CN101225527B - 氢发生用电极及其制造方法 - Google Patents
氢发生用电极及其制造方法 Download PDFInfo
- Publication number
- CN101225527B CN101225527B CN2007101814609A CN200710181460A CN101225527B CN 101225527 B CN101225527 B CN 101225527B CN 2007101814609 A CN2007101814609 A CN 2007101814609A CN 200710181460 A CN200710181460 A CN 200710181460A CN 101225527 B CN101225527 B CN 101225527B
- Authority
- CN
- China
- Prior art keywords
- electrode
- lanthanum
- hydrogen generation
- coating
- coating material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1241—Metallic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1279—Process of deposition of the inorganic material performed under reactive atmosphere, e.g. oxidising or reducing atmospheres
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/36—Hydrogen production from non-carbon containing sources, e.g. by water electrolysis
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Thermal Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Ceramic Engineering (AREA)
- Electrochemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Abstract
Description
Claims (7)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006289713 | 2006-10-25 | ||
JP2006289713 | 2006-10-25 | ||
JP2006-289713 | 2006-10-25 | ||
JP2007270852 | 2007-10-18 | ||
JP2007270852A JP4274489B2 (ja) | 2006-10-25 | 2007-10-18 | 水素発生用電極およびその製造方法 |
JP2007-270852 | 2007-10-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101225527A CN101225527A (zh) | 2008-07-23 |
CN101225527B true CN101225527B (zh) | 2011-01-26 |
Family
ID=39047548
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007101814609A Active CN101225527B (zh) | 2006-10-25 | 2007-10-25 | 氢发生用电极及其制造方法 |
Country Status (5)
Country | Link |
---|---|
US (2) | US7704909B2 (zh) |
EP (1) | EP1916320B1 (zh) |
JP (1) | JP4274489B2 (zh) |
CN (1) | CN101225527B (zh) |
DE (1) | DE602007008514D1 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101390588B1 (ko) | 2010-02-10 | 2014-04-30 | 페르메렉덴꾜꾸가부시끼가이샤 | 수소 발생용 활성 음극 |
EP2537961A4 (en) | 2010-02-17 | 2016-09-07 | Permelec Electrode Ltd | ELECTRODE BASE, NEGATIVE ELECTRODE FOR ELECTROLYSIS OF AQUEOUS SOLUTION USING THE SAME, METHOD FOR PRODUCING THE ELECTRODE BASE, AND PROCESS FOR PRODUCING THE NEGATIVE ELECTRODE FOR ELECTROLYSIS OF AQUEOUS SOLUTION |
ITMI20100268A1 (it) * | 2010-02-22 | 2011-08-23 | Industrie De Nora Spa | Elettrodo per processi elettrolitici e metodo per il suo ottenimento |
WO2012008554A1 (ja) * | 2010-07-14 | 2012-01-19 | 独立行政法人科学技術振興機構 | アモルファス導電性酸化物膜を形成するための前駆体組成物および方法 |
ITMI20110735A1 (it) * | 2011-05-03 | 2012-11-04 | Industrie De Nora Spa | Elettrodo per processi elettrolitici e metodo per il suo ottenimento |
WO2016104494A1 (ja) | 2014-12-26 | 2016-06-30 | 旭化成株式会社 | 電解用陰極及びその製造方法、並びに、電解用電解槽 |
CN107815703B (zh) * | 2016-09-14 | 2019-09-10 | 蓝星(北京)化工机械有限公司 | 析氢活性阴极及其制备方法和包含所述析氢活性阴极的电解槽 |
KR101950465B1 (ko) | 2017-08-11 | 2019-05-02 | 주식회사 엘지화학 | 전해용 전극 및 이의 제조방법 |
EP4027136B1 (en) * | 2018-07-13 | 2023-10-04 | Fuji Electric Co., Ltd. | Carbon dioxide gas sensor |
KR20210036724A (ko) * | 2019-09-26 | 2021-04-05 | 주식회사 엘지화학 | 전기분해용 전극 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1167833C (zh) * | 1999-02-24 | 2004-09-22 | 耐用电极株式会社 | 活性阴极及其制备方法 |
CN1262689C (zh) * | 2002-03-20 | 2006-07-05 | 旭化成株式会社 | 氢气发生用电极 |
CN101029405A (zh) * | 2006-02-28 | 2007-09-05 | 北京化工机械厂 | 活性阴极及其制备方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003277966A (ja) | 2002-03-22 | 2003-10-02 | Asahi Kasei Corp | 低い過電圧と耐久性に優れた水素発生用陰極 |
-
2007
- 2007-10-18 JP JP2007270852A patent/JP4274489B2/ja active Active
- 2007-10-23 EP EP07119059A patent/EP1916320B1/en active Active
- 2007-10-23 DE DE602007008514T patent/DE602007008514D1/de active Active
- 2007-10-24 US US11/877,954 patent/US7704909B2/en not_active Expired - Fee Related
- 2007-10-25 CN CN2007101814609A patent/CN101225527B/zh active Active
-
2010
- 2010-03-05 US US12/718,220 patent/US8034221B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1167833C (zh) * | 1999-02-24 | 2004-09-22 | 耐用电极株式会社 | 活性阴极及其制备方法 |
CN1262689C (zh) * | 2002-03-20 | 2006-07-05 | 旭化成株式会社 | 氢气发生用电极 |
US7229536B2 (en) * | 2002-03-20 | 2007-06-12 | Asahi Kasei Kabushiki Kaisha | Electrode for use in hydrogen generation |
CN101029405A (zh) * | 2006-02-28 | 2007-09-05 | 北京化工机械厂 | 活性阴极及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
US20100155235A1 (en) | 2010-06-24 |
US20080099328A1 (en) | 2008-05-01 |
JP4274489B2 (ja) | 2009-06-10 |
CN101225527A (zh) | 2008-07-23 |
JP2008133532A (ja) | 2008-06-12 |
DE602007008514D1 (de) | 2010-09-30 |
EP1916320B1 (en) | 2010-08-18 |
EP1916320A3 (en) | 2008-10-15 |
US7704909B2 (en) | 2010-04-27 |
US8034221B2 (en) | 2011-10-11 |
EP1916320A2 (en) | 2008-04-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: PERMELEC ELECTRODE LTD. Free format text: FORMER OWNER: CHLORINE ENGINEERS CORP., LTD. Effective date: 20140715 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20140715 Address after: Kanagawa Patentee after: Permelec Electrode Ltd. Address before: Tokyo, Japan, Japan Patentee before: Chlorine Engineers Corp., Ltd. |
|
C56 | Change in the name or address of the patentee | ||
CP01 | Change in the name or title of a patent holder |
Address after: Kanagawa Patentee after: DE NORA PERMELEC LTD Address before: Kanagawa Patentee before: Permelec Electrode Ltd. |