CN101185920A - 流体喷射装置 - Google Patents
流体喷射装置 Download PDFInfo
- Publication number
- CN101185920A CN101185920A CNA2007101514178A CN200710151417A CN101185920A CN 101185920 A CN101185920 A CN 101185920A CN A2007101514178 A CNA2007101514178 A CN A2007101514178A CN 200710151417 A CN200710151417 A CN 200710151417A CN 101185920 A CN101185920 A CN 101185920A
- Authority
- CN
- China
- Prior art keywords
- fluid
- discharge opening
- nozzle
- ejection apparatus
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Nozzles (AREA)
- Coating Apparatus (AREA)
Abstract
Description
Claims (5)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060116841A KR100828664B1 (ko) | 2006-11-24 | 2006-11-24 | 유체분사장치 |
KR1020060116841 | 2006-11-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101185920A true CN101185920A (zh) | 2008-05-28 |
CN100537044C CN100537044C (zh) | 2009-09-09 |
Family
ID=39478667
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2007101514178A Active CN100537044C (zh) | 2006-11-24 | 2007-09-28 | 流体喷射装置 |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR100828664B1 (zh) |
CN (1) | CN100537044C (zh) |
TW (1) | TWI325793B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101992154A (zh) * | 2009-08-24 | 2011-03-30 | 显示器生产服务株式会社 | 流体喷射装置 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101313262B1 (ko) * | 2010-07-12 | 2013-09-30 | 삼성전자주식회사 | 화학 기상 증착 장치 및 이를 이용한 반도체 에피 박막의 제조 방법 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2976085B2 (ja) * | 1993-07-16 | 1999-11-10 | 東京エレクトロン株式会社 | 処理装置 |
JP3652596B2 (ja) | 1999-10-25 | 2005-05-25 | 東京エレクトロン株式会社 | 液処理装置 |
KR101145851B1 (ko) * | 2005-10-28 | 2012-05-17 | 주식회사 케이씨텍 | 기판세정용 분사노즐 |
-
2006
- 2006-11-24 KR KR1020060116841A patent/KR100828664B1/ko active IP Right Grant
-
2007
- 2007-09-28 CN CNB2007101514178A patent/CN100537044C/zh active Active
- 2007-10-03 TW TW096137025A patent/TWI325793B/zh active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101992154A (zh) * | 2009-08-24 | 2011-03-30 | 显示器生产服务株式会社 | 流体喷射装置 |
Also Published As
Publication number | Publication date |
---|---|
TWI325793B (en) | 2010-06-11 |
KR100828664B1 (ko) | 2008-05-09 |
TW200822974A (en) | 2008-06-01 |
CN100537044C (zh) | 2009-09-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: WEIHAI DIANMEISHI OPTO-MECHATRONICS CO., LTD. Effective date: 20140226 |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20140226 Address after: Gyeonggi Do, South Korea Patentee after: Display Production Service Co., Ltd. Patentee after: Weihai dianmei Shiguang electromechanical Co Ltd Address before: Gyeonggi Do, South Korea Patentee before: Display Production Service Co., Ltd. |
|
CP03 | Change of name, title or address | ||
CP03 | Change of name, title or address |
Address after: 264205 No. 88-1, Bekaert Road, Weihai Economic and Technological Development Zone, Weihai City, Shandong Province Patentee after: WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd. Patentee after: DMS Co.,Ltd. Address before: Gyeonggi Do, South Korea Patentee before: DMS Co.,Ltd. Patentee before: WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd. |