CN100483172C - 投影光学系统,曝光装置以及设备的制造方法 - Google Patents
投影光学系统,曝光装置以及设备的制造方法 Download PDFInfo
- Publication number
- CN100483172C CN100483172C CNB021466696A CN02146669A CN100483172C CN 100483172 C CN100483172 C CN 100483172C CN B021466696 A CNB021466696 A CN B021466696A CN 02146669 A CN02146669 A CN 02146669A CN 100483172 C CN100483172 C CN 100483172C
- Authority
- CN
- China
- Prior art keywords
- mentioned
- optical system
- lens combination
- projection optical
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP339424/2001 | 2001-11-05 | ||
JP2001339424 | 2001-11-05 | ||
JP2002200695A JP4228130B2 (ja) | 2001-11-05 | 2002-07-10 | 投影光学系、露光装置及びデバイスの製造方法 |
JP200695/2002 | 2002-07-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1417610A CN1417610A (zh) | 2003-05-14 |
CN100483172C true CN100483172C (zh) | 2009-04-29 |
Family
ID=26624347
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB021466696A Expired - Fee Related CN100483172C (zh) | 2001-11-05 | 2002-11-01 | 投影光学系统,曝光装置以及设备的制造方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4228130B2 (ja) |
KR (1) | KR20030038427A (ja) |
CN (1) | CN100483172C (ja) |
TW (1) | TW588223B (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005017734A (ja) * | 2003-06-26 | 2005-01-20 | Nikon Corp | 投影光学系、露光装置、およびデバイス製造方法 |
JP4779394B2 (ja) * | 2005-03-23 | 2011-09-28 | 株式会社ニコン | 投影光学系、露光装置、および露光方法 |
JP2010091751A (ja) | 2008-10-07 | 2010-04-22 | Canon Inc | 投影光学系及び露光装置 |
CN102486569B (zh) * | 2010-12-01 | 2014-06-18 | 上海微电子装备有限公司 | 一种投影物镜系统 |
CN103105666B (zh) * | 2011-11-10 | 2015-04-15 | 上海微电子装备有限公司 | 一种曝光投影物镜 |
CN103364928B (zh) * | 2012-03-31 | 2015-09-30 | 上海微电子装备有限公司 | 一种投影物镜光学系统 |
CN107664809B (zh) * | 2016-07-29 | 2019-11-26 | 上海微电子装备(集团)股份有限公司 | 一种投影物镜 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3819048B2 (ja) * | 1995-03-15 | 2006-09-06 | 株式会社ニコン | 投影光学系及びそれを備えた露光装置並びに露光方法 |
JP3864399B2 (ja) * | 1996-08-08 | 2006-12-27 | 株式会社ニコン | 投影露光装置及び該投影露光装置に用いられる投影光学系並びにデバイス製造方法 |
JP2000056219A (ja) * | 1998-08-11 | 2000-02-25 | Nikon Corp | 投影光学系 |
JP2001051193A (en) * | 1999-06-03 | 2001-02-23 | Nikon Corp | Projection optical system projection exposing device provided with the system and manufacture of device |
-
2002
- 2002-07-10 JP JP2002200695A patent/JP4228130B2/ja not_active Expired - Fee Related
- 2002-10-22 TW TW091124319A patent/TW588223B/zh active
- 2002-11-01 CN CNB021466696A patent/CN100483172C/zh not_active Expired - Fee Related
- 2002-11-05 KR KR1020020068092A patent/KR20030038427A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
JP4228130B2 (ja) | 2009-02-25 |
KR20030038427A (ko) | 2003-05-16 |
TW588223B (en) | 2004-05-21 |
CN1417610A (zh) | 2003-05-14 |
JP2003202494A (ja) | 2003-07-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090429 Termination date: 20141101 |
|
EXPY | Termination of patent right or utility model |