CN101795961B - 用于制备微结构化制品的工具 - Google Patents

用于制备微结构化制品的工具 Download PDF

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Publication number
CN101795961B
CN101795961B CN2008801060642A CN200880106064A CN101795961B CN 101795961 B CN101795961 B CN 101795961B CN 2008801060642 A CN2008801060642 A CN 2008801060642A CN 200880106064 A CN200880106064 A CN 200880106064A CN 101795961 B CN101795961 B CN 101795961B
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CN
China
Prior art keywords
micro
structural
instrument
preparation
pressing mold
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Expired - Fee Related
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CN2008801060642A
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English (en)
Chinese (zh)
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CN101795961A (zh
Inventor
莫塞斯·M·大卫
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of CN101795961A publication Critical patent/CN101795961A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0015—Production of aperture devices, microporous systems or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Micromachines (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
CN2008801060642A 2007-09-06 2008-09-02 用于制备微结构化制品的工具 Expired - Fee Related CN101795961B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US96762207P 2007-09-06 2007-09-06
US60/967,622 2007-09-06
PCT/US2008/075021 WO2009032815A1 (en) 2007-09-06 2008-09-02 Tool for making microstructured articles

Publications (2)

Publication Number Publication Date
CN101795961A CN101795961A (zh) 2010-08-04
CN101795961B true CN101795961B (zh) 2013-05-01

Family

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CN2008801060642A Expired - Fee Related CN101795961B (zh) 2007-09-06 2008-09-02 用于制备微结构化制品的工具

Country Status (5)

Country Link
US (1) US20100308497A1 (https=)
EP (1) EP2205521A4 (https=)
JP (1) JP2010537843A (https=)
CN (1) CN101795961B (https=)
WO (1) WO2009032815A1 (https=)

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CN101795838B (zh) 2007-09-06 2014-02-12 3M创新有限公司 形成模具的方法以及使用所述模具形成制品的方法
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TW201325884A (zh) * 2011-12-29 2013-07-01 Hon Hai Prec Ind Co Ltd 光學薄膜壓印滾輪及該滾輪之製作方法
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US9711744B2 (en) 2012-12-21 2017-07-18 3M Innovative Properties Company Patterned structured transfer tape
JP6317247B2 (ja) * 2014-12-22 2018-04-25 富士フイルム株式会社 インプリント用モールド
WO2017136771A1 (en) 2016-02-05 2017-08-10 Havi Global Solutions, Llc Micro-structured surface with improved insulation and condensation resistance
US10687642B2 (en) 2016-02-05 2020-06-23 Havi Global Solutions, Llc Microstructured packaging surfaces for enhanced grip
US10752415B2 (en) 2016-04-07 2020-08-25 Havi Global Solutions, Llc Fluid pouch with inner microstructure
WO2018005294A1 (en) * 2016-06-27 2018-01-04 Havi Global Solutions, Llc Microstructured packaging surfaces for enhanced grip
JP7165719B2 (ja) * 2017-08-04 2022-11-04 スリーエム イノベイティブ プロパティズ カンパニー 平坦性が向上された微細複製研磨表面
EP3775086B1 (en) 2018-04-05 2022-09-14 3M Innovative Properties Company Gel adhesive comprising crosslinked blend of polydiorganosiloxane and acrylic polymer
KR20210073604A (ko) 2018-11-09 2021-06-18 쓰리엠 이노베이티브 프로퍼티즈 컴파니 나노구조화된 광학 필름 및 중간체
US12434427B2 (en) 2019-08-20 2025-10-07 Solventum Intellectual Properties Company Microstructured surface with increased microorganism removal when cleaned, articles and methods
EP4017654A1 (en) 2019-08-20 2022-06-29 3M Innovative Properties Company Microstructured surface with increased microorganism removal when cleaned, articles and methods
US11766822B2 (en) 2019-08-20 2023-09-26 3M Innovative Properties Company Microstructured surface with increased microorganism removal when cleaned, articles and methods
US20230158557A1 (en) 2020-05-20 2023-05-25 3M Innovative Properties Company Medical Articles with Microstructured Surface
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WO2022123440A1 (en) 2020-12-11 2022-06-16 3M Innovative Properties Company Method of thermoforming film with structured surface and articles
WO2022137063A1 (en) 2020-12-21 2022-06-30 3M Innovative Properties Company Superhydrophobic films
WO2022162528A1 (en) 2021-01-28 2022-08-04 3M Innovative Properties Company Microstructured surface with increased microorganism removal when cleaned, articles and methods
EP4401946A1 (en) 2021-09-14 2024-07-24 Solventum Intellectual Properties Company Articles including a microstructured curved surface and methods of making same
EP4643164A1 (en) 2022-12-28 2025-11-05 3M Innovative Properties Company Multilayered articles including a uv barrier layer
WO2024213958A1 (en) 2023-04-14 2024-10-17 Solventum Intellectual Properties Company Multilayer polymer film, method, and articles suitable for thermoforming

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