CN101762987B - 微光刻投射曝光设备的照明系统 - Google Patents

微光刻投射曝光设备的照明系统 Download PDF

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Publication number
CN101762987B
CN101762987B CN200910262203.7A CN200910262203A CN101762987B CN 101762987 B CN101762987 B CN 101762987B CN 200910262203 A CN200910262203 A CN 200910262203A CN 101762987 B CN101762987 B CN 101762987B
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CN
China
Prior art keywords
illuminator
light beam
pupil surface
light
system pupil
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CN200910262203.7A
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English (en)
Chinese (zh)
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CN101762987A (zh
Inventor
达米安·菲奥尔卡
拉尔夫·米勒
安德拉斯·梅杰
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
CN200910262203.7A 2008-12-23 2009-12-22 微光刻投射曝光设备的照明系统 Active CN101762987B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP20080022311 EP2202580B1 (fr) 2008-12-23 2008-12-23 Système d'illumination d'un appareil d'exposition à projection micro-lithographique
EP08022311.8 2008-12-23

Publications (2)

Publication Number Publication Date
CN101762987A CN101762987A (zh) 2010-06-30
CN101762987B true CN101762987B (zh) 2014-12-31

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ID=40639761

Family Applications (1)

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CN200910262203.7A Active CN101762987B (zh) 2008-12-23 2009-12-22 微光刻投射曝光设备的照明系统

Country Status (5)

Country Link
US (2) US7782443B2 (fr)
EP (2) EP2202580B1 (fr)
JP (1) JP5599606B2 (fr)
CN (1) CN101762987B (fr)
TW (1) TWI485527B (fr)

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JP5611443B2 (ja) * 2010-12-28 2014-10-22 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の照明系
JP5868492B2 (ja) * 2011-05-06 2016-02-24 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の照明系
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FR2996016B1 (fr) * 2012-09-25 2014-09-19 Sagem Defense Securite Illuminateur de photolithographie telecentrique selon deux directions
WO2014056513A1 (fr) * 2012-10-08 2014-04-17 Carl Zeiss Smt Gmbh Système d'éclairage d'appareil d'exposition par projection microlithographique
KR101992516B1 (ko) * 2012-10-08 2019-06-24 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 장치의 작동 방법
DE102013202948A1 (de) * 2013-02-22 2014-09-11 Carl Zeiss Smt Gmbh Beleuchtungssystem für eine EUV-Lithographievorrichtung und Facettenspiegel dafür
DE102014203041A1 (de) 2014-02-19 2015-08-20 Carl Zeiss Smt Gmbh Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage und Verfahren zum Betreiben eines solchen
DE102014203040A1 (de) * 2014-02-19 2015-08-20 Carl Zeiss Smt Gmbh Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage und Verfahren zum Betreiben eines solchen
WO2016045945A1 (fr) * 2014-09-26 2016-03-31 Asml Netherlands B.V. Appareil d'inspection et procédé de fabrication de dispositif
CN109690402A (zh) * 2016-07-21 2019-04-26 凸版印刷株式会社 光掩模、光掩模制造方法、以及使用光掩模的滤色器的制造方法
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JP7014226B2 (ja) * 2017-05-01 2022-02-01 株式会社ニコン 加工装置
WO2023117611A1 (fr) * 2021-12-23 2023-06-29 Asml Netherlands B.V. Systèmes et procédés de génération de multiples points d'éclairage à partir d'une seule source d'éclairage

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EP1262836A1 (fr) * 2001-06-01 2002-12-04 Asml Appareil lithographique
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Also Published As

Publication number Publication date
US20100277708A1 (en) 2010-11-04
TWI485527B (zh) 2015-05-21
US7782443B2 (en) 2010-08-24
TW201027273A (en) 2010-07-16
EP2317386A2 (fr) 2011-05-04
CN101762987A (zh) 2010-06-30
JP5599606B2 (ja) 2014-10-01
EP2202580B1 (fr) 2011-06-22
US20100157268A1 (en) 2010-06-24
EP2202580A1 (fr) 2010-06-30
EP2317386A3 (fr) 2011-06-01
EP2317386B1 (fr) 2012-07-11
US9013680B2 (en) 2015-04-21
JP2010153875A (ja) 2010-07-08

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