CN100586541C - 一种制备聚偏氟乙烯微孔滤膜的方法 - Google Patents
一种制备聚偏氟乙烯微孔滤膜的方法 Download PDFInfo
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- CN100586541C CN100586541C CN200710063466A CN200710063466A CN100586541C CN 100586541 C CN100586541 C CN 100586541C CN 200710063466 A CN200710063466 A CN 200710063466A CN 200710063466 A CN200710063466 A CN 200710063466A CN 100586541 C CN100586541 C CN 100586541C
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- Prior art keywords
- polyvinylidene fluoride
- diluent
- homogeneous phase
- phase solution
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000002033 PVDF binder Substances 0.000 title claims abstract description 37
- 229920002981 polyvinylidene fluoride Polymers 0.000 title claims abstract description 37
- 238000000034 method Methods 0.000 title claims abstract description 35
- 238000001914 filtration Methods 0.000 title claims description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 45
- 239000003085 diluting agent Substances 0.000 claims abstract description 28
- 229920000642 polymer Polymers 0.000 claims abstract description 26
- 239000012528 membrane Substances 0.000 claims abstract description 21
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical group CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 claims abstract description 20
- 238000005266 casting Methods 0.000 claims abstract description 6
- 238000001816 cooling Methods 0.000 claims abstract description 6
- 238000000465 moulding Methods 0.000 claims description 24
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 15
- 239000004088 foaming agent Substances 0.000 claims description 13
- 230000007480 spreading Effects 0.000 claims description 11
- 238000003892 spreading Methods 0.000 claims description 11
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 10
- 239000002202 Polyethylene glycol Substances 0.000 claims description 9
- 229920001223 polyethylene glycol Polymers 0.000 claims description 9
- 238000005406 washing Methods 0.000 claims description 9
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 6
- 229920005989 resin Polymers 0.000 claims description 6
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims description 5
- 235000019270 ammonium chloride Nutrition 0.000 claims description 5
- 238000002425 crystallisation Methods 0.000 claims description 5
- 230000008025 crystallization Effects 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 239000011148 porous material Substances 0.000 abstract description 22
- 230000004907 flux Effects 0.000 abstract description 21
- 238000000605 extraction Methods 0.000 abstract description 5
- 239000012982 microporous membrane Substances 0.000 abstract description 4
- 239000000126 substance Substances 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 230000007613 environmental effect Effects 0.000 abstract description 3
- 230000036541 health Effects 0.000 abstract description 3
- 238000000280 densification Methods 0.000 abstract description 2
- 230000035515 penetration Effects 0.000 abstract 1
- 238000000746 purification Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 29
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- 238000002360 preparation method Methods 0.000 description 11
- 238000002145 thermally induced phase separation Methods 0.000 description 11
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- 238000010792 warming Methods 0.000 description 8
- 238000010791 quenching Methods 0.000 description 7
- 230000000171 quenching effect Effects 0.000 description 7
- 239000000284 extract Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 238000013019 agitation Methods 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 238000005191 phase separation Methods 0.000 description 3
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000001471 micro-filtration Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000001112 coagulating effect Effects 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 125000005498 phthalate group Chemical group 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
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- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
Description
Claims (12)
Priority Applications (1)
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CN200710063466A CN100586541C (zh) | 2007-02-01 | 2007-02-01 | 一种制备聚偏氟乙烯微孔滤膜的方法 |
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CN200710063466A CN100586541C (zh) | 2007-02-01 | 2007-02-01 | 一种制备聚偏氟乙烯微孔滤膜的方法 |
Publications (2)
Publication Number | Publication Date |
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CN101234300A CN101234300A (zh) | 2008-08-06 |
CN100586541C true CN100586541C (zh) | 2010-02-03 |
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CN200710063466A Expired - Fee Related CN100586541C (zh) | 2007-02-01 | 2007-02-01 | 一种制备聚偏氟乙烯微孔滤膜的方法 |
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CN (1) | CN100586541C (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104084058A (zh) * | 2014-07-16 | 2014-10-08 | 亚美滤膜(南通)有限公司 | 部分结晶化有机高分子微孔滤膜的制备方法 |
CN104923089B (zh) * | 2015-06-16 | 2017-03-08 | 陕西科技大学 | 一种制备聚偏氟乙烯多孔膜的方法 |
US10584201B2 (en) * | 2017-01-10 | 2020-03-10 | The Texas A&M University System | Methanesulfonic acid mediated solvent free synthesis of conjugated porous polymer networks |
CN110721598B (zh) * | 2019-09-27 | 2022-03-29 | 贵州省材料产业技术研究院 | 一种高通量多孔膜的制备方法 |
CN114225722A (zh) * | 2021-12-27 | 2022-03-25 | 贵州省材料产业技术研究院 | 聚偏氟乙烯共混膜及其制备方法 |
CN117074665B (zh) * | 2023-09-01 | 2024-07-30 | 麦博睿新材料科技(重庆)有限公司 | 对称型聚偏二氟乙烯微滤膜的用途及蛋白免疫印迹方法 |
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Effective date of registration: 20150930 Address after: 132013, No. 89, sunrise Road, Jilin hi tech Development Zone Patentee after: JILIN JINSAI TECHNOLOGY DEVELOPMENT Co.,Ltd. Address before: 100080 Haidian District, Zhongguancun, North Street, No. 1, No. 2, Beijing Patentee before: Institute of Chemistry, Chinese Academy of Sciences |
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Address after: 132013, No. 89, sunrise Road, hi tech Zone, Jilin, Jilin Patentee after: JILIN JINSAI TECHNOLOGY DEVELOPMENT CO.,LTD. Address before: 132013, No. 89, sunrise Road, Jilin hi tech Development Zone Patentee before: Jilin Jinsai Technology Development Co.,Ltd. |
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