CN101479520A - 低释放率的气瓶组件 - Google Patents
低释放率的气瓶组件 Download PDFInfo
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- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
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- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K1/00—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
- F16K1/30—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces specially adapted for pressure containers
- F16K1/304—Shut-off valves with additional means
- F16K1/305—Shut-off valves with additional means with valve member and actuator on the same side of the seat
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- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K11/00—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves
- F16K11/02—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit
- F16K11/06—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements
- F16K11/065—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements with linearly sliding closure members
- F16K11/07—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements with linearly sliding closure members with cylindrical slides
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- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10T137/00—Fluid handling
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- Y10T137/86324—Tank with gas vent and inlet or outlet
- Y10T137/86332—Vent and inlet or outlet in unitary mounting
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Abstract
提供一种用于控制加压流体从高压气瓶(110)的出口排出的装置(100),该高压气瓶(110)容纳毒性的氢化物或可燃化合物。该装置(100)包括:用于保持处于至少部分气相的加压流体的气瓶(110);在密封位置螺纹式地连接至气瓶(110)的上部的气瓶端口主体(114);布置在气瓶端口主体(114)内的双端口阀头组件(116),其中,第一端口(130)用于利用加压流体填充该气瓶,第二端口与气瓶的出口(122)流体连通,以排出加压流体;气流排出路径(120),其由第二端口主体和出口部分地限定,并且还包括布置在第二端口主体上游的限流路径(130)和流道,但是,其中,该气流排出路径不包括选自压力调节器、止回阀和限流孔口的限制元件;并且当气瓶(110)的出口暴露于大气状态时,该限流路径(130)将从该气瓶排出的气体的流率限制为5,000sccm。
Description
技术领域
[0001]本发明涉及用于将高毒性的和/或可燃的化合物输送至半导体制造工具的高压气瓶组件(package)。
背景技术
[0002]诸如半导体制造的工业处理及制造应用需要对高毒性的或可燃的氢化物气体和卤化物气体的安全的储存和处理。半导体工业尤其依赖于用于晶片处理的硅烷(SiH4)的气态氢化物和诸如三氢化砷(AsH3)和三氢化磷(PH3)的液态压缩气体。各种半导体工艺系统通常使用处于高达1,500磅/平方英寸的压力下的SiH4,AsH3和PH3。由于它们的极度毒性和高蒸汽压,故由于输送系统构件的失效或在气瓶更换(change out)过程期间的人为差错所造成的不受控制的释放可导致灾难性的后果。例如,诸如硅烷的可燃气体的释放可导致火灾和系统损坏,并且可能造成人身伤害。另一方面,诸如三氢化砷的高毒性气体的泄漏可导致人身伤害甚至死亡。
[0003]参考作为极度毒性气体如何用于半导体工业的更加具体的示例的硅烷处理,硅烷通常在大约250磅/平方英寸或更高压力下储存在加压容器中。气瓶在生产环境中的处理存在各种各样的危险情况。一个140克硅烷气瓶的泄漏可将具有10英尺高度的30,000平方英尺的建筑的整个体积污染至立即危及生命和健康(IDLH)水平。如果泄漏率较大,则这可能仅仅在一分钟或两分钟内发生,这将意味着在漏失源附近区域中将存在极其致命的浓度达数个小时。
[0004]用于硅烷等的标准高压气瓶通常具有500毫升或更多的容积,并且包括气体在使用点通过其排出的阀出口。硅烷在高压下填充直到气瓶达到大约20%的容积。一旦填充,关闭气瓶阀并且将安全帽安装在阀出口上。气瓶随后输送至半导体工厂(fab),在半导体工厂处终端用户将在通风良好区域中移开安全帽,将容器放置在竖直位置,将气瓶附连至分配歧管,对新形成的连接进行吹洗并检漏,并且打开气瓶阀。该气瓶然后分配气态产品。
[0005]鉴于与这些流体从高压气瓶中非故意的释放相关的危险,本领域已提出多种提议来防止毒性流体/可燃流体的灾难性释放。
[0006]一种这样的提议是使用安装在高压气瓶外部的出口或流体流径中的限流孔口(RFO)。至少两种RFO可在当前被获得并使用。第一种是包括小直径孔(大约0.010英寸或254μm的直径)的金属衬垫,该小直径孔被钻通穿过具有大约0.5-0.7毫米厚度的垫圈状盘或衬垫的中心。第二种RFO设计是螺旋式连接至气瓶阀使用端口的插塞型孔口。这种RFO同样具有尺寸与上述RFO相似的直径孔。在高压(例如,1,500磅/平方英寸)下,这些RFO能够将最大流率限制为上千或上万标准立方厘米每分钟(sccm)。然而,这通常是不可接受的高流率。例如,当使用硅烷时,为了获得大约21,500sccm的释放率,气瓶压力必须降低至800磅/平方英寸。这种降低的填充压力又严格地限制了每个气瓶的总容积。这种容积限制需要更加频繁地更换气瓶,这又增加了气体泄漏、暴露和/或火灾的危险。称为SEMATECH(半导体制造技术)的半导体协会估计大约35%的与气体相关的事件发生在气瓶更换期间。
[0007]其它可选的系统已经在美国专利No.6,089,027和No.6,343,476B1中提出。在这些系统中,一个或多个设定压力调节器沿着气体的流径顺序地布置,该流径与气瓶的出口相连通。利用该调节器以将压力逐渐降低至大约100磅/平方英寸并且降低气瓶出口处的流率。此外,在称为并由Advanced Technology Materials,Inc.销售的商业实例中,采用诸如上述RFO的标准RFO,以将最大流量进一步降低至大约5,000sccm。
[0008]美国专利No.5,937,895;6,007,609;6,045,115公开了具有接通/断开阀的高压气瓶,这些专利转让给Praxair Technology,Inc.,并且通过引用而全部结合于本发明中。在这些文献中公开的系统只有当在出口上施加真空(即小于760托)时才能由终端用户打开。
[0009]本发明提供超过现有技术的若干优点,包括当高压气瓶的出口暴露于大气状态或者另外工作于超大气状态时,降低高毒性气体和/或可燃气体的流率。
[0010]本发明的另一个目的是提供一种装置,其不需要内部压力调节器、止回阀、限流孔口或其它机械操作特征,从而降低与高压气瓶和/或机械装置相关的成本和故障概率。
[0011]本发明的另一个目的是消除与使用外部RFO相关的可能误差。外部RFO可能在垫圈型RFO的情况下在密封表面周围泄漏,或者可能在插塞型RFO的情况下在螺纹周围泄漏。另外,操作者可能忘记安装RFO或可能安装尺寸不恰当的RFO。在附连气瓶之后或在移开气瓶之前的期间,去除夹带在RFO装置和气瓶阀座之间的所有空气或产品将非常关键。通过设计,RFO构造成用于在使用期间急剧地限制流过该装置的流量,但是在吹洗和抽空该连接的情况下,这种限制严格地限制了吹洗/抽空过程的速率和效率,从而增加了气体释放和/或人体暴露的可能性。通过将降低流量装置定位在气瓶内部或气瓶隔离阀的上游,消除了上述的差错。
[0012]又一目的是相比于传统的高压硅烷气体气瓶增大了可从气瓶获得的产品量。如上所述,当前提供的外部RFO使硅烷的最大填充压力通常限制为最大800磅/平方英寸。另一方面,本发明允许气瓶压力增加至高达1,500磅/平方英寸,并且相应增加的容积转化为更少的气瓶更换,从而改善了终端用户的安全性和生产率。
[0013]另一个目的是关于通风。压缩气体的所需的气体箱或气体柜的通风通常基于组件的更坏情况的预期释放率。具有0.010英寸RFO的800磅/平方英寸压力的硅烷气瓶的通常的排放速率处于300至350CFM的数量级。压缩气体协会(Compressed Gas Association)的出版物G-13-2006Storage and Handling of Silane and Silane Mixtures的第13节描述了硅烷在各种位置的通风需求。具体而言,第13.2.3.1.1节描述了用于确定最小通风率的计算方法。基于参考的计算方法,本发明可允许通风率从300-350CFM降低至50-100CFM,即3.5至6倍的降低。降低的通风率与降低的功率消耗和设备维修直接相关。
[0014]在阅读说明书、附图和所附的权利要求之后,本发明的其它的目的和方面将对本领域技术人员变得显而易见。
发明内容
[0015]根据本发明的一个方面,提供了一种用于控制加压流体从高压气瓶的出口排出的装置,该高压气瓶容纳毒性的氢化物或可燃化合物。该装置包括:用于保持处于至少部分气相的加压流体的气瓶;在密封位置螺纹式连接至气瓶的上部的气瓶端口主体;布置在气瓶端口主体内的双端口阀头组件,其中,第一端口用于利用加压流体填充气瓶,第二端口与气瓶的出口流体连通,以排出加压流体;气流排出路径,其由第二端口主体和出口部分地限定,并且还包括布置在第二端口主体上游的限流路径和流道,但是,其中,该气流排出路径不包括选自压力调节器、止回阀和限流孔口的限制元件;并且当气瓶的出口暴露于大气状态时,该限流路径将从气瓶排出的气体的流率限制为5,000sccm。
[0016]根据本发明的另一个方面,提供了一种用于控制加压流体从高压气瓶的出口排出的装置,该高压气瓶容纳毒性的氢化物或可燃化合物,其中,限流路径为超流阀,其当通过阀的预设流率被超过时限制和/或停止流体的流出。预设流率是通过该装置的流体的最大流率。例如,超流阀可设置为允许流体流的输送从0至5,000sccm,但是如果由于任何原因通过该装置的流率超过5,000sccm(诸如构件失效或装置下游的泄漏),超流阀将关闭并防止流体的任何的进一步释放。如果发生构件失效或泄漏,该装置将防止气体的进一步逃逸,从而将剩余流体保持在气瓶或储存容器内。单独地或与毛细管流限制器相组合,这种特征极大地提高了气瓶组件的安全特性、环境特性和健康特性。
附图说明
[0017]通过本发明的优选实施例的详细说明并结合附图,将更好地理解本发明的目的和优点,在附图中相同的标号始终表示相同的特征,在附图中:
[0018]图1示出了用于控制加压流体从高压气瓶的出口排出的装置的示意性截面图;
[0019]图2示出了毛细管流限制器的截面图;
[0020]图3示出了连接至半导体工具的本发明装置的示意图;和
[0021]图4示出了用于控制加压流体从高压气瓶的出口排出的装置的示意性截面图,该装置具有在其中的超流阀。
具体实施方式
[0022]半导体器件的制造需要多个工艺步骤,例如包括影响器件的导电率的某些衬底的掺杂、外延生长或金属有机物的化学气相沉积。通常,高毒性的或可燃的氢化物流体和卤化物流体在气相下被储存并分配至这些半导体制造工具。为了进行说明,本发明将关于硅烷气体进行描述。然而,本领域技术人员应理解的是,可使用其它毒性的氢化物气体或卤化物气体,诸如三氢化砷、三氢化磷和乙硼烷。
[0023]参考图1,描述了根据本发明的示范性实施例的用于控制加压流体的排出的装置100。装置100包括流体储存及分配气瓶110,其限定并围绕内部体积112,如图所示。
[0024]在容器的颈部处,包括双端口阀头组件116的气瓶端口主体114与套环118的内部螺纹开口螺纹式接合。双端口阀头组件116包括流体流排出通道120,其与阀头组件中的中心工作体积空腔形成流体流连通。中心工作体积空腔又与出口122连通,该出口122可在外部具有螺纹,或者另外构造成用于将连接器和相关管道和导管等联接至出口122。
[0025]阀元件124布置在中心工作体积空腔中,阀元件124在所示实施例中连接至手轮126,但是阀元件124可以可选地连接至自动阀促动器或其它控制器,诸如气动促动装置或电子促动装置。
[0026]阀头组件116还具有如下特征,即,在阀块中,填充通道128与填充阀130(和端口,其未示出但三维地定位在阀体后方)和容器的内部体积112相连通。因此,容器110可被加压气体填充,并且其后关闭并盖上填充端口。这种双端口阀在市场上可从位于Luxembourg的Ceodeux Ultra Pure Equipment Company获得。
[0027]阀头组件114中的中心流体流排出通道120在其下端处连接至限流路径130,该限流路径130包括位于限流路径的进口处的过滤器132。该进口布置在气体空间中,并且在液态压缩气体的情况下位于保持在气瓶110中的液态流体的上方。限流路径130的使用增加了在阀头组件114被剪断或者高压气瓶的出口另外地打开至大气状态的情况下的安全性。尤其,限流路径的优选结构为尺寸均匀的毛细管,其提供了灵活性和可靠性。限流路径的毛细管将气体从气瓶排出的流率限制为不超过5,000sccm。然而,限流路径和作为一个整体的装置都不包括选自压力调节器、止回阀或限流孔口的限制元件。
[0028]具体而言,参考图1,导管限定至少两个毛细管通道,其中毛细管的内径将处于大约126微米或更小的数量级。对于两个毛细管通道,这种直径将气瓶的释放率限制为小于5,000sccm(或5LPM),该气瓶具有可被迫使通过管道的1,500磅/平方英寸饱和压力的硅烷。通常的终端用户需要在大约0.2至5LPM的范围内的流率。以5LPM的速率,将花费39个小时使容器变空。这将花费8.5个小时使具有10英尺高度的30乘30英尺的房间达到1%的硅烷爆炸下限水平。八个半小时将为警报提供充裕的时间,以警示人员离开并使响应小组采取必要的行动。因此,多个毛细管的直径通常将小于126微米。
[0029]可调节毛细管的长度和直径,以提供通过该限制的最大期望流率5,000sccm。在以上述速率输送硅烷的情况下,毛细管通常为6.35厘米长。对于该长度,将需要两个具有大约126微米直径的并行的毛细管,以提供大致相同的流动容积。本发明的导管中的多个毛细管通道可小到2微米。然而,毛细管通道的尺寸通常将设置为使用不超过八个且不少于两个的毛细管通道,以提供众多通道并且同时仍然允许气体以适当的流率释放。
[0030]本发明的有益特征是提供管道的基本圆形的外部截面,该管道具有较均匀的内部毛细管通道。通过该管道的内部打开的流动区域将几乎完全由规则的毛细管限定(即,这些毛细管具有采用相同的规则性重复形状的形式的截面)。这些规则的毛细管优选地具有圆形截面。各个毛细管通道的圆度可由直径的变化所限定,直径的变化沿跨过每个毛细管通道的基本圆形截面的任何两条直线方向获得,并且不超过15%。不同的均匀毛细管通道的一致性可由毛细管之间的平均直径的变化所限定,该平均直径的变化不超过15%。通过该管道的所有剩余的流动区域通常采用尺寸不规则的毛细管通道的形式,该尺寸不规则的毛细管通道具有小于规则的毛细管通道的各个横截面积的各个横截面积。通常,不规则毛细管将具有等于规则毛细管的平均流动面积的50%或更小的平均横截面积。不规则毛细管的较小的直径减小了不规则毛细管的存在可能对通过限制器的流率调节的不利影响。
[0031]限流路径的优选结构是均匀的多毛细管组件,其中毛细管可为了额外的强度而被卷绕,或者另外以基本直线的平行通道而构成。毛细管可采用细长的轴或杆的形式,导管的外壁以及毛细管本身可由合适形成这种结构的任何材料制成。因此,获得的毛细管结构具有由限定毛细管的材料的稳定性或转变温度所限制的工作温度。这种尺寸的毛细管可由各种玻璃材料制成。用于形成玻璃纤维和管道本身的拉制技术非常容易用于生产本发明的管道结构。合适的玻璃材料包括硅酸铅、硅酸硼、传统的玻璃(钠钙硅酸盐玻璃)和其它形式的高纯度二氧化硅,诸如石英或熔融二氧化硅。特别优选的玻璃材料是石英。
[0032]参考图2,玻璃壁的厚度可相对于毛细管直径制造得相当大,以克服玻璃的易碎性。恰当的包围可进一步克服玻璃的所有易碎性。如图2中的截面图所示,在该实施例中,管道200优选地限定围绕中心毛细管通道240的六个毛细管通道220的六边形布置,其中所有的毛细管具有相同的相对直径。
[0033]管道可由外套筒围绕,以提供额外的支承和结构完整性。这种套筒可由金属材料构成。通常由不锈钢构成的可选的金属管道260可保护性地围绕玻璃管道200。金属管道260当可选地围绕结构200收缩时进一步增加了刚性和耐用性,并且提供了加强单元。利用金属管道260的可选的加强,玻璃管道的破碎将再次使通过毛细管装置130的限制流径的运行基本不发生变化。特别有利的装置可缩小围绕玻璃的多毛细管组件的金属套筒,以将管道压缩至套筒内。诸如这种装置的装置可提供所需的结构支承,用于施加推动许多流体通过直径接近126微米的毛细管所需的必要的超高压力。
[0034]毛细管装置可利用成型方法制成,该成型方法容易提供本发明的组件结构,尤其是均匀的多毛细管组件。该方法形成具有基本圆形的周边的多毛细管管道或导管,该周边围绕由外壁内的内壁所限定的多个规则的毛细管通道。该方法起始于将多个较小的导管插入围绕管道以形成管道和导管组件。该导管可通过将管道坯料变小地拉制为所期望的导管尺寸而形成。插入导管的数量将与由成型方法获得的规则毛细管的数量相符合。导管的共同开口围绕管道和导管组件的一端密封,以形成具有封闭端和相对的打开端的拉制坯料,所有导管围绕该封闭端相对流体流密封,所有导管围绕该打开端针对流体流打开。然后在合适的拉制装置中将拉制坯料加热到软化温度。
[0035]当限制来自拉制坯料的敞开导管端的流体流时同时拉制受热的拉制坯料,这将使导管的内部缩小至毛细管尺寸,并且同时防止导管内部的塌缩式封闭。具有基本等于导管数量的多个毛细管通道的多毛细管管道可通过拉伸并冷却拉制坯料而获得。在许多情况下,导管直径在拉制受热的拉制坯料期间的减小在其敞开端处提供足够的直径减小,以将流出导管内部的气体流合适地限制到维持由导管形成的毛细管通道的期望最终直径的速率。
[0036]在本发明的另一个实施例中,并且重新参考图1,在限流路径130的上游,具有管状安装部分的过滤器单元132用于移除污染颗粒,该管状安装部分螺纹式地或另外地接合至限流路径128,用于可配合的接合。该过滤器可以是可耐受气瓶内的高压的任何合适的膜、网或烧结金属过滤器,该烧结金属过滤器在本领域已知作为熔块过滤器。
[0037]在另一实施例中,如图3所示,气瓶100与诸如化学气相沉积工具300的半导体工具形成流体连通。质量流量控制器310布置在气瓶和工具之间的管线上,该质量流量控制器310控制输送至工具的气体的流率。通常,该工具需要从大约200至5,000sccm的流率。因此,来自气瓶100的最大流率为大约5,000sccm是比较理想的,而不管该流体流是否到达工具或者出口是否简单地暴露于大气状态。
[0038]在可选实施例中,如图4所示,毛细管装置130可与超流阀组件400组合地使用,或者由超流阀组件400替代,该超流阀组件400位于中心流体流排出通道120的上游或者位于阀124的上游。超流阀组件设置为当超过预设流率时阻止来自气瓶110的气体流。预设流率是通过该装置的流体的最大流率。例如,超流阀可设置为允许流体流的输送可从0至5,000sccm,但是如果由于任何原因通过该装置的流率超过5,000sccm(诸如构件失效或装置下游的泄漏),超流阀将关闭并防止流体的任何的进一步释放。如果发生构件失效或泄漏,该装置将防止气体的进一步逃逸,从而将剩余流体保持在气瓶或储存容器内。单独地或与毛细管流限制器相组合,这种特征极大地提高了气瓶组件的安全特性、环境特性和健康特性。因此,在促动轮126并打开阀124或另外地剪断阀头128之后,超流阀组件400将气体流率限制为大约0sccm。另外地,另一个超流阀400可附连至流径128或与流径128连通,并且在阀130的上游,在存在完全的阀剪断的情况下通过端口128的气体流也将被阻塞,从而防止流体通过128或120从容器逃逸。超流阀(在操作上)是一种机械装置,该机械装置检测在该装置上的压差并且当超过预设的压差或最大流率时停止通过该装置的流。这种装置在市场上可从Lee Company或其它制造商处获得。
[0039]将参考以下示例进一步详细描述根据本发明的低释放率组件,但是以下示例不被视为限制本发明。
示例
[0040]制备用于控制加压流体的排出的装置。该气瓶尤其包括通过在其中具有毛细管通道组件而部分限定的气流排出路径。该气瓶省略了压力调节器、止回阀和限流孔口。该气瓶填充有加压硅烷,并且连接至诸如金属有机物的气相沉积的半导体工具。同样,不具有毛细管通道的传统的高压硅烷组件连接至需要1,300seem的半导体工具。结果在下表1中列出。
表1
本发明的装置(68μm毛细管) | 传统的T形(高压气瓶) | |
可输送的产品(kg) | 13.5 | 5.6 |
最大释放率(sccm) | 5,000 | 21,460 |
可输送的产品(总量的百分比) | 86.5 | 96.8 |
[0041]从上述结果可以看出,用于保持产品的气瓶的容积增加了2.4倍达到13.5kg,并且硅烷的可输送量高达86.5%(或者11.7kg,相比于从传统气瓶获得的5.4kg)。此外,来自气瓶的释放率限制为5,000sccm,而传统气瓶具有21,460sccm的释放能力。释放率的这种四倍的减小改善了在下游泄漏或构件失效的情况下的组件的安全性,并且又允许每个气瓶的更大的填充体积,这与更少的气瓶更换相关。
[0042]基于工具的需求,制备毛细管组件以实现最大输送5,000sccm。在正常的工具操作期间,毛细管不具有除提供流径以外的预期功能,通过该流径,流体从容器内移动至出口。然而,在毛细管下游的不受控制的释放期间(诸如构件失效),毛细管将来自气瓶的最大流率限制至5,000sccm。
[0043]表2列出了从15.6kg硅烷气瓶输送的基于工具流量需求的气瓶剩余物(heel)和可用产品。
表2
工具流量需求(sccm) | 气瓶压力(维持期望流率所需的最小气瓶压力,(即在不同流率的检测点)) | 气瓶容量(剩余物Kg) | 可用容积 |
200 | 59 | 0.3 | 15.3 |
500 | 149 | 0.8 | 14.8 |
1,000 | 297 | 1.6 | 14.0 |
1,300 | 386 | 2.1 | 13.5 |
2,500 | 743 | 5.2 | 10.4 |
5,000 | 1,486 | 15.5 | 0.1 |
[0044]可从上表看出,降低工具流率将导致来自用于该示例的气瓶的产品的更高产品利用率。
[0045]虽然已经参考本发明的具体实施例来详细地描述本发明,但是对本领域技术人员显而易见的是,在不脱离权利要求的范围的情况下,可进行各种变化和改进以及采用等同物。
Claims (13)
1.一种用于控制加压流体从高压气瓶的出口排出的装置,该高压气瓶容纳毒性的氢化物/卤化物或可燃化合物,所述装置包括:
用于保持处于至少部分气相的加压流体的气瓶;
在密封位置螺纹式地连接至所述气瓶的上部的气瓶端口主体;
布置在所述气瓶端口主体内的双端口阀头组件,其中,第一端口用于利用加压流体填充所述气瓶,第二端口与所述气瓶的出口处于流体连通,以排出所述加压流体;
气流排出路径,其由所述第二端口主体和所述出口来部分地限定,并且还包括布置在所述第二端口主体上游的限流路径和流道,但是,其中,所述气流排出路径不包括选自压力调节器、止回阀和限流孔口的限制元件;并且
当所述气瓶的出口暴露于大气状态时,所述限流路径将从所述气瓶排出的气体的流率限制为最大5,000sccm。
2.如权利要求1所述的装置,其特征在于,所述限流路径由具有至少两个毛细管通道的导管限定。
3.如权利要求2所述的装置,其特征在于,所述毛细管通道具有大约126微米或更小的直径。
4.如权利要求1所述的装置,其特征在于,来自处于全压力下的所述气瓶的最大流率在所述大气状态下不超过5,000seem。
5.如权利要求2所述的装置,其特征在于,所述导管围绕多根细长轴,以限定限流路径。
6.如权利要求5所述的装置,其特征在于,所述毛细管包括直的管道,并且具有由至少两个外部管道围绕的一个中心管道的布置,以提供通过所述管道的毛细管尺寸的流动区域。
7.如权利要求1所述的装置,其特征在于,所述装置还包括质量流量控制器,其布置在所述气瓶出口的下游并且流体式地连接至半导体制造工具,其中,从所述气瓶至所述工具的质量流率在从大约200至大约5,000seem的范围内。
8.如权利要求1所述的装置,其特征在于,所述毛细管布置在所述气瓶中的液态流体的上方。
9.如权利要求1所述的装置,其特征在于,所述装置还包括在所述限流路径上游的烧结金属熔块过滤器。
10.如权利要求1所述的装置,其特征在于,所述流道布置在所述限流路径的下游,并且与所述第二端口连通。
11.如权利要求1所述的装置,其特征在于,所述装置还包括用于控制沿着所述流体排出路径的流体流的切断阀,其中所述关断阀选自手动阀、气动阀或电动阀。
12.一种用于控制加压流体从高压气瓶的出口排出的装置,该高压气瓶容纳毒性的氢化物或可燃化合物,所述装置包括:
用于保持处于至少部分气相的加压流体的气瓶;
在密封位置螺纹式地连接至所述气瓶的上部的气瓶端口主体;
布置在所述气瓶端口主体内的双端口阀头组件,其中,第一端口用于利用加压流体填充所述气瓶,第二端口与所述气瓶的出口处于流体连通,以排出所述加压流体;
气流排出路径,其由所述第二端口主体和所述出口部分地限定,并且还包括超流阀和布置在所述第二端口主体上游的流道,但是,其中,所述气流排出路径不包括选自压力调节器、止回阀和限流孔口的限制元件;并且
所述超流阀在超过预设流率时隔断来自所述气瓶的流。
13.如权利要求12所述的装置,其特征在于,所述填充端口流径包括超流阀,所述超流阀在超过所述预设流率时隔断通过所述填充端口的流。
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US11/477,906 US20080000532A1 (en) | 2006-06-30 | 2006-06-30 | Low release rate cylinder package |
US11/477,906 | 2006-06-30 | ||
PCT/US2007/014814 WO2008016441A2 (en) | 2006-06-30 | 2007-06-26 | Low release rate cylinder package |
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CN109114422A (zh) * | 2018-09-12 | 2019-01-01 | 西安飞机工业(集团)有限责任公司 | 一种防止飞机储气瓶积水倒流的方法及气瓶接头 |
CN109538933A (zh) * | 2018-12-29 | 2019-03-29 | 武汉格罗夫氢能汽车有限公司 | 一种多个储氢瓶共用瓶阀组件 |
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- 2007-06-26 CN CN2012102917798A patent/CN102853254A/zh active Pending
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- 2007-06-26 TW TW96123089A patent/TWI418725B/zh not_active IP Right Cessation
- 2007-06-26 WO PCT/US2007/014814 patent/WO2008016441A2/en active Application Filing
- 2007-06-26 CN CN200780024551XA patent/CN101479520B/zh not_active Expired - Fee Related
- 2007-06-26 KR KR1020087031756A patent/KR20090031377A/ko not_active Application Discontinuation
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CN108169318A (zh) * | 2018-01-23 | 2018-06-15 | 中国烟草总公司郑州烟草研究院 | 一种连续可调的标气配气装置 |
CN109114422A (zh) * | 2018-09-12 | 2019-01-01 | 西安飞机工业(集团)有限责任公司 | 一种防止飞机储气瓶积水倒流的方法及气瓶接头 |
CN109538933A (zh) * | 2018-12-29 | 2019-03-29 | 武汉格罗夫氢能汽车有限公司 | 一种多个储氢瓶共用瓶阀组件 |
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KR20090031377A (ko) | 2009-03-25 |
DE602007005132D1 (de) | 2010-04-15 |
JP2009542988A (ja) | 2009-12-03 |
CN102853254A (zh) | 2013-01-02 |
WO2008016441A2 (en) | 2008-02-07 |
IL195899A0 (en) | 2009-09-01 |
TW200815702A (en) | 2008-04-01 |
WO2008016441A3 (en) | 2008-04-03 |
EP2035741A2 (en) | 2009-03-18 |
US20080000532A1 (en) | 2008-01-03 |
EP2035741B1 (en) | 2010-03-03 |
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TWI418725B (zh) | 2013-12-11 |
IL195899A (en) | 2013-06-27 |
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