CN101736401A - 锗晶体生长的方法和装置 - Google Patents
锗晶体生长的方法和装置 Download PDFInfo
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- CN101736401A CN101736401A CN200810177006.0A CN200810177006A CN101736401A CN 101736401 A CN101736401 A CN 101736401A CN 200810177006 A CN200810177006 A CN 200810177006A CN 101736401 A CN101736401 A CN 101736401A
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- crucible
- ampoule
- crystal
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/08—Germanium
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/003—Heating or cooling of the melt or the crystallised material
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/02—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method without using solvents
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
Claims (11)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200810177006.0A CN101736401B (zh) | 2008-11-10 | 2008-11-10 | 锗晶体生长的方法和装置 |
US12/554,902 US8506706B2 (en) | 2008-11-08 | 2009-09-05 | Systems, methods and substrates of monocrystalline germanium crystal growth |
JP2011535568A JP5497053B2 (ja) | 2008-11-10 | 2009-11-09 | 単結晶ゲルマニウムの結晶成長システム、方法および基板 |
PCT/US2009/006052 WO2010053586A2 (en) | 2008-11-10 | 2009-11-09 | Systems, methods and substrates of monocrystalline germanium crystal growth |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200810177006.0A CN101736401B (zh) | 2008-11-10 | 2008-11-10 | 锗晶体生长的方法和装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101736401A true CN101736401A (zh) | 2010-06-16 |
CN101736401B CN101736401B (zh) | 2013-07-24 |
Family
ID=42167445
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200810177006.0A Active CN101736401B (zh) | 2008-11-08 | 2008-11-10 | 锗晶体生长的方法和装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8506706B2 (zh) |
JP (1) | JP5497053B2 (zh) |
CN (1) | CN101736401B (zh) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102356186A (zh) * | 2009-12-13 | 2012-02-15 | Axt公司 | 具有低微坑密度(mpd)的锗锭/晶圆和其制造系统及方法 |
CN103938270A (zh) * | 2014-04-09 | 2014-07-23 | 云南北方驰宏光电有限公司 | 镓重掺杂低位错锗单晶的生长方法 |
CN104328483A (zh) * | 2014-11-13 | 2015-02-04 | 吴晟 | 一种单晶生长方法及装置 |
CN105603534A (zh) * | 2016-02-26 | 2016-05-25 | 吕远芳 | 一种锗晶体应力消除方法 |
CN105723019A (zh) * | 2013-06-21 | 2016-06-29 | 南达科他州评议委员会 | 生长锗晶体的方法 |
CN105951170A (zh) * | 2016-06-30 | 2016-09-21 | 云南中科鑫圆晶体材料有限公司 | 锗单晶生长炉及基于生长炉的锗单晶生长温度控制方法 |
CN106283176A (zh) * | 2016-06-03 | 2017-01-04 | 广东先导稀材股份有限公司 | 一种iii‑v族半导体晶体的生长装置及生长方法 |
CN108277528A (zh) * | 2018-02-28 | 2018-07-13 | 昆明凯航光电科技有限公司 | 一种锗单晶退火过程电阻控制的方法 |
CN115233305A (zh) * | 2022-07-15 | 2022-10-25 | 云南中科鑫圆晶体材料有限公司 | Vb法制备超高纯多晶锗的方法 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9206525B2 (en) | 2011-11-30 | 2015-12-08 | General Electric Company | Method for configuring a system to grow a crystal by coupling a heat transfer device comprising at least one elongate member beneath a crucible |
CN103071780B (zh) * | 2013-01-15 | 2014-07-16 | 西北工业大学 | 一种用于镁合金定向凝固的坩埚及其制备方法 |
JP6047424B2 (ja) * | 2013-02-27 | 2016-12-21 | 京セラ株式会社 | シリコンインゴットの製造方法 |
US10934633B2 (en) | 2014-02-21 | 2021-03-02 | Momentive Performance Materials Inc. | Multi-zone variable power density heater apparatus containing and methods of using the same |
EP3289116A4 (en) * | 2015-04-29 | 2019-01-16 | 1366 Technologies Inc. | METHOD FOR MAINTAINING A VOLUME CONTENT OF MATERIAL MADE FROM WHICH THE MATERIAL IS EXHAUSTED AND REPLENISHED |
CN104805499A (zh) * | 2015-05-18 | 2015-07-29 | 王进 | N型多晶铸锭设备及其制备工艺 |
CN108091708B (zh) | 2017-12-08 | 2020-08-14 | 北京通美晶体技术有限公司 | 锗单晶片、其制法、晶棒的制法及单晶片的用途 |
EP3572560B1 (en) * | 2018-03-29 | 2024-09-11 | Crystal Systems Corporation | Single crystal manufacturing device |
CN110202419B (zh) | 2019-05-31 | 2021-10-19 | 北京通美晶体技术股份有限公司 | 锗单晶片、其制法、晶棒的制法及单晶片的用途 |
CN114525590B (zh) * | 2022-01-26 | 2023-03-24 | 深圳先进电子材料国际创新研究院 | 一种多功能晶体生长装置 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4784715A (en) * | 1975-07-09 | 1988-11-15 | Milton Stoll | Methods and apparatus for producing coherent or monolithic elements |
SU661966A1 (ru) * | 1976-11-23 | 1980-04-05 | Всесоюзный Научно-Исследовательский Институт Монокристаллов И Особо Чистых Химических Веществ "Вниимонокристалл" | Устройство дл выт гивани монокристаллов из расплава |
JPS605093A (ja) * | 1983-06-21 | 1985-01-11 | Sumitomo Electric Ind Ltd | 単結晶の製造方法 |
JPH08748B2 (ja) * | 1988-05-18 | 1996-01-10 | 株式会社東京電子冶金研究所 | ゲルマニウム単結晶体の製造方法 |
JP4135239B2 (ja) * | 1997-12-26 | 2008-08-20 | 住友電気工業株式会社 | 半導体結晶およびその製造方法ならびに製造装置 |
US6572700B2 (en) | 1997-12-26 | 2003-06-03 | Sumitomo Electric Industries, Ltd. | Semiconductor crystal, and method and apparatus of production thereof |
DE10349339A1 (de) | 2003-10-23 | 2005-06-16 | Crystal Growing Systems Gmbh | Kristallzüchtungsanlage |
US7591895B2 (en) * | 2004-06-11 | 2009-09-22 | Nippon Telegraph And Telephone Corporation | Method and apparatus for producing crystals |
JP2007099579A (ja) * | 2005-10-06 | 2007-04-19 | Nippon Telegr & Teleph Corp <Ntt> | 結晶製造方法およびその装置 |
CN100400720C (zh) * | 2006-04-21 | 2008-07-09 | 罗建国 | 精密垂直温差梯度冷凝单晶体生长装置及方法 |
-
2008
- 2008-11-10 CN CN200810177006.0A patent/CN101736401B/zh active Active
-
2009
- 2009-09-05 US US12/554,902 patent/US8506706B2/en active Active
- 2009-11-09 JP JP2011535568A patent/JP5497053B2/ja active Active
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102356186A (zh) * | 2009-12-13 | 2012-02-15 | Axt公司 | 具有低微坑密度(mpd)的锗锭/晶圆和其制造系统及方法 |
CN105723019A (zh) * | 2013-06-21 | 2016-06-29 | 南达科他州评议委员会 | 生长锗晶体的方法 |
US10125431B2 (en) | 2013-06-21 | 2018-11-13 | South Dakota Board Of Regents | Method of growing germanium crystals |
CN103938270B (zh) * | 2014-04-09 | 2017-02-15 | 云南北方驰宏光电有限公司 | 镓重掺杂低位错锗单晶的生长方法 |
CN103938270A (zh) * | 2014-04-09 | 2014-07-23 | 云南北方驰宏光电有限公司 | 镓重掺杂低位错锗单晶的生长方法 |
CN104328483A (zh) * | 2014-11-13 | 2015-02-04 | 吴晟 | 一种单晶生长方法及装置 |
CN105603534A (zh) * | 2016-02-26 | 2016-05-25 | 吕远芳 | 一种锗晶体应力消除方法 |
CN106283176A (zh) * | 2016-06-03 | 2017-01-04 | 广东先导稀材股份有限公司 | 一种iii‑v族半导体晶体的生长装置及生长方法 |
CN106283176B (zh) * | 2016-06-03 | 2019-07-02 | 广东先导稀材股份有限公司 | 一种iii-v族半导体晶体的生长装置及生长方法 |
CN105951170A (zh) * | 2016-06-30 | 2016-09-21 | 云南中科鑫圆晶体材料有限公司 | 锗单晶生长炉及基于生长炉的锗单晶生长温度控制方法 |
CN108277528A (zh) * | 2018-02-28 | 2018-07-13 | 昆明凯航光电科技有限公司 | 一种锗单晶退火过程电阻控制的方法 |
CN115233305A (zh) * | 2022-07-15 | 2022-10-25 | 云南中科鑫圆晶体材料有限公司 | Vb法制备超高纯多晶锗的方法 |
CN115233305B (zh) * | 2022-07-15 | 2023-06-20 | 云南中科鑫圆晶体材料有限公司 | Vb法制备超高纯多晶锗的方法 |
Also Published As
Publication number | Publication date |
---|---|
JP5497053B2 (ja) | 2014-05-21 |
US8506706B2 (en) | 2013-08-13 |
CN101736401B (zh) | 2013-07-24 |
US20100116196A1 (en) | 2010-05-13 |
JP2012508153A (ja) | 2012-04-05 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: BEIJING TONGMEI XTAL TECHNOLOGY CO.,LTD |
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C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20100813 Address after: California, USA Applicant after: AXT, Inc. Co-applicant after: Beijing Tongmei Crystal Technology Co.,Ltd. Address before: California, USA Applicant before: AXT, Inc. |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder |
Address after: California, USA Patentee after: AXT, Inc. Patentee after: Beijing Tongmei Crystal Technology Co.,Ltd. Address before: California, USA Patentee before: AXT, Inc. Patentee before: BEIJING TONGMEI XTAL TECHNOLOGY Co.,Ltd. |
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CP01 | Change in the name or title of a patent holder |