CN101795961B - 用于制备微结构化制品的工具 - Google Patents

用于制备微结构化制品的工具 Download PDF

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Publication number
CN101795961B
CN101795961B CN2008801060642A CN200880106064A CN101795961B CN 101795961 B CN101795961 B CN 101795961B CN 2008801060642 A CN2008801060642 A CN 2008801060642A CN 200880106064 A CN200880106064 A CN 200880106064A CN 101795961 B CN101795961 B CN 101795961B
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CN
China
Prior art keywords
micro
structural
instrument
preparation
pressing mold
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Expired - Fee Related
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CN2008801060642A
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English (en)
Chinese (zh)
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CN101795961A (zh
Inventor
莫塞斯·M·大卫
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of CN101795961A publication Critical patent/CN101795961A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0015—Production of aperture devices, microporous systems or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Micromachines (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
CN2008801060642A 2007-09-06 2008-09-02 用于制备微结构化制品的工具 Expired - Fee Related CN101795961B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US96762207P 2007-09-06 2007-09-06
US60/967,622 2007-09-06
PCT/US2008/075021 WO2009032815A1 (en) 2007-09-06 2008-09-02 Tool for making microstructured articles

Publications (2)

Publication Number Publication Date
CN101795961A CN101795961A (zh) 2010-08-04
CN101795961B true CN101795961B (zh) 2013-05-01

Family

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CN2008801060642A Expired - Fee Related CN101795961B (zh) 2007-09-06 2008-09-02 用于制备微结构化制品的工具

Country Status (5)

Country Link
US (1) US20100308497A1 (https=)
EP (1) EP2205521A4 (https=)
JP (1) JP2010537843A (https=)
CN (1) CN101795961B (https=)
WO (1) WO2009032815A1 (https=)

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CN104813232A (zh) * 2012-09-28 2015-07-29 纳幕尔杜邦公司 包含具有其上设置可成像的可交联含氟聚合物膜的基板的可成像制品,以及由其制备的成像制品
US9711744B2 (en) * 2012-12-21 2017-07-18 3M Innovative Properties Company Patterned structured transfer tape
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US10687642B2 (en) 2016-02-05 2020-06-23 Havi Global Solutions, Llc Microstructured packaging surfaces for enhanced grip
BR112018070338B1 (pt) 2016-04-07 2022-10-18 Havi Global Solutions, Llc Recipiente flexível para reter fluido
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JP7165719B2 (ja) * 2017-08-04 2022-11-04 スリーエム イノベイティブ プロパティズ カンパニー 平坦性が向上された微細複製研磨表面
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EP3877454B1 (en) 2018-11-09 2026-04-29 3M Innovative Properties Company Nanostructured optical films and intermediates
WO2021033162A1 (en) 2019-08-20 2021-02-25 3M Innovative Properties Company Microstructured surface with increased microorganism removal when cleaned, articles and methods
US12434427B2 (en) 2019-08-20 2025-10-07 Solventum Intellectual Properties Company Microstructured surface with increased microorganism removal when cleaned, articles and methods
US11766822B2 (en) 2019-08-20 2023-09-26 3M Innovative Properties Company Microstructured surface with increased microorganism removal when cleaned, articles and methods
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WO2022137063A1 (en) 2020-12-21 2022-06-30 3M Innovative Properties Company Superhydrophobic films
WO2022162528A1 (en) 2021-01-28 2022-08-04 3M Innovative Properties Company Microstructured surface with increased microorganism removal when cleaned, articles and methods
EP4401946A1 (en) 2021-09-14 2024-07-24 Solventum Intellectual Properties Company Articles including a microstructured curved surface and methods of making same
WO2024141815A1 (en) 2022-12-28 2024-07-04 3M Innovative Properties Company Multilayered articles including a uv barrier layer
CN120936479A (zh) 2023-04-14 2025-11-11 舒万诺知识产权公司 适于热成形的多层聚合物膜、方法和制品

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