CN101273256B - 压力传感器 - Google Patents
压力传感器 Download PDFInfo
- Publication number
- CN101273256B CN101273256B CN2006800354828A CN200680035482A CN101273256B CN 101273256 B CN101273256 B CN 101273256B CN 2006800354828 A CN2006800354828 A CN 2006800354828A CN 200680035482 A CN200680035482 A CN 200680035482A CN 101273256 B CN101273256 B CN 101273256B
- Authority
- CN
- China
- Prior art keywords
- mentioned
- tuning
- arms
- oscillation element
- piezoelectric oscillation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000010355 oscillation Effects 0.000 title claims abstract description 61
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 230000005284 excitation Effects 0.000 claims abstract description 9
- 230000002093 peripheral effect Effects 0.000 claims description 10
- 239000012141 concentrate Substances 0.000 claims description 3
- 239000013078 crystal Substances 0.000 description 11
- 230000005540 biological transmission Effects 0.000 description 5
- 238000004070 electrodeposition Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/16—Measuring force or stress, in general using properties of piezoelectric devices
- G01L1/162—Measuring force or stress, in general using properties of piezoelectric devices using piezoelectric resonators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0001—Transmitting or indicating the displacement of elastically deformable gauges by electric, electro-mechanical, magnetic or electro-magnetic means
- G01L9/0008—Transmitting or indicating the displacement of elastically deformable gauges by electric, electro-mechanical, magnetic or electro-magnetic means using vibrations
- G01L9/0022—Transmitting or indicating the displacement of elastically deformable gauges by electric, electro-mechanical, magnetic or electro-magnetic means using vibrations of a piezoelectric element
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/0595—Holders; Supports the holder support and resonator being formed in one body
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/10—Mounting in enclosures
- H03H9/1007—Mounting in enclosures for bulk acoustic wave [BAW] devices
- H03H9/1035—Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by two sealing substrates sandwiching the piezoelectric layer of the BAW device
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/21—Crystal tuning forks
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Measuring Fluid Pressure (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
Description
Claims (4)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005278932A JP3969442B2 (ja) | 2005-09-26 | 2005-09-26 | 圧力センサ |
JP278932/2005 | 2005-09-26 | ||
PCT/JP2006/319629 WO2007035004A1 (ja) | 2005-09-26 | 2006-09-25 | 双音叉型圧電振動素子、及び圧力センサ |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101273256A CN101273256A (zh) | 2008-09-24 |
CN101273256B true CN101273256B (zh) | 2013-11-13 |
Family
ID=37889030
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2006800354828A Expired - Fee Related CN101273256B (zh) | 2005-09-26 | 2006-09-25 | 压力传感器 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7677105B2 (zh) |
EP (1) | EP1930709A1 (zh) |
JP (1) | JP3969442B2 (zh) |
CN (1) | CN101273256B (zh) |
WO (1) | WO2007035004A1 (zh) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5088672B2 (ja) * | 2007-04-18 | 2012-12-05 | セイコーエプソン株式会社 | 圧力センサおよびその製造方法 |
JP5305028B2 (ja) * | 2008-10-16 | 2013-10-02 | セイコーエプソン株式会社 | 圧力センサー |
JP4973718B2 (ja) * | 2009-01-27 | 2012-07-11 | セイコーエプソン株式会社 | 圧力検出ユニット、及び圧力センサー |
JP4998860B2 (ja) * | 2009-02-26 | 2012-08-15 | セイコーエプソン株式会社 | 圧力センサー素子、圧力センサー |
JP2011221007A (ja) * | 2010-03-25 | 2011-11-04 | Seiko Epson Corp | 圧力検出装置 |
US8429976B2 (en) * | 2010-05-19 | 2013-04-30 | Schlumberger Technology Corporation | Low cost resonator-based pressure transducer |
JP2012058024A (ja) * | 2010-09-07 | 2012-03-22 | Seiko Epson Corp | 圧力センサー |
JP6014303B2 (ja) * | 2010-10-04 | 2016-10-25 | セイコーエプソン株式会社 | 気象変動予測情報提供システム及び気象変動予測情報提供方法 |
PL2458377T3 (pl) | 2010-11-29 | 2020-02-28 | Air Products And Chemicals, Inc. | Sposób i urządzenie do pomiaru masy cząsteczkowej gazu |
ES2434260T3 (es) | 2010-11-29 | 2013-12-16 | Air Products And Chemicals, Inc. | Método y aparato para medir el caudal másico de un gas |
PT2458357E (pt) | 2010-11-29 | 2014-06-11 | Air Prod & Chem | Método e aparelho para medir a pressão de um gás |
US9038263B2 (en) | 2011-01-13 | 2015-05-26 | Delaware Capital Formation, Inc. | Thickness shear mode resonator sensors and methods of forming a plurality of resonator sensors |
US9759739B2 (en) * | 2011-02-02 | 2017-09-12 | Honeywell International Inc. | MEMS vibrating-beam accelerometer with piezoelectric drive |
US8955382B2 (en) | 2011-03-10 | 2015-02-17 | Honeywell International Inc. | High performance double-ended tuning fork |
US8887567B2 (en) | 2011-12-20 | 2014-11-18 | Honeywell International Inc. | Double-ended tuning fork with outrigger excitation |
PL2667159T3 (pl) | 2012-05-24 | 2022-05-02 | Air Products And Chemicals, Inc. | Sposób oraz urządzenie dla mierzenia masowego natężenia przepływu gazu |
ES2659146T3 (es) | 2012-05-24 | 2018-03-14 | Air Products And Chemicals, Inc. | Método y aparato para proporcionar una mezcla de gases |
ES2536091T3 (es) | 2012-05-24 | 2015-05-20 | Air Products And Chemicals, Inc. | Aparato para la medición del contenido verdadero de un cilindro de gas bajo presión |
ES2845173T3 (es) | 2012-05-24 | 2021-07-26 | Air Prod & Chem | Procedimiento y aparato para regular el caudal másico de un gas |
ES2663244T3 (es) | 2012-05-24 | 2018-04-11 | Air Products And Chemicals, Inc. | Método y aparato para proporcionar una mezcla de gases |
ES2556783T3 (es) | 2012-05-24 | 2016-01-20 | Air Products And Chemicals, Inc. | Método y aparato para medir las propiedades físicas de fluidos bifásicos |
USD760230S1 (en) | 2014-09-16 | 2016-06-28 | Daishinku Corporation | Piezoelectric vibration device |
US9527733B2 (en) | 2014-11-07 | 2016-12-27 | The Chinese University Of Hong Kong | Method and apparatus for dynamic-tuning |
CN107478862B (zh) * | 2017-07-12 | 2020-05-12 | 北京遥测技术研究所 | 一种基于金金键合的石英振梁加速度计敏感芯片 |
US11754452B2 (en) | 2018-08-17 | 2023-09-12 | Schlumberger Technology Corporation | Resonating sensor for high-pressure and high-temperature environments |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1441549A (zh) * | 2002-02-27 | 2003-09-10 | 藤丸工业株式会社 | 小型电子部件 |
CN1551493A (zh) * | 2003-05-16 | 2004-12-01 | 精工爱普生株式会社 | 音叉型压电振动片及音叉型压电振子 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5811015B2 (ja) * | 1978-10-31 | 1983-03-01 | 明星電気株式会社 | 圧力センサ |
US4406966A (en) | 1980-01-28 | 1983-09-27 | Paroscientific, Inc. | Isolating and temperature compensating system for resonators |
FR2530338A1 (fr) * | 1982-07-13 | 1984-01-20 | Asulab Sa | Element sensible a la pression et capteur de pression en faisant application |
FR2531532A1 (fr) * | 1982-08-05 | 1984-02-10 | Flopetrol | Capteur piezo-electrique, notamment pour la mesure de pressions |
JPS60133320A (ja) * | 1983-12-22 | 1985-07-16 | Ishida Scales Mfg Co Ltd | 荷重検出器 |
JPH0519795Y2 (zh) * | 1985-01-25 | 1993-05-25 | ||
JPS635228A (ja) * | 1986-06-25 | 1988-01-11 | Toyo Commun Equip Co Ltd | 温度又は圧力センサ |
FR2604791B1 (fr) * | 1986-10-02 | 1988-11-25 | Commissariat Energie Atomique | Procedes de fabrication d'une jauge piezoresistive et d'un accelerometre comportant une telle jauge |
JPH07109970B2 (ja) * | 1987-07-24 | 1995-11-22 | 東洋通信機株式会社 | 双音叉型圧電振動子の構造 |
JPH0747292Y2 (ja) | 1987-08-12 | 1995-11-01 | 麒麟麦酒株式会社 | ラベラーにおけるラベルへの記号表示装置 |
JPS6486608A (en) * | 1987-09-28 | 1989-03-31 | Toyo Communication Equip | Structure of piezoelectric vibrator |
US5265470A (en) * | 1987-11-09 | 1993-11-30 | California Institute Of Technology | Tunnel effect measuring systems and particle detectors |
US5165289A (en) * | 1990-07-10 | 1992-11-24 | Johnson Service Company | Resonant mechanical sensor |
JP2538450B2 (ja) | 1991-07-08 | 1996-09-25 | 日本電信電話株式会社 | 音声の励振信号符号化・復号化方法 |
GB2278721B (en) * | 1993-05-31 | 1996-12-18 | Murata Manufacturing Co | Chip-type piezoelectric resonance component |
JP3094746B2 (ja) * | 1993-05-31 | 2000-10-03 | 株式会社村田製作所 | チップ型圧電共振部品 |
US5458000A (en) * | 1993-07-20 | 1995-10-17 | Honeywell Inc. | Static pressure compensation of resonant integrated microbeam sensors |
US6084257A (en) * | 1995-05-24 | 2000-07-04 | Lucas Novasensor | Single crystal silicon sensor with high aspect ratio and curvilinear structures |
US6812413B1 (en) * | 1995-06-12 | 2004-11-02 | Circuits And Systems, Inc. | Electronic weighing apparatus utilizing surface acoustic waves |
GB9524624D0 (en) * | 1995-12-01 | 1996-01-31 | Weston Aerospace Ltd | Pressure sensor |
JP4586441B2 (ja) | 2003-09-24 | 2010-11-24 | エプソントヨコム株式会社 | 圧力センサ |
US7290453B2 (en) * | 2004-12-28 | 2007-11-06 | Amnon Brosh | Composite MEMS pressure sensor configuration |
US7490519B2 (en) * | 2005-09-30 | 2009-02-17 | General Electric Company | System and method for sensing differential pressure |
-
2005
- 2005-09-26 JP JP2005278932A patent/JP3969442B2/ja not_active Expired - Fee Related
-
2006
- 2006-09-25 EP EP06810984A patent/EP1930709A1/en not_active Withdrawn
- 2006-09-25 CN CN2006800354828A patent/CN101273256B/zh not_active Expired - Fee Related
- 2006-09-25 US US12/066,060 patent/US7677105B2/en not_active Expired - Fee Related
- 2006-09-25 WO PCT/JP2006/319629 patent/WO2007035004A1/ja active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1441549A (zh) * | 2002-02-27 | 2003-09-10 | 藤丸工业株式会社 | 小型电子部件 |
CN1551493A (zh) * | 2003-05-16 | 2004-12-01 | 精工爱普生株式会社 | 音叉型压电振动片及音叉型压电振子 |
Also Published As
Publication number | Publication date |
---|---|
WO2007035004A1 (ja) | 2007-03-29 |
US7677105B2 (en) | 2010-03-16 |
CN101273256A (zh) | 2008-09-24 |
JP3969442B2 (ja) | 2007-09-05 |
JP2007093214A (ja) | 2007-04-12 |
US20090151461A1 (en) | 2009-06-18 |
EP1930709A1 (en) | 2008-06-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: SEIKO EPSON CORP. Free format text: FORMER OWNER: EPSON TOYOCOM CORP. Effective date: 20111021 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20111021 Address after: Tokyo, Japan, Japan Applicant after: Seiko Epson Corp. Address before: Tokyo, Japan Applicant before: Epson Toyocom Corp. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20131113 Termination date: 20170925 |
|
CF01 | Termination of patent right due to non-payment of annual fee |