CN101617436A - 带通滤波器和制造带通滤波器的方法 - Google Patents
带通滤波器和制造带通滤波器的方法 Download PDFInfo
- Publication number
- CN101617436A CN101617436A CN200880005919A CN200880005919A CN101617436A CN 101617436 A CN101617436 A CN 101617436A CN 200880005919 A CN200880005919 A CN 200880005919A CN 200880005919 A CN200880005919 A CN 200880005919A CN 101617436 A CN101617436 A CN 101617436A
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- Prior art keywords
- filter
- piezoelectric element
- band pass
- layer
- pass filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000000034 method Methods 0.000 title claims description 14
- 238000004519 manufacturing process Methods 0.000 title claims description 6
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- 238000000059 patterning Methods 0.000 claims abstract description 11
- 230000008054 signal transmission Effects 0.000 claims abstract description 10
- 230000005540 biological transmission Effects 0.000 claims abstract description 3
- 239000004020 conductor Substances 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 13
- 230000011218 segmentation Effects 0.000 claims description 12
- 238000000151 deposition Methods 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 7
- 238000005530 etching Methods 0.000 claims description 7
- 239000013078 crystal Substances 0.000 claims description 6
- 229910052451 lead zirconate titanate Inorganic materials 0.000 claims description 4
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 12
- 238000010586 diagram Methods 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical group [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
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- 238000005859 coupling reaction Methods 0.000 description 1
- 208000002925 dental caries Diseases 0.000 description 1
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- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P1/00—Auxiliary devices
- H01P1/20—Frequency-selective devices, e.g. filters
- H01P1/201—Filters for transverse electromagnetic waves
- H01P1/203—Strip line filters
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/0538—Constructional combinations of supports or holders with electromechanical or other electronic elements
- H03H9/0542—Constructional combinations of supports or holders with electromechanical or other electronic elements consisting of a lateral arrangement
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/542—Filters comprising resonators of piezoelectric or electrostrictive material including passive elements
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/56—Monolithic crystal filters
- H03H9/564—Monolithic crystal filters implemented with thin-film techniques
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/56—Monolithic crystal filters
- H03H9/566—Electric coupling means therefor
- H03H9/568—Electric coupling means therefor consisting of a ladder configuration
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Electromagnetism (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Control Of Motors That Do Not Use Commutators (AREA)
- Filters And Equalizers (AREA)
Abstract
Description
Claims (9)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP044560/2007 | 2007-02-23 | ||
JP2007044560A JP5038740B2 (ja) | 2007-02-23 | 2007-02-23 | 帯域通過フィルタおよびその製造方法 |
PCT/JP2008/053128 WO2008108193A1 (en) | 2007-02-23 | 2008-02-19 | Bandpass filter and process of fabricating the same |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101617436A true CN101617436A (zh) | 2009-12-30 |
CN101617436B CN101617436B (zh) | 2013-05-22 |
Family
ID=39531290
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2008800059192A Expired - Fee Related CN101617436B (zh) | 2007-02-23 | 2008-02-19 | 带通滤波器和制造带通滤波器的方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8098118B2 (zh) |
EP (1) | EP2122743B1 (zh) |
JP (1) | JP5038740B2 (zh) |
CN (1) | CN101617436B (zh) |
TW (1) | TWI351126B (zh) |
WO (1) | WO2008108193A1 (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102270976A (zh) * | 2010-06-07 | 2011-12-07 | 株式会社村田制作所 | 高频模块 |
CN107529685A (zh) * | 2016-06-24 | 2018-01-02 | 三星电机株式会社 | 体声波谐振器以及包括该体声波谐振器的滤波器 |
CN108270414A (zh) * | 2017-01-03 | 2018-07-10 | 稳懋半导体股份有限公司 | 具有质量调整结构的体声波共振器的制造方法 |
CN111146328A (zh) * | 2019-12-31 | 2020-05-12 | 诺思(天津)微系统有限责任公司 | 单晶压电结构及具有其的电子设备 |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9412235B2 (en) | 2009-05-08 | 2016-08-09 | Aristocrat Technologies Australia Pty Limited | Gaming system, a method of gaming and a linked game controller |
DE102011100468B4 (de) * | 2011-05-04 | 2013-07-04 | Epcos Ag | Mit akustischen Volumenwellen arbeitendes BAW-Filter, Herstellungsverfahren hierfür und Duplexer |
US8816567B2 (en) | 2011-07-19 | 2014-08-26 | Qualcomm Mems Technologies, Inc. | Piezoelectric laterally vibrating resonator structure geometries for spurious frequency suppression |
US20130120415A1 (en) * | 2011-11-14 | 2013-05-16 | Qualcomm Mems Technologies, Inc. | Combined resonators and passive circuit components on a shared substrate |
CN104333346A (zh) * | 2014-11-27 | 2015-02-04 | 王少夫 | 一种新型超宽带压电滤波器 |
WO2018063299A1 (en) * | 2016-09-30 | 2018-04-05 | Intel Corporation | Rf filters and resonators of crystalline iii-n films |
DE102016125877B4 (de) * | 2016-12-29 | 2018-08-23 | Snaptrack, Inc. | BAW-Resonator- und Resonator-Anordnung |
TWI611604B (zh) * | 2017-01-03 | 2018-01-11 | 穩懋半導體股份有限公司 | 體聲波濾波器及調諧體聲波濾波器之體聲波共振器之方法 |
JP7037336B2 (ja) * | 2017-11-16 | 2022-03-16 | 太陽誘電株式会社 | 弾性波デバイスおよびその製造方法、フィルタ並びにマルチプレクサ |
DE102018105091A1 (de) * | 2018-03-06 | 2019-09-12 | RF360 Europe GmbH | HF-Filter, HF-Filterkomponente und Verfahren zur Herstellung eines HF-Filters |
CN112585871A (zh) * | 2018-07-05 | 2021-03-30 | 阿库斯蒂斯有限公司 | 5G 3.5-3.6GHz频带声波谐振器射频滤波器电路 |
US10425061B1 (en) * | 2018-10-11 | 2019-09-24 | Qorvo Us, Inc. | Wireless communication circuitry |
DE102019102694B4 (de) * | 2019-02-04 | 2020-10-08 | RF360 Europe GmbH | Elektroakustisches Bauelement, HF-Filter und Herstellungsverfahren |
CN110492864B (zh) * | 2019-08-09 | 2023-04-07 | 天津大学 | 一种体声波滤波器的封装结构及该滤波器的制造方法 |
US11998852B2 (en) | 2022-07-29 | 2024-06-04 | Aristocrat Technologies, Inc. | Multi-player gaming system with synchronization periods and associated synchronization methods |
CN115833779A (zh) * | 2023-02-15 | 2023-03-21 | 成都频岢微电子有限公司 | 一种波浪形体声波谐振器 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2112599A (en) * | 1981-12-24 | 1983-07-20 | Philips Electronic Associated | Bandpass filters |
JP3309578B2 (ja) * | 1994-08-11 | 2002-07-29 | 松下電器産業株式会社 | 高周波共振器及び高周波フィルタ |
JPH08335807A (ja) * | 1995-06-09 | 1996-12-17 | Meidensha Corp | バンドパスフィルタ |
US6768399B2 (en) * | 2000-07-24 | 2004-07-27 | Matsushita Electric Industrial Co., Ltd. | Laminated bandpass filter, high frequency radio device and laminated bandpass filter manufacturing method |
FR2821993B1 (fr) | 2001-03-09 | 2003-06-20 | Thomson Csf | Circuit grave de protection contre la foudre |
JP3972810B2 (ja) * | 2002-12-18 | 2007-09-05 | 株式会社村田製作所 | 分波器、および通信機 |
JP4192794B2 (ja) * | 2004-01-26 | 2008-12-10 | セイコーエプソン株式会社 | 圧電素子、圧電アクチュエーター、インクジェット式記録ヘッド、インクジェットプリンター、表面弾性波素子、周波数フィルタ、発振器、電子回路、薄膜圧電共振器、及び電子機器 |
JP4155576B2 (ja) | 2004-04-01 | 2008-09-24 | 国立大学法人東京工業大学 | リングフィルタ及びそれを用いた広帯域の帯域通過フィルタ |
US7446629B2 (en) | 2004-08-04 | 2008-11-04 | Matsushita Electric Industrial Co., Ltd. | Antenna duplexer, and RF module and communication apparatus using the same |
KR100750736B1 (ko) * | 2004-11-10 | 2007-08-22 | 삼성전자주식회사 | 하나의 트리밍 인덕터를 사용하는 필터 |
NO323325B1 (no) * | 2005-08-11 | 2007-03-19 | Norspace As | Elektronisk filter |
-
2007
- 2007-02-23 JP JP2007044560A patent/JP5038740B2/ja not_active Expired - Fee Related
-
2008
- 2008-02-19 EP EP20080711892 patent/EP2122743B1/en not_active Not-in-force
- 2008-02-19 CN CN2008800059192A patent/CN101617436B/zh not_active Expired - Fee Related
- 2008-02-19 WO PCT/JP2008/053128 patent/WO2008108193A1/en active Application Filing
- 2008-02-19 US US12/528,070 patent/US8098118B2/en not_active Expired - Fee Related
- 2008-02-20 TW TW097105945A patent/TWI351126B/zh not_active IP Right Cessation
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102270976A (zh) * | 2010-06-07 | 2011-12-07 | 株式会社村田制作所 | 高频模块 |
CN102270976B (zh) * | 2010-06-07 | 2015-03-04 | 株式会社村田制作所 | 高频模块 |
US9007145B2 (en) | 2010-06-07 | 2015-04-14 | Murata Manufacturing Co., Ltd. | High-frequency signal balancing multiplexer |
CN107529685A (zh) * | 2016-06-24 | 2018-01-02 | 三星电机株式会社 | 体声波谐振器以及包括该体声波谐振器的滤波器 |
CN107529685B (zh) * | 2016-06-24 | 2020-10-09 | 三星电机株式会社 | 体声波谐振器以及包括该体声波谐振器的滤波器 |
US10855249B2 (en) | 2016-06-24 | 2020-12-01 | Samsung Electro-Mechanics Co., Ltd. | Bulk acoustic wave resonator and filter including the same |
CN108270414A (zh) * | 2017-01-03 | 2018-07-10 | 稳懋半导体股份有限公司 | 具有质量调整结构的体声波共振器的制造方法 |
CN108270414B (zh) * | 2017-01-03 | 2021-06-22 | 稳懋半导体股份有限公司 | 具有质量调整结构的体声波共振器的制造方法 |
CN111146328A (zh) * | 2019-12-31 | 2020-05-12 | 诺思(天津)微系统有限责任公司 | 单晶压电结构及具有其的电子设备 |
Also Published As
Publication number | Publication date |
---|---|
WO2008108193A1 (en) | 2008-09-12 |
US20100117763A1 (en) | 2010-05-13 |
CN101617436B (zh) | 2013-05-22 |
TWI351126B (en) | 2011-10-21 |
TW200840131A (en) | 2008-10-01 |
EP2122743B1 (en) | 2012-11-28 |
JP2008211387A (ja) | 2008-09-11 |
EP2122743A1 (en) | 2009-11-25 |
JP5038740B2 (ja) | 2012-10-03 |
US8098118B2 (en) | 2012-01-17 |
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Owner name: MATSUSHITA ELECTRIC INDUSTRIAL CO, LTD. Free format text: FORMER OWNER: MATSUSHITA ELECTRIC WORKS LTD. Effective date: 20120314 |
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Effective date of registration: 20120314 Address after: Japan Osaka kamato City Applicant after: Matsushita Electric Industrial Co., Ltd. Address before: Osaka Japan Applicant before: Matsushita Electric Works, Ltd. |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CI01 | Correction of invention patent gazette |
Correction item: Claim 6 Correct: Correct False: Error Number: 21 Volume: 29 |
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CI03 | Correction of invention patent |
Correction item: Claim 6 Correct: Correct False: Error Number: 21 Page: Description Volume: 29 |
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