CN101356017B - 灰尘除去装置 - Google Patents

灰尘除去装置 Download PDF

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Publication number
CN101356017B
CN101356017B CN2006800504562A CN200680050456A CN101356017B CN 101356017 B CN101356017 B CN 101356017B CN 2006800504562 A CN2006800504562 A CN 2006800504562A CN 200680050456 A CN200680050456 A CN 200680050456A CN 101356017 B CN101356017 B CN 101356017B
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CN
China
Prior art keywords
brush
cam
rotating brush
retreat
dust remover
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN2006800504562A
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English (en)
Chinese (zh)
Other versions
CN101356017A (zh
Inventor
中田厚纪
大山纯志
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NICOLES CO Ltd
Nix Inc
Original Assignee
NICOLES CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NICOLES CO Ltd filed Critical NICOLES CO Ltd
Publication of CN101356017A publication Critical patent/CN101356017A/zh
Application granted granted Critical
Publication of CN101356017B publication Critical patent/CN101356017B/zh
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/20—Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B08B1/34—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis parallel to the surface
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/26—Cleaning or polishing of the conductive pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
    • H05K2203/0257—Brushing, e.g. cleaning the conductive pattern by brushing or wiping

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
CN2006800504562A 2006-01-12 2006-06-09 灰尘除去装置 Active CN101356017B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP005363/2006 2006-01-12
JP2006005363A JP4611900B2 (ja) 2006-01-12 2006-01-12 ダスト除去装置
PCT/JP2006/311648 WO2007080662A1 (ja) 2006-01-12 2006-06-09 ダスト除去装置

Publications (2)

Publication Number Publication Date
CN101356017A CN101356017A (zh) 2009-01-28
CN101356017B true CN101356017B (zh) 2010-07-28

Family

ID=38256077

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006800504562A Active CN101356017B (zh) 2006-01-12 2006-06-09 灰尘除去装置

Country Status (5)

Country Link
US (1) US20090276970A1 (ja)
JP (1) JP4611900B2 (ja)
CN (1) CN101356017B (ja)
DE (1) DE112006003654T5 (ja)
WO (1) WO2007080662A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102921653A (zh) * 2012-11-06 2013-02-13 天津中环真美音响科技有限公司 导磁上板中孔清洁装置及方法

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5927643B2 (ja) * 2011-11-04 2016-06-01 株式会社マシンエンジニアリング ピックアップユニット
CN103041999A (zh) * 2013-01-04 2013-04-17 深圳顺络电子股份有限公司 一种叠层线圈元器件的陶瓷生带通孔表面清理装置和方法
CN103075686B (zh) * 2013-01-18 2015-10-28 福建鸿博光电科技有限公司 照明系统及其配套的清洁设备与灯光照明结构
CN103878667A (zh) * 2014-03-23 2014-06-25 山西中电科新能源技术有限公司 多晶硅锭边料表面清理装置
CN104097105A (zh) * 2014-06-20 2014-10-15 济南星辉数控机械科技有限公司 一种数控机床推料机构
CN107457202A (zh) * 2017-08-23 2017-12-12 惠州市正耀科技有限公司 一种应用于建筑领域的螺杆清灰机
CN108405383B (zh) * 2018-01-24 2023-08-08 青海大学 一种太阳能电池板有轨清洁装置
CN109603352B (zh) * 2018-08-07 2021-04-13 霍焕章 一种微硅粉除尘成型一体装置
CN109746840A (zh) * 2019-03-18 2019-05-14 青岛泽瀚机械制造有限公司 履带抛丸机
CN111112187B (zh) * 2019-12-27 2021-09-03 涡阳县幸福门业有限公司 一种玻璃生产用玻璃清洗装置
JP7421791B2 (ja) * 2020-01-14 2024-01-25 株式会社ニックス ダスト除去装置
CN112222038B (zh) * 2020-10-13 2021-08-03 宁波丞达精机股份有限公司 一种半导体封装装置用的供料机构
CN112246059A (zh) * 2020-10-16 2021-01-22 西藏昌都高争建材股份有限公司 一种多筒式水泥生产除尘装置
CN112591515B (zh) * 2020-12-15 2023-06-23 重庆和泰润佳股份有限公司 一种薄膜上卷装置
CN113251251B (zh) * 2021-04-28 2022-01-25 科大乾延科技有限公司 一种裸眼3d显示屏
CN113385459A (zh) * 2021-06-16 2021-09-14 盐城工业职业技术学院 一种可自动清除计算机内部灰尘的装置
CN115106871A (zh) * 2022-08-29 2022-09-27 成都中科卓尔智能科技集团有限公司 一种半导体材料表面缺陷柔性高精度修复装置及工艺

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1153119A (zh) * 1995-02-17 1997-07-02 本田技研工业株式会社 抽气型除尘方法与除尘装置

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US101167A (en) * 1870-03-22 Improved machine for burnishing boot and shoe heels
US446196A (en) * 1891-02-10 Glass-beveling machine
US762766A (en) * 1903-11-30 1904-06-14 Louis Schulte Grinding and polishing machine.
US940015A (en) * 1909-04-14 1909-11-16 Manufacturers Machine Co Buffing-machine.
US1103957A (en) * 1909-04-21 1914-07-21 United Shoe Machinery Ab Buffing-machine.
US1115640A (en) * 1909-05-03 1914-11-03 United Shoe Machinery Ab Grinding or polishing machine.
US2073786A (en) * 1932-11-14 1937-03-16 Gen Spring Bumper Corp Polishing machine
US2349314A (en) * 1937-09-27 1944-05-23 Jetta Truesdell Motion converting mechanism
US2567798A (en) * 1946-06-08 1951-09-11 Speedo Mfg Co Inc Motion converting mechanism
DE3033315A1 (de) * 1980-09-04 1982-04-01 Agfa-Gevaert Ag, 5090 Leverkusen Vorrichtung zum reinigen von bandfoermigen datentraegern, vorzugsweise fotografischen filmen
US5109770A (en) * 1989-09-22 1992-05-05 Oxy-Dry Corporation Printing cylinder cleaning system
US5044035A (en) * 1990-02-12 1991-09-03 George Barradas Dental cleaning device
US5402604A (en) * 1993-03-17 1995-04-04 Ryobi Motor Products Oscillating spindle sander
IT1272535B (it) * 1993-08-30 1997-06-23 Sperotto Rimar Spa Macchina garzatrice e/o smerigliatrice per tessuti e maglieria
JPH11221742A (ja) * 1997-09-30 1999-08-17 Hoya Corp 研磨方法及び研磨装置並びに磁気記録媒体用ガラス基板及び磁気記録媒体
US6446296B1 (en) * 2000-03-06 2002-09-10 Rite Track Equipment Services, Inc. Substrate cleaning apparatus with brush force control and method
JP2002283165A (ja) * 2001-03-28 2002-10-03 Brother Ind Ltd 工具交換装置
US7121919B2 (en) * 2001-08-30 2006-10-17 Micron Technology, Inc. Chemical mechanical polishing system and process
JP2003334499A (ja) 2002-05-21 2003-11-25 Hojitsu Seiko Kk ダスト除去装置及びダスト除去方法
CN1681453A (zh) * 2002-09-11 2005-10-12 宝洁公司 多重运动去污刷
JP2005211722A (ja) * 2004-01-27 2005-08-11 Nix Inc ダスト除去装置およびダスト除去方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1153119A (zh) * 1995-02-17 1997-07-02 本田技研工业株式会社 抽气型除尘方法与除尘装置

Non-Patent Citations (2)

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Title
JP特开2002-283165A 2002.10.03
JP特开2005-211722A 2005.08.11

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102921653A (zh) * 2012-11-06 2013-02-13 天津中环真美音响科技有限公司 导磁上板中孔清洁装置及方法
CN102921653B (zh) * 2012-11-06 2014-12-03 天津中环真美声学技术有限公司 导磁上板中孔清洁装置及方法

Also Published As

Publication number Publication date
DE112006003654T5 (de) 2009-02-19
JP2007189036A (ja) 2007-07-26
CN101356017A (zh) 2009-01-28
WO2007080662A1 (ja) 2007-07-19
US20090276970A1 (en) 2009-11-12
JP4611900B2 (ja) 2011-01-12

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