CN101639623B - 光罩的检测方法及装置 - Google Patents
光罩的检测方法及装置 Download PDFInfo
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- CN101639623B CN101639623B CN2009103061129A CN200910306112A CN101639623B CN 101639623 B CN101639623 B CN 101639623B CN 2009103061129 A CN2009103061129 A CN 2009103061129A CN 200910306112 A CN200910306112 A CN 200910306112A CN 101639623 B CN101639623 B CN 101639623B
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CN2009103061129A CN101639623B (zh) | 2009-08-26 | 2009-08-26 | 光罩的检测方法及装置 |
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CN101639623A CN101639623A (zh) | 2010-02-03 |
CN101639623B true CN101639623B (zh) | 2011-10-26 |
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CN102219177A (zh) * | 2010-04-14 | 2011-10-19 | 原相科技股份有限公司 | 改善钨沉积拓朴形貌的微机电系统光罩与方法 |
US8818072B2 (en) * | 2010-08-25 | 2014-08-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Rendered database image-to-inspection image optimization for inspection |
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Owner name: SHENZHEN NEWWAY PHOTOMASK MAKING CO., LTD. Free format text: FORMER OWNER: SHENZHEN NEWWAY ELECTRONIC CO., LTD. Effective date: 20130423 |
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Effective date of registration: 20130423 Address after: 518057 Guangdong, Nanshan District, China, No., Long Hill Road, innovation park, No. D, first floor, block Patentee after: SHENZHEN NEWWAY PHOTOMASK MAKING CO., LTD. Address before: 1, building 518000, block D, Hua Han Innovation Park, North Zone, Nanshan District hi tech Zone, Guangdong, Shenzhen Patentee before: Shenzhen Newway Electronic Co., Ltd. |
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