CN101302644B - 用于电镀工件的系统和方法 - Google Patents
用于电镀工件的系统和方法 Download PDFInfo
- Publication number
- CN101302644B CN101302644B CN2008100040821A CN200810004082A CN101302644B CN 101302644 B CN101302644 B CN 101302644B CN 2008100040821 A CN2008100040821 A CN 2008100040821A CN 200810004082 A CN200810004082 A CN 200810004082A CN 101302644 B CN101302644 B CN 101302644B
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- CN
- China
- Prior art keywords
- anode
- metal
- workpiece
- container
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/008—Current shielding devices
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/007—Current directing devices
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
Claims (17)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/627,494 US8177945B2 (en) | 2007-01-26 | 2007-01-26 | Multi-anode system for uniform plating of alloys |
US11/627,494 | 2007-01-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101302644A CN101302644A (zh) | 2008-11-12 |
CN101302644B true CN101302644B (zh) | 2011-08-03 |
Family
ID=39666714
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2008100040821A Expired - Fee Related CN101302644B (zh) | 2007-01-26 | 2008-01-24 | 用于电镀工件的系统和方法 |
Country Status (2)
Country | Link |
---|---|
US (3) | US8177945B2 (zh) |
CN (1) | CN101302644B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US12134831B2 (en) | 2022-11-18 | 2024-11-05 | Lam Research Corporation | Apparatus for an inert anode plating cell |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
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EP1919703B1 (en) | 2005-08-12 | 2013-04-24 | Modumetal, LLC | Compositionally modulated composite materials and methods for making the same |
JP2009249659A (ja) * | 2008-04-02 | 2009-10-29 | Nippon Mektron Ltd | 電気めっき装置及び電気めっき方法 |
US8008632B2 (en) * | 2008-07-24 | 2011-08-30 | Seagate Technology Llc | Two-zone ion beam carbon deposition |
RU2463390C1 (ru) * | 2008-09-29 | 2012-10-10 | Уильям Д. ХУРСТ | Способ металлизации и устройство для его осуществления |
EA029168B1 (ru) | 2009-06-08 | 2018-02-28 | Модьюметал, Инк. | Электроосажденное наноламинатное покрытие и оболочка для защиты от коррозии |
JP2011127172A (ja) * | 2009-12-17 | 2011-06-30 | Nitto Denko Corp | めっき装置および配線回路基板の製造方法 |
CN201753369U (zh) * | 2010-03-29 | 2011-03-02 | 富葵精密组件(深圳)有限公司 | 电镀装置 |
CA2806505C (en) * | 2010-08-11 | 2017-10-31 | Outotec Oyj | Apparatus for use in electrorefining and electrowinning |
CN102732938A (zh) * | 2011-04-06 | 2012-10-17 | 汯宽科技股份有限公司 | 动态调整阳极供电面积的电镀装置及其方法 |
JP5795514B2 (ja) * | 2011-09-29 | 2015-10-14 | アルメックスPe株式会社 | 連続メッキ装置 |
WO2014061352A1 (ja) * | 2012-10-15 | 2014-04-24 | 東洋鋼鈑株式会社 | 合金めっき層を有する金属板の製造方法 |
CA2905575C (en) | 2013-03-15 | 2022-07-12 | Modumetal, Inc. | A method and apparatus for continuously applying nanolaminate metal coatings |
CA2905513C (en) | 2013-03-15 | 2022-05-03 | Modumetal, Inc. | Nickel chromium nanolaminate coating having high hardness |
BR112015022192A8 (pt) | 2013-03-15 | 2019-11-26 | Modumetal Inc | artigo e seu método de preparação |
WO2014146114A1 (en) | 2013-03-15 | 2014-09-18 | Modumetal, Inc. | Nanolaminate coatings |
CN104928723B (zh) * | 2014-03-21 | 2018-06-26 | 爱蓝天高新技术材料(大连)有限公司 | 一种泡沫金属板及其制造方法 |
US9428841B2 (en) | 2014-05-21 | 2016-08-30 | Globalfoundries Inc. | Apparatuses, systems and methods that allow for selective removal of a specific metal from a multi-metal plating solution |
US9689084B2 (en) | 2014-05-22 | 2017-06-27 | Globalfounries Inc. | Electrodeposition systems and methods that minimize anode and/or plating solution degradation |
BR112017005534A2 (pt) | 2014-09-18 | 2017-12-05 | Modumetal Inc | métodos de preparação de artigos por processos de eletrodeposição e fabricação aditiva |
CN106795645B (zh) | 2014-09-18 | 2020-03-27 | 莫杜美拓有限公司 | 用于连续施加纳米层压金属涂层的方法和装置 |
TW201720969A (zh) * | 2015-12-14 | 2017-06-16 | 台灣先進系統股份有限公司 | 可調控式不溶性陽極板及其應用於銅柱電鍍之方法 |
US20170298529A1 (en) * | 2016-04-15 | 2017-10-19 | Boardtek Electronics Corporation. | Electroplating system |
CN105839169A (zh) * | 2016-05-31 | 2016-08-10 | 上海大学 | 材料的电沉积高通量制备设备与方法 |
WO2018049062A1 (en) | 2016-09-08 | 2018-03-15 | Modumetal, Inc. | Processes for providing laminated coatings on workpieces, and articles made therefrom |
KR102412452B1 (ko) | 2016-09-14 | 2022-06-23 | 모두메탈, 인크. | 신뢰가능한 고처리량 복합 전기장 발생을 위한 시스템, 및 그로부터 코팅을 제조하는 방법 |
EP3529827A4 (en) * | 2016-10-20 | 2020-09-09 | IH IP Holdings Limited | PROCESS FOR PLACING A METAL SUBSTRATE TO OBTAIN A DESIRED SURFACE GRAIN SIZE |
WO2018085591A1 (en) | 2016-11-02 | 2018-05-11 | Modumetal, Inc. | Topology optimized high interface packing structures |
CN110770372B (zh) | 2017-04-21 | 2022-10-11 | 莫杜美拓有限公司 | 具有电沉积涂层的管状制品及其生产系统和方法 |
WO2019210264A1 (en) | 2018-04-27 | 2019-10-31 | Modumetal, Inc. | Apparatuses, systems, and methods for producing a plurality of articles with nanolaminated coatings using rotation |
CN110184641B (zh) * | 2018-07-27 | 2021-07-30 | 新阳硅密(上海)半导体技术有限公司 | 电镀装置的电镀方法 |
TW202424278A (zh) | 2018-10-03 | 2024-06-16 | 美商蘭姆研究公司 | 用於惰性陽極鍍覆槽的流量分配設備 |
CN113423874B (zh) * | 2018-12-28 | 2024-03-15 | 盛美半导体设备(上海)股份有限公司 | 电镀装置及电镀方法 |
CN111074308B (zh) * | 2019-12-30 | 2021-03-12 | 福建南平南孚电池有限公司 | 在钢壳的表面上电镀镍钴合金镀层的方法和装置 |
CN114808084B (zh) * | 2021-01-29 | 2024-07-02 | 泰科电子(上海)有限公司 | 电镀装置和电镀系统 |
CN114582579A (zh) * | 2022-03-24 | 2022-06-03 | 电子科技大学 | 一种可调异形镍阳极制备均匀镍磷合金电阻膜的方法 |
CN114836808A (zh) * | 2022-05-31 | 2022-08-02 | 京东方科技集团股份有限公司 | 一种电镀装置及电镀方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2175238Y (zh) * | 1993-09-29 | 1994-08-24 | 北京科技大学 | 锌-镍合金电镀用阳极 |
CN1786287A (zh) * | 2005-11-16 | 2006-06-14 | 英可高新技术材料(沈阳)有限公司 | 电沉积制造的梯度多孔金属材料及其制造工艺 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1920964A (en) * | 1928-03-30 | 1933-08-08 | Bell Telephone Labor Inc | Electrodeposition of alloys |
US1960029A (en) * | 1931-11-19 | 1934-05-22 | Bell Telephone Labor Inc | Electrodeposition of alloys |
NL69111C (zh) * | 1939-10-25 | |||
US3926772A (en) * | 1973-11-05 | 1975-12-16 | Ford Motor Co | Making an anode assembly |
US3880725A (en) * | 1974-04-10 | 1975-04-29 | Rca Corp | Predetermined thickness profiles through electroplating |
US4462874A (en) * | 1983-11-16 | 1984-07-31 | Omi International Corporation | Cyanide-free copper plating process |
US4832812A (en) * | 1987-09-08 | 1989-05-23 | Eco-Tec Limited | Apparatus for electroplating metals |
US5049246A (en) * | 1989-06-20 | 1991-09-17 | Hull Harry F | Electrolytic processing apparatus and method with time multiplexed power supply |
JPH086198B2 (ja) * | 1990-08-15 | 1996-01-24 | 株式会社アルメックス | 水平搬送型メッキ装置 |
GB9321864D0 (en) * | 1993-10-22 | 1993-12-15 | Raychem Sa Nv | Dimensionally recoverable article |
EP0818563A1 (en) | 1996-01-30 | 1998-01-14 | Naganoken | Aqueous solution for forming metal complexes, tin-silver alloy plating bath, and process for producing plated object using the plating bath |
US6565729B2 (en) * | 1998-03-20 | 2003-05-20 | Semitool, Inc. | Method for electrochemically depositing metal on a semiconductor workpiece |
US7070686B2 (en) * | 2000-03-27 | 2006-07-04 | Novellus Systems, Inc. | Dynamically variable field shaping element |
US6261426B1 (en) * | 1999-01-22 | 2001-07-17 | International Business Machines Corporation | Method and apparatus for enhancing the uniformity of electrodeposition or electroetching |
US6190530B1 (en) * | 1999-04-12 | 2001-02-20 | International Business Machines Corporation | Anode container, electroplating system, method and plated object |
US6193860B1 (en) | 1999-04-23 | 2001-02-27 | Vlsi Technolgy, Inc. | Method and apparatus for improved copper plating uniformity on a semiconductor wafer using optimized electrical currents |
US6156169A (en) * | 1999-10-06 | 2000-12-05 | Jyu Lenq Enterprises Co., Ltd. | Electroplating anode titanium basket |
US6224721B1 (en) * | 1999-11-30 | 2001-05-01 | Nelson Solid Temp, Inc. | Electroplating apparatus |
US6805786B2 (en) * | 2002-09-24 | 2004-10-19 | Northrop Grumman Corporation | Precious alloyed metal solder plating process |
US7012333B2 (en) | 2002-12-26 | 2006-03-14 | Ebara Corporation | Lead free bump and method of forming the same |
JP4725145B2 (ja) * | 2005-03-17 | 2011-07-13 | 日本電気株式会社 | 合金めっき方法および合金めっき装置 |
DE102005014748B4 (de) * | 2005-03-31 | 2007-02-08 | Advanced Micro Devices, Inc., Sunnyvale | Technik zum elektrochemischen Abscheiden einer Legierung mit chemischer Ordnung |
-
2007
- 2007-01-26 US US11/627,494 patent/US8177945B2/en active Active
-
2008
- 2008-01-24 CN CN2008100040821A patent/CN101302644B/zh not_active Expired - Fee Related
-
2012
- 2012-02-28 US US13/406,679 patent/US8551303B2/en not_active Expired - Fee Related
- 2012-09-06 US US13/604,666 patent/US8623194B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2175238Y (zh) * | 1993-09-29 | 1994-08-24 | 北京科技大学 | 锌-镍合金电镀用阳极 |
CN1786287A (zh) * | 2005-11-16 | 2006-06-14 | 英可高新技术材料(沈阳)有限公司 | 电沉积制造的梯度多孔金属材料及其制造工艺 |
Non-Patent Citations (3)
Title |
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2439-440. * |
石井英雄等.日本电镀指南 1.湖南科学技术出版社,1985,278. |
石井英雄等.日本电镀指南 1.湖南科学技术出版社,1985,278. * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US12134831B2 (en) | 2022-11-18 | 2024-11-05 | Lam Research Corporation | Apparatus for an inert anode plating cell |
Also Published As
Publication number | Publication date |
---|---|
US8623194B2 (en) | 2014-01-07 |
US20120325667A1 (en) | 2012-12-27 |
CN101302644A (zh) | 2008-11-12 |
US20080179192A1 (en) | 2008-07-31 |
US20120152750A1 (en) | 2012-06-21 |
US8551303B2 (en) | 2013-10-08 |
US8177945B2 (en) | 2012-05-15 |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20171115 Address after: Grand Cayman, Cayman Islands Patentee after: GLOBALFOUNDRIES INC. Address before: American New York Patentee before: Core USA second LLC Effective date of registration: 20171115 Address after: American New York Patentee after: Core USA second LLC Address before: New York grams of Armand Patentee before: International Business Machines Corp. |
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TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20171120 Address after: Grand Cayman, Cayman Islands Patentee after: GLOBALFOUNDRIES INC. Address before: American New York Patentee before: Core USA second LLC Effective date of registration: 20171120 Address after: American New York Patentee after: Core USA second LLC Address before: New York grams of Armand Patentee before: International Business Machines Corp. |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110803 Termination date: 20210124 |