CN101151323B - 含多胺的单分散性硅石微粒及其制造方法 - Google Patents
含多胺的单分散性硅石微粒及其制造方法 Download PDFInfo
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- CN101151323B CN101151323B CN2006800105007A CN200680010500A CN101151323B CN 101151323 B CN101151323 B CN 101151323B CN 2006800105007 A CN2006800105007 A CN 2006800105007A CN 200680010500 A CN200680010500 A CN 200680010500A CN 101151323 B CN101151323 B CN 101151323B
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/41—Compounds containing sulfur bound to oxygen
- C08K5/42—Sulfonic acids; Derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/02—Polyamines
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Silicon Compounds (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
Claims (8)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP106010/2005 | 2005-04-01 | ||
JP2005106010 | 2005-04-01 | ||
PCT/JP2006/306520 WO2006106760A1 (ja) | 2005-04-01 | 2006-03-29 | ポリアミンを含む単分散性シリカ微粒子及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101151323A CN101151323A (zh) | 2008-03-26 |
CN101151323B true CN101151323B (zh) | 2010-05-19 |
Family
ID=37073323
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2006800105007A Active CN101151323B (zh) | 2005-04-01 | 2006-03-29 | 含多胺的单分散性硅石微粒及其制造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7645828B2 (zh) |
CN (1) | CN101151323B (zh) |
TW (1) | TW200700317A (zh) |
WO (1) | WO2006106760A1 (zh) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060135361A1 (en) * | 2004-12-22 | 2006-06-22 | Markel David P | Markable material |
JP4026662B1 (ja) * | 2006-08-01 | 2007-12-26 | 大日本インキ化学工業株式会社 | 金属ナノ粒子分散体とその製造方法 |
JP4026664B1 (ja) * | 2006-08-03 | 2007-12-26 | 大日本インキ化学工業株式会社 | 金属ナノ粒子分散体、およびその製造方法 |
US8017234B2 (en) * | 2008-06-12 | 2011-09-13 | Dic Corporation | Structural object coated with superhydrophobic nanostructure composite and process for producing the same |
US9441119B2 (en) * | 2011-03-28 | 2016-09-13 | Intermolecular, Inc. | Sol-gel transition control of coatings by addition of solidifiers for conformal coatings on textured glass |
CN102382856B (zh) * | 2011-10-25 | 2013-06-19 | 上海交通大学 | 含可降解亚胺键的聚阳离子基因载体、制备方法和复合物 |
WO2014058014A1 (ja) * | 2012-10-10 | 2014-04-17 | Dic株式会社 | 有機無機複合シリカナノ粒子及びその製造方法 |
US10731040B2 (en) * | 2016-07-12 | 2020-08-04 | The University Of Massachusetts | Crosslinked phenolic compound, method of forming, and polymer composition containing the same |
US11111398B2 (en) | 2017-01-11 | 2021-09-07 | International Business Machines Corporation | Subsurface modified silica materials |
US20210403680A1 (en) * | 2020-06-25 | 2021-12-30 | Solenis Technologies, L.P. | Compositions and methods for improving adhesion of an image to a treated substrate |
WO2022044658A1 (ja) * | 2020-08-25 | 2022-03-03 | 富士フイルム株式会社 | マイクロカプセル、マイクロカプセルの製造方法、蓄熱シート、蓄熱シートの製造方法、蓄熱体 |
CN115353117A (zh) * | 2022-10-20 | 2022-11-18 | 四川大学 | 一种超疏水沙粒及其制备方法与应用 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62225244A (ja) | 1986-03-27 | 1987-10-03 | Nippon Shokubai Kagaku Kogyo Co Ltd | 吸着剤 |
JPH0637282B2 (ja) | 1989-04-04 | 1994-05-18 | 株式会社日本触媒 | 金属酸化物系複合体球状微粒子及びその製法 |
JP2671727B2 (ja) | 1992-09-17 | 1997-10-29 | 信越化学工業株式会社 | 表面処理シリカ並びにその製造方法及び半導体封止用樹脂組成物用充填剤 |
CN100532459C (zh) * | 2004-02-18 | 2009-08-26 | 财团法人川村理化学研究所 | 有机无机复合纳米纤维、有机无机复合结构体以及它们的制备方法 |
JP3883556B2 (ja) | 2004-02-18 | 2007-02-21 | 財団法人川村理化学研究所 | 有機無機複合ナノファイバ、有機無機複合構造体及びこれらの製造方法 |
JP3978440B2 (ja) | 2004-05-31 | 2007-09-19 | 財団法人川村理化学研究所 | シリカ/ポリマー/金属複合材料及びその製造方法 |
WO2005116140A1 (ja) * | 2004-05-31 | 2005-12-08 | Kawamura Institute Of Chemical Research | 複合ナノファイバ、複合ナノファイバ会合体、複合構造体及びこれらの製造方法 |
JP3978443B2 (ja) | 2004-08-24 | 2007-09-19 | 財団法人川村理化学研究所 | シリカ/金属錯体複合材料及びその製造方法 |
JP4730730B2 (ja) | 2005-02-07 | 2011-07-20 | 一般財団法人川村理化学研究所 | 有機無機複合材料及びその製造方法 |
-
2006
- 2006-03-29 WO PCT/JP2006/306520 patent/WO2006106760A1/ja active Application Filing
- 2006-03-29 CN CN2006800105007A patent/CN101151323B/zh active Active
- 2006-03-29 US US11/909,654 patent/US7645828B2/en active Active
- 2006-03-29 TW TW095110923A patent/TW200700317A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
US7645828B2 (en) | 2010-01-12 |
WO2006106760A1 (ja) | 2006-10-12 |
US20090036591A1 (en) | 2009-02-05 |
CN101151323A (zh) | 2008-03-26 |
TW200700317A (en) | 2007-01-01 |
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Owner name: KAWAMURA INSTITUE OF CHEMICAL RES Free format text: FORMER OWNER: KAWAMURA INSTITUTE OF CHEMICAL RESEARCH Effective date: 20130910 Owner name: DAINIPPON INK CHEMICALS Effective date: 20130910 |
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Effective date of registration: 20130910 Address after: Chiba County, Japan Patentee after: Kawamura Inst Chem Res Patentee after: Dainippon Ink Chemicals Address before: Chiba County, Japan Patentee before: Kawamura Institute of Chemical Research |