WO2013115208A1 - Système optique de transmission, système optique d'éclairage, dispositif d'exposition et procédé de fabrication d'un dispositif - Google Patents

Système optique de transmission, système optique d'éclairage, dispositif d'exposition et procédé de fabrication d'un dispositif Download PDF

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Publication number
WO2013115208A1
WO2013115208A1 PCT/JP2013/051960 JP2013051960W WO2013115208A1 WO 2013115208 A1 WO2013115208 A1 WO 2013115208A1 JP 2013051960 W JP2013051960 W JP 2013051960W WO 2013115208 A1 WO2013115208 A1 WO 2013115208A1
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Prior art keywords
optical system
light
illumination
incident
working surface
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PCT/JP2013/051960
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English (en)
Japanese (ja)
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小松田　秀基
範夫 三宅
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株式会社ニコン
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Publication of WO2013115208A1 publication Critical patent/WO2013115208A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0905—Dividing and/or superposing multiple light beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Definitions

  • the present invention relates to a transmission optical system, an illumination optical system, an exposure apparatus, and a device manufacturing method.
  • a light source emitted from a light source is a secondary light source (generally a surface light source consisting of a number of light sources via a fly-eye lens as an optical integrator).
  • a secondary light source generally a surface light source consisting of a number of light sources via a fly-eye lens as an optical integrator.
  • Form a predetermined light intensity distribution in the illumination pupil is referred to as “pupil intensity distribution”.
  • the illumination pupil is a position where the illumination surface becomes the Fourier transform plane of the illumination pupil by the action of the optical system between the illumination pupil and the illumination surface (a mask or a wafer in the case of an exposure apparatus). Defined.
  • the mask on which a predetermined pattern is formed is illuminated in a superimposed manner.
  • the light transmitted through the mask forms an image on the wafer via the projection optical system, and the mask pattern is projected and exposed (transferred) onto the wafer.
  • the pattern formed on the mask is miniaturized, and it is indispensable to obtain a uniform illuminance distribution on the wafer in order to accurately transfer the fine pattern onto the wafer.
  • an illumination optical system capable of continuously changing the pupil intensity distribution (and consequently the illumination condition) without using a zoom optical system (see, for example, Patent Document 1).
  • an incident light beam is generated using a movable multi-mirror configured by a large number of minute mirror elements that are arranged in an array and whose tilt angle and tilt direction are individually driven and controlled.
  • the cross section of the light beam is converted into a desired shape or a desired size, and thus a desired pupil intensity distribution is realized.
  • the conventional illumination optical system uses a spatial light modulator that has a plurality of mirror elements whose postures are individually controlled, so changes in pupil intensity distribution (changes in external shape, light intensity distribution, polarization state, etc.) ) Has a high degree of freedom.
  • the profile of a beam supplied from a pulse emission type laser light source changes or changes with time by switching the emission frequency.
  • the intensity distribution of the light beam incident on the spatial light modulator also varies with the variation of the beam profile.
  • the present invention has been made in view of the above-described problems, and an object of the present invention is to provide a transmission optical system capable of stably guiding a light beam having a uniform intensity distribution to a spatial light modulator, for example.
  • the present invention also provides an illumination optical system capable of stably forming a desired pupil intensity distribution using a transmission optical system that stably guides a light beam having a uniform intensity distribution to a spatial light modulator, for example.
  • the purpose is to do.
  • the present invention also provides an exposure apparatus and a device manufacturing method capable of transferring a fine pattern to a photosensitive substrate under an appropriate illumination condition using an illumination optical system that stably forms a desired pupil intensity distribution. The purpose is to provide.
  • an illumination optical system illuminates a surface to be illuminated with light from a light source, and the incident light is used to form a pupil intensity distribution on the illumination pupil of the illumination optical system.
  • a transmission optical system that is disposed in the optical path of an illumination optical system having a working surface that emits light having an angular distribution by giving an angular distribution, and guides light from the light source to the working surface
  • a wavefront divider comprising a plurality of optical surfaces arranged along a plane that traverses an optical path of light from the light source and dividing the light from the light source to generate a plurality of light beams;
  • the transmission optical system is characterized in that the plurality of light beams from the wavefront splitter are at least partially overlapped on the working surface.
  • an illumination optical system that illuminates the illuminated surface with light from a light source, and has an action surface that imparts an angular distribution to incident light in order to form a pupil intensity distribution on the illumination pupil of the illumination optical system.
  • the transmission optical system that is arranged in the optical path of the illumination optical system and guides the light from the light source to the working surface, Wavefront split type optical integrator, A relay optical system that at least partially superimposes a plurality of light fluxes wave-divided by the optical integrator on the working surface;
  • the optical integrator and the relay optical system are arranged so that a rear focal position of the optical integrator and a front focal position of the relay optical system coincide with each other.
  • the exposure apparatus accommodated in the first housing including an illumination optical system having an operation surface that imparts an angular distribution to incident light in order to form a pupil intensity distribution on the illumination pupil.
  • a wavefront divider comprising a plurality of optical surfaces for dividing the light from the light source to generate a plurality of light fluxes;
  • a transmission optical system comprising an incident angle adjusting member that is disposed on the incident side of the wavefront divider and adjusts an incident angle of a light beam incident on the wavefront divider.
  • An illumination optical system comprising a plurality of optical elements arranged along the working surface and individually controlled, and a spatial light modulator for spatially modulating and emitting incident light I will provide a.
  • a wavefront divider comprising a plurality of optical surfaces for dividing the light from the light source to generate a plurality of light fluxes;
  • a relay optical system that at least partially superimposes a plurality of light beams that have been wavefront-divided by the wavefront divider on a predetermined surface;
  • a plurality of optical elements arranged along the predetermined plane and individually controlled, and a spatial light modulator for spatially modulating and emitting incident light to form a pupil intensity distribution in the illumination pupil;
  • An illumination optical system comprising: a control unit that controls the plurality of optical elements of the spatial light modulator based on information on the collapse of telecentricity of light incident on the predetermined surface.
  • an exposure apparatus comprising the illumination optical system of the fourth or fifth aspect for illuminating a predetermined pattern, and exposing the predetermined pattern onto a photosensitive substrate.
  • the seventh embodiment using the exposure apparatus of the sixth embodiment, exposing the predetermined pattern to the photosensitive substrate; Developing the photosensitive substrate having the predetermined pattern transferred thereon, and forming a mask layer having a shape corresponding to the predetermined pattern on the surface of the photosensitive substrate; And processing the surface of the photosensitive substrate through the mask layer.
  • a device manufacturing method is provided.
  • FIG. 6 is a diagram plotting the relationship between the variable intervals d1 to d4 and the variable optical path length LT described in Table (1).
  • FIG. 1 is a diagram schematically showing a configuration of an exposure apparatus EX according to the embodiment.
  • the Z-axis is along the normal direction of the transfer surface (exposure surface) of the wafer W, which is a photosensitive substrate, and the Y-axis is in the direction parallel to the paper surface of FIG.
  • the X axis is set in a direction perpendicular to the paper surface of FIG.
  • exposure light (illumination light) is supplied from a light source LS.
  • the light source LS for example, an ArF excimer laser light source that supplies pulsed light with a wavelength of 193 nm, a KrF excimer laser light source that supplies pulsed light with a wavelength of 248 nm, or the like can be used.
  • the light source LS is housed in a housing different from the housing in which the exposure apparatus EX is housed.
  • Light emitted from the light source LS in the ⁇ Y direction is incident on the spatial light modulator 2 in the exposure apparatus EX via the transmission optical system 1.
  • the spatial light modulator 2 is based on a plurality of mirror elements arranged in a predetermined plane and individually controlled, and a control signal from a control system CR that comprehensively controls the operation of the exposure apparatus. And a drive unit that individually controls and drives the postures of the plurality of mirror elements.
  • the array surface of the plurality of mirror elements of the spatial light modulator 2 (hereinafter referred to as “spatial light modulator array surface”) has pupil intensity distribution on the illumination pupil of the illumination optical system (1 to 7) including the transmission optical system 1 In order to form an angle distribution to incident light.
  • the transmission optical system 1 includes a parallel plane plate 10 that can be rotated around two axes manually or automatically (for example, electrically).
  • the parallel plane plate 10 is configured to be rotatable around, for example, a first axis extending in the X direction and a second axis perpendicular to the first axis on the surface of the parallel plane plate 10.
  • the plane parallel plate 10 as a herbing member rotates about two axes as necessary, and emits light incident along the optical axis AX from the light source LS in the X direction and / or the Z direction.
  • the light that has passed through the plane-parallel plate 10 is attenuated by an attenuator 11 whose tilt angle with respect to the optical axis AX is variable, and after the light intensity has been reduced to a required level, an adjustment tilt mirror that can be rotated around two axes manually or automatically. 12 is incident.
  • the adjustment tilt mirror 12 is configured to be rotatable around, for example, a first axis extending in the X direction and a second axis perpendicular to the first axis on the reflection surface of the adjustment tilt mirror 12.
  • the adjustment tilt mirror 12 rotates around two axes as necessary to change the direction of reflected light along the XZ plane and / or the direction of reflected light along the YZ plane.
  • the light reflected in the + Z direction by the adjusting tilt mirror 12 is incident on a fly's eye optical system 13 including a pair of lens array members 13a and 13b arranged at an interval in the optical axis AX direction.
  • the lens array members 13a and 13b are configured by a plurality of lens elements (refractive optical elements) arranged in parallel in a dense and vertical manner along a plane perpendicular to the optical axis AX.
  • the lens element 13aa constituting the first lens array member 13a is a positive lens element having a spherical entrance surface and a planar exit surface, and is a spatial light modulator.
  • 2 has a rectangular cross-sectional shape substantially similar to the outer shape of the effective reflection region on the two arrangement surfaces.
  • the lens element 13ba constituting the second lens array member 13b is a positive lens element having a planar entrance surface and a spherical exit surface, and has a rectangular cross-sectional shape corresponding to the lens element 13aa.
  • the rear focal position of the fly-eye optical system 13 is on the rear side (exit side) with respect to the second lens array member 13b. By setting the rear focal position of the fly-eye optical system 13 outside the lens elements 13aa and 13ba, damage to the lens elements 13aa and 13ba due to irradiation energy can be avoided.
  • the rear focal position of the fly-eye optical system 13 may be between the first lens array member 13a and the second lens array member 13b.
  • the light beam incident on the fly-eye optical system 13 as a wavefront division type optical integrator is two-dimensionally divided on the incident surface of the first lens array member 13a and passes through the second lens array member 13b, for example, the fly-eye optical system.
  • a plurality of small light sources arranged two-dimensionally along the rear focal plane of 13 are formed. Light from a plurality of small light sources illuminates the array surface (working surface) of the spatial light modulator 2 in a superimposed manner via the relay optical system 14 including the front lens group 14a and the rear lens group 14b. The distance between the front lens group 14a and the rear lens group 14b is variable. The specific configuration and operation of the relay optical system 14 will be described later.
  • a plurality of incident surfaces of the first lens array member 13a of the fly-eye optical system 13 are arranged along a plane crossing the optical path of the light from the light source, and generate a plurality of light beams by dividing the light from the light source.
  • the fly's eye optical system 13 can be regarded as a wavefront divider having a plurality of these optical surfaces.
  • the numerical aperture of the fly eye optical system 13 is set to a value larger than the sine of the divergence angle of the light beam incident on the fly eye optical system 13.
  • an electric tilt mirror 15a that is rotatable about two axes in accordance with a command from the control system CR is disposed.
  • an electric tilt mirror 15b that can be rotated around two axes in accordance with a command from the control system CR is disposed.
  • the electric tilt mirrors 15a and 15b are configured to be rotatable around, for example, a first axis extending in the X direction and a second axis orthogonal to the first axis on the reflection surface of the electric tilt mirrors 15a and 15b.
  • the electric tilt mirrors 15a and 15b are rotated around two axes according to a command from the control system CR as necessary to change the direction of reflected light along the XZ plane and / or the direction of reflected light along the YZ plane. .
  • the light that has passed through the relay optical system 14 and the electric tilt mirror 15b is incident on the beam splitter 17 via a parallel plane plate 16 that can be rotated around two axes manually or automatically.
  • the parallel plane plate 16 is configured to be rotatable around, for example, a first axis extending in the X direction and a second axis perpendicular to the first axis on the surface of the parallel plane plate 16. Yes.
  • the plane parallel plate 16 serving as a herbing member rotates around two axes as necessary, and emits light incident along the optical axis AX while being translated in the X direction and / or the Y direction.
  • the light transmitted through the beam splitter 17 enters the spatial light modulator 2 as described above.
  • the light reflected by the beam splitter 17, that is, the light extracted from the illumination optical path by the beam splitter 17 enters the beam monitor 18.
  • the beam monitor 18 is based on the light extracted from the illumination optical path, the position of the light incident on the spatial light modulator 2 in the arrangement plane, the angle of the light incident on the spatial light modulator 2 with respect to the arrangement plane, and the spatial light.
  • the light intensity distribution on the arrangement surface of the modulator 2 is monitored.
  • the monitoring result of the beam monitor 18 is supplied to the control system CR.
  • the control system CR controls the transmission optical system 1 and the spatial light modulator 2 based on the output of the beam monitor 18.
  • the beam monitor 18 includes a position monitor 18a, an angle monitor 18b, and an intensity distribution monitor 18c.
  • the position monitor 18a measures the position in the plane crossing the optical path of the light incident on the working surface of the spatial light modulator 2 (and thus the incident position of the light on the array surface of the spatial light modulator 2).
  • the angle monitor 18b measures the angle of the light incident on the working surface of the spatial light modulator 2 with respect to the working surface (that is, the incident angle of light on the arrangement surface of the light incident on the spatial light modulator 2).
  • the intensity distribution monitor 18 c measures the light intensity distribution on the arrangement surface of the spatial light modulator 2.
  • the position monitor 18a and the intensity distribution monitor 18c are optically conjugate with the arrangement surface of the spatial light modulator 2 (the optically Fourier transform relationship with respect to the rear focal position of the fly-eye optical system 13).
  • the angle monitor 18b is a photoelectric sensor disposed at a position (optically conjugate with the rear focal position of the fly-eye optical system 13) that is optically Fourier-transformed with respect to the arrangement surface of the spatial light modulator 2.
  • An imaging unit having a conversion surface is provided.
  • the internal configuration of the beam monitor 18 is disclosed in, for example, US Patent Publication No. 2011/0069305.
  • the fly eye optical system 13 and the relay optical system 14 are arranged so that the rear focal position of the fly eye optical system 13 and the front focal position of the relay optical system 14 coincide.
  • the light from each small light source formed on the rear focal plane of the fly-eye optical system 13 becomes parallel light via the relay optical system 14 and enters the array surface of the spatial light modulator 2.
  • a divergent light group from a small light source on the optical axis AX enters the array surface of the spatial light modulator 2 as a light group parallel to the optical axis AX via the relay optical system 14. .
  • the light from the plurality of small light sources formed by the fly-eye optical system 13 illuminates the array surface (working surface) of the spatial light modulator 2 via the relay optical system 14 in a superimposed manner.
  • the arrangement surface (action surface) of the spatial light modulator 2 may be partially superimposed and illuminated by each of the light from the plurality of small light sources.
  • the light emitted from the spatial light modulator 2 in the + Y direction is incident on the micro fly's eye lens (or fly eye lens) 4 via the relay lens 3.
  • the relay lens 3 has a front focal position located near the arrangement surface of the spatial light modulator 2 and a rear focal position located near the incident surface of the micro fly's eye lens 4. 2 and the incident surface of the micro fly's eye lens 4 are optically set in a Fourier transform relationship. Therefore, the light passing through the spatial light modulator 2 variably distributes the light intensity corresponding to the postures of the plurality of mirror elements on the incident surface of the micro fly's eye lens 4 as will be described later.
  • the position of the incident surface of the micro fly's eye lens 4 is almost optically conjugate with the rear focal position of the fly's eye optical system 13.
  • the micro fly's eye lens 4 is, for example, an optical element made up of a large number of micro lenses having positive refractive power arranged vertically and horizontally and densely.
  • the micro fly's eye lens 4 is formed by etching a parallel plane plate to form a micro lens group.
  • a micro fly's eye lens unlike a fly eye lens composed of lens elements isolated from each other, a large number of micro lenses (micro refractive surfaces) are integrally formed without being isolated from each other.
  • the micro fly's eye lens is the same wavefront division type optical integrator as the fly's eye lens in that the lens elements are arranged vertically and horizontally.
  • a rectangular minute refracting surface as a unit wavefront dividing surface in the micro fly's eye lens 4 is a rectangular shape similar to the shape of the illumination field to be formed on the mask M (and thus the shape of the exposure region to be formed on the wafer W). It is.
  • a cylindrical micro fly's eye lens can be used as the micro fly's eye lens 4. The configuration and operation of the cylindrical micro fly's eye lens are disclosed in, for example, US Pat. No. 6,913,373.
  • the light beam incident on the micro fly's eye lens 4 is two-dimensionally divided by a large number of microlenses, and the light intensity distribution that is substantially the same as the light intensity distribution formed on the incident surface is formed on the rear focal plane or in the vicinity of the illumination pupil.
  • a secondary light source substantially surface light source consisting of a large number of small light sources: pupil intensity distribution
  • the light from the secondary light source formed on the illumination pupil immediately after the micro fly's eye lens 4 illuminates the mask blind 6 in a superimposed manner via the condenser optical system 5.
  • a rectangular illumination field corresponding to the shape and focal length of the rectangular micro-refractive surface of the micro fly's eye lens 4 is formed on the mask blind 6 as an illumination field stop.
  • the aperture (light) having a shape corresponding to the secondary light source is located at or near the rear focal plane of the micro fly's eye lens 4, that is, at a position optically conjugate with an entrance pupil plane of the projection optical system PL described later.
  • An illumination aperture stop having a transmission part may be arranged.
  • the light beam that has passed through the rectangular opening (light transmitting portion) of the mask blind 6 is subjected to the condensing action of the imaging optical system 7 and is reflected by the optical path bending mirror disposed in the optical path of the imaging optical system 7. After being reflected in the ⁇ Z direction, the mask M on which a predetermined pattern is formed is illuminated in a superimposed manner. That is, the imaging optical system 7 forms an image of the rectangular opening of the mask blind 6 on the mask M.
  • the light beam transmitted through the mask M held on the mask stage MS forms an image of a mask pattern on the wafer (photosensitive substrate) W held on the wafer stage WS through the projection optical system PL.
  • batch exposure or scan exposure is performed while the wafer stage WS is two-dimensionally driven and controlled in a plane (XY plane) orthogonal to the optical axis AX of the projection optical system PL, and thus the wafer W is two-dimensionally driven and controlled.
  • the pattern of the mask M is sequentially exposed in each exposure region of the wafer W.
  • the exposure apparatus EX of the present embodiment measures the first pupil intensity distribution that measures the pupil intensity distribution on the exit pupil plane of the illumination optical system based on the light via the illumination optical system (1 to 7) including the transmission optical system 1.
  • a second pupil intensity distribution measuring unit DTw that measures the pupil intensity distribution on the pupil plane of the projection optical system PL (the exit pupil plane of the projection optical system PL) based on the light through the projection optical system PL,
  • a control system CR that controls the spatial light modulator 2 based on the measurement result of at least one of the first and second pupil intensity distribution measurement units DTr and DTw, and controls the overall operation of the exposure apparatus. .
  • the first pupil intensity distribution measurement unit DTr includes, for example, an imaging unit having a photoelectric conversion surface disposed at a position optically conjugate with the exit pupil position of the illumination optical system, and each point on the surface to be irradiated by the illumination optical system. Is monitored (pupil intensity distribution formed at the exit pupil position of the illumination optical system by light incident on each point).
  • the second pupil intensity distribution measurement unit DTw includes an imaging unit having a photoelectric conversion surface arranged at a position optically conjugate with the pupil position of the projection optical system PL, for example, and includes each image plane of the projection optical system PL. The pupil intensity distribution related to the points (pupil intensity distribution formed by the light incident on each point at the pupil position of the projection optical system PL) is monitored.
  • the secondary light source formed by the micro fly's eye lens 4 is used as a light source, and the mask M (and thus the wafer W) disposed on the irradiated surface of the illumination optical system is Koehler illuminated.
  • the position where the secondary light source is formed is optically conjugate with the position of the aperture stop AS of the projection optical system PL, and the formation surface of the secondary light source can be called the illumination pupil plane of the illumination optical system.
  • the image of the formation surface of the secondary light source can be called an exit pupil plane of the illumination optical system.
  • the irradiated surface (the surface on which the mask M is disposed or the surface on which the wafer W is disposed when the illumination optical system including the projection optical system PL is considered) is optical with respect to the illumination pupil plane.
  • the pupil intensity distribution is a light intensity distribution (luminance distribution) on the illumination pupil plane of the illumination optical system or a plane optically conjugate with the illumination pupil plane.
  • the relay lens 3 and the micro fly's eye lens 4 include a distribution forming optical system that forms a pupil intensity distribution on the illumination pupil immediately after the micro fly's eye lens 4 based on the light beam that has passed through the spatial light modulator 2. It is composed.
  • the spatial light modulator 2 includes a plurality of mirror elements 2a arranged in a predetermined plane, a base 2b holding the plurality of mirror elements 2a, and a cable (not shown) connected to the base 2b. ) Through which the plurality of mirror elements 2a are individually controlled and driven.
  • FIG. 4 shows an optical path from the spatial light modulator 2 to the incident surface 4 a of the micro fly's eye lens 4.
  • the attitude of the plurality of mirror elements 2a is changed by the action of the drive unit 2c that operates based on a command from the control system CR, and each mirror element 2a is set in a predetermined direction.
  • the spatial light modulator 2 includes a plurality of minute mirror elements 2a arranged two-dimensionally, and the spatial modulation according to the incident position of the incident light can be varied. Is applied and injected.
  • the number of mirror elements 2a is typically large, typically about 4000 to 100,000.
  • the light beam L1 is incident on the mirror element SEa of the plurality of mirror elements 2a, and the light beam L2 is incident on the mirror element SEb different from the mirror element SEa.
  • the light beam L3 is incident on a mirror element SEc different from the mirror elements SEa and SEb, and the light beam L4 is incident on a mirror element SEd different from the mirror elements SEa to SEc.
  • the mirror elements SEa to SEd give spatial modulations set according to their positions to the lights L1 to L4.
  • the spatial light modulator 2 in a reference state in which the reflecting surfaces of all the mirror elements 2a are set along one plane, a light beam incident along a direction parallel to the optical axis AX of the transmission optical system 1 After being reflected by the light modulator 2, the light travels in a direction parallel to the optical axis AX of the relay lens 3. Further, as described above, the array surface of the plurality of mirror elements 2 a of the spatial light modulator 2 and the incident surface 4 a of the micro fly's eye lens 4 are optically positioned in a Fourier transform relationship via the relay lens 3. ing.
  • the relay lens 3 determines the angle that the plurality of mirror elements SEa to SEd of the spatial light modulator 2 gives to the emitted light on the incident surface 4a that is the far field (Fraunhofer diffraction region) of the spatial light modulator 2. Convert to position.
  • the light intensity distribution (pupil intensity distribution) of the secondary light source formed by the micro fly's eye lens 4 is the light intensity distribution formed on the incident surface 4 a of the micro fly's eye lens 4 by the spatial light modulator 2 and the relay lens 3. Corresponding distribution.
  • the spatial light modulator 2 is a large number of minute reflecting elements regularly and two-dimensionally arranged along one plane with a planar reflecting surface as the upper surface.
  • a movable multi-mirror including a mirror element 2a.
  • Each mirror element 2a is movable, and the inclination of the reflection surface, that is, the inclination angle and the inclination direction of the reflection surface are independently controlled by the action of the drive unit 2c that operates based on the control signal from the control system CR.
  • Each mirror element 2a can be rotated continuously or discretely by a desired rotation angle with two directions parallel to the reflecting surface and orthogonal to each other as rotation axes. That is, it is possible to two-dimensionally control the inclination of the reflecting surface of each mirror element 2a.
  • each mirror element 2a When the reflecting surface of each mirror element 2a is discretely rotated, the rotation angle is set in a plurality of states (for example,..., -2.5 degrees, -2.0 degrees, ... 0 degrees, +0.5 degrees). ... +2.5 degrees,.
  • FIG. 5 shows a mirror element 2a having a square outer shape
  • the outer shape of the mirror element 2a is not limited to a square.
  • the shape can be arranged so that the gap between the mirror elements 2a is reduced (a shape that can be packed most closely). Further, from the viewpoint of light utilization efficiency, the interval between two adjacent mirror elements 2a can be minimized.
  • the spatial light modulator 2 for example, a spatial light modulator that continuously changes the directions of a plurality of mirror elements 2a arranged two-dimensionally is used.
  • a spatial light modulator for example, European Patent Publication No. 779530, US Pat. No. 5,867,302, US Pat. No. 6,480,320, US Pat. No. 6,600,591 U.S. Patent No. 6,733,144, U.S. Patent No. 6,900,915, U.S. Patent No. 7,095,546, U.S. Patent No. 7,295,726, U.S. Patent No. 7, No. 424,330, U.S. Patent No. 7,567,375, U.S. Patent Publication No. 2008/0309901, U.S.
  • Patent Publication No. 2011/0181852 U.S. Patent Publication No. 2011/188017, and JP-A-2006.
  • the spatial light modulator disclosed in Japanese Patent Application No. -1143737 can be used. Note that the orientations of the plurality of mirror elements 2a arranged two-dimensionally may be controlled so as to have a plurality of discrete stages.
  • the attitude of the plurality of mirror elements 2a is changed by the action of the drive unit 2c that operates according to the control signal from the control system CR, and each mirror element 2a is set in a predetermined direction.
  • the light reflected at a predetermined angle by each of the plurality of mirror elements 2a of the spatial light modulator 2 is applied to the incident surface 4a of the micro fly's eye lens 4 (to the illumination pupil) by the optical Fourier transform action by the relay lens 3.
  • the relay lens 3 can be regarded as having an action of converting the angle change of the light emitted from the spatial light modulator 2 into the position change on the incident surface 4 a of the micro fly's eye lens 4.
  • the desired pupil intensity distribution is also formed at the (position).
  • the spatial light modulator 2 variably forms a pupil intensity distribution on the illumination pupil immediately after the micro fly's eye lens 4.
  • the relay lens 3 converts the angular distribution of the emitted light beam from the spatial light modulator 2 into a position distribution in the cross section of the emitted light beam from the distribution forming optical system.
  • the main body of the exposure apparatus EX that is, the part from the spatial light modulator 2 to the wafer stage WS is a considerably large apparatus as a whole, and requires a large floor area for installation.
  • An ArF excimer laser light source (or KrF excimer laser light source) used as a light source LS for supplying exposure light (illumination light) to the exposure apparatus EX is also a considerably large apparatus. Therefore, in an exposure apparatus using an excimer laser light source, the light source LS is often arranged at a certain distance from the exposure apparatus main body (2 to WS).
  • an exposure apparatus main body (EX; 2 to WS) is installed on the upper floor where the light source LS is installed, and the light emitted from the light output port of the light source LS is exposed via the transmission optical system 1.
  • the light is guided to the arrangement surface (working surface) of the spatial light modulator 2 arranged at the light inlet of the apparatus main body (EX; 2 to WS).
  • the optical path from the light output port of the light source LS to the arrangement surface of the spatial light modulator 2 is relatively long, and the optical path length may differ for each exposure apparatus.
  • the transmission optical system 1 of the present embodiment includes a first transmission unit 1A extending from the plane parallel plate 10 to the electric tilt mirror 15a, and a second transmission unit 1B extending from the rear lens group 14b of the relay optical system 14 to the beam splitter 17.
  • the connection portion 1C is provided between the housing of the first transmission unit 1A and the housing of the second transmission unit 1B and is formed of, for example, a hollow pipe.
  • the relay optical system 14 the distance along the optical axis AX between the front lens group 14a and the rear lens group 14b (for example, the distance along the Y direction between the first transmission unit 1A and the second transmission unit 1B) is the relay. It changes according to the change in the optical path length of the optical path from the rear focal position of the fly-eye optical system 13 to the arrangement surface of the spatial light modulator 2 while keeping the focal length of the optical system 14 constant.
  • the distance along the Y direction between the first transmission unit 1A and the second transmission unit 1B is changed, and the optical axis AX of the front lens group 14a and the rear lens group 14b of the relay optical system 14 is changed.
  • Changing the interval is nothing but changing the optical path length from the light output port of the light source LS to the array surface of the spatial light modulator 2.
  • Keeping the focal length of the relay optical system 14 constant means that the outer shape of the light beam superimposed on the arrangement surface of the spatial light modulator 2 is constant according to the outer shape of the effective reflection area on the arrangement surface of the spatial light modulator 2. Means to hold on.
  • a specific configuration example and operation of the relay optical system 14 will be described.
  • FIG. 6 is a diagram schematically showing the lens configuration of a relay optical system arranged in the optical path of the transmission optical system.
  • the optical path from the rear focal plane 13c of the fly-eye optical system 13 to the array plane 2d of the spatial light modulator 2 is shown in a straight line, and the electric tilt mirrors 15a and 15b, the parallel plane plate 16, and The illustration of the beam splitter 17 is omitted.
  • the array surface 2 d of the spatial light modulator 2 is represented by a surface orthogonal to the optical axis AX.
  • the front lens group 14a includes a biconvex lens L11, a biconcave lens L12, a biconcave lens L13, and a biconvex lens L14 in order from the light incident side (rear focal plane 13c side). It is composed of
  • the rear lens group 14b includes a biconvex lens L21 and a biconcave lens L22 in order from the light incident side.
  • the biconvex lens L11 of the front lens group 14a and the biconcave lens L22 of the rear lens group 14b are fixed along the optical axis AX. That is, the axial distance between the rear focal plane 13c of the fly-eye optical system 13 and the biconvex lens L11 and the axial distance between the biconcave lens L22 and the array surface 2d of the spatial light modulator 2 are unchanged.
  • the lenses other than the biconvex lens L11 and the biconcave lens L22 that is, the biconcave lens L12, the biconcave lens L13, the biconvex lens L14, and the biconvex lens L21 are movable along the optical axis AX. Accordingly, the axial distance d1 between the biconvex lens L11 and the biconcave lens L12, the axial distance d2 between the biconcave lens L12 and the biconcave lens L13, the axial distance d3 between the biconcave lens L13 and the biconvex lens L14, the biconvex lens L14 and the biconvex lens.
  • the axial distance ds from L21, the axial distance d4 between the biconvex lens L21 and the biconcave lens L22, and the optical path length LT from the rear focal plane 13c of the fly-eye optical system 13 to the array plane 2d of the spatial light modulator 2 are as follows: It is variable. All the lenses L11 to L14, L21 and L22 are made of fluorite.
  • the following table (1) lists the values of the specifications of the relay optical system according to the example of FIG.
  • fr represents the focal length.
  • the surface number is an optical surface along the traveling direction of light from the rear focal plane 13c of the fly-eye optical system 13 to the array surface 2d of the spatial light modulator 2.
  • FIG. 7 is a graph plotting the relationship between the variable intervals d1 to d4 described in Table (1) and the variable optical path length LT.
  • FIG. 8 is a graph plotting the relationship between the variable interval ds and the variable optical path length LT described in Table (1). 7 and 8, the unit of the variable intervals d1 to d4, ds is mm, and the unit of the variable optical path length LT is m.
  • the spatial light modulator is controlled from the rear focal plane 13c of the fly-eye optical system 13 while keeping the focal length fr constant at 5000 mm.
  • the optical path length LT to the second arrangement surface 2d can be changed between 6 m and 15 m.
  • the front lens group 14a in order from the light incident side, the front lens group 14a has a positive / negative / negative / positive refractive power arrangement, and the rear lens group 14b has a positive / negative refraction.
  • the refractive power arrangement of the front lens group 14a and the rear lens group 14b is not limited to this.
  • the two negative groups (biconcave lens L12 and biconcave lens L13) and the most positive side positive group (biconvex lens L14) in the front lens group 14a are movable groups.
  • the positive group (biconvex lens L21) in the side lens group 14b is a movable group
  • the movable group when the optical path length is changed is not limited to this example.
  • the length of the connection unit 1C that connects the first and second transmission units 1A and 1B is changed. Needless to say.
  • the plurality of partial light beams that have been wavefront-divided by the fly-eye optical system 13 are arranged on the array surface (working surface) of the spatial light modulator 2 via the relay optical system 14. ). Accordingly, light having a non-uniform beam profile emitted from the light source LS becomes light with improved intensity distribution due to the action of the fly-eye optical system 13 and is incident on the working surface of the spatial light modulator 2. . That is, by the action of the fly-eye optical system 13, the light intensity distribution of the light beam incident on each mirror element 2a of the spatial light modulator 2 is made uniform, and as a result, the light intensity distribution of the light beam emitted from each mirror element 2a is also uniform. It becomes. As a result, the controllability of the spatial light modulator 2 to drive a large number of mirror elements 2a when forming the pupil intensity distribution is improved.
  • the rear focal position of the fly-eye optical system 13 and the front focal position of the relay optical system 14 are the same.
  • the controllability of the spatial light modulator 2 is improved.
  • a light beam having a substantially uniform intensity distribution can be stably guided to the working surface of the spatial light modulator 2, and the controllability of the spatial light modulator 2 is improved. Can do.
  • the transmission optical system 1 that stably guides a light beam having a substantially uniform intensity distribution to the working surface of the spatial light modulator 2 is used.
  • a desired pupil intensity distribution can be stably formed in the illumination pupil immediately after.
  • the illumination optical system (2 to 7) that stably forms a desired pupil intensity distribution is used according to the pattern characteristics of the mask M to be transferred. The fine pattern can be accurately transferred onto the wafer W under the appropriate illumination conditions realized.
  • the control result of the light intensity distribution on the arrangement surface of the spatial light modulator 2 is supplied to the controller CR from the intensity distribution monitor 18c of the beam monitor 18 as necessary.
  • the controller CR refers to the monitor result regarding the light intensity distribution of the intensity distribution monitor 18c as needed, and appropriately controls the spatial light modulator 2 according to the temporal variation of the beam profile of the light supplied from the light source LS. By doing so, a desired pupil intensity distribution can be stably formed.
  • an attenuator that is disposed closer to the light source than the fly-eye optical system 13 and has a variable inclination angle with respect to the optical axis AX as a light amount adjusting member that adjusts the amount of light reaching the working surface of the spatial light modulator 2. 11 is provided. Therefore, the durability of the optical member constituting the fly-eye optical system 13 and the film provided on the optical surface thereof can be improved by the dimming action of the attenuator 11. Further, the amount of exposure can be adjusted and stabilized by the dimming action of the attenuator 11. The exposure amount can be adjusted and stabilized by using a neutral density filter provided at an arbitrary position in the optical path of the transmission optical system 1 instead of or in addition to the attenuator.
  • the plane-parallel plate 10 that is disposed on the light source side relative to the fly-eye optical system 13 and that can rotate about two axes, and that is disposed on the light source side relative to the fly-eye optical system 13 and rotates about two axes.
  • An adjustable tilt mirror 12 is provided. Therefore, due to the action of the plane parallel plate 10 as the herbing member and the adjustment tilt mirror 12, the fly-eye optical system 13 is connected so that the center line of the light beam incident on the fly-eye optical system 13 substantially coincides with the optical axis AX. The position and angle of the incident light beam can be adjusted.
  • the transmission optical system 1 includes a parallel flat plate 16 that is disposed closer to the irradiated surface (mask side) than the fly-eye optical system 13 and can rotate about two axes. The position of the incident light beam on the working surface of the spatial light modulator 2 can be adjusted by the action of the parallel flat plate 16 as a herving member.
  • the transmission optical system 1 includes a pair of electric tilt mirrors 15a and 15b that are disposed on the irradiated surface side of the fly-eye optical system 13 and can rotate about two axes. Therefore, referring to the output of the position monitor 18a and the output of the angle monitor 18b, the position variation and angle variation of the light beam incident on the working surface of the spatial light modulator 2 (for example, in the transmission optical system 1 due to minute vibrations or component installation errors). Position fluctuation and angle fluctuation of the luminous flux generated in (1) can be finely adjusted by the cooperative action of the pair of electric tilt mirrors 15a and 15b.
  • the pair of electric tilt mirrors 15a and 15b includes a position adjusting member that adjusts a position in a plane crossing the optical path of light incident on the working surface of the spatial light modulator 2 based on the output of the position monitor 18a, and an angle monitor.
  • An angle adjusting member that adjusts the angle of the light incident on the working surface of the spatial light modulator 2 with respect to the working surface based on the output of 18b is configured. Even if the fly-eye optical system 13 is tilted with respect to the optical axis AX, the function of one electric tilt mirror can be substituted.
  • the rear focal position of the fly-eye optical system 13 and the front focal position of the relay optical system 14 coincide with each other.
  • the formed light from each small light source becomes parallel light and enters the array surface of the spatial light modulator 2.
  • the present invention is not limited to this.
  • FIG. 9 a modified example in which the rear focal position 13c of the fly-eye optical system 13 and the front focal position 14c of the relay optical system 14 do not coincide is possible.
  • the relay optical system 14 is represented by one optical member.
  • the divergent light beam from the small light source on the optical axis AX reaches the array surface of the spatial light modulator 2 through the relay optical system 14 as a light beam having a relatively small divergence angle (or convergence angle). . That is, in the modified example in which the rear focal position of the fly-eye optical system 13 and the front focal position of the relay optical system 14 do not coincide with each other, the telecentricity of the light incident on the arrangement surface of the spatial light modulator 2 is lost. In a reference state in which the light reflected by the light modulator 2 travels in a direction parallel to the optical axis AX of the relay lens 3, the reflecting surfaces of the plurality of mirror elements 2a are concave (or convex) as a whole.
  • the control system CR is incident on the arrangement surface of the spatial light modulator 2 with the state where the reflecting surfaces of the plurality of mirror elements 2 a are generally concave (or convex) as a reference state.
  • the attitudes of the plurality of mirror elements 2a may be controlled based on information on the collapse of the telecentricity of the light to be transmitted.
  • the rear focal position of the fly-eye optical system 13 and the incident surface of the micro fly-eye lens 4 are optically substantially conjugate with each other as in the above-described embodiment. .
  • a sufficiently small conjugate image of each small light source formed on the rear focal plane of the fly-eye optical system 13 is formed on the inside of the unit wavefront dividing surface on the incident surface of the micro fly's eye lens 4.
  • the maximum value of light energy per unit area irradiated on the lens elements 13aa and 13ba constituting the fly-eye optical system 13 is determined per pulse.
  • a pulse-emitting laser light source for example, an excimer laser light source
  • the maximum value of light energy per unit area irradiated on the lens elements 13aa and 13ba constituting the fly-eye optical system 13 is determined per pulse.
  • the focal length of the relay optical system 14 can be set to 2000 mm to 10000 mm, for example. Further, the pitch of the two-dimensional arrangement of the lens elements 13aa and 13ba constituting the fly eye optical system 13 is set to 0.5 mm to 3 mm, for example, and the focal length of the fly eye optical system 13 is set to 80 mm to 400 m, for example. be able to.
  • the fly-eye optical system 13 including the pair of lens array members 13a and 13b is used as the wavefront division type optical integrator.
  • the present invention is not limited to this, and various modifications can be made to the specific configuration of the fly-eye optical system.
  • a fly-eye optical system composed of a single lens array member, a cylindrical micro fly-eye lens, or the like can be used instead of the fly-eye optical system 13.
  • the refractive power of the lens elements 13aa and 13ba of the pair of lens array members 13a and 13b of the fly-eye optical system 13 may be negative refractive power, and their refractive surfaces (lens surfaces) are aspherical. Also good.
  • the fly-eye optical system 13 is not limited to a refractive optical system.
  • a diffractive optical element array in which diffractive optical elements are arranged in an array or a mirror array in which a plurality of mirrors are arranged in an array are used. Can do.
  • the configuration and operation of the cylindrical micro fly's eye lens are disclosed in, for example, US Pat. No. 6,913,373.
  • the spatial light modulator having a plurality of mirror elements that are two-dimensionally arranged and individually controlled the directions (angle: inclination) of the plurality of two-dimensionally arranged reflecting surfaces are individually set.
  • the controllable spatial light modulator 2 is used.
  • a spatial light modulator that can individually control the height (position) of a plurality of two-dimensionally arranged reflecting surfaces can be used.
  • the spatial light modulator disclosed in FIG. 1d of US Pat. No. 5,312,513 and US Pat. No. 6,885,493 can be used.
  • spatial light modulators by forming a two-dimensional height distribution, an action similar to that of the diffractive surface can be given to incident light.
  • the spatial light modulator having a plurality of reflection surfaces arranged two-dimensionally as described above is modified in accordance with the disclosure of, for example, US Pat. No. 6,891,655 and US Patent Publication No. 2005/0095749. May be.
  • a reflective spatial light modulator 2 having a plurality of mirror elements 2a arranged is used.
  • the present invention is not limited to this, and a transmission-type spatial light modulator having a plurality of transmission optical elements arranged in a predetermined plane and individually controlled, and a diffractive optical element having a diffractive optical surface (working surface) Etc. can also be used.
  • variable pattern forming apparatus that forms a predetermined pattern based on predetermined electronic data can be used instead of a mask.
  • a spatial light modulation element including a plurality of reflection elements driven based on predetermined electronic data can be used.
  • An exposure apparatus using a spatial light modulator is disclosed, for example, in US Patent Publication No. 2007/0296936.
  • a transmissive spatial light modulator may be used, or a self-luminous image display element may be used.
  • the exposure apparatus of the above-described embodiment is manufactured by assembling various subsystems including the respective constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Is done.
  • various optical systems are adjusted to achieve optical accuracy
  • various mechanical systems are adjusted to achieve mechanical accuracy
  • various electrical systems are Adjustments are made to achieve electrical accuracy.
  • the assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus.
  • the exposure apparatus may be manufactured in a clean room where the temperature, cleanliness, etc. are controlled.
  • FIG. 10 is a flowchart showing a manufacturing process of a semiconductor device.
  • a metal film is vapor-deposited on a wafer W to be a substrate of the semiconductor device (step S40), and a photoresist, which is a photosensitive material, is applied on the vapor-deposited metal film.
  • Step S42 the pattern formed on the mask (reticle) M is transferred to each shot area on the wafer W (step S44: exposure process), and the wafer W after the transfer is completed.
  • Development that is, development of the photoresist to which the pattern has been transferred (step S46: development process).
  • step S48 processing step.
  • the resist pattern is a photoresist layer in which unevenness having a shape corresponding to the pattern transferred by the projection exposure apparatus of the above-described embodiment is generated, and the recess penetrates the photoresist layer. It is.
  • the surface of the wafer W is processed through this resist pattern.
  • the processing performed in step S48 includes, for example, at least one of etching of the surface of the wafer W or film formation of a metal film or the like.
  • the projection exposure apparatus of the above-described embodiment performs pattern transfer using the wafer W coated with the photoresist as the photosensitive substrate, that is, the plate P.
  • FIG. 11 is a flowchart showing a manufacturing process of a liquid crystal device such as a liquid crystal display element.
  • a pattern formation process step S50
  • a color filter formation process step S52
  • a cell assembly process step S54
  • a module assembly process step S56
  • step S50 a predetermined pattern such as a circuit pattern and an electrode pattern is formed on the glass substrate coated with a photoresist as the plate P using the projection exposure apparatus of the above-described embodiment.
  • the pattern forming step includes an exposure step of transferring the pattern to the photoresist layer using the projection exposure apparatus of the above-described embodiment, and development of the plate P on which the pattern is transferred, that is, development of the photoresist layer on the glass substrate. And a developing step for generating a photoresist layer having a shape corresponding to the pattern, and a processing step for processing the surface of the glass substrate through the developed photoresist layer.
  • a large number of sets of three dots corresponding to R (Red), G (Green), and B (Blue) are arranged in a matrix or three R, G, and B
  • a color filter is formed by arranging a plurality of stripe filter sets in the horizontal scanning direction.
  • a liquid crystal panel liquid crystal cell
  • a liquid crystal panel is assembled using the glass substrate on which the predetermined pattern is formed in step S50 and the color filter formed in step S52.
  • a liquid crystal panel is formed by injecting liquid crystal between a glass substrate and a color filter.
  • various components such as an electric circuit and a backlight for performing the display operation of the liquid crystal panel are attached to the liquid crystal panel assembled in step S54.
  • the present invention is not limited to application to an exposure apparatus for manufacturing a semiconductor device, for example, an exposure apparatus for a display device such as a liquid crystal display element formed on a square glass plate or a plasma display, It can also be widely applied to an exposure apparatus for manufacturing various devices such as an image sensor (CCD or the like), a micromachine, a thin film magnetic head, and a DNA chip. Furthermore, the present invention can also be applied to an exposure process (exposure apparatus) when manufacturing a mask (photomask, reticle, etc.) on which mask patterns of various devices are formed using a photolithography process.
  • an exposure apparatus for manufacturing a semiconductor device for example, an exposure apparatus for a display device such as a liquid crystal display element formed on a square glass plate or a plasma display
  • various devices such as an image sensor (CCD or the like), a micromachine, a thin film magnetic head, and a DNA chip.
  • the present invention can also be applied to an exposure process (exposure apparatus) when manufacturing a mask (photomask,
  • ArF excimer laser light (wavelength: 193 nm) or KrF excimer laser light (wavelength: 248 nm) is used as the exposure light.
  • the present invention is not limited to this, and other suitable pulse lasers are used.
  • a light source for example, an F 2 laser light source that supplies laser light with a wavelength of 157 nm, a Kr 2 laser light source that supplies laser light with a wavelength of 146 nm, an Ar 2 laser light source that supplies laser light with a wavelength of 126 nm, or the like can be used.
  • a CW (Continuous Wave) light source such as an ultrahigh pressure mercury lamp that emits bright lines such as g-line (wavelength 436 nm) and i-line (wavelength 365 nm).
  • a harmonic generator of a YAG laser or the like can also be used.
  • a single wavelength laser beam in an infrared region or a visible region oscillated from a DFB semiconductor laser or a fiber laser is used as vacuum ultraviolet light.
  • a harmonic that is amplified by a fiber amplifier doped with erbium (or both erbium and ytterbium) and wavelength-converted into ultraviolet light using a nonlinear optical crystal may be used.
  • a so-called immersion method is applied in which the optical path between the projection optical system and the photosensitive substrate is filled with a medium (typically liquid) having a refractive index larger than 1.1. You may do it.
  • a technique for filling the liquid in the optical path between the projection optical system and the photosensitive substrate a technique for locally filling the liquid as disclosed in International Publication No. WO99 / 49504, a special technique, A method of moving a stage holding a substrate to be exposed as disclosed in Kaihei 6-124873 in a liquid tank, or a predetermined stage on a stage as disclosed in Japanese Patent Laid-Open No. 10-303114. A method of forming a liquid tank having a depth and holding the substrate therein can be employed.
  • the teachings of WO99 / 49504, JP-A-6-124873 and JP-A-10-303114 are incorporated by reference.
  • the present invention is applied to the illumination optical system that illuminates the mask (or wafer) in the exposure apparatus.
  • the present invention is not limited to this, and an object other than the mask (or wafer) is used.
  • the present invention can also be applied to a general illumination optical system that illuminates the irradiation surface.
  • an illumination optical device that illuminates the illuminated surface with light from a light source, An illumination pupil, and a working surface that emits light having an angular distribution by adding an angular distribution to incident light in order to form a pupil intensity distribution on the illumination pupil with the light from the light source, and the light from the light source
  • a wavefront divider comprising a plurality of optical surfaces arranged along a plane that traverses an optical path of light from the light source and dividing the light from the light source to generate a plurality of light beams;
  • the illumination optical device according to claim 1, wherein the plurality of light beams from the wavefront splitter are at least partially superimposed on the working surface.
  • a relay optical system that at least partially superimposes the plurality of light beams on the working surface;
  • Optical device. 3 The illumination optical system according to clause 2, wherein the relay optical system includes a front lens group and a rear lens group, and an interval between the front lens group and the rear lens group is variable. apparatus. 4).
  • the distance between the front lens group and the rear lens group is an optical path from the rear focal position of the wavefront divider to the working surface while keeping the focal length of the relay optical system constant. 4.
  • the illumination optical apparatus according to clause 3, wherein the illumination optical apparatus is configured to change in accordance with a change in the optical path length of the optical path. 5). 5. The illumination optical apparatus according to clause 3 or 4, wherein the front lens group includes at least one lens configured to be movable in an optical axis direction. 6). 6. The illumination optical apparatus according to any one of clauses 3 to 5, wherein the rear lens group includes at least one lens configured to be movable in the optical axis direction. 7). A position measuring device for measuring a position in a plane crossing the optical path of light incident on the working surface based on light extracted from an optical path between the relay optical system and the working surface; 7. The illumination optical apparatus according to any one of clauses 1 to 6. 8).
  • a provision comprising an angle measuring device for measuring an angle of light incident on the working surface with respect to the working surface based on light extracted from an optical path between the relay optical system and the working surface.
  • the illumination optical apparatus according to any one of 1 to 7. 9.
  • 10. 10 The illumination optical apparatus according to clause 8 or 9, further comprising an angle adjusting member that adjusts an angle of light incident on the working surface with respect to the working surface based on an output of the angle measuring device. 11.
  • the wavefront divider has a fly-eye optical system composed of a plurality of refractive optical elements arranged in parallel, and a rear focal position of the fly-eye optical system is outside the plurality of refractive optical elements.
  • the illumination optical device according to any one of clauses 1 to 10, which is characterized. 12 12.
  • the fly's eye optical system is made of fluorite.
  • 14 14.
  • the incident angle adjusting member that is arranged on the incident side of the wavefront divider and adjusts an incident angle of a light beam incident on the wavefront divider, according to any one of clauses 1 to 14, Illumination optical device. 16.
  • an illumination optical device that illuminates the illuminated surface with light from a light source, An illumination pupil, and a working surface that emits light having an angular distribution by adding an angular distribution to incident light in order to form a pupil intensity distribution on the illumination pupil with the light from the light source, and the light from the light source
  • the transmission optical system is Wavefront split type optical integrator, A relay optical system that at least partially superimposes a plurality of light fluxes wave-divided by the optical integrator on the working surface;
  • the illumination optical apparatus wherein the optical integrator and the relay optical system are arranged so that a rear focal position of the optical integrator and a front focal
  • the illumination optical system includes a plurality of optical elements that are arranged along the working surface and are individually controlled, and includes a spatial light modulator that spatially modulates and emits incident light. 17.
  • the illumination optical apparatus according to any one of clauses 1 to 16, which is characterized. 18.
  • Clause 17 characterized in that the spatial light modulator has a plurality of mirror elements arranged two-dimensionally within the working surface, and a drive unit that individually controls and drives the postures of the plurality of mirror elements.
  • the illumination optical device according to 1. 19.
  • Optical device 20.
  • the distribution forming optical system includes a wavefront division type second optical integrator in which an incident surface is arranged at a position optically conjugate with a rear focal position of the wavefront divider or the optical integrator.
  • 20. The illumination optical device according to clause 19. 21.
  • 21. The illumination optical apparatus according to clause 19 or 20, wherein the distribution forming optical system converts a change in angle of light from the spatial light modulator into a change in position on the plane of the illumination pupil.
  • Clause 1 is used in combination with a projection optical system that forms a surface optically conjugate with the irradiated surface, and the illumination pupil is at a position optically conjugate with the aperture stop of the projection optical system.
  • the illumination optical apparatus according to any one of Items 1 to 21. 23. 23.
  • An exposure apparatus comprising the illumination optical apparatus according to any one of clauses 1 to 22 for illuminating a predetermined pattern, and exposing the predetermined pattern onto a photosensitive substrate.
  • An illumination optical system for illuminating the predetermined pattern;
  • a transmission optical system for guiding light from a light source accommodated in the second housing to the illumination optical system;
  • the illumination optical system includes: An illumination pupil, and a working surface that emits light having an angular distribution by adding an angular distribution to incident light in order to form a pupil intensity distribution on the illumination pupil with the light from the light source, and the light from the light source Illuminate the irradiated surface with
  • the transmission optical system is A wavefront divider comprising a plurality of optical surfaces for dividing the light from the light source to generate a plurality of light fluxes;
  • An exposure apparatus comprising: an incident angle adjusting member that is disposed on an incident side of the wavefront divider and adjusts an incident angle of a light beam incident on the wavefront divider.
  • Article 25 characterized by comprising a plurality of optical elements arranged along the working surface and individually controlled, and comprising a spatial light modulator that spatially modulates and emits incident light.
  • the spatial light modulator includes a plurality of mirror elements two-dimensionally arranged in the working surface, and a drive unit that individually controls and drives the postures of the plurality of mirror elements.
  • the exposure apparatus described in 1. 28. 28. The exposure according to any one of clauses 25 to 27, further comprising a distribution forming optical system that forms the pupil intensity distribution in the illumination pupil based on light that has passed through the spatial light modulator. apparatus. 29.
  • the distribution forming optical system includes a wavefront division type second optical integrator in which an incident surface is arranged at a position optically conjugate with a rear focal position of the wavefront divider or the optical integrator.
  • the exposure apparatus according to clause 28. 30. 30. The exposure apparatus according to clause 29, wherein the distribution forming optical system converts a change in angle of light from the spatial light modulator into a change in position on the plane of the illumination pupil.
  • 31. A projection optical system that forms a surface optically conjugate with the irradiated surface; 31.
  • a device manufacturing method comprising: 33.
  • a wavefront divider comprising a plurality of optical surfaces arranged along a plane that traverses an optical path of light from the light source and dividing the light from the light source to generate a plurality of light beams;
  • the plurality of light beams from the wavefront splitter at least partially overlap on the working surface;
  • the transmission optical system wherein the working surface emits light having an angular distribution by giving an angular distribution to incident light in order to form a pupil intensity distribution on an illumination pupil of the illumination optical system.

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

La présente invention se rapporte à un système optique de transmission qui peut guider de manière stable un faisceau de lumière qui présente une distribution d'intensité uniforme vers un modulateur spatial de lumière, par exemple. Le système optique de transmission est positionné sur le trajet optique de ce système optique d'éclairage qui éclaire une surface qui doit être éclairée avec une lumière provenant d'une source de lumière, ledit système optique d'éclairage ayant une surface de travail destinée à appliquer une distribution d'angle à une lumière incidente afin de former une distribution d'intensité d'ouverture sur une ouverture d'éclairage du système optique d'éclairage. En outre, le système optique de transmission, qui guide la lumière provenant de la source de lumière jusqu'à la surface de travail, est pourvu d'un intégrateur optique de division de front d'onde et d'un système optique de relais qui superpose au moins partiellement une pluralité de faisceaux de lumière, qui ont été soumis à une division de front d'onde par l'intégrateur optique, sur la surface de travail.
PCT/JP2013/051960 2012-02-03 2013-01-30 Système optique de transmission, système optique d'éclairage, dispositif d'exposition et procédé de fabrication d'un dispositif WO2013115208A1 (fr)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017527111A (ja) * 2014-08-14 2017-09-14 エムティティ イノベーション インコーポレイテッドＭｔｔ Ｉｎｎｏｖａｔｉｏｎ Ｉｎｃｏｒｐｏｒａｔｅｄ 複数レーザ光源

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009111369A (ja) * 2007-10-12 2009-05-21 Nikon Corp 照明光学装置、露光装置及びデバイスの製造方法
JP2010153875A (ja) * 2008-12-23 2010-07-08 Carl Zeiss Smt Ag マイクロリソグラフィ投影露光装置の照明システム
JP2011507292A (ja) * 2007-12-21 2011-03-03 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ露光装置のマスク照明用の照明系
JP2011166158A (ja) * 2010-02-09 2011-08-25 Carl Zeiss Smt Gmbh マイクロリソグラフィ投影露光装置の光学ラスタ要素、光学インテグレータ、及び照明系

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009111369A (ja) * 2007-10-12 2009-05-21 Nikon Corp 照明光学装置、露光装置及びデバイスの製造方法
JP2011507292A (ja) * 2007-12-21 2011-03-03 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ露光装置のマスク照明用の照明系
JP2010153875A (ja) * 2008-12-23 2010-07-08 Carl Zeiss Smt Ag マイクロリソグラフィ投影露光装置の照明システム
JP2011166158A (ja) * 2010-02-09 2011-08-25 Carl Zeiss Smt Gmbh マイクロリソグラフィ投影露光装置の光学ラスタ要素、光学インテグレータ、及び照明系

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017527111A (ja) * 2014-08-14 2017-09-14 エムティティ イノベーション インコーポレイテッドＭｔｔ Ｉｎｎｏｖａｔｉｏｎ Ｉｎｃｏｒｐｏｒａｔｅｄ 複数レーザ光源

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