CN100540726C - 用于镀覆表面的模块化装置 - Google Patents
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Abstract
本发明涉及一种用来镀覆工件(10)的真空室,在该真空室内执行物理气相沉积(PVD)方法。本发明目的是创造一种上述类型的真空室,其可以具有模块化的阴极。为此,该真空室具有多个容纳装置,各容纳装置中可以设置多个阴极。容纳一个或多个阴极(40、42、44、46)的第一容纳装置(30)大致设置在真空室(20)的中心,两个容纳至少一个阴极(48、50、52、54)的辅助容纳装置(32、34)各以类似门的方式设置在真空室(20)的边缘。
Description
本发明涉及一种通过物理气相沉积(PVD)方法在真空环境下镀覆工件(基件)表面的模块化装置,通过一个电弧或多个电弧镀覆材料,包括用不同的方式镀覆多个层,下文称作“模块化专用镀覆”。另外,本发明涉及包括这种模块化装置的系统。
从WO-A-02/50865中可以获知一种在工件上进行镀覆的装置,该这种镀覆由在两个近似圆柱形的目标件上进行沉积而得到,其中物质沉积在工件上从而形成一个层。WO-A-02/50865文献中还提出了该目标件被设计成具有一定的磁场布局,从而挥发的物质能具有一定方向性并进而获得一种特定效果。
从EP-A-135577中可以获知一种实现选择性镀覆最佳效果的方法。
为此在镀覆室中设置几个大致圆柱体的阴极,并通过磁场源来控制物质沉积。在这种布置中磁场源优选设置在阴极中,且阴极可相对磁场源转动,或者磁场源相对阴极转动,从而使物质在目标件上更均匀的移动。然后将物质沉积在基件上。
在该室中,通常基件放置在一转动台上并被连续镀覆,同时该台旋转。从现有技术中可知可以将阴极放置在例如转动台的中心,通过这种方式可以在一个室中进行几个工件的镀覆。
在这里引用上述两篇专利说明书的全文来作为本申请说明书的一部分内容。
如果对大致杆形的工件进行镀覆,则根据WO-A-02/50865的结构布局可以被看作是一种成功的装置。在这种情况下要选择一种相应的镀覆室。然而,已发现适于多种工件的镀覆室才是更通用的。
因而本发明的首要目的是给出一种可变的镀覆室或者可变结构的镀覆装置,其可以适用于要镀覆的其它类型工件,从而该镀覆室比现有技术的镀覆室更有多种变化。
本发明通过权利要求1限定的结构来满足该目的。在这种结构中,本发明的首要技术手段是能通过模块化布局来处理的多个镀覆位置。
这种结构用于容纳一个镀覆系统,该镀膜系统也构成本发明的一部分。
本发明的优选实施例在从属权利要求中列出。
一种解决该技术问题的相应系统在权利要求6中提出。
上述以及权利要求列出的用于本发明的以及在下文实施方式中描述的工序步骤和相关部件不受到任何关于其尺寸、设计、所用材料及相关技术概念的例外条件的限制,从而在相关应用领域公知的选择标准可以不带任何限制的进行应用。
根据本发明客体的其它细节、特征以及优点包括在下文结合附图的详细说明中,附图举例示出了根据本发明的一种模块化装置。
附图中:
图1是镀覆室的透视图,其实施了根据本发明的结构布局;
图2是根据图1的工件的透视图;
图3是根据本发明模块化结构的第一种构形的透视图;
图4是根据本发明模块化结构的第二种构形的透视图;
图5是根据图4构形的俯视图;
图6是根据本发明模块化结构的第三种构形的透视图;
图7是根据图6构形的俯视图;
图8是根据本发明模块化结构的第四种构形的俯视图;
图9是根据本发明模块化结构的第五种构形的俯视图;
图10是带有水平阴极的构形(第六种构形)的透视图;
图11是带有根据图10阴极的构形的侧视图;
图12是带有根据图10阴极的构形的俯视图;
图13是根据图1构形的透视图,区别在于带有平面阴极(第七种构形);
图14是根据图13构形的侧视图;
图15是根据本发明系统的阴极布置。
图1示出了带有相关电子器件200的镀覆设备的整个系统100。
该系统的核心部件是镀覆室,其在图2中更清晰的表示出来,包括以门的方式设置在其侧面上的两个或多个装置32、34。在这些装置中可以容纳阴极,除了本领域公知的阴极内部容纳装置外,具有多种结构,下面将主要描述其中一部分。
和第一种构形一样,图3示出了根据下述实施例的模块化结构的全构形。在室100中有一个通道门110,中心有一个包括4个转动阴极40、42、44、46的结构。另外,在所述装置32、34的侧面,以门式结构各容纳有另外两个阴极48、50、52和54。在中心阴极周围设有一个转台形式的基件支架,在该基件支架上容纳有多个基件。当在该构形上进行镀覆时,所有阴极如果可能的话要用相同材料制成,但这不是必须的。在这种构形中,可以获得最佳沉积速率或者最佳镀覆速率。
为了完整性,需要指出转动阴极优选按照所引用现有技术提出的方式工作,换句话说具有一个定向形成电弧的装置。
根据图4和5的第二种构形与上述第一种构形的区别在于除了内部区域设置上文所述的四个阴极40、42、44和46外,只在两个外部装置32、34中各设置一个阴极48和52。在这种构形中,内部区域具有较高的沉积速率,外侧阴极48和52用于专门目的,例如用于离子蚀刻或者错层沉积。这种错层可以是金刚石涂层或者例如是润滑涂层。应注意到外阴极可以与内部阴极同时工作或者分别工作,或者相互关联,这取决于特定的镀覆任务。
第二构形的其它特征对应于第一构形的其它特征。
在根据图6和7的第三构形中,只有两个外部装置32和34设置有两个阴极,从而可以例如从外部镀覆较大的部件(锻模或者圆形锯条等)。在这种构形中,内部装置30是空的。第三构形的其它特征对应于第二构形的其它特征。
根据图8的第四构形与上述第一构形的区别在于除了外部区域的4个阴极48、50、52、54之外,内部区域30只设两个阴极,即阴极40和46,其被设置在远离外部区域的位置上。在这种构形中,不会影响外部区域32和34的阴极和内部区域30阴极之间的等离子体。
根据图9的第五构形与上述第一构形的区别在于只有两个阴极48和52设置在外部区域中,并且只有两个阴极设置在内部区域30中,即阴极40和46,其被设置在远离外部区域的位置上。这是另一种典型的交错镀覆的构形,其中外部区域的阴极和内部区域的阴极可以包括不同的材料。
令人惊讶地发现根据图10和图12的构形特别适于与本发明结构一同使用和工作。在这种构形中,两个外部装置32和34各包括两个水平设置的旋转阴极。在这种情况下形成了水平有效表面,其适用于例如带锯以及其它平面工件。在这种构形中,两个阴极各用于镀覆全部四个表面,如图10所示。这种构形提供了一种特殊的优点就是可以承载较大尺寸的工件,并且可以在有效表面上进行均匀的镀覆,例如在带锯的自由面上或者模具及模子的表面上,而不会在镀覆厚度上存在任何差异。
图13和14的第七构形与上述第一构形的区别在于除了如上文所述的内部区域的四个阴极40、42、44、46外,只有一个外部区域32包括两个旋转阴极48和50。另外一个外部区域34配备有一个或多个常规的平面阴极。
图15示出了一种阴极结构。
本领域技术人员可以认识到上文所述的构形不是穷举的,而仅仅用来在所附权利要求书的范围内为本领域普通技术人员进行举例说明。
Claims (8)
1.一种用来由真空室(20)镀覆工件(10)表面的模块化装置,在该真空室(20)内可进行物理气相沉积(PVD)方法,
其中真空室包括至少一个阳极装置和多个阴极(40、42、44、46、48、50、52、54)的容纳装置;其中在至少一个阳极与阴极(40、42、44、46、48、50、52、54)之间能引燃多个电弧;
其中用于容纳至少一个阴极(40、42、44、46)的第一容纳装置(30)设置在真空室(20)的中心位置;并且至少一个用于容纳至少一个阴极(48、50、52、54)的第二容纳装置(32、34)设置在真空室(20)的边缘,且第二容纳装置(32、34)被设计成作为真空室(20)的可拆卸和/或平开的门;
其特征在于,第二容纳装置(32、34)被设计成容纳多个阴极,所述多个阴极水平放置且一个放在另一个上方使得它们向真空室内突出。
2.根据权利要求1所述的模块化装置,其特征在于,两个第二容纳装置(32、34)被设计成容纳至少两个阴极(48、50、52、54),且各位于真空室(20)的边缘,作为真空室(20)的可拆卸和/或平开的门。
3.根据权利要求1或2所述的模块化装置,其特征在于,位于真空室(20)中心的用于容纳阴极(40、42、44、46)的第一容纳装置(30)被设计成选择性地容纳一到四个阴极,所述阴极垂直布置且为圆柱形。
4.根据权利要求3所述的模块化装置,其特征在于,每个阴极均为转动阴极。
5.根据权利要求1或2所述的模块化装置,其特征在于,第二容纳装置(32、34)各被设计成容纳圆柱形的阴极。
6.根据权利要求1或2所述的模块化装置,其特征在于,包括基件布置装置,用于容纳一个或多个要被镀覆的工件(10)。
7.根据权利要求6所述的模块化装置,其特征在于,基件布置装置是转动圆盘传送装置,并且该转动圆盘传送装置被设计成环绕第一容纳装置(30)。
8.根据权利要求7所述的模块化装置,其特征在于,该转动圆盘传送装置被设计成在转动圆盘传送装置上设置有转动触轮台车,该转动触轮台车用于接收要被镀覆的工件(10)和/或用于接收用来容纳要被镀覆的工件(10)的附属件。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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EP03405753A EP1524329A1 (de) | 2003-10-17 | 2003-10-17 | Modulare Vorrichtung zur Beschichtung von Oberflächen |
EP03405753.9 | 2003-10-17 |
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CN1867692A CN1867692A (zh) | 2006-11-22 |
CN100540726C true CN100540726C (zh) | 2009-09-16 |
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CNB2004800306083A Expired - Fee Related CN100540726C (zh) | 2003-10-17 | 2004-10-15 | 用于镀覆表面的模块化装置 |
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US (1) | US20070137566A1 (zh) |
EP (2) | EP1524329A1 (zh) |
KR (1) | KR101091594B1 (zh) |
CN (1) | CN100540726C (zh) |
DE (1) | DE502004010209D1 (zh) |
HK (1) | HK1096435A1 (zh) |
WO (1) | WO2005038077A2 (zh) |
Families Citing this family (11)
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KR100977613B1 (ko) * | 2008-03-26 | 2010-08-23 | 한전케이피에스 주식회사 | 고온용 부품의 윤활코팅장치 |
EP2163661B1 (de) | 2008-09-05 | 2012-08-01 | LMT Fette Werkzeugtechnik GmbH & Co. KG | Wälzfräswerkzeug mit einer Beschichtung und Verfahren zur Neubeschichtung eines Wälzfräswerkzeuges |
CZ304905B6 (cs) * | 2009-11-23 | 2015-01-14 | Shm, S.R.O. | Způsob vytváření PVD vrstev s pomocí rotační cylindrické katody a zařízení k provádění tohoto způsobu |
EP2521159A1 (en) | 2011-05-06 | 2012-11-07 | Pivot a.s. | Glow discharge apparatus and method with lateral rotating arc cathodes |
CH705029A1 (de) | 2011-05-27 | 2012-11-30 | Bloesch W Ag | Beschichtetes Holzbearbeitungswerkzeug. |
US9761424B1 (en) | 2011-09-07 | 2017-09-12 | Nano-Product Engineering, LLC | Filtered cathodic arc method, apparatus and applications thereof |
US10304665B2 (en) | 2011-09-07 | 2019-05-28 | Nano-Product Engineering, LLC | Reactors for plasma-assisted processes and associated methods |
DE102011113563A1 (de) * | 2011-09-19 | 2013-03-21 | Oerlikon Trading Ag, Trübbach | Karussellschlitten für Vakuumbehandlungsanlage |
CN106086816A (zh) * | 2016-07-06 | 2016-11-09 | 广东振华科技股份有限公司 | 一种cvd镀膜机 |
CN110777347A (zh) * | 2019-10-28 | 2020-02-11 | 浙江锋源氢能科技有限公司 | Pvd样品转架和pvd设备 |
WO2022097286A1 (ja) * | 2020-11-06 | 2022-05-12 | 貴嗣 飯塚 | 成膜装置、成膜ユニット及び成膜方法 |
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WO1990002216A1 (en) * | 1988-08-25 | 1990-03-08 | Vac-Tec Systems, Inc. | Physical vapor deposition dual coating apparatus and process |
ES2022946T5 (es) * | 1987-08-26 | 1996-04-16 | Balzers Hochvakuum | Procedimiento para la aportacion de capas sobre sustratos. |
DE3829260A1 (de) * | 1988-08-29 | 1990-03-01 | Multi Arc Gmbh | Plasmabeschichtungskammer mit entfernbarem schutzschirm |
DE4443740B4 (de) * | 1994-12-08 | 2005-09-15 | W. Blösch AG | Vorrichtung zum Beschichten von Substraten |
US5750207A (en) * | 1995-02-17 | 1998-05-12 | Si Diamond Technology, Inc. | System and method for depositing coating of modulated composition |
DE10005612A1 (de) * | 2000-02-09 | 2001-08-16 | Hauzer Techno Coating Europ B | Verfahren zur Herstellung eines Gegenstandes und Gegenstand |
CZ296094B6 (cs) * | 2000-12-18 | 2006-01-11 | Shm, S. R. O. | Zarízení pro odparování materiálu k povlakování predmetu |
-
2003
- 2003-10-17 EP EP03405753A patent/EP1524329A1/de not_active Withdrawn
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2004
- 2004-10-15 EP EP04790508A patent/EP1673488B1/de active Active
- 2004-10-15 WO PCT/EP2004/011669 patent/WO2005038077A2/de active Application Filing
- 2004-10-15 US US10/575,854 patent/US20070137566A1/en not_active Abandoned
- 2004-10-15 CN CNB2004800306083A patent/CN100540726C/zh not_active Expired - Fee Related
- 2004-10-15 DE DE502004010209T patent/DE502004010209D1/de active Active
- 2004-10-15 KR KR1020067008721A patent/KR101091594B1/ko active IP Right Grant
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Also Published As
Publication number | Publication date |
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HK1096435A1 (en) | 2007-06-01 |
CN1867692A (zh) | 2006-11-22 |
DE502004010209D1 (de) | 2009-11-19 |
EP1673488A2 (de) | 2006-06-28 |
US20070137566A1 (en) | 2007-06-21 |
WO2005038077A2 (de) | 2005-04-28 |
EP1524329A1 (de) | 2005-04-20 |
KR20070007251A (ko) | 2007-01-15 |
EP1673488B1 (de) | 2009-10-07 |
KR101091594B1 (ko) | 2011-12-13 |
WO2005038077A3 (de) | 2006-03-02 |
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