CN101452846B - 厚铝成膜工艺方法 - Google Patents
厚铝成膜工艺方法 Download PDFInfo
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- CN101452846B CN101452846B CN200710094354A CN200710094354A CN101452846B CN 101452846 B CN101452846 B CN 101452846B CN 200710094354 A CN200710094354 A CN 200710094354A CN 200710094354 A CN200710094354 A CN 200710094354A CN 101452846 B CN101452846 B CN 101452846B
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- aluminum film
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CN200710094354A CN101452846B (zh) | 2007-11-30 | 2007-11-30 | 厚铝成膜工艺方法 |
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CN200710094354A CN101452846B (zh) | 2007-11-30 | 2007-11-30 | 厚铝成膜工艺方法 |
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CN101452846A CN101452846A (zh) | 2009-06-10 |
CN101452846B true CN101452846B (zh) | 2010-05-26 |
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Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102810504A (zh) * | 2011-05-31 | 2012-12-05 | 无锡华润上华半导体有限公司 | 厚铝生长工艺方法 |
CN102931059B (zh) * | 2011-08-11 | 2015-11-25 | 无锡华润上华科技有限公司 | 背金溅射方法 |
CN102586737A (zh) * | 2012-03-09 | 2012-07-18 | 上海先进半导体制造股份有限公司 | 铝铜膜的物理气相沉积方法 |
CN104779155B (zh) * | 2014-01-14 | 2018-01-02 | 北大方正集团有限公司 | 一种硅铝生长界面的处理方法和一种用于生长铝的硅片 |
CN106531637A (zh) * | 2016-12-05 | 2017-03-22 | 武汉新芯集成电路制造有限公司 | 一种改善铝膜缺陷的方法 |
US10438813B2 (en) | 2017-11-13 | 2019-10-08 | Alpha And Omega Semiconductor (Cayman) Ltd. | Semiconductor device having one or more titanium interlayers and method of making the same |
CN111524901B (zh) * | 2020-04-17 | 2023-02-28 | 深圳市华星光电半导体显示技术有限公司 | 阵列基板制备方法及成膜系统 |
CN113308676B (zh) * | 2021-05-25 | 2023-02-24 | 西安微电子技术研究所 | 一种铝硅铜厚金属薄膜物理气相淀积的腔体处理方法 |
CN114481031A (zh) * | 2022-02-11 | 2022-05-13 | 丹东安顺微电子有限公司 | 一种半导体生产用石墨坩埚蒸铝的工艺 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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US5208186A (en) * | 1989-02-09 | 1993-05-04 | National Semiconductor Corporation | Process for reflow bonding of bumps in IC devices |
CN1630042A (zh) * | 2003-12-18 | 2005-06-22 | 上海华虹Nec电子有限公司 | 一种金属配线的多步干法刻蚀方法 |
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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US5208186A (en) * | 1989-02-09 | 1993-05-04 | National Semiconductor Corporation | Process for reflow bonding of bumps in IC devices |
CN1630042A (zh) * | 2003-12-18 | 2005-06-22 | 上海华虹Nec电子有限公司 | 一种金属配线的多步干法刻蚀方法 |
Non-Patent Citations (1)
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JP特开平5-342923A 1993.12.24 |
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CN101452846A (zh) | 2009-06-10 |
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Owner name: SHANGHAI HUAHONG GRACE SEMICONDUCTOR MANUFACTURING Free format text: FORMER OWNER: HUAHONG NEC ELECTRONICS CO LTD, SHANGHAI Effective date: 20131216 |
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Effective date of registration: 20131216 Address after: 201203 Shanghai city Zuchongzhi road Pudong New Area Zhangjiang hi tech Park No. 1399 Patentee after: Shanghai Huahong Grace Semiconductor Manufacturing Corporation Address before: 201206, Shanghai, Pudong New Area, Sichuan Road, No. 1188 Bridge Patentee before: Shanghai Huahong NEC Electronics Co., Ltd. |