CN100577856C - 用于高功率溅镀的电源联接器 - Google Patents
用于高功率溅镀的电源联接器 Download PDFInfo
- Publication number
- CN100577856C CN100577856C CN200510064057A CN200510064057A CN100577856C CN 100577856 C CN100577856 C CN 100577856C CN 200510064057 A CN200510064057 A CN 200510064057A CN 200510064057 A CN200510064057 A CN 200510064057A CN 100577856 C CN100577856 C CN 100577856C
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- China
- Prior art keywords
- bearing
- vacuum chamber
- axle
- power coupling
- power
- Prior art date
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Links
- 230000008878 coupling Effects 0.000 title claims description 32
- 238000010168 coupling process Methods 0.000 title claims description 32
- 238000005859 coupling reaction Methods 0.000 title claims description 32
- 238000004544 sputter deposition Methods 0.000 title abstract description 9
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 238000007789 sealing Methods 0.000 claims description 33
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 26
- 229910001338 liquidmetal Inorganic materials 0.000 claims description 12
- 239000000919 ceramic Substances 0.000 claims description 7
- 238000010276 construction Methods 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 10
- 239000011248 coating agent Substances 0.000 abstract description 4
- 238000000576 coating method Methods 0.000 abstract description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 36
- 229910052742 iron Inorganic materials 0.000 description 18
- 238000010438 heat treatment Methods 0.000 description 11
- 239000000463 material Substances 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 238000007747 plating Methods 0.000 description 8
- 239000013077 target material Substances 0.000 description 8
- 239000004020 conductor Substances 0.000 description 7
- 230000000712 assembly Effects 0.000 description 6
- 238000000429 assembly Methods 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000011553 magnetic fluid Substances 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 230000005672 electromagnetic field Effects 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 241000931705 Cicada Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229920002449 FKM Polymers 0.000 description 1
- 241001330988 Palmyra Species 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000019771 cognition Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 235000019628 coolness Nutrition 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 238000002294 plasma sputter deposition Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V1/00—Shades for light sources, i.e. lampshades for table, floor, wall or ceiling lamps
- F21V1/02—Frames
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V21/00—Supporting, suspending, or attaching arrangements for lighting devices; Hand grips
- F21V21/02—Wall, ceiling, or floor bases; Fixing pendants or arms to the bases
- F21V21/04—Recessed bases
- F21V21/041—Mounting arrangements specially adapted for false ceiling panels or partition walls made of plates
- F21V21/042—Mounting arrangements specially adapted for false ceiling panels or partition walls made of plates using clamping means, e.g. for clamping with panel or wall
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (19)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/820,896 US20050224343A1 (en) | 2004-04-08 | 2004-04-08 | Power coupling for high-power sputtering |
US10/820,896 | 2004-04-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1680619A CN1680619A (zh) | 2005-10-12 |
CN100577856C true CN100577856C (zh) | 2010-01-06 |
Family
ID=34912721
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200510064057A Active CN100577856C (zh) | 2004-04-08 | 2005-04-06 | 用于高功率溅镀的电源联接器 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20050224343A1 (zh) |
EP (1) | EP1584707A1 (zh) |
JP (1) | JP4445877B2 (zh) |
KR (1) | KR100648251B1 (zh) |
CN (1) | CN100577856C (zh) |
TW (1) | TWI282375B (zh) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7399385B2 (en) | 2001-06-14 | 2008-07-15 | Tru Vue, Inc. | Alternating current rotatable sputter cathode |
US20060049043A1 (en) * | 2004-08-17 | 2006-03-09 | Matuska Neal W | Magnetron assembly |
US7790003B2 (en) * | 2004-10-12 | 2010-09-07 | Southwest Research Institute | Method for magnetron sputter deposition |
US7592051B2 (en) * | 2005-02-09 | 2009-09-22 | Southwest Research Institute | Nanostructured low-Cr Cu-Cr coatings for high temperature oxidation resistance |
EP1840926B1 (de) * | 2006-03-29 | 2011-10-19 | Applied Materials GmbH & Co. KG | Isolierende Vakuumdrehdurchführung für Rotationsmagnetrons |
EP1870487B1 (de) * | 2006-06-22 | 2009-07-29 | Applied Materials GmbH & Co. KG | Vakuumbeschichtungsanlage |
CN101634011B (zh) * | 2008-07-21 | 2011-04-27 | 中国科学院宁波材料技术与工程研究所 | 一种实现工件外表面均匀镀膜的磁控溅射装置及方法 |
CN101634012B (zh) * | 2008-07-21 | 2011-05-25 | 中国科学院宁波材料技术与工程研究所 | 一种用于表面防护的离子束辅助磁控溅射沉积方法 |
DE102008058528B4 (de) | 2008-11-21 | 2011-03-03 | Von Ardenne Anlagentechnik Gmbh | Endblock für eine Magnetronanordnung mit einem rotierenden Target |
KR101209652B1 (ko) | 2010-03-16 | 2012-12-07 | 주식회사 에스에프에이 | 스퍼터 장치 |
GB201200574D0 (en) | 2012-01-13 | 2012-02-29 | Gencoa Ltd | In-vacuum rotational device |
DE102012200564A1 (de) * | 2012-01-16 | 2013-07-18 | Von Ardenne Anlagentechnik Gmbh | Antriebs- und Versorgungseinrichtung für eine rotierende Elektrode, drehbare Anode und Vakuumprozessanlage |
KR20130136856A (ko) * | 2012-06-05 | 2013-12-13 | 주식회사 씨티씨 | 스퍼터링 소스 및 이를 포함하는 원통형 스퍼터링 장치 |
DE102012110284B3 (de) | 2012-10-26 | 2013-11-14 | Von Ardenne Anlagentechnik Gmbh | Sputterbeschichtungseinrichtung und Vakuumbeschichtungsanlage |
DE102013106168B4 (de) * | 2013-06-13 | 2015-02-12 | Von Ardenne Gmbh | Cantilever-Magnetron mit einem rotierenden Target |
US9809876B2 (en) * | 2014-01-13 | 2017-11-07 | Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique (C.R.V.C.) Sarl | Endblock for rotatable target with electrical connection between collector and rotor at pressure less than atmospheric pressure |
DE102014101344B4 (de) * | 2014-02-04 | 2016-03-31 | Von Ardenne Gmbh | Endblock-Anordnung |
DE102014101582B4 (de) * | 2014-02-07 | 2017-10-26 | Von Ardenne Gmbh | Lagervorrichtung |
JP6415957B2 (ja) * | 2014-12-09 | 2018-10-31 | 株式会社アルバック | ロータリーカソード、および、スパッタ装置 |
US10396708B2 (en) | 2017-01-03 | 2019-08-27 | Saudi Arabian Oil Company | Maintaining a solar power module |
US10374546B2 (en) | 2017-01-03 | 2019-08-06 | Saudi Arabian Oil Company | Maintaining a solar power module |
US10469027B2 (en) | 2017-01-03 | 2019-11-05 | Saudi Arabian Oil Company | Maintaining a solar power module |
JP7362431B2 (ja) * | 2019-10-31 | 2023-10-17 | キヤノントッキ株式会社 | 成膜装置、ターゲットユニットの取り外し方法、及びターゲットユニットの取り付け方法 |
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US521638A (en) * | 1894-06-19 | oleal | ||
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CA1075223A (en) * | 1975-12-12 | 1980-04-08 | Donald G. Needham | Poly (arylene sulfide) antifriction composition |
DE3070700D1 (en) * | 1980-08-08 | 1985-07-04 | Battelle Development Corp | Cylindrical magnetron sputtering cathode |
US4422916A (en) * | 1981-02-12 | 1983-12-27 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
US4356073A (en) * | 1981-02-12 | 1982-10-26 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
US4417968A (en) * | 1983-03-21 | 1983-11-29 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
US4443318A (en) * | 1983-08-17 | 1984-04-17 | Shatterproof Glass Corporation | Cathodic sputtering apparatus |
US4445997A (en) * | 1983-08-17 | 1984-05-01 | Shatterproof Glass Corporation | Rotatable sputtering apparatus |
US4466877A (en) * | 1983-10-11 | 1984-08-21 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
US4519885A (en) * | 1983-12-27 | 1985-05-28 | Shatterproof Glass Corp. | Method and apparatus for changing sputtering targets in a magnetron sputtering system |
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US6736948B2 (en) * | 2002-01-18 | 2004-05-18 | Von Ardenne Anlagentechnik Gmbh | Cylindrical AC/DC magnetron with compliant drive system and improved electrical and thermal isolation |
US20030173217A1 (en) * | 2002-03-14 | 2003-09-18 | Sputtering Components, Inc. | High-power ion sputtering magnetron |
DE10213049A1 (de) * | 2002-03-22 | 2003-10-02 | Dieter Wurczinger | Drehbare Rohrkatode |
-
2004
- 2004-04-08 US US10/820,896 patent/US20050224343A1/en not_active Abandoned
- 2004-11-09 EP EP04026537A patent/EP1584707A1/en not_active Ceased
- 2004-11-18 TW TW093135398A patent/TWI282375B/zh not_active IP Right Cessation
-
2005
- 2005-01-06 KR KR1020050001388A patent/KR100648251B1/ko active IP Right Grant
- 2005-01-17 JP JP2005009055A patent/JP4445877B2/ja active Active
- 2005-04-06 CN CN200510064057A patent/CN100577856C/zh active Active
Also Published As
Publication number | Publication date |
---|---|
KR20050098767A (ko) | 2005-10-12 |
JP4445877B2 (ja) | 2010-04-07 |
TWI282375B (en) | 2007-06-11 |
US20050224343A1 (en) | 2005-10-13 |
KR100648251B1 (ko) | 2006-11-24 |
JP2005298965A (ja) | 2005-10-27 |
CN1680619A (zh) | 2005-10-12 |
EP1584707A1 (en) | 2005-10-12 |
TW200533771A (en) | 2005-10-16 |
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