CN100581657C - Gap nozzle,substrate processing apparatus and method - Google Patents

Gap nozzle,substrate processing apparatus and method Download PDF

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Publication number
CN100581657C
CN100581657C CN200610054724A CN200610054724A CN100581657C CN 100581657 C CN100581657 C CN 100581657C CN 200610054724 A CN200610054724 A CN 200610054724A CN 200610054724 A CN200610054724 A CN 200610054724A CN 100581657 C CN100581657 C CN 100581657C
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mentioned
side plate
nozzle
discharge opening
length direction
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CN1833779A (en
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池田文彦
楫野一树
细川章宏
吉田顺一
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Skilling Group
Dainippon Screen Manufacturing Co Ltd
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Dainippon Screen Manufacturing Co Ltd
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    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J37/00—Baking; Roasting; Grilling; Frying
    • A47J37/10—Frying pans, e.g. frying pans with integrated lids or basting devices
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J36/00—Parts, details or accessories of cooking-vessels
    • A47J36/06—Lids or covers for cooking-vessels

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  • Engineering & Computer Science (AREA)
  • Food Science & Technology (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)

Abstract

The invention relates to a method for coating process liquid with stable coating width by narrow nozzle. Wherein, the thickness (d) of lower end (721a) of the side plate (721) of narrow nozzle is under 0.7mm; therefore, even the motion speed of narrow nozzle (42) is slow, or the viscidity of corrosion resisting liquid is lower, the invention can reduce the outward expansion width of coated corrosion resisting liquid 90, to restrain the change of coated width.

Description

Gap nozzle, substrate board treatment and substrate processing method using same
Technical field
The present invention relates to a kind of with treatment fluid be coated in liquid crystal with glass substrate, semiconductor substrate, film liquid crystal with flexible base, board, base board for optical mask, chromatic filter with the lip-deep gap nozzle of substrate etc. (below, abbreviate " substrate " as), the substrate processing method using same that has the substrate board treatment of this gap nozzle and used this gap nozzle.
Background technology
From in the past, in the manufacturing process of substrate, include the working procedure of coating that treatment fluids such as photoresist is coated in substrate surface.In working procedure of coating, use from the gap nozzle of the portion that spues to the spue applying device (so-called narrow-gap type coating machine) of treatment fluid of substrate surface with slit-shaped.
Figure 22 represents to utilize existing applying device 100 to apply the state of processing.Applying device 100, moves on the directions X in the drawings to the surface applied treatment fluid 190 of substrate 200 time from the portion that spues 111 of gap nozzle 110.Thus, on the surface of substrate 200, form the film of treatment fluid.This existing applying device for example is disclosed in the patent documentation 1.
Patent documentation 1:JP spy opens the 2003-275648 communique
But, in existing applying device 100, be difficult to stable coating width W coating treatment fluid 190.
For example, as when beginning to apply, when the translational speed of gap nozzle 110 is slow, as shown in figure 23, the trend that exists coated treatment fluid 190 to expand laterally.At this moment, the application width W of treatment fluid 190 broadens.On the other hand, when the translational speed of gap nozzle 110 is fast, as shown in figure 24, the trend that exists coated treatment fluid 190 to shrink to the inside.At this moment, the application width W of treatment fluid 190 narrows down.
In addition, not only according to the translational speed of gap nozzle 110, and according to the condition of the viscosity of treatment fluid, the surface tension of treatment fluid, the surface state of substrate 200 etc., the application width W of treatment fluid 190 also can change.Also have, if application width W changes like this, then therewith together and the thickness of the film that forms also becomes unstable.
Summary of the invention
The present invention proposes in view of such thing, and its purpose is to provide a kind of technology that can be applied treatment fluid by gap nozzle with stable coating width.
(1). for the present invention who addresses the above problem is a kind of gap nozzle, the discharge opening that has slit-shaped in its underpart is characterized in that, has: nozzle body portion, it limits the edge of opening of above-mentioned discharge opening at length direction; Pair of side plates, it is installed in the two ends on the length direction of said nozzle main part respectively, and limits the edge of opening of above-mentioned discharge opening at the width vertical with above-mentioned length direction; This gap nozzle is on one side from the above-mentioned discharge opening treatment fluid that spues, on one side the member that moves along the width vertical with above-mentioned length direction, the thickness on the length direction of the bottom of above-mentioned side plate is below the 0.7mm.
(2). the present invention is the gap nozzle of being put down in writing as above-mentioned (1), it is characterized in that, the lateral surface of the bottom of above-mentioned side plate angle with respect to the horizontal plane is more than 45 degree.
(3). the present invention is the gap nozzle of being put down in writing as (1) or (2), it is characterized in that, the lower end part of above-mentioned side plate is in the below of the bottom of said nozzle main part.
(4). the present invention is the gap nozzle of being put down in writing as (1) or (2), it is characterized in that, the lower end part of above-mentioned side plate is in the top of the bottom of said nozzle main part.
(5). the present invention is the gap nozzle of being put down in writing as (1) or (2), it is characterized in that, above-mentioned side plate has the adjusting device of the height of the bottom of regulating above-mentioned side plate.
(6). the present invention is the gap nozzle of being put down in writing as (1) or (2), it is characterized in that, above-mentioned side plate has the thin plate of the end that limits above-mentioned discharge opening and the pressed component of fixing above-mentioned thin plate.
(7). the present invention is a kind of gap nozzle, and the discharge opening that has slit-shaped in its underpart is characterized in that, has: nozzle body portion, it limits the edge of opening of above-mentioned discharge opening at length direction; Pair of side plates, it is installed in the two ends on the length direction of said nozzle main part respectively, and limits the edge of opening of above-mentioned discharge opening at the width vertical with above-mentioned length direction; This gap nozzle is on one side from the above-mentioned discharge opening treatment fluid that spues, on one side the member that moves along the width vertical with above-mentioned length direction, the lower end part of above-mentioned side plate is in the below of the bottom of said nozzle main part.
(8). the present invention is a kind of gap nozzle, and the discharge opening that has slit-shaped in its underpart is characterized in that, has: nozzle body portion, it limits the edge of opening of above-mentioned discharge opening at length direction; Pair of side plates, it is installed in the two ends on the length direction of said nozzle main part respectively, and limits the edge of opening of above-mentioned discharge opening at the width vertical with above-mentioned length direction; This gap nozzle is on one side from the above-mentioned discharge opening treatment fluid that spues, on one side the member that moves along the width vertical with above-mentioned length direction, the lower end part of above-mentioned side plate is in the top of the bottom of said nozzle main part.
(9). the present invention is a kind of gap nozzle, and the discharge opening that has slit-shaped in its underpart is characterized in that, has: nozzle body portion, it limits the edge of opening of above-mentioned discharge opening at length direction; Pair of side plates, it is installed in the two ends on the length direction of said nozzle main part respectively, and limits the edge of opening of above-mentioned discharge opening at the width vertical with above-mentioned length direction; This gap nozzle is on one side from the above-mentioned discharge opening treatment fluid that spues, on one side the member that moves along the width vertical with above-mentioned length direction, above-mentioned side plate has the adjusting device of the height of the bottom of regulating above-mentioned side plate.
(10). the present invention is a kind of substrate board treatment, it is characterized in that, has: as any gap nozzle of being put down in writing in above-mentioned (1), (7), (8) and (9); Holding device, its lower horizontal at above-mentioned gap nozzle keeps substrate; Scanning means, it makes above-mentioned gap nozzle, on the direction vertical with the length direction of above-mentioned discharge opening, the substrate that is kept by above-mentioned holding device is carried out relative scanning; Feedway, it supplies with treatment fluid to above-mentioned gap nozzle.
(11). the present invention is a kind of substrate processing method using same, and the gap nozzle that uses above-mentioned (9) to be put down in writing is characterized in that, comprising: supply with operation, when it makes above-mentioned gap nozzle carry out relative scanning to substrate, from above-mentioned discharge opening to the substrate treatment fluid that spues; Regulate operation, the speed of its viscosity according to above-mentioned treatment fluid, above-mentioned gap nozzle or this two conditions are regulated the height of the bottom of above-mentioned side plate.
If according to above-mentioned (1)～(6) and quote the invention that these above-mentioned (10) are put down in writing, then the thickness with the bottom of side plate is made as below the 0.7mm.Therefore, can dwindle coated treatment fluid expansion width laterally.Thereby, when can suppress the change of application width of treatment fluid, the also thickness of the film that can suppress to be formed change.
Particularly, if the invention of being put down in writing according to above-mentioned (2), then the lateral surface angle with respect to the horizontal plane with the bottom of side plate is made as more than 45 degree.Therefore, can prevent that treatment fluid from exceeding the bottom of side plate and expansion laterally.
Particularly, as if the invention of being put down in writing according to above-mentioned (3), then the lower end part of side plate is in the below of the bottom of nozzle body portion.Therefore, the pressure that treatment fluid is drawn laterally strengthens, thereby can dwindle coated treatment fluid contracted width to the inside.Therefore, can further suppress the change of the application width of treatment fluid.
Particularly, as if the invention of being put down in writing according to above-mentioned (4), then the lower end part of side plate is in the top of the bottom of nozzle body portion.Therefore, the pressure that treatment fluid is drawn laterally dies down, thereby can dwindle coated treatment fluid expansion width laterally.Therefore, can further suppress the change of the application width of treatment fluid.
Particularly, if the invention of being put down in writing according to above-mentioned (5), then can regulate the height of the bottom of side plate according to the viscosity of the translational speed of gap nozzle and treatment fluid.Therefore, can according to situation suitably dwindle treatment fluid laterally the expansion width and contracted width to the inside.
Particularly, the invention as if being put down in writing according to above-mentioned (6) then can form simple shape respectively with thin plate and pressed component.Therefore, can form side plate easily.
Also have, if according to above-mentioned (7) and quote the invention that this above-mentioned (10) are put down in writing, then the lower end part of side plate is in the below of the bottom of nozzle body portion.Therefore, the pressure that draws treatment fluid laterally strengthens, thereby can dwindle coated treatment fluid contracted width to the inside.Therefore, when can suppress the change of application width of treatment fluid, the also thickness of the film that can suppress to be formed change.
Also have, if according to above-mentioned (8) and quote the invention that this above-mentioned (10) are put down in writing, then the lower end part of side plate is in the top of the bottom of nozzle body portion.Therefore, the pressure that treatment fluid is drawn laterally dies down, thereby dwindles coated treatment fluid expansion width laterally.Therefore, when can suppress the change of application width of treatment fluid, the also thickness of the film that can suppress to be formed change.
Also have,, then can regulate the height of the bottom of side plate according to the viscosity of the translational speed of gap nozzle and treatment fluid if according to above-mentioned (9) and quote this above-mentioned (10), the invention that (11) are put down in writing.Therefore, can suitably dwindle the expansion width laterally of treatment fluid and contracted width to the inside according to situation.Therefore, when can suppress the change of application width of treatment fluid, the also thickness of the film that can suppress to be formed change.
Description of drawings
Fig. 1 is the stereogram of the summary of expression substrate board treatment of the present invention.
Fig. 2 is the stereogram of the nozzle body portion structure of expression gap nozzle.
Fig. 3 is the figure of the side plate shape of expression first embodiment.
The figure of coating result when Fig. 4 is expression change side plate thickness.
Fig. 5 is the figure of the side plate shape of expression first embodiment.
Fig. 6 is the figure of the side plate shape of expression first embodiment.
Fig. 7 is the figure of the side plate shape of expression second embodiment.
Fig. 8 is the figure of the side plate shape of expression second embodiment.
Fig. 9 is the figure of the side plate shape of expression second embodiment.
Figure 10 is the figure of the side plate shape of expression second embodiment.
Figure 11 is the figure of the side plate shape of expression the 3rd embodiment.
Figure 12 is the figure of the side plate shape of expression the 3rd embodiment.
Figure 13 is the figure of the side plate shape of expression the 3rd embodiment.
Figure 14 is the figure of the side plate shape of expression the 3rd embodiment.
Figure 15 is the figure of the side plate shape of expression the 4th embodiment.
Figure 16 is the figure of the side plate shape of expression the 4th embodiment.
Figure 17 is the figure of the electrical structure of the expression control part height that is used to regulate movable platen.
Figure 18 is the figure of relation of the height of expression speed of gap nozzle and movable platen.
Figure 19 is the figure of relation of the height of expression viscosity of liquid against corrosion and movable platen.
Figure 20 is the figure that is illustrated in the relation of nozzle body portion under the different situation of the height of bottom of the bottom of front side of nozzle body portion and rear side and side plate.
Figure 21 is the figure that is illustrated in the relation of nozzle body portion under the different situation of the height of bottom of the bottom of front side of nozzle body portion and rear side and side plate.
Figure 22 is the figure of the coating treatment state that undertaken by existing applying device of expression.
Figure 23 is the figure of the coating treatment state that undertaken by existing applying device of expression.
Figure 24 is the figure of the coating treatment state that undertaken by existing applying device of expression.
The specific embodiment
Below, to preferred forms of the present invention, describe with reference to accompanying drawing.
＜1. about the overall structure of substrate board treatment 〉
Fig. 1 is the stereogram of the summary of expression substrate board treatment 1 of the present invention.In Fig. 1 and following each figure,, directions X, Y direction and Z direction are defined for the ease of diagram and explanation.Directions X is the moving direction of gap nozzle 42.The Y direction is the length direction of gap nozzle 42.The Z direction is a vertical.
Substrate board treatment 1 is to be used for liquid against corrosion is coated in device on the square glass substrate of the image panel that constitutes liquid crystal indicator, and it has main part 10 and control part 20.Main part 10 has objective table 30, bridge formation portion 40 and drive division 50.
Objective table 30 is maintenance platforms of mounting substrate 2.Objective table is made of stone material of rectangular shape etc., and processes its upper surface and side very smooth.The upper surface of objective table 30 is horizontal planes, and becomes the maintenance face 31 of substrate 2.Be formed with not shown a plurality of vacuum suction mouths at maintenance face 31.When treatment substrate 2 in substrate board treatment 1, by the absorption of vacuum suction mouth substrate 2, substrate 2 maintenance levels thus.
Maintenance face 31 is provided with a plurality of lifter pins 32.Lifter pin 32 constitutes in the mode of oscilaltion freely.When objective table 30 was taken away, lifter pin 32 rose and also keeps substrate when being loaded in substrate 2 on the objective table 30 or with substrate.Also have, in maintenance face 31,, be set with a pair of orbit 33 across the both ends in the zone that keeps substrate 2.In the time of orbit 33 supporting bridge formation portion 40, constitute the line slideway that move of guiding bridge formation portion 40 to directions X.
Maintenance face 31+the directions X side is provided with opening 34.The inside of the main part 10 below opening 34 is provided with the complementary tank etc. that the state that is used to make gap nozzle 42 prepares applying mechanism normally and is used to prevent gap nozzle 42 dryings.
Bridge formation portion 40 level frames are located at the top of objective table 30.Bridge formation portion 40 has carbon fibre is strengthened the elevating mechanism 43 as the two ends of the nozzle support 41 of framework material, the gap nozzle 42 that is installed in nozzle support 41, supporting nozzle support 41 such as resin.
Gap nozzle 42 has nozzle body portion 71, is installed in the side plate 72 at nozzle body portion 71 two ends.Gap nozzle 42 is the surface of scanning substrate 2 on one side, on one side to the regional coating of the regulation on substrate 2 surfaces liquid against corrosion.Detailed structure narration more later on about gap nozzle 42.
Elevating mechanism 43 is by nozzle support 41 supporting gap nozzles 42.Elevating mechanism 43 has AC servo motor 43a and not shown ball screw, and according to come translation lifting gap nozzle 42 from the control signal of control part 20.In addition, the posture of 43 pairs of gap nozzles 42 of elevating mechanism in the YZ plane adjusted.
Drive division 50 has a pair of retaining element 51 that is provided with along the both sides of objective table 30, a pair of moving meter 52 that is installed in the both ends of bridge formation portion 40.Drive division 50 constitutes a pair of AC drag cup linear motor by retaining element 51 and moving meter 52, and bridge formation portion 40 is moved on directions X.Also have, the linear encoder 53 with conversion portion and detecting element is installed at drive division 50.Linear encoder 53 detects the position of moving meter 52, and testing result is sent to control part 20.
Control part 20 has the storage part 22 according to the various operation of data of routine processes portion 21 and storage program and various data.In addition, be provided with the operating portion 23 of the indication input of accepting the operator and the display part 24 of the various data of demonstration in the front of control part 20.
Control part 20 is electrically connected with main part 10 by not shown cable.Control part 20 is based on from the input signal of operating portion 23 with control the action of retaining element 51 and moving meter 52 from the testing result of linear encoder 53.Control the action of the bridge formation portion 40 on the objective table 30 thus.In addition, control part 20 is based on controlling the action of elevating mechanism 43 and by the disgorging motion of the liquid against corrosion of gap nozzle 42 from the input signal of operating portion 23 with from the signal of not shown various sensors.
＜2. about the structure of gap nozzle 〉
Structure to above-mentioned gap nozzle 42 further describes.Fig. 2 is the stereogram of structure of the nozzle body portion 71 of expression gap nozzle 42.
As shown in Figure 2, be formed with liquor charging path 73 in the inside of nozzle body portion 71.Liquor charging path 73 is connected with liquid supply source 75 against corrosion.Also have, be formed with the discharge opening 74 of slit-shaped in the bottom of nozzle body portion 71.Liquid against corrosion is supplied with to liquor charging path 73 from liquid supply source 75 against corrosion, and spues to substrate 2 from discharge opening 74.
Side plate 72 is installed in both ends 71d, the 71e of nozzle body portion 71 as shown in Figure 2.That is, nozzle body portion 71 in the front of liquor charging path 73 (X side) and the back side (+X side) limit flowing of liquid against corrosion, (+Y side and-Y side) limits the flow velocity of liquid against corrosion and side plate 72 is at the both ends of liquor charging path 73.Also have nozzle body portion 71 to limit the edge of opening of discharge opening 74, and side plate 72 limit the edge of opening of discharge opening 74 at width (directions X) in length direction (Y direction).
In the present invention, side plate 72 can adopt various embodiments.Below, the various embodiments of side plate 72 are described.
First embodiment of＜2-1. side plate 〉
At first, first embodiment to side plate 72 describes.Fig. 3 has cut off near the side plate 721 of first embodiment profile with the plane that comprises liquor charging path 73.In addition, in Fig. 3 and Fig. 5～Figure 16, only represent near the side plate on one side, but also have same structure near the side plate of another side.
Is that mode below the 0.7mm is processed to side plate 721 with the thickness d in the Y direction of its bottom 721a.Therefore, even the liquid against corrosion 90 that is spued from discharge opening 74 expands (the dashdotted state Fig. 3) to side plate 721 sides, its expansion width all is suppressed in the scope of thickness d under many circumstances.This be since the expansion of liquid 90 against corrosion mainly be by occur in and the bottom 721a of side plate 721 between the influence of meniscus cause.Therefore, the change of the application width of liquid against corrosion is in the one-sided scope that is suppressed at thickness d.
Fig. 4 is in the general coating condition (viscosity of liquid 90 against corrosion: 2～10cp, the sweep speed of gap nozzle 42: in 50～150m/sec), the thickness d of bottom 721a by making side plate 721 changes, and whether the application width of investigating liquid 90 against corrosion enters specified scope (1000 ± 1mm) result.According to this result, when thickness d is 0.7mm when following, application width enters specified scope, thereby can obtain stable coating width.
Return Fig. 3, the thickness d of the bottom 721a of side plate 721 is processed into more than the 0.01mm.Therefore, can guarantee the rigidity of side plate 721 at bottom 721a.Also have, it is easy that the processing of side plate 721 becomes.
Tapered of the lateral surface 721b of the bottom 721a of side plate 721.Lateral surface 721b with respect to the horizontal plane (XY plane) angle θ 45 the degree more than.Thus, can prevent that liquid 90 against corrosion from exceeding the thickness d of bottom 721a and expansion laterally.
The lateral surface 721b of the bottom 721a of side plate 721 is connected in the lateral surface 721e of the top 721d of side plate 721 via stage portion 721c.And the top 721d of side plate 721 has the thickness D greater than the thickness d of bottom 721a.Therefore, side plate 721 whole rigidity are guaranteed, thereby are also become easy to the installation of nozzle body portion 71.
Like this, in the first embodiment, the thickness d of the bottom 721a of side plate 721 is below the 0.7mm.Therefore, even when the translational speed of gap nozzle 42 is slow or the viscosity of liquid against corrosion 90 low the time, also can reduce coated liquid against corrosion 90 expansion width laterally.Therefore, when can suppress the change of application width of liquid 90 against corrosion, also can suppress to be formed on the thickness change of the film on the substrate 2.
The side plate 721 of first embodiment also can constitute in mode as shown in Figure 5.In Fig. 5, the lateral surface 721b of the bottom 721a of side plate 721 has the angle θ of 90 degree with respect to the horizontal plane.That is, the lateral surface 721b of the bottom 721a of side plate 721 is with respect to the horizontal plane vertical.According to this, can prevent further that liquid 90 against corrosion from exceeding the thickness d of bottom 721a and expansion laterally.
The side plate 721 of first embodiment also can constitute in mode as shown in Figure 6.The thin plate 721f that the side plate 721 of Fig. 6 has assembled the end that limits liquor charging path 73 and discharge opening 74 constitutes with the pressed component 721g that is installed in the thin plate 721f outside.According to this, thin plate 721f and pressed component 721g become simple shape respectively.Therefore, can form the thickness attenuation of bottom 721a easily and have the shape of the side plate 721 of stage portion 721c.
Second embodiment of＜2-2. side plate 〉
Then, second embodiment to side plate 72 describes.Fig. 7 has cut off near the side plate 722 of second embodiment profile with the plane that comprises liquor charging path 73.
The bottom 722a of side plate 722 is arranged on the below of the bottom 71f of nozzle body portion 71.That is, the face of nozzle body portion 71 sides of side plate 722 (limiting the face of the end of liquor charging path 73) extends to the below of the bottom 71f of nozzle body portion 71 always.Therefore, the distance L 2 of 2 of side plate 722 and substrates is less than the distance L 1 of 2 of nozzle body portion 71 and substrates.
The liquid against corrosion 90 that is spued from discharge opening 74 forms meniscus part 90a between side plate 722 and substrate 2.In present embodiment, owing to make the close substrate 2 of the bottom 722a of side plate 722, so the radius of curvature r of meniscus part 90a diminishes.If the surface tension of liquid 90 against corrosion is made as γ, the laplace pressure Δ P that then becomes the power of liquid 90 against corrosion direction (Y direction) traction laterally can be represented by Δ P=2 γ/r.Therefore, if the radius of curvature r of meniscus part 90a diminishes, then laplace pressure Δ P becomes big.That is, the influence of capillarity strengthens, thereby the liquid 90 against corrosion that becomes is drawn laterally by powerful power.Thus, even under the situation that the liquid against corrosion 90 that is spued from discharge opening 74 shrinks to the inside, also can reduce its contracted width.
In addition, outwards expand on a large scale in order to prevent liquid 90 against corrosion, the difference that preferably makes above-mentioned distance L 1 and distance L 2 is following or below 70% of distance L 1 of 100 μ m.
In the present embodiment, be not gap nozzle 42 all but only make side plate 722 close to substrate 2.Therefore, exist under the situation of rubbish even have on the situation of fluctuating or the substrate 2 at substrate 2, nozzle body portion 71 can not contact with them yet.That is, nozzle body portion 71 can not sustain damage owing to rubbish etc., thereby can save cost and the time that is used to exchange expensive nozzle body portion 71.
Like this, in second embodiment, the bottom 722a of side plate 722 is arranged on the below of the bottom 71f of nozzle body portion 71.Therefore, even when the translational speed of gap nozzle 42 is fast or the viscosity of liquid against corrosion 90 high the time, coated liquid against corrosion 90 contracted width is to the inside diminished.Therefore, when can suppress the change of application width of liquid 90 against corrosion, also can suppress to be formed on the thickness change of the film on the substrate 2.
The side plate 722 of second embodiment also can be to constitute as Fig. 8～mode shown in Figure 10.In Fig. 8～Figure 10, be made as 0.01mm more than and 0.7mm below in the thickness d of Y direction the bottom 722a of side plate 722.Also have, the lateral surface 722b angle θ with respect to the horizontal plane of the bottom 722a of side plate 722 is more than 45 degree.According to this, can obtain also can obtain the effect of above-mentioned first embodiment on the basis of effect of present embodiment.
The 3rd embodiment of＜2-3. side plate 〉
Then, the 3rd embodiment to side plate 72 describes.Figure 11 has cut off near the side plate 723 of the 3rd embodiment profile with the plane that comprises liquor charging path 73.
The bottom 723a of side plate 723 is arranged on the top of the bottom 71f of nozzle body portion 71.That is, the face of nozzle body portion 71 sides of side plate 723 (limiting the face of the end of liquor charging path 73) does not extend to the bottom 71f of nozzle body portion 71.Therefore, the distance L 3 of 2 of side plate 723 and substrates is greater than the distance L 1 of 2 of nozzle body portion 71 and substrates.
In the present embodiment, because the bottom 723a of side plate 723 and the distance of substrate 2, so the laplace pressure Δ P of liquid 90 against corrosion direction traction laterally is little.Therefore, even under the situation that the liquid against corrosion 90 that is spued from discharge opening 74 expands laterally, this expansion width is diminished.
When the translational speed of gap nozzle 42 is very slow or the viscosity of liquid against corrosion 90 low-down the time, present embodiment is effective especially.Have such trend at this time, that is, liquid 90 against corrosion exceeds the bottom of side plate 723 and expands laterally, and forms protuberance 90b (among Figure 11 with the state shown in the chain-dotted line) in end edge.As present embodiment, if the bottom 723a that makes side plate 723 when then can reduce expansion width laterally, can eliminate above-mentioned protuberance 90b significantly away from substrate 2.
In addition, shrink to the inside significantly in order to prevent liquid 90 against corrosion, the difference that preferably makes above-mentioned distance L 1 and distance L 2 is below the 500 μ m.
In the present embodiment, be not gap nozzle 42 all but only make side plate 723 away from substrate 2.Therefore, when can make the distance of 2 of nozzle body portion 71 and substrates be kept for applying the optimum distance L1 of liquid 90 against corrosion, can guarantee the distance L 3 between side plate 723 and the substrate 2 very big.
Like this, in the 3rd embodiment, the bottom 723a of side plate 723 is arranged on the top of the bottom 71f of nozzle body portion 71.Therefore, even when the translational speed of gap nozzle 42 is slow or the viscosity of liquid against corrosion 90 low the time, also can make coated liquid against corrosion 90 expansion reduced width laterally.Also have, also can eliminate the protuberance 90b of the end edge that is formed on liquid 90 against corrosion.Therefore, can suppress the change of the application width of liquid 90 against corrosion, also can suppress to be formed on the thickness change of the film on the substrate 2 simultaneously.
The side plate 723 of the 3rd embodiment also can be to constitute as Figure 12～mode shown in Figure 14.In Figure 12～Figure 14, be made as 0.01mm more than and 0.7mm below in the thickness d of Y direction the bottom 723a of side plate 723.Also have, the lateral surface 723b angle θ with respect to the horizontal plane of the bottom 723a of side plate 723 is more than 45 degree.According to this, can obtain also can obtain the effect of above-mentioned first embodiment on the basis of effect of present embodiment.
The 4th embodiment of＜2-4. side plate 〉
At last, the 4th embodiment to side plate 72 describes.Figure 15 has cut off near the side plate 724 of the 4th embodiment profile with the plane that comprises liquor charging path 73.
The movable platen 724a that side plate 724 has assembled the end that limits liquor charging path 73 and discharge opening 74 constitutes with being fixed on the pressed component 724b of nozzle body portion 71.Movable platen 724a is connected with pressed component 724b by the adjustment bolt 724c that is screwed at an upper portion thereof.Therefore, adjust bolt 724c and can make movable platen 724a oscilaltion by rotation.That is, this side plate 724 passes through to regulate the height of movable platen 724a, and can regulate the height of the bottom 724d of side plate 724.
The height of movable platen 724a is regulated according to the translational speed of gap nozzle 42, the viscosity of liquid against corrosion 90.For example, when gap nozzle 42 is moved with low speed or the viscosity of liquid against corrosion 90 low the time, movable platen 724a is adjusted to high relatively position.According to this, the distance between the bottom 724d of movable platen 724a and substrate W becomes big, thereby coated liquid against corrosion 90 expansion width is laterally diminished.Also have,, movable platen 724a is adjusted to low relatively position when gap nozzle 42 with high-speed mobile the time or the viscosity of liquid against corrosion 90 high the time.According to this, the bottom 724d of movable platen 724a and the distance between substrate W diminish, thereby coated liquid against corrosion 90 shrinkage amplitude is to the inside diminished.
The side plate 724 of the 4th embodiment also can constitute in mode as shown in figure 16.In the side plate 724 in Figure 16, movable platen 724a is connected by the eccentric cam 724f that rotates around fixed axis 724e with pressed component 724b.Utilize this structure, also can regulate the height of movable platen 724a by rotation eccentric cam 724f.
In addition, side plate 724 can adopt manual operation above-mentioned adjustment bolt 724c or eccentric cam 724f and the structure of regulating the height of movable platen 724a, also can adopt power sources such as utilizing motor to regulate the structure of the height of movable platen 724a.Also have, also can adopt control part 20 and power source are electrically connected, and based on the structure of regulating the height of movable platen 724a from the signal of control part 20 automatically.
Also have, the height of movable platen 724a can be regulated when gap nozzle 42 is static, also can regulate in the scanning process of gap nozzle 42.Figure 17 is illustrated in the electrical structure that control part 20 is regulated movable platen 724a in the scanning process of gap nozzle 42 height is used.Control part 20 calculates the actual speed of gap nozzle 42 based on the detection signal from linear encoder 53.Then, control part 20 is controlled power source 724g based on the actual speed of gap nozzle 42.Thus, make according to the actual speed of gap nozzle 42 and to adjust bolt 724c action, thereby can adjust the height of movable platen 724a.Also same structure can be applicable to the eccentric cam 724f among Figure 16.
When using this gap nozzle 42 to apply to handle, from the discharge opening 74 of gap nozzle 42 to substrate 2 liquid against corrosion that spues.Then, gap nozzle 42 is moved, and regulate the height of movable platen 724a according to its translational speed by drive division 50.
Make that relation between the height of the speed of gap nozzle 42 and movable platen 724a for example satisfies, relation as shown in figure 18.That is, as scan just begin the back and just to stop before, when gap nozzle 42 is low speed, make movable platen 724a rise to high relatively position.And, when making gap nozzle 42, make movable platen 724a drop to low relatively position with high-speed mobile.According to this, can dwindle in time liquid 90 against corrosion laterally the expansion width and contracted width to the inside.
In addition, control part 20 viscosity that also can be based on liquid 90 against corrosion is controlled power source 724g.The relation of the height of the viscosity of liquid 90 against corrosion and movable platen 724a is for example satisfied, relation as shown in figure 19.That is, when the viscosity of liquid 90 against corrosion is low, make movable platen 724a rise to high relatively position.And, when the viscosity of liquid 90 against corrosion is high, make movable platen 724a drop to low relatively position.Also have, control part 20 also can be controlled power source 724g based on two conditions of the viscosity of the translational speed of relevant gap nozzle 42 and liquid against corrosion 90.
＜3. variation 〉
More than, embodiments of the present invention are illustrated, but the present invention is defined in above-mentioned example.For example, above-mentioned substrate board treatment 1 has adopted the structure that gap nozzle 42 is scanned for static substrate 2, but also can adopt the structure with respect to fixing gap nozzle 42 moving substrates 2.That is, make gap nozzle 42 carry out the structure of relative scanning with respect to substrate as long as adopt.
Also have, in above-mentioned example, front side (the identical situation of height of+bottom X) and the bottom of the rear side of liquor charging path 73 (X side) of the liquor charging path 73 of nozzle body portion 71 has been described.At this moment, the bottom of above-mentioned side plate 72 (bottom of side plate 721,722,723 or the bottom of movable platen 724a) is set in from the position of the bottom 71f that is lower than nozzle body portion 71 to the scope of the position that is higher than this.But as shown in figure 20, nozzle body portion 71 also can make the lower end side 71g of liquor charging path 73 front sides be positioned at the below of the bottom 71h of liquor charging path 73 rear sides.At this moment, the bottom of above-mentioned side plate 72 is preferably set from the position h1 of bottom (lowest end of the nozzle body portion 71) 71g of the front side that is lower than nozzle body portion 71, to the scope of the position h2 of the bottom 71h of the rear side that is higher than nozzle body portion 71.Also have as shown in figure 21, nozzle body portion 71 also can make the bottom 71g of the front side of liquor charging path 73 be positioned at the top of bottom 71h of the rear side of liquor charging path 73.At this moment, the bottom of above-mentioned side plate 72 is preferably set from the position h3 of bottom (lowest end of the nozzle body portion 71) 71h of the rear side that is lower than nozzle body portion 71, to the scope of the position h4 of the bottom 71g of the front side that is higher than nozzle body portion 71.If the height setting of side plate 72 in such scope, then can be obtained stable coating width more.
Also have, the substrate of handling object is not limited to the liquid crystal glass substrate, also can be semiconductor substrate and photomask etc.Also have, coated treatment fluid is not limited to liquid against corrosion, also can be other treatment fluid such as developer solution.

Claims (11)

1. gap nozzle, the discharge opening that has slit-shaped in its underpart is characterized in that, has:
Nozzle body portion, it limits the edge of opening of above-mentioned discharge opening at length direction;
Pair of side plates, it is installed in the two ends on the length direction of said nozzle main part respectively, and limits the edge of opening of above-mentioned discharge opening at the width vertical with above-mentioned length direction by described pair of side plates;
This gap nozzle is on one side from the above-mentioned discharge opening treatment fluid that spues, on one side the member that moves along the width vertical with above-mentioned length direction,
Thickness on the length direction of the bottom of above-mentioned side plate is below the 0.7mm.
2. the gap nozzle of putting down in writing as claim 1 is characterized in that, the lateral surface of the bottom of above-mentioned side plate angle with respect to the horizontal plane is more than 45 degree.
3. as claim 1 or 2 gap nozzles of being put down in writing, it is characterized in that the lower end part of above-mentioned side plate is in the below of the bottom of said nozzle main part.
4. as claim 1 or 2 gap nozzles of being put down in writing, it is characterized in that the lower end part of above-mentioned side plate is in the top of the bottom of said nozzle main part.
5. as claim 1 or 2 gap nozzles of being put down in writing, it is characterized in that above-mentioned side plate has the adjusting device of the height of the bottom of regulating above-mentioned side plate.
6. as claim 1 or 2 gap nozzles of being put down in writing, it is characterized in that above-mentioned side plate has the thin plate of the end that limits above-mentioned discharge opening and the pressed component of fixing above-mentioned thin plate.
7. gap nozzle, the discharge opening that has slit-shaped in its underpart is characterized in that, has:
Nozzle body portion, it limits the edge of opening of above-mentioned discharge opening at length direction;
Pair of side plates, it is installed in the two ends on the length direction of said nozzle main part respectively, and limits the edge of opening of above-mentioned discharge opening at the width vertical with above-mentioned length direction by described pair of side plates;
This gap nozzle is on one side from the above-mentioned discharge opening treatment fluid that spues, on one side the member that moves along the width vertical with above-mentioned length direction,
The lower end part of above-mentioned side plate is in the below of the bottom of said nozzle main part.
8. gap nozzle, the discharge opening that has slit-shaped in its underpart is characterized in that, has:
Nozzle body portion, it limits the edge of opening of above-mentioned discharge opening at length direction;
Pair of side plates, it is installed in the two ends on the length direction of said nozzle main part respectively, and limits the edge of opening of above-mentioned discharge opening at the width vertical with above-mentioned length direction by described pair of side plates;
This gap nozzle is on one side from the above-mentioned discharge opening treatment fluid that spues, on one side the member that moves along the width vertical with above-mentioned length direction,
The lower end part of above-mentioned side plate is in the top of the bottom of said nozzle main part.
9. gap nozzle, the discharge opening that has slit-shaped in its underpart is characterized in that, has:
Nozzle body portion, it limits the edge of opening of above-mentioned discharge opening at length direction;
Pair of side plates, it is installed in the two ends on the length direction of said nozzle main part respectively, and limits the edge of opening of above-mentioned discharge opening at the width vertical with above-mentioned length direction by described pair of side plates;
This gap nozzle is on one side from the above-mentioned discharge opening treatment fluid that spues, on one side the member that moves along the width vertical with above-mentioned length direction,
Above-mentioned side plate has the adjusting device of the height of the bottom of regulating above-mentioned side plate.
10. substrate board treatment is characterized in that having:
As any gap nozzle of being put down in writing in the claim 1,7,8 and 9;
Holding device, its lower horizontal at above-mentioned gap nozzle keeps substrate;
Scanning means, it makes above-mentioned gap nozzle, on the direction vertical with the length direction of above-mentioned discharge opening, the substrate that is kept by above-mentioned holding device is carried out relative scanning;
Feedway, it supplies with treatment fluid to above-mentioned gap nozzle.
11. a substrate processing method using same is characterized in that, the gap nozzle that uses claim 9 to put down in writing, and described substrate processing method using same comprises:
Supply with operation, when it makes above-mentioned gap nozzle carry out relative scanning to substrate, from above-mentioned discharge opening to the substrate treatment fluid that spues;
Regulate operation, the speed of its viscosity according to above-mentioned treatment fluid, above-mentioned gap nozzle or this two conditions are regulated the height of the bottom of above-mentioned side plate.
CN200610054724A 2005-03-16 2006-03-02 Gap nozzle,substrate processing apparatus and method Active CN100581657C (en)

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JP2005075402A JP4549905B2 (en) 2005-03-16 2005-03-16 Slit nozzle, substrate processing apparatus, and substrate processing method
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JP4549905B2 (en) 2010-09-22
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