CN100578174C - 压阻应变集中器 - Google Patents

压阻应变集中器 Download PDF

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Publication number
CN100578174C
CN100578174C CN200580047276A CN200580047276A CN100578174C CN 100578174 C CN100578174 C CN 100578174C CN 200580047276 A CN200580047276 A CN 200580047276A CN 200580047276 A CN200580047276 A CN 200580047276A CN 100578174 C CN100578174 C CN 100578174C
Authority
CN
China
Prior art keywords
strain sensing
sensing element
strain
substrate
gap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN200580047276A
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English (en)
Chinese (zh)
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CN101111751A (zh
Inventor
莱斯利·B·威尔纳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Meggitt Orange County Inc
Original Assignee
Endevco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Endevco Corp filed Critical Endevco Corp
Publication of CN101111751A publication Critical patent/CN101111751A/zh
Application granted granted Critical
Publication of CN100578174C publication Critical patent/CN100578174C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G01L1/2206—Special supports with preselected places to mount the resistance strain gauges; Mounting of supports
    • G01L1/2231—Special supports with preselected places to mount the resistance strain gauges; Mounting of supports the supports being disc- or ring-shaped, adapted for measuring a force along a single direction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
    • G01L19/14—Housings
    • G01L19/141—Monolithic housings, e.g. molded or one-piece housings
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0042—Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
    • G01L9/0052—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements
    • G01L9/0054—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements integral with a semiconducting diaphragm

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Pressure Sensors (AREA)
  • Measuring Fluid Pressure (AREA)
  • Measurement Of Force In General (AREA)
CN200580047276A 2004-11-30 2005-11-29 压阻应变集中器 Expired - Fee Related CN100578174C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/000,512 US6988412B1 (en) 2004-11-30 2004-11-30 Piezoresistive strain concentrator
US11/000,512 2004-11-30

Publications (2)

Publication Number Publication Date
CN101111751A CN101111751A (zh) 2008-01-23
CN100578174C true CN100578174C (zh) 2010-01-06

Family

ID=35613934

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200580047276A Expired - Fee Related CN100578174C (zh) 2004-11-30 2005-11-29 压阻应变集中器

Country Status (7)

Country Link
US (3) US6988412B1 (enExample)
EP (1) EP1828735B1 (enExample)
JP (1) JP2008522193A (enExample)
KR (1) KR20070102502A (enExample)
CN (1) CN100578174C (enExample)
CA (1) CA2590407A1 (enExample)
WO (1) WO2006060452A2 (enExample)

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CN104040315A (zh) * 2011-12-09 2014-09-10 欧芬菲尔德公司 流体压力传感器以及测量探针

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US7621190B2 (en) * 2006-02-21 2009-11-24 Cisco Technology, Inc. Method and apparatus for strain monitoring of printed circuit board assemblies
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US7594440B2 (en) * 2006-10-05 2009-09-29 Endevco Corporation Highly sensitive piezoresistive element
JP5174343B2 (ja) * 2006-12-12 2013-04-03 本田技研工業株式会社 力覚センサ用チップ
KR100868758B1 (ko) * 2007-01-15 2008-11-13 삼성전기주식회사 압저항 센서를 구비한 회전형 ｍｅｍｓ 디바이스
US7987716B2 (en) * 2008-03-26 2011-08-02 Endevco Corporation Coupled pivoted acceleration sensors
US8459128B2 (en) * 2008-04-15 2013-06-11 Indian Institute Of Science Sub-threshold elastic deflection FET sensor for sensing pressure/force, a method and system thereof
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US8381596B2 (en) * 2009-12-21 2013-02-26 Silicon Microstructures, Inc. CMOS compatible pressure sensor for low pressures
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CN106935526B (zh) * 2015-12-31 2019-08-30 中国科学院上海微系统与信息技术研究所 用于硅通孔互连的多晶硅应力传感器结构及其制备方法
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CN108798629B (zh) * 2018-04-28 2021-09-17 中国石油天然气集团有限公司 一种用于随钻测量的电桥连接结构及扭矩测量方法
JP7077139B2 (ja) * 2018-05-23 2022-05-30 株式会社豊田中央研究所 歪ゲージの製造方法および歪ゲージ
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KR101985946B1 (ko) * 2018-11-21 2019-06-04 호산엔지니어링(주) Msg를 이용한 로드셀 장치
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TWI696810B (zh) 2019-08-09 2020-06-21 國立中山大學 力量感測器及其感測件
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CN113282192A (zh) * 2021-05-24 2021-08-20 维沃移动通信有限公司 压感模组及电子设备
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CN117740208B (zh) * 2023-12-20 2025-11-07 苏州大学 一种微悬臂梁触觉传感器及其制备方法
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104040315A (zh) * 2011-12-09 2014-09-10 欧芬菲尔德公司 流体压力传感器以及测量探针
CN104040315B (zh) * 2011-12-09 2016-03-09 欧芬菲尔德公司 流体压力传感器以及测量探针

Also Published As

Publication number Publication date
WO2006060452A3 (en) 2007-04-19
EP1828735A2 (en) 2007-09-05
US6988412B1 (en) 2006-01-24
KR20070102502A (ko) 2007-10-18
EP1828735A4 (en) 2010-01-06
CN101111751A (zh) 2008-01-23
WO2006060452A2 (en) 2006-06-08
US20060130596A1 (en) 2006-06-22
JP2008522193A (ja) 2008-06-26
US20060117871A1 (en) 2006-06-08
EP1828735B1 (en) 2014-09-17
CA2590407A1 (en) 2006-06-08
US7146865B2 (en) 2006-12-12
US7392716B2 (en) 2008-07-01

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