CN101224324B - 带电粒子线治疗装置 - Google Patents

带电粒子线治疗装置 Download PDF

Info

Publication number
CN101224324B
CN101224324B CN2008100035414A CN200810003541A CN101224324B CN 101224324 B CN101224324 B CN 101224324B CN 2008100035414 A CN2008100035414 A CN 2008100035414A CN 200810003541 A CN200810003541 A CN 200810003541A CN 101224324 B CN101224324 B CN 101224324B
Authority
CN
China
Prior art keywords
charged particle
irradiation
mentioned
proton beam
axis direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN2008100035414A
Other languages
English (en)
Chinese (zh)
Other versions
CN101224324A (zh
Inventor
西尾祯治
荻野尚
野村和弘
立川敏树
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Heavy Industries Ltd
National Cancer Center Japan
Original Assignee
Sumitomo Heavy Industries Ltd
National Cancer Center Japan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries Ltd, National Cancer Center Japan filed Critical Sumitomo Heavy Industries Ltd
Publication of CN101224324A publication Critical patent/CN101224324A/zh
Application granted granted Critical
Publication of CN101224324B publication Critical patent/CN101224324B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N5/00—Radiation therapy
    • A61N5/10—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
    • A61N5/1042—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy with spatial modulation of the radiation beam within the treatment head
    • A61N5/1043—Scanning the radiation beam, e.g. spot scanning or raster scanning
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N5/00—Radiation therapy
    • A61N5/10—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
    • A61N5/1077—Beam delivery systems
    • A61N5/1079—Sharing a beam by multiple treatment stations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F5/00—Screening processes; Screens therefor
    • G03F5/02—Screening processes; Screens therefor by projection methods
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Biomedical Technology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Veterinary Medicine (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Radiation-Therapy Devices (AREA)
  • Nuclear Medicine (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
CN2008100035414A 2007-01-18 2008-01-18 带电粒子线治疗装置 Active CN101224324B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP009524/2007 2007-01-18
JP2007009524A JP4797140B2 (ja) 2007-01-18 2007-01-18 荷電粒子線照射装置

Publications (2)

Publication Number Publication Date
CN101224324A CN101224324A (zh) 2008-07-23
CN101224324B true CN101224324B (zh) 2012-10-10

Family

ID=39700797

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2008100035414A Active CN101224324B (zh) 2007-01-18 2008-01-18 带电粒子线治疗装置

Country Status (4)

Country Link
JP (1) JP4797140B2 (enrdf_load_html_response)
KR (1) KR100960823B1 (enrdf_load_html_response)
CN (1) CN101224324B (enrdf_load_html_response)
TW (1) TW200836792A (enrdf_load_html_response)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2010013346A1 (ja) * 2008-08-01 2012-01-05 独立行政法人放射線医学総合研究所 放射線治療・ｐｅｔ複合装置
JP5360914B2 (ja) * 2008-08-01 2013-12-04 独立行政法人放射線医学総合研究所 検出器シフト型放射線治療・ｐｅｔ複合装置
JP5286004B2 (ja) * 2008-09-12 2013-09-11 株式会社日立ハイテクノロジーズ 基板の検査装置、および、基板の検査方法
WO2010046983A1 (ja) * 2008-10-23 2010-04-29 株式会社島津製作所 粒子線治療装置
JP5339592B2 (ja) * 2009-01-28 2013-11-13 独立行政法人国立がん研究センター 陽子線治療におけるポジトロン放出核種のアクティビティ分布のシミュレーション方法
KR101127680B1 (ko) * 2009-09-08 2012-03-23 중앙대학교 산학협력단 도넛형 코일을 이용한 하전입자 빔 단층촬영 장치 및 방법
EP2490765B1 (en) 2009-10-23 2016-09-21 Ion Beam Applications Gantry comprising beam analyser for use in particle therapy
WO2012090614A1 (ja) * 2010-12-27 2012-07-05 住友重機械工業株式会社 エネルギーデグレーダ、及びそれを備えた荷電粒子照射システム
JP5726541B2 (ja) * 2011-01-18 2015-06-03 住友重機械工業株式会社 エネルギーデグレーダ、及びそれを備えた荷電粒子照射システム
US8809815B2 (en) * 2011-04-25 2014-08-19 Mitsubishi Electric Corporation Particle-beam energy changing apparatus, particle beam therapy system including the same, and method of changing particle beam energy
JP5701671B2 (ja) * 2011-04-27 2015-04-15 住友重機械工業株式会社 荷電粒子線照射装置
JP5726644B2 (ja) * 2011-06-06 2015-06-03 住友重機械工業株式会社 エネルギーデグレーダ、及びそれを備えた荷電粒子線照射システム
JP2012254146A (ja) * 2011-06-08 2012-12-27 Hitachi Ltd 荷電粒子ビーム照射システム
JP6587826B2 (ja) * 2015-05-14 2019-10-09 株式会社日立製作所 粒子線照射システム
CN105251138B (zh) * 2015-11-13 2018-03-13 上海艾普强粒子设备有限公司 一种粒子照射装置以及包括该装置的粒子治疗系统
US20190046137A1 (en) * 2016-03-03 2019-02-14 Koninklijke Philips N.V. Hybrid x-ray and gamma imaging system
CN105797282B (zh) * 2016-03-07 2018-09-04 上海艾普强粒子设备有限公司 一种粒子照射装置以及包括该装置的粒子治疗系统
CN109310380B (zh) * 2016-06-15 2023-02-28 深圳市奥沃医学新技术发展有限公司 肿瘤位置的追踪方法及放射治疗设备
JP6594835B2 (ja) * 2016-09-02 2019-10-23 住友重機械工業株式会社 荷電粒子線治療装置、及びリッジフィルタ

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1045344A (zh) * 1989-03-09 1990-09-19 菲利浦光灯制造公司 X射线检查设备
JPH1147287A (ja) 1997-08-08 1999-02-23 Sumitomo Heavy Ind Ltd 放射線治療用回転照射室
CN1445560A (zh) * 2002-03-20 2003-10-01 株式会社日立制作所 放射成象装置、放射成象方法和放射成象支持方法
CN1460451A (zh) * 2002-05-22 2003-12-10 佳能株式会社 放射线摄影装置和放射线摄影方法
CN1520780A (zh) * 2003-02-12 2004-08-18 ��ʽ���絺���������� X射线照相设备
JP2005114739A (ja) * 2004-12-10 2005-04-28 Toshiba Corp 核医学診断装置
CN1636512A (zh) * 2003-12-26 2005-07-13 Ge医疗系统环球技术有限公司 放射断层摄影系统及断层摄影方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3142612B2 (ja) 1991-07-05 2001-03-07 栄胤 池上 固体の表面物性を探査する方法および走査クラスター顕微鏡
EP1358657A1 (en) * 2001-02-06 2003-11-05 Gesellschaft für Schwerionenforschung mbH Gantry system for transport and delivery of a high energy ion beam in a heavy ion cancer therapy facility
JP4352841B2 (ja) 2003-10-02 2009-10-28 株式会社島津製作所 放射線検出器、および、ｒｉイメージング装置
JP2006021046A (ja) * 2005-07-05 2006-01-26 Mitsubishi Heavy Ind Ltd 放射線治療装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1045344A (zh) * 1989-03-09 1990-09-19 菲利浦光灯制造公司 X射线检查设备
JPH1147287A (ja) 1997-08-08 1999-02-23 Sumitomo Heavy Ind Ltd 放射線治療用回転照射室
CN1445560A (zh) * 2002-03-20 2003-10-01 株式会社日立制作所 放射成象装置、放射成象方法和放射成象支持方法
CN1460451A (zh) * 2002-05-22 2003-12-10 佳能株式会社 放射线摄影装置和放射线摄影方法
CN1520780A (zh) * 2003-02-12 2004-08-18 ��ʽ���絺���������� X射线照相设备
CN1636512A (zh) * 2003-12-26 2005-07-13 Ge医疗系统环球技术有限公司 放射断层摄影系统及断层摄影方法
JP2005114739A (ja) * 2004-12-10 2005-04-28 Toshiba Corp 核医学診断装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
同上.

Also Published As

Publication number Publication date
KR20080068594A (ko) 2008-07-23
JP2008173297A (ja) 2008-07-31
JP4797140B2 (ja) 2011-10-19
TWI352605B (enrdf_load_html_response) 2011-11-21
CN101224324A (zh) 2008-07-23
KR100960823B1 (ko) 2010-06-07
TW200836792A (en) 2008-09-16

Similar Documents

Publication Publication Date Title
CN101224324B (zh) 带电粒子线治疗装置
JP4984906B2 (ja) 荷電粒子線照射装置
US7564945B2 (en) System including computed tomography device for image guided treatment
US9061143B2 (en) Charged particle beam irradiation system and charged particle beam irradiation planning method
EP3251600B1 (en) Radiographic imaging apparatus and particle beam therapy system
CN104302357B (zh) 粒子束远程多向照射装置
EP3015133B1 (en) Radiotherapy apparatus
US10500420B2 (en) Small beam area, mid-voltage radiotherapy system with reduced skin dose, reduced scatter around the treatment volume, and improved overall accuracy
JP2013046709A (ja) 放射線治療装置におけるアイソセンターの変位測定方法、その変位の調整方法、及び変位測定用ファントム
WO2013127005A1 (en) Reduced dose x-ray imaging
KR101872226B1 (ko) 교정 유닛, 방사선 치료장치 및 방사선 치료장치의 교정 방법
Matinfar et al. Small animal radiation research platform: imaging, mechanics, control and calibration
US11065474B2 (en) Patient alignment method and system using light field and light reflector during radiation therapy
JP5317227B2 (ja) 荷電粒子線照射装置
JP5504398B2 (ja) 荷電粒子線照射装置
US8403821B2 (en) Radiotherapy apparatus controller and radiation irradiating method
JP5481711B2 (ja) 荷電粒子線照射装置
JP3790481B2 (ja) 放射線治療装置
JP2013013613A (ja) 荷電粒子線照射装置
KR101474926B1 (ko) 엑스선 촬영장치

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant