CN101143433A - 电处理轮廓控制 - Google Patents

电处理轮廓控制 Download PDF

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Publication number
CN101143433A
CN101143433A CNA2007101669018A CN200710166901A CN101143433A CN 101143433 A CN101143433 A CN 101143433A CN A2007101669018 A CNA2007101669018 A CN A2007101669018A CN 200710166901 A CN200710166901 A CN 200710166901A CN 101143433 A CN101143433 A CN 101143433A
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CN
China
Prior art keywords
electrode
substrate
conductive
base material
bias
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2007101669018A
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English (en)
Chinese (zh)
Inventor
A·P·马内斯
V·佳尔布特
Y·王
A·迪布施特
D·J·K·奥尔加多
L-Y·陈
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of CN101143433A publication Critical patent/CN101143433A/zh
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H5/00—Combined machining
    • B23H5/06—Electrochemical machining combined with mechanical working, e.g. grinding or honing
    • B23H5/08—Electrolytic grinding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Control Of Indicators Other Than Cathode Ray Tubes (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
CNA2007101669018A 2005-01-26 2006-01-24 电处理轮廓控制 Pending CN101143433A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/043,570 2005-01-26
US11/043,570 US7655565B2 (en) 2005-01-26 2005-01-26 Electroprocessing profile control

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CNA2006800029291A Division CN101107090A (zh) 2005-01-26 2006-01-24 电处理轮廓控制

Publications (1)

Publication Number Publication Date
CN101143433A true CN101143433A (zh) 2008-03-19

Family

ID=36587252

Family Applications (3)

Application Number Title Priority Date Filing Date
CNA2007101669018A Pending CN101143433A (zh) 2005-01-26 2006-01-24 电处理轮廓控制
CNA2006800029291A Pending CN101107090A (zh) 2005-01-26 2006-01-24 电处理轮廓控制
CNA2008101757013A Pending CN101480743A (zh) 2005-01-26 2006-01-24 电处理轮廓控制

Family Applications After (2)

Application Number Title Priority Date Filing Date
CNA2006800029291A Pending CN101107090A (zh) 2005-01-26 2006-01-24 电处理轮廓控制
CNA2008101757013A Pending CN101480743A (zh) 2005-01-26 2006-01-24 电处理轮廓控制

Country Status (6)

Country Link
US (3) US7655565B2 (https=)
JP (1) JP2008528308A (https=)
KR (1) KR20070095396A (https=)
CN (3) CN101143433A (https=)
TW (1) TWI286960B (https=)
WO (1) WO2006081285A2 (https=)

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CN116079580A (zh) * 2023-02-03 2023-05-09 北京晶亦精微科技股份有限公司 一种电化学机械抛光装置

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