CN101379433B - 含有苯并*唑衍生物及其类似物作为敏化剂的紫外线敏感的平版印版前体 - Google Patents

含有苯并*唑衍生物及其类似物作为敏化剂的紫外线敏感的平版印版前体 Download PDF

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Publication number
CN101379433B
CN101379433B CN200780004999.5A CN200780004999A CN101379433B CN 101379433 B CN101379433 B CN 101379433B CN 200780004999 A CN200780004999 A CN 200780004999A CN 101379433 B CN101379433 B CN 101379433B
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China
Prior art keywords
hydrogen
aryl
replace
sensitizer
printing plate
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Expired - Fee Related
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CN200780004999.5A
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English (en)
Chinese (zh)
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CN101379433A (zh
Inventor
B·施特雷梅尔
H·鲍曼
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Kodak Graphic Communications GmbH
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Kodak Graphic Communications GmbH
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CN200780004999.5A 2006-02-08 2007-01-31 含有苯并*唑衍生物及其类似物作为敏化剂的紫外线敏感的平版印版前体 Expired - Fee Related CN101379433B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102006005826.7 2006-02-08
DE102006005826 2006-02-08
PCT/EP2007/000830 WO2007090550A1 (en) 2006-02-08 2007-01-31 Uv-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer

Publications (2)

Publication Number Publication Date
CN101379433A CN101379433A (zh) 2009-03-04
CN101379433B true CN101379433B (zh) 2012-05-30

Family

ID=38050240

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200780004999.5A Expired - Fee Related CN101379433B (zh) 2006-02-08 2007-01-31 含有苯并*唑衍生物及其类似物作为敏化剂的紫外线敏感的平版印版前体

Country Status (6)

Country Link
US (1) US8632937B2 (enExample)
EP (1) EP1987396B1 (enExample)
JP (1) JP4897834B2 (enExample)
CN (1) CN101379433B (enExample)
DE (1) DE602007006766D1 (enExample)
WO (1) WO2007090550A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7858292B2 (en) 2007-12-04 2010-12-28 Eastman Kodak Company Imageable elements with components having 1H-tetrazole groups
JP5546801B2 (ja) * 2008-06-10 2014-07-09 富士フイルム株式会社 紫外光レーザー露光用感光性樹脂組成物、パターン形成方法、その方法を用いて製造したカラーフィルタ、カラーフィルタの製造方法および液晶表示装置
TW201000099A (en) 2008-06-20 2010-01-01 Amgen Inc S1P1 receptor agonists and use thereof
JP5479759B2 (ja) * 2008-09-05 2014-04-23 株式会社半導体エネルギー研究所 ベンゾオキサゾール誘導体、発光素子用材料、発光素子、発光装置及び電子機器
EP2194429A1 (en) 2008-12-02 2010-06-09 Eastman Kodak Company Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates
EP2196851A1 (en) 2008-12-12 2010-06-16 Eastman Kodak Company Negative working lithographic printing plate precursors comprising a reactive binder containing aliphatic bi- or polycyclic moieties
US20100151385A1 (en) 2008-12-17 2010-06-17 Ray Kevin B Stack of negative-working imageable elements
EP2284005B1 (en) 2009-08-10 2012-05-02 Eastman Kodak Company Lithographic printing plate precursors with beta-hydroxy alkylamide crosslinkers
US8383319B2 (en) 2009-08-25 2013-02-26 Eastman Kodak Company Lithographic printing plate precursors and stacks
EP2293144B1 (en) 2009-09-04 2012-11-07 Eastman Kodak Company Method of drying lithographic printing plates after single-step-processing
CN103937324A (zh) * 2014-03-21 2014-07-23 中国科学院化学研究所 一种自由基聚合亲水性涂层材料及其在印刷版材制备中的应用
JP2016035042A (ja) * 2014-07-31 2016-03-17 太陽インキ製造株式会社 硬化性樹脂組成物、ドライフィルム、硬化物およびプリント配線板
EP3392709A1 (en) 2017-04-21 2018-10-24 Agfa Nv A lithographic printing plate precursor
CN114957151A (zh) * 2022-04-10 2022-08-30 同济大学 苯并五元环-苯乙炔基酮肟酯类化合物及其制备和应用
CN114656418B (zh) * 2022-04-10 2024-01-26 同济大学 一类(e)-苯并五元环-苯乙烯基硫鎓盐衍生物及其制备和应用

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0300410A2 (en) * 1987-07-21 1989-01-25 Mitsubishi Chemical Corporation Photopolymerizable composition
JP2002221790A (ja) * 2001-01-24 2002-08-09 Fuji Photo Film Co Ltd 感光性組成物およびそれを用いた光重合方法
CN1597313A (zh) * 2003-09-19 2005-03-23 富士胶片株式会社 平版印刷法和预敏化版

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002351071A (ja) * 2001-05-28 2002-12-04 Fuji Photo Film Co Ltd 感光性組成物
JP4337485B2 (ja) * 2003-09-16 2009-09-30 三菱化学株式会社 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法
JP2005181954A (ja) * 2003-11-28 2005-07-07 Konica Minolta Medical & Graphic Inc ホログラフィック記録メディア、ホログラフィック記録方法およびホログラフィック情報メディア
JP2006071916A (ja) * 2004-09-01 2006-03-16 Mitsubishi Chemicals Corp 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0300410A2 (en) * 1987-07-21 1989-01-25 Mitsubishi Chemical Corporation Photopolymerizable composition
JP2002221790A (ja) * 2001-01-24 2002-08-09 Fuji Photo Film Co Ltd 感光性組成物およびそれを用いた光重合方法
CN1597313A (zh) * 2003-09-19 2005-03-23 富士胶片株式会社 平版印刷法和预敏化版

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
A.Bondi.van der Waals Volumes and Radii.<<PHYSICAL CHEMISTRY>>.1964,第68卷(第3期),441-451. *
Yuan H.Zhao, Michael H.Abraham, Andreas M.Zissimos.Fast Calculation of van der Waals Volume as a Sum of Atomic and Bond Contributions and its Application to Drug Compounds.<<ORGANIC CHEMISTRY>>.2003,第68卷7368-7373. *

Also Published As

Publication number Publication date
JP2009526251A (ja) 2009-07-16
US8632937B2 (en) 2014-01-21
DE602007006766D1 (de) 2010-07-08
WO2007090550A1 (en) 2007-08-16
CN101379433A (zh) 2009-03-04
EP1987396A1 (en) 2008-11-05
JP4897834B2 (ja) 2012-03-14
EP1987396B1 (en) 2010-05-26
US20100291355A1 (en) 2010-11-18

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