CN101611496B - 掺杂纳米颗粒型半导体结 - Google Patents
掺杂纳米颗粒型半导体结 Download PDFInfo
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- CN101611496B CN101611496B CN2007800515595A CN200780051559A CN101611496B CN 101611496 B CN101611496 B CN 101611496B CN 2007800515595 A CN2007800515595 A CN 2007800515595A CN 200780051559 A CN200780051559 A CN 200780051559A CN 101611496 B CN101611496 B CN 101611496B
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- semiconductor
- doped
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D8/00—Diodes
- H10D8/50—PIN diodes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
- H01L21/02381—Silicon, silicon germanium, germanium
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02551—Group 12/16 materials
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02551—Group 12/16 materials
- H01L21/0256—Selenides
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02551—Group 12/16 materials
- H01L21/02562—Tellurides
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/0257—Doping during depositing
- H01L21/02573—Conductivity type
- H01L21/02576—N-type
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/0257—Doping during depositing
- H01L21/02573—Conductivity type
- H01L21/02579—P-type
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/0257—Doping during depositing
- H01L21/02573—Conductivity type
- H01L21/02581—Transition metal or rare earth elements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02587—Structure
- H01L21/0259—Microstructure
- H01L21/02601—Nanoparticles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/117—Shapes of semiconductor bodies
- H10D62/118—Nanostructure semiconductor bodies
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/117—Shapes of semiconductor bodies
- H10D62/118—Nanostructure semiconductor bodies
- H10D62/119—Nanowire, nanosheet or nanotube semiconductor bodies
- H10D62/121—Nanowire, nanosheet or nanotube semiconductor bodies oriented parallel to substrates
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D8/00—Diodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/817—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
- H10H20/818—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous within the light-emitting regions
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/89—Deposition of materials, e.g. coating, cvd, or ald
- Y10S977/892—Liquid phase deposition
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Composite Materials (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/678,734 | 2007-02-26 | ||
| US11/678,734 US7605062B2 (en) | 2007-02-26 | 2007-02-26 | Doped nanoparticle-based semiconductor junction |
| PCT/US2007/025208 WO2008105863A1 (en) | 2007-02-26 | 2007-12-10 | Doped nanoparticle-based semiconductor junction |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101611496A CN101611496A (zh) | 2009-12-23 |
| CN101611496B true CN101611496B (zh) | 2012-11-28 |
Family
ID=39358059
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007800515595A Expired - Fee Related CN101611496B (zh) | 2007-02-26 | 2007-12-10 | 掺杂纳米颗粒型半导体结 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7605062B2 (enExample) |
| EP (1) | EP2115780A1 (enExample) |
| JP (1) | JP2010521061A (enExample) |
| CN (1) | CN101611496B (enExample) |
| TW (1) | TW200847244A (enExample) |
| WO (1) | WO2008105863A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7785657B2 (en) * | 2006-12-11 | 2010-08-31 | Evident Technologies, Inc. | Nanostructured layers, method of making nanostructured layers, and application thereof |
| US20090014423A1 (en) * | 2007-07-10 | 2009-01-15 | Xuegeng Li | Concentric flow-through plasma reactor and methods therefor |
| WO2008137738A2 (en) * | 2007-05-03 | 2008-11-13 | Innovalight, Inc. | Method of forming group iv semiconductor junctions using laser processing |
| US8968438B2 (en) * | 2007-07-10 | 2015-03-03 | Innovalight, Inc. | Methods and apparatus for the in situ collection of nucleated particles |
| US8471170B2 (en) | 2007-07-10 | 2013-06-25 | Innovalight, Inc. | Methods and apparatus for the production of group IV nanoparticles in a flow-through plasma reactor |
| US20090053878A1 (en) * | 2007-08-21 | 2009-02-26 | Maxim Kelman | Method for fabrication of semiconductor thin films using flash lamp processing |
| US20110031452A1 (en) * | 2007-11-28 | 2011-02-10 | Todd Krauss | Nanoparticles Having Continuous Photoluminescence |
| US8986511B1 (en) * | 2009-10-14 | 2015-03-24 | U.S. Department Of Energy | Visible light photoreduction of CO2 using heterostructured catalysts |
| US9372283B2 (en) * | 2009-11-13 | 2016-06-21 | Babak NIKOOBAKHT | Nanoengineered devices based on electro-optical modulation of the electrical and optical properties of plasmonic nanoparticles |
| EP2504854A2 (en) * | 2009-11-25 | 2012-10-03 | E.I. Du Pont De Nemours And Company | CZTS/Se PRECURSOR INKS AND METHODS FOR PREPARING CZTS/Se THIN FILMS AND CZTS/Se-BASED PHOTOVOLTAIC CELLS |
| US8530883B2 (en) * | 2010-03-11 | 2013-09-10 | Light-Based Technologies Incorporated | Manufacture of quantum dot-enabled solid-state light emitters |
| US8813857B2 (en) | 2011-02-17 | 2014-08-26 | Baker Hughes Incorporated | Annulus mounted potential energy driven setting tool |
| US9318628B2 (en) * | 2011-05-20 | 2016-04-19 | The University Of Chicago | Mid-infrared photodetectors |
| CA2909313A1 (en) * | 2013-04-12 | 2014-10-16 | The Board Of Trustees Of The University Of Illinois | Transient electronic devices comprising inorganic or hybrid inorganic and organic substrates and encapsulates |
| JP2015128105A (ja) * | 2013-12-27 | 2015-07-09 | ソニー株式会社 | 半導体ナノ粒子分散体、光電変換素子および撮像装置 |
| JP6514231B2 (ja) * | 2014-01-06 | 2019-05-15 | ナノコ テクノロジーズ リミテッド | カドミウムフリー量子ドットナノ粒子 |
| US10925543B2 (en) | 2015-11-11 | 2021-02-23 | The Board Of Trustees Of The University Of Illinois | Bioresorbable silicon electronics for transient implants |
| US11088147B2 (en) | 2019-06-26 | 2021-08-10 | Micron Technology, Inc. | Apparatus with doped surfaces, and related methods with in situ doping |
| KR102685407B1 (ko) * | 2019-08-02 | 2024-07-18 | 삼성디스플레이 주식회사 | 발광 소자, 이를 포함하는 표시 장치 및 표시 장치 제조 방법 |
| EP4588110A1 (en) * | 2022-09-15 | 2025-07-23 | China Triumph International Engineering Co., Ltd. | Method for manufacturing a copper-free cdte based thin film solar cell device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5537000A (en) * | 1994-04-29 | 1996-07-16 | The Regents, University Of California | Electroluminescent devices formed using semiconductor nanocrystals as an electron transport media and method of making such electroluminescent devices |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6521541B2 (en) * | 2000-08-23 | 2003-02-18 | California Institute Of Technology | Surface preparation of substances for continuous convective assembly of fine particles |
| JP2002232010A (ja) * | 2001-02-07 | 2002-08-16 | Sony Corp | 表示装置およびその製造方法 |
| US6878871B2 (en) * | 2002-09-05 | 2005-04-12 | Nanosys, Inc. | Nanostructure and nanocomposite based compositions and photovoltaic devices |
| US7294449B1 (en) * | 2003-12-31 | 2007-11-13 | Kovio, Inc. | Radiation patternable functional materials, methods of their use, and structures formed therefrom |
| JP4781821B2 (ja) * | 2004-01-23 | 2011-09-28 | Hoya株式会社 | 量子ドット分散発光素子およびその製造方法 |
| US20050230673A1 (en) | 2004-03-25 | 2005-10-20 | Mueller Alexander H | Colloidal quantum dot light emitting diodes |
| WO2006116337A2 (en) | 2005-04-25 | 2006-11-02 | Board Of Trustees Of The University Of Arkansas | Doped semiconductor nanocrystals and methods of making same |
-
2007
- 2007-02-26 US US11/678,734 patent/US7605062B2/en not_active Expired - Fee Related
- 2007-12-10 CN CN2007800515595A patent/CN101611496B/zh not_active Expired - Fee Related
- 2007-12-10 JP JP2009550855A patent/JP2010521061A/ja active Pending
- 2007-12-10 EP EP07862700A patent/EP2115780A1/en not_active Withdrawn
- 2007-12-10 WO PCT/US2007/025208 patent/WO2008105863A1/en not_active Ceased
- 2007-12-21 TW TW096149579A patent/TW200847244A/zh unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5537000A (en) * | 1994-04-29 | 1996-07-16 | The Regents, University Of California | Electroluminescent devices formed using semiconductor nanocrystals as an electron transport media and method of making such electroluminescent devices |
Also Published As
| Publication number | Publication date |
|---|---|
| US7605062B2 (en) | 2009-10-20 |
| US20080206972A1 (en) | 2008-08-28 |
| EP2115780A1 (en) | 2009-11-11 |
| WO2008105863A1 (en) | 2008-09-04 |
| CN101611496A (zh) | 2009-12-23 |
| JP2010521061A (ja) | 2010-06-17 |
| TW200847244A (en) | 2008-12-01 |
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| Date | Code | Title | Description |
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| C06 | Publication | ||
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20171228 Address after: University of Manchester Patentee after: Nanoco Technologies Ltd. Address before: American New York Patentee before: Eastman Kodak Co. |
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| TR01 | Transfer of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121128 Termination date: 20211210 |
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| CF01 | Termination of patent right due to non-payment of annual fee |