的STEM显微照片,所述显微照片示出了:(A)所述(Ti、Al)N层、(B)在(A)中的区域上的电子衍射图、(C)Ti EDS图(明反差)和(D)Al EDS图(明反差)。
发明详述
根据本发明,提供了一种通过排屑来用于加工的切削工具,所述切削工具包括硬质合金、金属陶瓷、陶瓷、基于立方氮化硼的材料或高速钢的硬质合金主体,以及包括金属氮化物化合物的多晶层状、多层结构,并以下列方式涂覆于其上的硬且耐磨的涂层:以立方结构的(Ti1-xAlx)N层和立方结构的MeN层的重复形式(见图1a)...MeN(3)/(Ti1-xAlx)N(4)/MeN(3)/(Ti1-xAlx)N(4)/MeN(3)/(Ti1-xAlx)N(4)/MeN(3)/...,其中0.3<x<0.95,优选0.45<x<0.75,并且Me为金属元素Ti、Zr、Hf、V、Nb、Ta、Mo和Al中的一种或多种,优选为Ti、V、Nb、Ta和Al中的一种或多种。
所述层状结构的总厚度为0.5~20μm,优选为1~10μm,最优选为2~5μm。在整个多层结构中,图1a中的重复周期(5),即双层dMeN+d(Ti,Al)N的总厚度基本不变(即,其变化不超过20%)。所述重复周期为5nm≤20nm,优选为5nm≤.≤10nm,且1/10<(dMeN/d(Ti,Al)N)<1/3,其中厚度dMeN比dMeN≥1nm大。
在第一实施方案中,Me为Ti。
在第二实施方案中,Me为Zr。
在第三实施方案中,Me为V。
在第四实施方案中,Me为Nb。
在第五实施方案中,Me为Ta。
在第六实施方案中,Me为Al。
在第七实施方案中,Me为金属元素Ti、V、Nb或Al中的两种以上。
在第八实施方案中,Me为金属元素V、Nb或Al中的两种以上。
在第九实施方案中,Me为金属元素Ti、Zr、V或Nb中的两种以上。
在第十实施方案中,Me为金属元素Zr、V或Nb中的两种以上。
根据现有技术,可利用TiN、TiC、Ti(C、N)或(Ti、Al)N,优选(Ti、Al)N的内部(3)单-和/或多层涂层和/或TiN、TiC、Ti(C、N)或(Ti、Al)N,优选(Ti、Al)N的外部(4)单-和/或多层涂层来涂覆图1b中的所述主体(1),使得总涂层厚度为1~20μm,优选为1~10μm,最优选为2~7μm。
所述MeN层的压缩应力水平在之间,优选在之间,而(Ti1-xAlx)N层的应力水平在-6.0<.(Ti1-xAlx)N)<-0.5GPa之间变化,优选在-6.0<.(Ti1-xAlx)N)<-3.0GPa之间变化。
所述MeN/(Ti1-xAlx)N多层涂层的平均组成为46原子%<Zr+Hf+V+Nb+Ta+Mo+Ti+Al<54原子%,优选为
48原子%<Zr+Hf+V+Nb+Ta+Mo+Ti+Al<52原子%,以及余量的N。
本发明的涂覆方法基于在下列条件下的纯的和/或合金化阴极的阴极电弧沉积:使用Ti/Al-阴极生长(Ti1-xAlx)N层,所述Ti/Al-阴极的组成在(70原子%的Ti+30原子%的Al)和(5原子%的Ti+95原子%的Al)之间,并且优选在(40原子%的Ti+60原子%的Al)和(30原子%的Ti+70原子%的Al)之间。使用纯的或合金化的阴极来生长所述MeN层,其中Me为金属元素Ti、Zr、Hf、V、Nb、Ta、Mo和Al的一种或多种,优选为Ti、V、Nb、Ta或Al的一种或多种。根据阴极的尺寸,蒸发电流在50A和200A之间,并且在使用63mm直径的阴极时优选在50A和100A之间。在总压力为0.5Pa~9.0Pa,优选为1.5Pa~5.0Pa的Ar+N2的气氛中,优选在纯N2的气氛中,生长所述层。偏压为-10V~-300V,优选为-20V~-100V。沉积温度在350℃和700℃之间,优选在400℃和650℃之间。
本发明还涉及根据以上的切削刀具的应用,其在以下条件下,对不锈钢和高温合金进行加工:切削速度为50~400m/分钟,优选为75~300m/分钟;根据切削速度和刀片形状,在铣削的情况下,平均每齿进给量为0.08~0.5mm、优选为0.1~0.4mm。
具体实施方式
实施例1
使用具有94重量%的WC-6重量%的Co的组成(WC的粒度为0.8μm)的硬质合金刀片。
在沉积之前,在碱性溶液和醇的超声波浴中清洗所述刀片。将系统抽真空至低于2.0×10-3Pa的压力,之后,利用Ar离子来溅射清洗所述刀片。使用阴极电弧沉积生长TiN/(Ti1-xAlx)N层。用于(Ti1-xAlx)N的阴极材料为Ti/Al(33原子%的Ti+67原子%的Al),直径为63mm(图2a中的位置(2a)),并且对于TiN层,使用纯Ti(直径为63mm,图2a中的位置(2b))。对于两种阴极材料,都在99.995%的纯N2气氛中,在4Pa的总压力下,使用-40V的偏压和60A的蒸发电流来沉积所述层。通过改变到阴极的蒸发电流、沉积系统的设置(即在四个位置(2)中的阴极材料,见图2b)和固定装置的旋转速度,获得层厚度的变化(见表1)。对于所有的刀片,总涂层厚度接近3μm。沉积温度为约450℃。
使用包括扫描TEM(STEM)的截面透射电子显微镜(TEM)以研究所述层的微结构。试样准备包括对上表面和下表面两者进行标准机械研磨/抛光和离子束溅射蚀刻以及通过在所述刀片的刃口上使用聚焦离子束(FIB)铣削的TEM试样的切断。图3(A)为具有TiN(明反差)和(Ti0.36Al0.64)N(暗反差)的多层涂层的截面STEM显微照片。所述微结构为柱状,并且致密,在几个界面上具有大的单晶颗粒(示意性地示于(B)中)。
使用Cu Kα辐射和θ-2θ构型获得了作为沉积层的XRD图。图4示出了(A)单相(Ti0,36Al0.64)N层和(B)具有TiN和(Ti0,36Al0.64)N的多层TiN/(Ti、Al)N涂层的XRD图。指示的峰对应于单相(1)TiN、(2)(Ti、Al)N和(3)硬质合金。与图4中的结果类似,表1中总结的所有沉积涂层显示了单相立方TiN和(Ti、Al)N结构。
通过使用sin2法的XRD测量(见表1)对所述涂层的TiN和(Ti1-xAlx)N层的残余应力进行评价。分别在TiN 220-和(Ti1-xAlx)N220-反射上使用CuK-辐射来进行所述测量。不能对比<4nm更薄的层的应力值进行推断。将测角仪的设置示于图5中。使用侧倾技术(-几何几何测量)获得数据,11,-角(正和负)、等距离位于0~0.82(~65°)的sin2范围内。使用=0.25的泊松比和E=450Gpa的杨氏模量对所述残余应力值进行评价。
通过使用具有在10KV下运行的Thermo Noran EDS检测器的LEO Ultra 55扫描电子显微镜的能量色散光谱(EDS)分析区域,对所述涂层的总平均组成进行评价。使用Noran System Six(NSS ver 2)软件对数据进行评价(见表1)。
表1
实施例2
重复实施例1,但是使用纯Ta阴极(直径为63mm,图2a中的位置(2b))来生长TaN层。
通过能量色散光谱(EDS)分析对涂层的总平均组成进行评价(见实施例1),并总结于表2中。
表2
实施例3
重复实施例2,但是使用Ti/Nb(95原子%的Ti+5原子%的Nb)阴极(直径为63mm,图2a中的位置(2b))来生长(Ti、Nb)N层。
通过能量色散光谱(EDS)分析对涂层的总平均组成进行评价(见实施例1),并总结于表3中。
表3
实施例4
重复实施例2,但是使用纯Nb阴极(直径为63mm,图2a中的位置(2b))来生长NbN层。
通过能量色散光谱(EDS)分析对涂层的总平均组成进行评价(见实施例1),并总结于表4中。
表4
实施例5
重复实施例2,但是使用纯Zr阴极(直径为63mm,图2a中的位置(2b))来生长ZrN层。
通过能量色散光谱(EDS)分析对涂层的总平均组成进行评价(见实施例1),并总结于表5中。
表5
实施例6
重复实施例2,但是使用纯V阴极(直径为63mm,图2a中的位置(2b))来生长VN层。
通过能量色散光谱(EDS)分析对涂层的总平均组成进行评价(见实施例1),并总结于表6中。
表6
实施例7
重复实施例2,但是使用Al/Ti(95原子%的Al+5原子%的Ti)阴极(直径为63mm,图2a中的位置(2b))来生长(Al、Ti)N层。
通过能量色散光谱(EDS)分析对涂层的总平均组成进行评价(见实施例1),并总结于表7中。
表7
实施例8
根据以下条件对源自实施例1的刀片进行了测试:
几何形状: CNMG120408-MF1
应用: 连续车床
工件材料: AISI 316L
切削速度: 230m/分钟
进给: 0.15mm/转
切削深度: 1mm
工具寿命标准:侧面磨损(vb)>0.3mm
测试结果
表8
实施例9
根据以下条件对源自实施例1的刀片进行了测试:
几何形状: CNMG120412-MR3
应用: 连续车床
工件材料: Inconel 718
切削速度: 90m/分钟
进给: 0.2mm/转
切削深度: 0.5mm
工具寿命标准:侧面磨损(vb)>0.2mm
测试结果
表9
实施例10
根据以下条件对源自实施例5的刀片进行了测试:
几何形状: CNMG120408-MF1
应用: 连续车床
工件材料: AISI 316L
切削速度: 250m/分钟
进给: 0.15mm/转
切削深度: 1mm
工具寿命标准:侧面磨损(vb)>0.3mm
测试结果
表10
实施例11
通过包括电子衍射的TEM、STEM和EDS对源自实施例8的使用过的刀片进行了更详细的研究。图6(A)示出了试样4的涂层(表1)的STEM显微照片。所述图像示出了TiN富集区(更明的反差)和AlN富集区(更暗的反差)。这通过(C)和(D)中的EDS图,进一步得到验证,所述(C)和(D)中的EDS图分别示出了Ti(明区域示出了Ti富集区)和Al(明区域示出了Al富集区)的EDS图。此外,Ti和Al的富集区的典型尺寸约为5nm。选定区域的电子衍射图(B)示出了在层状结构上的一致性和立方结构。
Claims (18)
1.一种通过排屑来用于加工的切削工具,所述切削工具包括硬质合金、金属陶瓷、陶瓷、基于立方氮化硼的材料或高速钢的硬质合金主体以及硬且耐磨的涂层,其特征在于,所述涂层包括以立方结构的(Ti1-xAlx)N层和立方结构的MeN层的重复形式...MeN/(Ti1-xAlx)N/MeN/(Ti1-xAlx)N/MeN/(Ti1-xAlx)N/MeN/(Ti1-xAlx)N...的金属氮化物化合物的多晶层状、多层结构,其中0.3<x<0.95,优选0.45<x<0.75,并且Me为金属元素Ti、Zr、Hf、V、Nb、Ta、Mo和Al的一种或多种,所述重复形式的重复周期为λ,所述重复周期λ在整个层压结构中基本不变,所述整个层压结构的总厚度在0.5和20μm之间,优选1至10μm;重复周期λ为5nm≤20nm,优选为5nm≤.≤10nm以及层厚度关系为1/10<(dMeN/d(Ti、Al)N)<1/3,其中厚度dMeN比dMeN≥1nm大。
2.如权利要求1的切削工具,其特征在于,Me为Ti。
3.如权利要求1的切削工具,其特征在于,Me为Zr。
4.如权利要求1的切削工具,其特征在于,Me为V。
5.如权利要求1的切削工具,其特征在于,Me为Nb。
6.如权利要求1的切削工具,其特征在于,Me为Ta。
7.如权利要求1的切削工具,其特征在于,Me为Al。
8.如权利要求1的切削工具,其特征在于,Me为金属元素Ti、V、Nb或Al中的两种或多种。
9.如权利要求1的切削工具,其特征在于,Me为金属元素Zr、V、Nb或Ta中的两种或多种。
10.如权利要求1的切削工具,其特征在于,Me为金属元素Ti、Zr、V或Nb的两种或多种。
11.如权利要求1的切削工具,其特征在于,Me为金属元素Zr、V或Nb中的两种或多种。
12.如前述权利要求的切削工具,其特征在于,所述多层涂层的总厚度为2~10μm。
14.如前述权利要求的切削工具,其特征在于,所述MeN/(Ti1-xAlx)N多层涂层的平均组成为
46原子%<Zr+Hf+V+Nb+Ta+Mo+Ti+Al<54原子%,优选为
48原子%<Zr+Hf+V+Nb+Ta+Mo+Ti+Al<52原子%,以及余量的N。
15.如前述权利要求的切削工具,其特征在于,利用PVD,优选利用阴极电弧蒸镀来沉积所述涂层。
16.如前述权利要求的切削工具,其特征在于,根据现有技术,可利用TiN、TiC、Ti(C、N)或(Ti、Al)N,优选(Ti、Al)N的内部单-和/或多层涂层和/或TiN、TiC、Ti(C、N)或(Ti、Al)N,优选(Ti、Al)N的外部单-和/或多层涂层来涂覆所述主体,至总厚度为1~20μm,优选为1~10μm,最优选为2~7μm。
17.制备如权利要求1的切削工具的方法,其特征在于,所述层具有重复形式MeN/(Ti1-xAlx)N/MeN/(Ti1-xAlx)N/MeN/(Ti1-xAlx)N/MeN/...,其中Me为金属元素Ti、Zr、Hf、V、Nb、Ta、Mo和Al的一种或多种,优选为Ti、V、Nb、Ta或Al的一种或多种,所述(Ti1-xAlx)N和MeN层为立方结构,其中0.3<x<0.95,优选0.45<x<0.75,并在下列条件下通过使用纯的和/或合金化的Ti+Al以及Me阴极的阴极电弧沉积来生长所述层,以获得期望的层组成:蒸发电流在50A和200A之间;在总压力为0.5Pa~9.0Pa,优选为1.5Pa~5.0Pa的Ar+N2气氛中,优选在纯N2中;偏压在-10V和-300V之间,优选在-20V和-100V之间;温度在350℃和700℃之间,优选在400℃和650℃之间。
18.如前述权利要求的切削刀具的应用,其用于在以下条件下对不锈钢和高温合金进行加工:切削速度为50~400m/分钟,优选为75~300m/分钟;根据切削速度和刀片形状,在铣削的情况下,平均每齿进给量为0.08~0.5mm,优选为0.1~0.4mm。
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- 2009-02-19 EP EP09711935.8A patent/EP2247772B1/en not_active Not-in-force
- 2009-02-19 CN CN200980106128.3A patent/CN101952482B/zh not_active Expired - Fee Related
- 2009-02-19 KR KR1020107021176A patent/KR20100116682A/ko not_active Application Discontinuation
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Also Published As
Publication number | Publication date |
---|---|
EP2247772A4 (en) | 2015-07-29 |
CN101952482B (zh) | 2014-05-28 |
WO2009105024A1 (en) | 2009-08-27 |
KR20100116682A (ko) | 2010-11-01 |
EP2247772B1 (en) | 2016-06-29 |
EP2247772A1 (en) | 2010-11-10 |
US8409696B2 (en) | 2013-04-02 |
US20110111197A1 (en) | 2011-05-12 |
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