CN101681807B - 半导体器件的制造方法 - Google Patents

半导体器件的制造方法 Download PDF

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Publication number
CN101681807B
CN101681807B CN2008800179476A CN200880017947A CN101681807B CN 101681807 B CN101681807 B CN 101681807B CN 2008800179476 A CN2008800179476 A CN 2008800179476A CN 200880017947 A CN200880017947 A CN 200880017947A CN 101681807 B CN101681807 B CN 101681807B
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China
Prior art keywords
layer
substrate
producing
semiconductor devices
substrates
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Expired - Fee Related
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CN2008800179476A
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English (en)
Chinese (zh)
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CN101681807A (zh
Inventor
山崎舜平
田中幸一郎
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Publication of CN101681807A publication Critical patent/CN101681807A/zh
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
    • H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
    • H01L21/76254—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques with separation/delamination along an ion implanted layer, e.g. Smart-cut, Unibond
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01—Manufacture or treatment
    • H10D86/021—Manufacture or treatment of multiple TFTs
    • H10D86/0214—Manufacture or treatment of multiple TFTs using temporary substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/411—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs characterised by materials, geometry or structure of the substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/031—Manufacture or treatment of FETs having insulated gates [IGFET] of thin-film transistors [TFT]
    • H10D30/0321—Manufacture or treatment of FETs having insulated gates [IGFET] of thin-film transistors [TFT] comprising silicon, e.g. amorphous silicon or polysilicon
    • H10D30/0323—Manufacture or treatment of FETs having insulated gates [IGFET] of thin-film transistors [TFT] comprising silicon, e.g. amorphous silicon or polysilicon comprising monocrystalline silicon

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Thin Film Transistor (AREA)
  • Liquid Crystal (AREA)
CN2008800179476A 2007-06-01 2008-05-19 半导体器件的制造方法 Expired - Fee Related CN101681807B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007146889 2007-06-01
JP146889/2007 2007-06-01
PCT/JP2008/059602 WO2008149699A1 (en) 2007-06-01 2008-05-19 Manufacturing method of semiconductor substrate and semiconductor device

Publications (2)

Publication Number Publication Date
CN101681807A CN101681807A (zh) 2010-03-24
CN101681807B true CN101681807B (zh) 2012-03-14

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CN2008800179476A Expired - Fee Related CN101681807B (zh) 2007-06-01 2008-05-19 半导体器件的制造方法

Country Status (5)

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US (1) US7863155B2 (enExample)
JP (1) JP5348942B2 (enExample)
KR (1) KR101495153B1 (enExample)
CN (1) CN101681807B (enExample)
WO (1) WO2008149699A1 (enExample)

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CN101743616B (zh) * 2007-06-28 2012-02-22 株式会社半导体能源研究所 半导体装置的制造方法
US8431451B2 (en) 2007-06-29 2013-04-30 Semicondutor Energy Laboratory Co., Ltd. Display device and method for manufacturing the same
JP5498670B2 (ja) 2007-07-13 2014-05-21 株式会社半導体エネルギー研究所 半導体基板の作製方法
TWI493609B (zh) * 2007-10-23 2015-07-21 Semiconductor Energy Lab 半導體基板、顯示面板及顯示裝置的製造方法
JP5700617B2 (ja) 2008-07-08 2015-04-15 株式会社半導体エネルギー研究所 Ｓｏｉ基板の作製方法
SG163481A1 (en) * 2009-01-21 2010-08-30 Semiconductor Energy Lab Method for manufacturing soi substrate and semiconductor device
JP5453947B2 (ja) * 2009-06-17 2014-03-26 ソニー株式会社 固体撮像素子の製造方法
JP2011227369A (ja) * 2010-04-22 2011-11-10 Hitachi Displays Ltd 画像表示装置及びその製造方法
CN104058363B (zh) * 2013-03-22 2016-01-20 上海丽恒光微电子科技有限公司 基于mems透射光阀的显示装置及其形成方法
JP5549769B1 (ja) * 2013-08-26 2014-07-16 Ｔｄｋ株式会社 モジュール部品の製造方法
US10224233B2 (en) 2014-11-18 2019-03-05 Globalwafers Co., Ltd. High resistivity silicon-on-insulator substrate comprising a charge trapping layer formed by He-N2 co-implantation
EP3573094B1 (en) 2014-11-18 2023-01-04 GlobalWafers Co., Ltd. High resistivity semiconductor-on-insulator wafer and a method of manufacturing
FR3029538B1 (fr) * 2014-12-04 2019-04-26 Soitec Procede de transfert de couche
WO2016140850A1 (en) 2015-03-03 2016-09-09 Sunedison Semiconductor Limited Method of depositing charge trapping polycrystalline silicon films on silicon substrates with controllable film stress
EP3304586B1 (en) 2015-06-01 2020-10-07 GlobalWafers Co., Ltd. A method of manufacturing silicon germanium-on-insulator
US10529616B2 (en) 2015-11-20 2020-01-07 Globalwafers Co., Ltd. Manufacturing method of smoothing a semiconductor surface
US10573550B2 (en) 2016-03-07 2020-02-25 Globalwafers Co., Ltd. Semiconductor on insulator structure comprising a plasma oxide layer and method of manufacture thereof
WO2017155808A1 (en) * 2016-03-07 2017-09-14 Sunedison Semiconductor Limited Semiconductor on insulator structure comprising a plasma nitride layer and method of manufacture thereof
EP3469120B1 (en) 2016-06-08 2022-02-02 GlobalWafers Co., Ltd. High resistivity single crystal silicon ingot and wafer having improved mechanical strength
US10269617B2 (en) 2016-06-22 2019-04-23 Globalwafers Co., Ltd. High resistivity silicon-on-insulator substrate comprising an isolation region
JP6810578B2 (ja) * 2016-11-18 2021-01-06 株式会社Ｓｃｒｅｅｎホールディングス ドーパント導入方法および熱処理方法
JP7123182B2 (ja) 2018-06-08 2022-08-22 グローバルウェーハズ カンパニー リミテッド シリコン箔層の移転方法
CN111081531B (zh) * 2019-10-30 2022-03-18 华灿光电（浙江）有限公司 外延层剥离方法

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JPH11163363A (ja) 1997-11-22 1999-06-18 Semiconductor Energy Lab Co Ltd 半導体装置およびその作製方法
JP2003324188A (ja) * 2002-04-30 2003-11-14 Ishikawajima Harima Heavy Ind Co Ltd 大面積単結晶シリコン基板の製造方法
US6953736B2 (en) * 2002-07-09 2005-10-11 S.O.I.Tec Silicon On Insulator Technologies S.A. Process for transferring a layer of strained semiconductor material

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JPH11163363A (ja) 1997-11-22 1999-06-18 Semiconductor Energy Lab Co Ltd 半導体装置およびその作製方法
JP2003324188A (ja) * 2002-04-30 2003-11-14 Ishikawajima Harima Heavy Ind Co Ltd 大面積単結晶シリコン基板の製造方法
US6953736B2 (en) * 2002-07-09 2005-10-11 S.O.I.Tec Silicon On Insulator Technologies S.A. Process for transferring a layer of strained semiconductor material

Also Published As

Publication number Publication date
KR101495153B1 (ko) 2015-02-24
CN101681807A (zh) 2010-03-24
WO2008149699A1 (en) 2008-12-11
JP5348942B2 (ja) 2013-11-20
US7863155B2 (en) 2011-01-04
US20080299744A1 (en) 2008-12-04
JP2009010353A (ja) 2009-01-15
KR20100022484A (ko) 2010-03-02

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