CN100580552C - 具有无机粒子的多光子活性组合物及制造结构的方法 - Google Patents

具有无机粒子的多光子活性组合物及制造结构的方法 Download PDF

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Publication number
CN100580552C
CN100580552C CN03823673A CN03823673A CN100580552C CN 100580552 C CN100580552 C CN 100580552C CN 03823673 A CN03823673 A CN 03823673A CN 03823673 A CN03823673 A CN 03823673A CN 100580552 C CN100580552 C CN 100580552C
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multiphoton
active
composition
particles
active composition
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Expired - Fee Related
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CN03823673A
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Chinese (zh)
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CN1688937A (zh
Inventor
C·A·莱舍戴尔
C·R·查特
D·S·汤普森
W·L·汤普森
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3M Innovative Properties Co
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3M Innovative Properties Co
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN03823673A 2002-10-02 2003-09-26 具有无机粒子的多光子活性组合物及制造结构的方法 Expired - Fee Related CN100580552C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/262,927 US7265161B2 (en) 2002-10-02 2002-10-02 Multi-photon reactive compositions with inorganic particles and method for fabricating structures
US10/262,927 2002-10-02

Publications (2)

Publication Number Publication Date
CN1688937A CN1688937A (zh) 2005-10-26
CN100580552C true CN100580552C (zh) 2010-01-13

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US (3) US7265161B2 (enExample)
EP (1) EP1546805A1 (enExample)
JP (1) JP4723248B2 (enExample)
KR (1) KR20050071538A (enExample)
CN (1) CN100580552C (enExample)
AU (1) AU2003279024A1 (enExample)
BR (1) BR0314958A (enExample)
CA (1) CA2499868A1 (enExample)
WO (1) WO2004031862A1 (enExample)

Families Citing this family (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7265161B2 (en) * 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US7237893B2 (en) * 2001-12-28 2007-07-03 Chang Shiao H Light adjustable lenses capable of post-fabrication power modification via multi-photon processes
US7232650B2 (en) * 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
WO2005015268A2 (en) * 2003-08-08 2005-02-17 Calhoun Vision Light adjustable lenses capable of post-fabrication power modification via multi-photon processes
US20050036179A1 (en) * 2003-08-13 2005-02-17 General Electric Company Holographic storage medium comprising metal-containing high refractive index region, and storage article containing same
AU2003304694A1 (en) * 2003-12-05 2005-08-12 3M Innovative Properties Company Process for producing photonic crystals and controlled defects therein
US20050124712A1 (en) * 2003-12-05 2005-06-09 3M Innovative Properties Company Process for producing photonic crystals
US7771803B2 (en) * 2004-10-27 2010-08-10 Palo Alto Research Center Incorporated Oblique parts or surfaces
US7710371B2 (en) * 2004-12-16 2010-05-04 Xerox Corporation Variable volume between flexible structure and support surface
ATE403708T1 (de) * 2004-12-29 2008-08-15 3M Innovative Properties Co Multiphoton-polymerisierbare vorkeramische polymerzusammensetzungen
US7297374B1 (en) * 2004-12-29 2007-11-20 3M Innovative Properties Company Single- and multi-photon polymerizable pre-ceramic polymeric compositions
WO2006077995A1 (en) * 2005-01-18 2006-07-27 Fujifilm Corporation Transparent film and method for manufacturing the same, polarized plate and image display device
EP1720072B1 (en) * 2005-05-01 2019-06-05 Rohm and Haas Electronic Materials, L.L.C. Compositons and processes for immersion lithography
US7583444B1 (en) * 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
CN101448632B (zh) * 2006-05-18 2012-12-12 3M创新有限公司 用于制备具有提取结构的光导的方法以及由此方法生产的光导
US7491287B2 (en) * 2006-06-09 2009-02-17 3M Innovative Properties Company Bonding method with flowable adhesive composition
JP5105808B2 (ja) * 2006-09-19 2012-12-26 保土谷化学工業株式会社 ジスチリルベンゼン誘導体及びこれを用いた三次元メモリ材料、光制限材料、光造形用光硬化樹脂の硬化材料、並びに二光子蛍光顕微鏡用蛍光色素材料。
EP2420891B1 (en) * 2006-10-30 2021-06-23 Rohm and Haas Electronic Materials LLC Process for immersion lithography
IN2009CN03580A (enExample) * 2006-12-21 2015-09-11 Agfa Graphics Nv
US8376013B2 (en) 2008-03-11 2013-02-19 Duke University Plasmonic assisted systems and methods for interior energy-activation from an exterior source
US20080296711A1 (en) * 2007-05-30 2008-12-04 Freescale Semiconductor, Inc. Magnetoelectronic device having enhanced permeability dielectric and method of manufacture
JP5037243B2 (ja) * 2007-07-06 2012-09-26 富士フイルム株式会社 界面結合剤、該界面結合剤を含有するレジスト組成物、及び該界面結合剤からなる層を有する磁気記録媒体形成用積層体、並びに該界面結合剤を用いた磁気記録媒体の製造方法、及び該製造方法により製造された磁気記録媒体
US7851138B2 (en) * 2007-07-19 2010-12-14 Hitachi Global Storage Technologies, Netherlands, B.V. Patterning a surface comprising silicon and carbon
WO2009014501A1 (en) * 2007-07-20 2009-01-29 Agency For Science, Technology And Research Two-photon stereolithography using photocurable compositions
WO2009048808A1 (en) * 2007-10-11 2009-04-16 3M Innovative Properties Company Chromatic confocal sensor
TWI407262B (zh) * 2007-11-05 2013-09-01 羅門哈斯電子材料有限公司 浸潤式微影組成物及製程
KR101403187B1 (ko) * 2008-02-19 2014-06-02 삼성전자주식회사 감광성 조성물, 이를 이용한 미세 가공 방법 및 그에 의해형성된 미세 가공물
IL196690A0 (en) * 2008-05-29 2011-08-01 Plasan Sasa Ltd Interchangeable door
US20100068275A1 (en) * 2008-09-16 2010-03-18 Searete Llc, A Limited Liability Corporation Of The State Of Delaware Personalizable dosage form
US20100068153A1 (en) * 2008-09-16 2010-03-18 Searete Llc, A Limited Liability Corporation Of The State Of Delaware Ex vivo activatable final dosage form
US20100068278A1 (en) * 2008-09-16 2010-03-18 Searete Llc, A Limited Liablity Corporation Of The State Of Delaware Ex vivo modifiable medicament release-associations
US20100068254A1 (en) * 2008-09-16 2010-03-18 Mahalaxmi Gita Bangera Modifying a medicament availability state of a final dosage form
KR20100052948A (ko) * 2008-11-11 2010-05-20 삼성전자주식회사 라디칼 중합용 조성물 및 이를 이용한 패턴 형성 방법
CN102768466A (zh) * 2011-05-05 2012-11-07 中国科学院理化技术研究所 化学增幅型正性光刻胶、制备方法及其在双光子精细加工中的应用
WO2012170204A1 (en) * 2011-06-08 2012-12-13 3M Innovative Properties Company Photoresists containing polymer-tethered nanoparticles
US20130108956A1 (en) * 2011-11-01 2013-05-02 Az Electronic Materials Usa Corp. Nanocomposite positive photosensitive composition and use thereof
WO2013130297A1 (en) 2012-02-28 2013-09-06 3M Innovative Properties Company Multiphoton curing methods using negative contrast compositions
EP3077865B1 (en) 2013-12-06 2022-09-28 3M Innovative Properties Company Multiphoton imaging method using an immersed microscope objective having water soluble protective fim
EP3077421B1 (en) 2013-12-06 2018-01-31 3M Innovative Properties Company Liquid photoreactive composition and method of fabricating structures
WO2015119616A1 (en) * 2014-02-07 2015-08-13 Eastman Kodak Company Photopolymerizable compositions for electroless plating methods
US9696624B2 (en) * 2015-07-29 2017-07-04 Rohm And Haas Electronic Materials Llc Nanoparticle-polymer resists
EP3163372B1 (en) 2015-10-26 2020-04-29 Samsung Electronics Co., Ltd. Quantum dot having polymeric outer layer, photosensitive compositions including the same, and quantum dot polymer composite pattern produced therefrom
WO2017155779A1 (en) 2016-03-07 2017-09-14 3M Innovative Properties Company Vacuum glazing pillars for insulated glass units and insulated glass units therefrom
WO2017155687A1 (en) 2016-03-07 2017-09-14 3M Innovative Properties Company Vacuum glazing pillars for insulated glass units and insulated glass units therefrom
US20170369654A1 (en) 2016-06-24 2017-12-28 Dow Global Technologies Llc Curable resin composition
KR20190042000A (ko) * 2016-08-24 2019-04-23 도레이 카부시키가이샤 감광성 페이스트, 세라믹 그린 시트, 전자 부품, 패턴의 제조 방법 및 전자 부품의 제조 방법
US10023500B2 (en) 2016-08-30 2018-07-17 General Electric Company Light-curable ceramic slurries with hybrid binders
JP2019532165A (ja) 2016-09-14 2019-11-07 スリーエム イノベイティブ プロパティズ カンパニー 速硬化性光学接着剤
MY194777A (en) * 2017-03-29 2022-12-15 Asahi Chemical Ind Photosensitive resin composition
US10833469B2 (en) 2017-10-13 2020-11-10 Washington University Photonic molecule laser
US10538460B2 (en) 2018-03-15 2020-01-21 General Electric Company Ceramic slurries for additive manufacturing techniques
CN108525673B (zh) * 2018-04-26 2020-09-29 杭州诚洁环保有限公司 一种类芬顿固体催化剂及其制备方法和应用
WO2020095837A1 (ja) * 2018-11-05 2020-05-14 日本化学工業株式会社 改質リン酸タングステン酸ジルコニウム、負熱膨張フィラー及び高分子組成物
US11453618B2 (en) * 2018-11-06 2022-09-27 Utility Global, Inc. Ceramic sintering
CN109551855B (zh) * 2018-11-30 2020-07-07 河南永威安防股份有限公司 一种光催化高压装饰板及其制备方法
US11248143B2 (en) 2019-05-24 2022-02-15 Dupont Electronics, Inc. Coated films and electronic devices
CN110568721A (zh) * 2019-09-12 2019-12-13 Oppo广东移动通信有限公司 玻璃盖板的制作方法、玻璃盖板及移动终端
US11484969B2 (en) 2019-10-18 2022-11-01 3M Innovative Properties Company Method of making a three-dimensional structure containing substructures
US12468138B2 (en) 2019-12-05 2025-11-11 3M Innovative Properties Company Multiphoton imaging methods in a scattering and/or absorbing medium, and articles
US11578002B2 (en) 2020-02-27 2023-02-14 General Electric Company Ceramic slurries with photoreactive-photostable hybrid binders
US11572313B2 (en) 2020-02-27 2023-02-07 General Electric Company Ceramic slurries with photoreactive-photostable hybrid binders
CN111468075B (zh) * 2020-04-14 2022-04-08 蚌埠学院 一种磁性三嗪基共价键有机骨架材料的合成方法及其在染料废水吸附中的应用
CN113499436B (zh) * 2021-07-23 2023-03-10 山东中医药大学 一种二氧化钼光响应纳米材料及其制备方法和应用
US12409643B2 (en) 2021-09-15 2025-09-09 Dupont Electronics, Inc. Articles having inorganic substrates and polymer film layers
US12234374B2 (en) 2022-03-02 2025-02-25 Dupont Electronics, Inc. Polymer compositions and coating solutions

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998021521A1 (en) * 1996-11-12 1998-05-22 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
CN1303358A (zh) * 1998-05-27 2001-07-11 新材料公共服务公司研究所 多层光学系统的生产方法
WO2001096409A2 (en) * 2000-06-15 2001-12-20 3M Innovative Properties Company Multiphoton photosensitization system

Family Cites Families (97)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB400662A (en) * 1932-04-30 1933-10-30 Henry Dreyfus Improvements in the production of artificial filaments
US2801185A (en) * 1952-05-16 1957-07-30 Du Pont Silica hydrosol powder
US3018262A (en) * 1957-05-01 1962-01-23 Shell Oil Co Curing polyepoxides with certain metal salts of inorganic acids
NL298323A (enExample) * 1959-12-24
US3502520A (en) * 1965-12-30 1970-03-24 Ibm Process of making patterned unitary solid bodies from finely divided discrete particles
US3583931A (en) * 1969-11-26 1971-06-08 Du Pont Oxides of cubic crystal structure containing bismuth and at least one of ruthenium and iridium
US3954475A (en) 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US3987037A (en) 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US3729313A (en) * 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US3808006A (en) * 1971-12-06 1974-04-30 Minnesota Mining & Mfg Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US3741769A (en) * 1972-10-24 1973-06-26 Minnesota Mining & Mfg Novel photosensitive polymerizable systems and their use
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US4250053A (en) * 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
US4257915A (en) 1979-07-23 1981-03-24 E. I. Du Pont De Nemours And Company Photopolymer initiator system containing a semiconductor, a reducing agent and an oxidizing agent
US4279717A (en) * 1979-08-03 1981-07-21 General Electric Company Ultraviolet curable epoxy silicone coating compositions
US4394433A (en) 1979-12-07 1983-07-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4522958A (en) * 1983-09-06 1985-06-11 Ppg Industries, Inc. High-solids coating composition for improved rheology control containing chemically modified inorganic microparticles
US4642126A (en) * 1985-02-11 1987-02-10 Norton Company Coated abrasives with rapidly curable adhesives and controllable curvature
US4652274A (en) * 1985-08-07 1987-03-24 Minnesota Mining And Manufacturing Company Coated abrasive product having radiation curable binder
US4751138A (en) 1986-08-11 1988-06-14 Minnesota Mining And Manufacturing Company Coated abrasive having radiation curable binder
US4735632A (en) 1987-04-02 1988-04-05 Minnesota Mining And Manufacturing Company Coated abrasive binder containing ternary photoinitiator system
CA1323949C (en) * 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US4889792A (en) 1987-12-09 1989-12-26 Minnesota Mining And Manufacturing Company Ternary photoinitiator system for addition polymerization
US5104929A (en) 1988-04-11 1992-04-14 Minnesota Mining And Manufacturing Company Abrasion resistant coatings comprising silicon dioxide dispersions
US4859572A (en) * 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
JPH0288615A (ja) * 1988-09-27 1990-03-28 Mitsubishi Rayon Co Ltd 難燃性液状感光性樹脂組成物
US4954416A (en) 1988-12-21 1990-09-04 Minnesota Mining And Manufacturing Company Tethered sulfonium salt photoinitiators for free radical polymerization
US4963471A (en) * 1989-07-14 1990-10-16 E. I. Du Pont De Nemours And Company Holographic photopolymer compositions and elements for refractive index imaging
US5032478A (en) * 1989-08-21 1991-07-16 E. I. Du Pont De Nemours And Company Photosensitive aqueous developable gold conductor composition
US5047313A (en) * 1989-08-21 1991-09-10 E. I. Du Pont De Nemours And Company Photosensitive semi-aqueous developable copper conductor composition
US5032490A (en) * 1989-08-21 1991-07-16 E. I. Du Pont De Nemours And Company Photosensitive aqueous developable copper conductor composition
DK0432907T3 (da) 1989-11-22 1995-07-10 Johnson Matthey Plc Forbedrede pastasammensætninger
US5238744A (en) 1990-08-16 1993-08-24 Minnesota Mining And Manufacturing Company Tough polymeric mixtures
US5189136A (en) 1990-12-12 1993-02-23 The Regents Of The University Of California Conducting polymer formed of poly(2-methoxy,5-(2'-ethyl-hexyloxy)-p-phenylenevinylene)
US5235015A (en) * 1991-02-21 1993-08-10 Minnesota Mining And Manufacturing Company High speed aqueous solvent developable photopolymer compositions
DE4116957A1 (de) * 1991-05-24 1992-11-26 Ruetgerswerke Ag Durch strahlung vernetzbare beschichtungsmittel und ihre verwendung
FR2694494B1 (fr) * 1992-08-05 1994-09-30 Rhone Poulenc Chimie Composition cosmétique contenant en suspension des particules non hydrosolubles.
US5307438A (en) * 1992-08-13 1994-04-26 Minnesota Mining And Manufacturing Company Index matching compositions with improved DNG/DT
TW268969B (enExample) * 1992-10-02 1996-01-21 Minnesota Mining & Mfg
US5496682A (en) * 1993-10-15 1996-03-05 W. R. Grace & Co.-Conn. Three dimensional sintered inorganic structures using photopolymerization
US5624782A (en) * 1994-04-14 1997-04-29 E. I. Du Pont De Nemours And Company Method of manufacturing thick-film resistor elements
US5856373A (en) * 1994-10-31 1999-01-05 Minnesota Mining And Manufacturing Company Dental visible light curable epoxy system with enhanced depth of cure
US5648407A (en) * 1995-05-16 1997-07-15 Minnesota Mining And Manufacturing Company Curable resin sols and fiber-reinforced composites derived therefrom
JP3570154B2 (ja) * 1996-08-08 2004-09-29 富士ゼロックス株式会社 データ中継装置、及びデータ中継方法
US6267913B1 (en) * 1996-11-12 2001-07-31 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
US6608228B1 (en) 1997-11-07 2003-08-19 California Institute Of Technology Two-photon or higher-order absorbing optical materials for generation of reactive species
JP3766165B2 (ja) * 1997-03-07 2006-04-12 株式会社ニコン 画像形成方法及び感光材料
US6054007A (en) 1997-04-09 2000-04-25 3M Innovative Properties Company Method of forming shaped adhesives
US6025406A (en) 1997-04-11 2000-02-15 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy resins
US5998495A (en) * 1997-04-11 1999-12-07 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy/polyol resin compositions
US5859251A (en) * 1997-09-18 1999-01-12 The United States Of America As Represented By The Secretary Of The Air Force Symmetrical dyes with large two-photon absorption cross-sections
US5770737A (en) * 1997-09-18 1998-06-23 The United States Of America As Represented By The Secretary Of The Air Force Asymmetrical dyes with large two-photon absorption cross-sections
US6322901B1 (en) 1997-11-13 2001-11-27 Massachusetts Institute Of Technology Highly luminescent color-selective nano-crystalline materials
US6005707A (en) 1997-11-21 1999-12-21 Lucent Technologies Inc. Optical devices comprising polymer-dispersed crystalline materials
US5990479A (en) 1997-11-25 1999-11-23 Regents Of The University Of California Organo Luminescent semiconductor nanocrystal probes for biological applications and process for making and using such probes
JP4050370B2 (ja) 1998-01-07 2008-02-20 株式会社Ｋｒｉ 無機質含有感光性樹脂組成物および無機パターン形成方法
US6501091B1 (en) 1998-04-01 2002-12-31 Massachusetts Institute Of Technology Quantum dot white and colored light emitting diodes
CA2326322C (en) * 1998-04-21 2011-03-01 University Of Connecticut Free-form nanofabrication using multi-photon excitation
US6262129B1 (en) 1998-07-31 2001-07-17 International Business Machines Corporation Method for producing nanoparticles of transition metals
EP1116036B1 (en) 1998-09-18 2004-08-11 Massachusetts Institute Of Technology Water-soluble fluorescent semiconductor nanocrystals
US6426513B1 (en) 1998-09-18 2002-07-30 Massachusetts Institute Of Technology Water-soluble thiol-capped nanocrystals
US6245849B1 (en) 1999-06-02 2001-06-12 Sandia Corporation Fabrication of ceramic microstructures from polymer compositions containing ceramic nanoparticles
US6100405A (en) * 1999-06-15 2000-08-08 The United States Of America As Represented By The Secretary Of The Air Force Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion
JP2001026416A (ja) * 1999-07-12 2001-01-30 Kansai Research Institute 粒子分散体
US6512606B1 (en) * 1999-07-29 2003-01-28 Siros Technologies, Inc. Optical storage media and method for optical data storage via local changes in reflectivity of a format grating
US6783914B1 (en) 2000-02-25 2004-08-31 Massachusetts Institute Of Technology Encapsulated inorganic resists
US6624915B1 (en) * 2000-03-16 2003-09-23 Science Applications International Corporation Holographic recording and micro/nanofabrication via ultrafast holographic two-photon induced photopolymerization (H-TPIP)
AU2001270321A1 (en) 2000-06-15 2001-12-24 3M Innovative Properties Company Method for making or adding structures to an article
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
AU2001268465A1 (en) 2000-06-15 2001-12-24 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
WO2001096962A2 (en) 2000-06-15 2001-12-20 3M Innovative Properties Company Multiphoton absorption method using patterned light
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
US7790353B2 (en) 2000-06-15 2010-09-07 3M Innovative Properties Company Multidirectional photoreactive absorption method
WO2001096915A2 (en) 2000-06-15 2001-12-20 3M Innovative Properties Company Microfabrication of organic optical elements
US7118845B2 (en) * 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
US7265161B2 (en) 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
US7005229B2 (en) * 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
DE60139620D1 (de) 2000-06-15 2009-10-01 3M Innovative Properties Co Methode und gerät zur erzielung wiederholter multiphotonabsorption
WO2001096952A2 (en) 2000-06-15 2001-12-20 3M Innovative Properties Company Multicolor imaging using multiphoton photochemical processes
US7060419B2 (en) * 2000-06-15 2006-06-13 3M Innovative Properties Company Process for producing microfluidic articles
US6686106B2 (en) * 2000-06-26 2004-02-03 Ube Industries, Ltd. Photosensitive resin compositions, insulating films, and processes for formation of the films
JP4648530B2 (ja) * 2000-10-10 2011-03-09 大日本印刷株式会社 感光性樹脂組成物および液晶ディスプレイ用カラーフィルタ
JP4378876B2 (ja) * 2000-12-07 2009-12-09 宇部興産株式会社 感光性カバ−レイフィルムおよびカバ−レイフィルムの形成法
US7252699B2 (en) * 2000-12-15 2007-08-07 The Arizona Board Of Regents Method for patterning metal using nanoparticle containing precursors
JP2002189289A (ja) * 2000-12-21 2002-07-05 Mitsubishi Gas Chem Co Inc 自己消火性レジスト組成物
JP4701520B2 (ja) * 2001-03-08 2011-06-15 株式会社村田製作所 電子回路部品製造用水現像性感光性ペースト、ならびにそれを用いた電子回路部品における機能材料膜の形成方法、および多層セラミック基板の製造方法
US7008749B2 (en) * 2001-03-12 2006-03-07 The University Of North Carolina At Charlotte High resolution resists for next generation lithographies
EP1390664A4 (en) 2001-03-30 2008-01-02 Univ Arizona MATERIALS, METHODS AND USES FOR PHOTOCHEMICAL GENERATION OF ACIDS AND / OR RADICAL SPECIES
US6774300B2 (en) * 2001-04-27 2004-08-10 Adrena, Inc. Apparatus and method for photovoltaic energy production based on internal charge emission in a solid-state heterostructure
US6593392B2 (en) * 2001-06-22 2003-07-15 Corning Incorporated Curable halogenated compositions
US6656990B2 (en) * 2001-07-11 2003-12-02 Corning Incorporated Curable high refractive index compositions
US6750266B2 (en) * 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US6682872B2 (en) * 2002-01-22 2004-01-27 International Business Machines Corporation UV-curable compositions and method of use thereof in microelectronics
US7232650B2 (en) * 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
US20030155667A1 (en) * 2002-12-12 2003-08-21 Devoe Robert J Method for making or adding structures to an article

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998021521A1 (en) * 1996-11-12 1998-05-22 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
CN1303358A (zh) * 1998-05-27 2001-07-11 新材料公共服务公司研究所 多层光学系统的生产方法
WO2001096409A2 (en) * 2000-06-15 2001-12-20 3M Innovative Properties Company Multiphoton photosensitization system

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
AN EFFICIENTTWO-PHOTON-GENERATEDPHOTOACIDAPPLIED TOPOSITIVE-TONE 3DMICROFABRICATION.W.ZHOU ET AL.SCIENCE,Vol.296 No.5570. 2002 *
One-and two-photon induced growth of ligandcoatednanoparticles for 2 &3D metal patterning. Stellacci F et al.Proceedings of SPIE-The International Society for Optical Engineering,Vol.4809. 2002 *

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