CN101561559B - Online film thickness monitoring system and light splitting device for high-resolution narrow-band spectrum - Google Patents
Online film thickness monitoring system and light splitting device for high-resolution narrow-band spectrum Download PDFInfo
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- CN101561559B CN101561559B CN2009100847093A CN200910084709A CN101561559B CN 101561559 B CN101561559 B CN 101561559B CN 2009100847093 A CN2009100847093 A CN 2009100847093A CN 200910084709 A CN200910084709 A CN 200910084709A CN 101561559 B CN101561559 B CN 101561559B
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Abstract
The invention discloses an online film thickness monitoring system and a light splitting device for a high-resolution narrow-band spectrum. The system comprises a light source, an emitting unit, a monitoring sheet, a receiving unit, a spectrum light-splitting device, a CCD array signal conversion system and a control acquisition unit. The spectrum light-splitting device comprises an incidence slit, a first collimating objective lens, a plane grating, a second collimating objective lens and a plane reflector. The online film thickness monitoring system for the high-resolution narrow-band spectrum combines the spectrum light-splitting device with a linear array CCD to achieve dynamic monitoring wavelength adjustment, a symmetrical spectrum band with the length of tens of nanometers for the left part and the right part respectively centering on a monitoring wavelength point is formed, a spectrum signal near 100 nanometers is obtained at each monitoring point, the spectrum data quantity islarge, the wavelength resolution is high, the computation of evaluation functions is precise, and a scientific method for achieving high-precision automatic film coating for a spectrum monitoring sys tem in the process of optical coating is provided.
Description
Technical field
The present invention relates to a kind of optical coating film thickness spectroscopic methodology online monitoring system and light-dividing device, be applied to the automatic on-line film thickness monitoring of the coating process of optical coating system.
Background technology
The preparation of film except selecting suitable material and preparation technology, also must accurately be controlled its thickness.Thicknesses of layers in the coating process can't directly be measured, and all is a kind of amount relevant with thickness of monitoring usually, calculates the thickness of rete then thus.
The theoretical foundation of optical thin film is the interference of light theory, so special concern is optical thickness, the method that belongs to the optical thickness monitoring at present comprises single wavelength monitor method and wide optical spectrum monitor method.
The characteristics of single wavelength monitor method are directly to monitor the absolute transmissivity or the reflectance value of a wavelength points of rete, parameter according to known assembly of thin films, transmittance values/reflectance value when this supervisory wavelength point that precomputes each rete theoretic throat correspondence stops is controlled each tunic by calculated value then.Adopt photoelectric method, use monochromator splitting, detectors such as photomultiplier receive, and advantage is the wavelength resolution height, use the monochromator of entrance slit 100 μ m, exit slit 100 μ m, focal length 300mm, and its wavelength resolution is 0.27nm.Shortcoming is that data volume is little owing to only monitor the shading value of a wavelength points, if unpredictable undesired signal can cause system's rest point erroneous judgement, can't monitor.
Wide optical spectrum monitor is the spectral characteristic that monitors film in the wavelength coverage of the full spectrum of 350-1050nm, and what measure in real time is the transmissivity or the reflectance value of full spectrum, and what obtain is the curve of spectrum.Characteristics are: control is directly perceived, accurate, and the quantity of information that obtains is higher than single wavelength monitor method far away; In certain spectral range, can realize thicknesses of layers error compensation.Advantages such as wide optical spectrum monitor is generally selected the spectrometer based on ccd array for use, and focal length is generally shorter, and this type of spectrometer has that reaction velocity is fast, good stability, volume are little, shortcoming is that wavelength resolution is not high.Calculate the formula of wavelength resolution:
Wavelength resolution (FWHM)=pixel resolution * chromatic dispersion number
For example, use the spectrometer of entrance slit 100 μ m, 3648 of pixels, spectral width 700nm, carry out full spectral detection, its pixel resolution is 9pixels, and the chromatic dispersion number is 700nm/3648pixels.Can calculate wavelength resolution by above-mentioned formula is 6.5nm, and this is not enough to being coated with high precision film products such as spike interference filter.
Summary of the invention
The object of the present invention is to provide online film thickness monitoring system of a kind of high-resolution narrow-band spectrum and light-dividing device, this light-dividing device can improve the wavelength resolution of wide optical spectrum monitor system, to expand systematically range of application of wide optical spectrum monitor, realize High Precision Automatic coating process.
For achieving the above object, high-resolution narrow-band spectrum light-dividing device of the present invention, comprise entrance slit, first collimator objective, plane grating, second collimator objective, plane mirror, complex light projects on first collimator objective through entrance slit and obtains parallel beam, parallel beam projects second collimator objective after the plane grating beam split, on the focusing surface through imaging in second collimator objective behind the plane mirror, it is characterized in that, the focusing surface of described second collimator objective is provided with the outgoing window, and described outgoing window place forms presses the tactic band of wavelength.
Further, the width of described band is that size according to the outgoing window determines.
Further, described plane grating is provided with drive motor, and by drive motor control plane grating rotating, and then the control parallel beam projects on described second collimator objective with different angle of diffraction.
Further, the size of described outgoing window is 1-10mm.
The online film thickness monitoring system of high-resolution narrow-band spectrum of the present invention, comprise light source, transmitter unit, monitoring piece, receiving element, the spectrum light-dividing device, ccd array signal translating system and control collecting unit, the light signal that light source sends is given the transmitter unit that is fixed on vacuum chamber by Optical Fiber Transmission, incide in the vacuum chamber then, and on monitoring piece, form hot spot, reflect through monitoring piece, light after receiving by light receiving unit by the chromatic dispersion of spectrum light-dividing device after at the band of a certain wavelength coverage of its exit window interruption-forming, the ccd array signal translating system that is positioned at outgoing window place changes the intensity distributions of band the distribution of electric charge power into, is undertaken carrying out data processing and calculating to computing machine after the A/D conversion by the control collecting unit.
Further, the scope of described band is 400nm-900nm.
Further, described spectrum light-dividing device, comprise entrance slit, first collimator objective, plane grating, second collimator objective, plane mirror, complex light projects on first collimator objective through entrance slit and obtains parallel beam, parallel beam projects second collimator objective after the plane grating beam split, on the focusing surface through imaging in second collimator objective behind the plane mirror, the focusing surface of second collimator objective is provided with the outgoing window, and this outgoing window place forms presses the tactic band of wavelength.
Further, described ccd array signal translating system is arranged on the focusing surface place of described second collimator objective.
Further, described ccd array signal translating system is a line array CCD.
Further, to obtain spectral resolution behind described spectrum light-dividing device and ccd array signal translating system be 0.2-1nm to light beam.
The online film thickness monitoring system of high-resolution narrow-band spectrum of the present invention, the spectrum light-dividing device is combined with line array CCD, realized dynamic supervisory wavelength adjustment, formation with the supervisory wavelength point be the center symmetry about the band of each tens nanometer, obtain the spectral signal of nearly 100 nanometers in each control point, the spectroscopic data amount is big, the wavelength resolution height, evaluation function calculates accurately, for the optical spectrum monitor system realizes that in the optical coating process High Precision Automatic plated film provides a kind of scientific methods.
Description of drawings
Fig. 1 is the structural representation of supervisory system of the present invention;
Fig. 2 is the light-dividing principle figure of spectrum light-dividing device of the present invention.
Embodiment
As shown in Figure 1, the online film thickness monitoring system of high-resolution narrow-band spectrum of the present invention, comprise light source 1, transmitter unit 2, monitoring piece 4, receiving element 5, monochromator 6, ccd array signal translating system 7 and control collecting unit 8, the light signal that light source 1 sends is given the transmitter unit 2 that is fixed on the vacuum chamber 3 by Optical Fiber Transmission, incide then in the vacuum chamber 3, and on monitoring piece 4, form hot spot, through monitoring piece 4 reflections, light after receiving by receiving element 5 by monochromator 6 chromatic dispersions after at the band of a certain wavelength coverage of its exit window interruption-forming, the ccd array signal translating system 7 that is positioned at outgoing window place changes the intensity distributions of band the distribution of electric charge power into, is undertaken carrying out data processing and calculating for computing machine 9 after the A/D conversion by control collecting unit 8.
As illustrated in fig. 1 and 2, the beam split and the photoelectric conversion process of supervisory system of the present invention are as follows: the complex light that receiving element 5 obtains projects on first collimator objective 62 through entrance slit 61, and entrance slit 61 is on the focusing surface of first collimator objective 62.Therefore, light beam behind first collimator objective 62 is a parallel beam, this parallel beam is after plane grating 63 beam split, the parallel beam that is divided into different wave length is invested on second collimator objective 64 with different angle of diffraction, second collimator objective 64 plays photographic lens, these parallel beams image on the focusing surface of second collimator objective 64 after plane mirror 65 reflections, thereby obtain a series of by the tactic band of wavelength, outgoing window 66 is positioned on the focusing surface of second collimator objective 64, drive plane grating 63, can outgoing window 66 places form with the supervisory wavelength point be the center symmetry about the band of each tens nanometer, the intensity distributions of bands of a spectrum is changed into the distribution of electric charge power by the ccd array signal translating system 7 that is positioned at outgoing window 66 places with thousands of pixels, the control collecting unit receives data by computer monitoring software and carries out spectrum transform after the A/D conversion, spectrum simulation calculates evaluation function.Automatically declare according to evaluation function value supervisory system and to stop.
The size of outgoing window 66 is traditionally arranged to be 3-5mm, make the bands of a spectrum that form a certain supervisory wavelength band point after monochromator 6 beam split, the width of these bands of a spectrum is determined by the size of outgoing window 66, outgoing window 66 is big more, the bands of a spectrum of gained are wide more after its beam split, in order to guarantee behind ccd array signal translating system 7, to have high resolving power, the bands of a spectrum of a certain supervisory wavelength point of gained are unsuitable wide after the beam split, for supervisory wavelength point for the symmetry at center about the band of each tens nanometer, this band is generally 100nm, and the scope of its control point wavelength is generally 400-900nm.
The parameter of monochromator 6 is that entrance slit 100 μ m, outgoing window 3mm, focal length 300mm are about 7.3pixels through its pixel resolution of measuring and calculating.As supervisory wavelength is 400nm, drive grating, adjust wavelength to 400nm, form the band of 350-450nm at outgoing window 66,3648 valid pixels by CCD receive, the chromatic dispersion number is 100nm/3648pixels, and by formula wavelength resolution (FWHM)=pixel resolution * chromatic dispersion number, the wavelength resolution that can calculate this device is 0.2nm.For supervisory wavelength is 900nm, drive grating 63, adjust wavelength to 900nm, then form the band of 850-950nm at outgoing window 66, be the band of supervisory wavelength point for each 50nm about the symmetry at center, the width of this band is 100nm, and the wavelength resolution that calculates this device is 0.2nm.For supervisory wavelength is 650nm, drives grating 63, adjusts wavelength to 650nm, then forms the band of 600-700nm at outgoing window 66.It all forms the band that a width is 100nm at outgoing window 66 places for the arbitrary control point in the 400-900nm wavelength coverage by that analogy, and the wavelength resolution that calculates this device is 0.2nm.The size that can also adjust entrance slit 61 and outgoing window 66 according to the needs of plated film is adjusted the wavelength resolution of this device.The size of outgoing window 66 is relevant with the width of the bands of a spectrum of supervisory wavelength, and the spectral bandwidth of outgoing window 66 big more resulting supervisory wavelength is wide more.The wavelength resolution of light-dividing device is generally 0.2-1nm in this supervisory system.
Supervisory system of the present invention, both guaranteed to have enough monitor data amounts, effectively raise the wavelength resolution of device again, efficiently solve the drawback of single wavelength monitor and wide optical spectrum monitor, for the optical spectrum monitor system realizes that in the optical coating process High Precision Automatic plated film provides a kind of scientific methods.
It is pointed out that any pro forma distortion of making according to the specific embodiment of the invention, all do not break away from the scope that spirit of the present invention and claim are protected.
Claims (5)
1. online film thickness monitoring system of high-resolution narrow-band spectrum, comprise light source, transmitter unit, monitoring piece, receiving element, the spectrum light-dividing device, ccd array signal translating system and control collecting unit, it is characterized in that, described spectrum light-dividing device comprises entrance slit, first collimator objective, plane grating, second collimator objective, plane mirror, complex light projects on first collimator objective through entrance slit and obtains parallel beam, parallel beam projects second collimator objective after the plane grating beam split, on the focusing surface through imaging in second collimator objective behind the plane mirror, the focusing surface of second collimator objective is provided with the outgoing window, described outgoing window place forms presses the tactic band of wavelength, the width of this band is to determine according to the big or small of outgoing window, and driving plane grating can be centrosymmetric dynamic spectrum band with the supervisory wavelength point in the formation of outgoing window place; The light signal that light source sends is given the transmitter unit that is fixed on vacuum chamber by Optical Fiber Transmission, incide in the vacuum chamber then, and on monitoring piece, form hot spot, reflect through monitoring piece, light after being received by receiving element is centrosymmetric dynamic spectrum band at its exit window interruption-forming with the supervisory wavelength point after by the chromatic dispersion of described spectrum light-dividing device, the ccd array signal translating system that is positioned at outgoing window place changes the intensity distributions of band the distribution of electric charge power into, is undertaken carrying out data processing and calculating to computing machine after the A/D conversion by the control collecting unit.
2. the online film thickness monitoring system of high-resolution narrow-band spectrum as claimed in claim 1 is characterized in that the scope of described band is 400nm-900nm.
3. the online film thickness monitoring system of high-resolution narrow-band spectrum as claimed in claim 1 is characterized in that described ccd array signal translating system is the CCD linear array.
4. the online film thickness monitoring system of high-resolution narrow-band spectrum as claimed in claim 1 is characterized in that the size of described outgoing window is 1-10mm.
5. as the online film thickness monitoring system of the arbitrary described high-resolution narrow-band spectrum of claim 1-4, it is characterized in that it is 0.2-1nm that light beam obtains spectral resolution behind described spectrum light-dividing device and ccd array signal translating system.
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102778202B (en) * | 2012-03-23 | 2016-01-27 | 北京京东方光电科技有限公司 | A kind of film thickness measurement device and method |
| CN104215187A (en) * | 2013-05-31 | 2014-12-17 | 昆山胜泽光电科技有限公司 | Device for measuring thickness and refractive index of AR (antireflection) film |
| CN103323107A (en) * | 2013-06-17 | 2013-09-25 | 中国人民解放军军械工程学院 | Fast measuring system and method for laser information |
| CN103575398B (en) * | 2013-11-26 | 2016-04-27 | 武进田 | UV, visible light near infrared spectrometer echelette grating light-dividing device |
| CN113267130B (en) * | 2021-06-11 | 2022-08-05 | 华中科技大学 | Line scanning film thickness measuring system |
| CN116770257B (en) * | 2023-06-25 | 2024-02-06 | 广州市博泰光学科技有限公司 | Optical lens coating film manufacturing system and manufacturing method thereof |
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| CN2349564Y (en) * | 1998-09-30 | 1999-11-17 | 复旦大学 | Single axle driven intelligent raster monochromator |
| CN2783265Y (en) * | 2005-04-01 | 2006-05-24 | 北京欧普特科技有限公司 | Online monitoring system of wide spectrum optical coated membrane |
| CN1896722A (en) * | 2005-10-21 | 2007-01-17 | 中国科学院长春光学精密机械与物理研究所 | Continuouslly-scanning fluorescent imaging file tester |
| CN2869853Y (en) * | 2006-02-14 | 2007-02-14 | 南京中地仪器有限公司 | Laser-inducing plasma spectrum analyser |
| CN201012934Y (en) * | 2007-02-01 | 2008-01-30 | 河南中光学集团有限公司 | Monochro-meter automatic control device |
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| CN2349564Y (en) * | 1998-09-30 | 1999-11-17 | 复旦大学 | Single axle driven intelligent raster monochromator |
| CN2783265Y (en) * | 2005-04-01 | 2006-05-24 | 北京欧普特科技有限公司 | Online monitoring system of wide spectrum optical coated membrane |
| CN1896722A (en) * | 2005-10-21 | 2007-01-17 | 中国科学院长春光学精密机械与物理研究所 | Continuouslly-scanning fluorescent imaging file tester |
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