CN100348773C - 用于向一种基片涂敷涂料的真空模块和模块系统 - Google Patents

用于向一种基片涂敷涂料的真空模块和模块系统 Download PDF

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Publication number
CN100348773C
CN100348773C CNB018121780A CN01812178A CN100348773C CN 100348773 C CN100348773 C CN 100348773C CN B018121780 A CNB018121780 A CN B018121780A CN 01812178 A CN01812178 A CN 01812178A CN 100348773 C CN100348773 C CN 100348773C
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CN
China
Prior art keywords
substrate
module
vacuum chamber
vacuum
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB018121780A
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English (en)
Chinese (zh)
Other versions
CN1617947A (zh
Inventor
乌拉迪齐默尔·夏伊里帕乌
米卡拉伊·洛伊丘卡
阿里克桑德尔·哈赫洛夫
谢尔盖·马雷舍夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
YZOVAC CO Ltd
Original Assignee
YZOVAC CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by YZOVAC CO Ltd filed Critical YZOVAC CO Ltd
Publication of CN1617947A publication Critical patent/CN1617947A/zh
Application granted granted Critical
Publication of CN100348773C publication Critical patent/CN100348773C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/46—Machines having sequentially arranged operating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2209/00—Apparatus and processes for manufacture of discharge tubes
    • H01J2209/01—Generalised techniques
    • H01J2209/012—Coating
    • H01J2209/015—Machines therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
CNB018121780A 2000-07-05 2001-05-22 用于向一种基片涂敷涂料的真空模块和模块系统 Expired - Fee Related CN100348773C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EA200000807 2000-07-05
EA200000807A EA003148B1 (ru) 2000-07-05 2000-07-05 Вакуумный модуль (его варианты) и система модулей для нанесения покрытий на подложку

Publications (2)

Publication Number Publication Date
CN1617947A CN1617947A (zh) 2005-05-18
CN100348773C true CN100348773C (zh) 2007-11-14

Family

ID=8161557

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB018121780A Expired - Fee Related CN100348773C (zh) 2000-07-05 2001-05-22 用于向一种基片涂敷涂料的真空模块和模块系统

Country Status (7)

Country Link
JP (1) JP4766821B2 (cg-RX-API-DMAC7.html)
KR (1) KR100737035B1 (cg-RX-API-DMAC7.html)
CN (1) CN100348773C (cg-RX-API-DMAC7.html)
AU (1) AU6896001A (cg-RX-API-DMAC7.html)
EA (1) EA003148B1 (cg-RX-API-DMAC7.html)
MY (1) MY137307A (cg-RX-API-DMAC7.html)
WO (1) WO2002008484A2 (cg-RX-API-DMAC7.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006526125A (ja) 2003-05-13 2006-11-16 アプライド　マテリアルズ　インコーポレイテッド 処理チャンバの開口を封止するための方法および装置
EA200501183A1 (ru) * 2005-07-18 2006-12-29 Владимир Яковлевич ШИРИПОВ Вакуумный кластер для нанесения покрытий на подложку (варианты)
EA009303B1 (ru) * 2006-05-15 2007-12-28 Владимир Яковлевич ШИРИПОВ Способ нанесения пленок нитрида кремния в вакууме (варианты)
EA034967B1 (ru) 2018-05-04 2020-04-13 Общество С Ограниченной Ответственностью "Изовак Технологии" Технологическая линия для формирования тонкопленочных покрытий в вакууме (варианты)
CN110592550A (zh) * 2019-10-28 2019-12-20 上海映晓电子科技有限公司 一种磁控溅射和电子束蒸镀双腔镀膜装置及其使用方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2008156A (en) * 1977-11-19 1979-05-31 Hunt C J L Vacuum Metallising Hollow Bodies
US5489369A (en) * 1993-10-25 1996-02-06 Viratec Thin Films, Inc. Method and apparatus for thin film coating an article
WO1997039160A1 (en) * 1996-04-18 1997-10-23 Kabushiki Kaisha Toshiba Method of producing a cathode-ray tube and apparatus therefor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2008156A (en) * 1977-11-19 1979-05-31 Hunt C J L Vacuum Metallising Hollow Bodies
US5489369A (en) * 1993-10-25 1996-02-06 Viratec Thin Films, Inc. Method and apparatus for thin film coating an article
WO1997039160A1 (en) * 1996-04-18 1997-10-23 Kabushiki Kaisha Toshiba Method of producing a cathode-ray tube and apparatus therefor

Also Published As

Publication number Publication date
EA003148B1 (ru) 2003-02-27
JP4766821B2 (ja) 2011-09-07
WO2002008484A2 (en) 2002-01-31
JP2004504495A (ja) 2004-02-12
KR100737035B1 (ko) 2007-07-09
KR20030024771A (ko) 2003-03-26
MY137307A (en) 2009-01-30
EA200000807A1 (ru) 2002-02-28
WO2002008484A3 (en) 2002-07-04
CN1617947A (zh) 2005-05-18
AU6896001A (en) 2002-02-05

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Granted publication date: 20071114

Termination date: 20160522