CH651072A5 - Selbstverzehrende katode fuer einen lichtbogenmetallverdampfer. - Google Patents

Selbstverzehrende katode fuer einen lichtbogenmetallverdampfer. Download PDF

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Publication number
CH651072A5
CH651072A5 CH6144/82A CH614482A CH651072A5 CH 651072 A5 CH651072 A5 CH 651072A5 CH 6144/82 A CH6144/82 A CH 6144/82A CH 614482 A CH614482 A CH 614482A CH 651072 A5 CH651072 A5 CH 651072A5
Authority
CH
Switzerland
Prior art keywords
self
consuming
cathode
arc
cathodes
Prior art date
Application number
CH6144/82A
Other languages
German (de)
English (en)
Inventor
Leonid Pavlovich Sablev
Rimma Ivanovna Stupak
Original Assignee
Sablev Leonid P
Rimma Ivanovna Stupak
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sablev Leonid P, Rimma Ivanovna Stupak filed Critical Sablev Leonid P
Publication of CH651072A5 publication Critical patent/CH651072A5/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32614—Consumable cathodes for arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Electroluminescent Light Sources (AREA)
  • Discharge Heating (AREA)
CH6144/82A 1981-02-23 1981-02-23 Selbstverzehrende katode fuer einen lichtbogenmetallverdampfer. CH651072A5 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/SU1981/000014 WO1982002906A1 (en) 1981-02-23 1981-02-23 Consumable cathode for electric-arc evaporator of metal

Publications (1)

Publication Number Publication Date
CH651072A5 true CH651072A5 (de) 1985-08-30

Family

ID=21616717

Family Applications (1)

Application Number Title Priority Date Filing Date
CH6144/82A CH651072A5 (de) 1981-02-23 1981-02-23 Selbstverzehrende katode fuer einen lichtbogenmetallverdampfer.

Country Status (10)

Country Link
US (1) US4563262A (cg-RX-API-DMAC7.html)
JP (1) JPS6011103B2 (cg-RX-API-DMAC7.html)
CA (1) CA1179972A (cg-RX-API-DMAC7.html)
CH (1) CH651072A5 (cg-RX-API-DMAC7.html)
DE (1) DE3152736C2 (cg-RX-API-DMAC7.html)
FR (1) FR2512270A1 (cg-RX-API-DMAC7.html)
GB (1) GB2106545B (cg-RX-API-DMAC7.html)
NL (1) NL8201806A (cg-RX-API-DMAC7.html)
SE (1) SE452030B (cg-RX-API-DMAC7.html)
WO (1) WO1982002906A1 (cg-RX-API-DMAC7.html)

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US4351855A (en) * 1981-02-24 1982-09-28 Eduard Pinkhasov Noncrucible method of and apparatus for the vapor deposition of material upon a substrate using voltaic arc in vacuum
US4537794A (en) * 1981-02-24 1985-08-27 Wedtech Corp. Method of coating ceramics
US4609564C2 (en) * 1981-02-24 2001-10-09 Masco Vt Inc Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase
US4596719A (en) * 1981-02-24 1986-06-24 Wedtech Corp. Multilayer coating method and apparatus
GB2140040B (en) * 1983-05-09 1986-09-17 Vac Tec Syst Evaporation arc stabilization
US4448659A (en) * 1983-09-12 1984-05-15 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization including initial target cleaning
GB2150947A (en) * 1983-12-07 1985-07-10 Vac Tec Syst Evaporation arc stabilization for non-permeable targets utilizing permeable stop ring
US5096558A (en) * 1984-04-12 1992-03-17 Plasco Dr. Ehrich Plasma - Coating Gmbh Method and apparatus for evaporating material in vacuum
IL74360A (en) * 1984-05-25 1989-01-31 Wedtech Corp Method of coating ceramics and quartz crucibles with material electrically transformed into a vapor phase
US4620913A (en) * 1985-11-15 1986-11-04 Multi-Arc Vacuum Systems, Inc. Electric arc vapor deposition method and apparatus
JP2571948B2 (ja) * 1986-04-04 1997-01-16 リージェンツ オブ ザ ユニバーシティ オブ ミネソタ 耐火性金属化合物のアークコーティング
GB2202237A (en) * 1987-03-12 1988-09-21 Vac Tec Syst Cathodic arc plasma deposition of hard coatings
US5298136A (en) * 1987-08-18 1994-03-29 Regents Of The University Of Minnesota Steered arc coating with thick targets
DE3901401C2 (de) * 1988-03-01 1996-12-19 Fraunhofer Ges Forschung Verfahren zur Steuerung einer Vakuum-Lichtbogenentladung
CS275226B2 (en) * 1989-09-13 1992-02-19 Fyzikalni Ustav Csav Method of arc discharge's cathode vaporization with cathode spots and macroparticles' reduced emission and device for realization of this method
JPH03106506A (ja) * 1989-09-19 1991-05-07 Nkk Corp 圧延機のロールカリバー中心とパスライン中心を一致させる調整方法
DE4026494A1 (de) * 1990-08-22 1992-02-27 Ehrich Plasma Coating Vorrichtung zur materialverdampfung mittels vakuumlichtbogenentladung und verfahren
US5126030A (en) * 1990-12-10 1992-06-30 Kabushiki Kaisha Kobe Seiko Sho Apparatus and method of cathodic arc deposition
DE4223592C2 (de) * 1992-06-24 2001-05-17 Leybold Ag Lichtbogen-Verdampfungsvorrichtung
DE4336680C2 (de) * 1993-10-27 1998-05-14 Fraunhofer Ges Forschung Verfahren zum Elektronenstrahlverdampfen
EP0658634B1 (en) * 1993-12-17 1999-03-10 KABUSHIKI KAISHA KOBE SEIKO SHO also known as Kobe Steel Ltd. Vacuum arc deposition apparatus
US5518597A (en) * 1995-03-28 1996-05-21 Minnesota Mining And Manufacturing Company Cathodic arc coating apparatus and method
DE19924094C2 (de) * 1999-05-21 2003-04-30 Fraunhofer Ges Forschung Vakuumbogenverdampfer und Verfahren zu seinem Betrieb
DE60041951D1 (de) * 1999-12-20 2009-05-20 United Technologies Corp Verwendung einer Kathode zur Vakuumbogenverdampfung
CN100338255C (zh) * 2003-10-13 2007-09-19 沈阳黎明航空发动机(集团)有限责任公司 一种铝硅钇扩散合金化涂层的制备方法
CH696828A5 (de) * 2003-11-18 2007-12-14 Oerlikon Trading Ag Zündvorrichtung.
US9153422B2 (en) 2011-08-02 2015-10-06 Envaerospace, Inc. Arc PVD plasma source and method of deposition of nanoimplanted coatings
RU2510428C1 (ru) * 2013-03-15 2014-03-27 Федеральное Государственное Унитарное Предприятие "Научно-Производственное Объединение "Техномаш" Электродуговой испаритель металлов и сплавов
US10954594B2 (en) * 2015-09-30 2021-03-23 Applied Materials, Inc. High temperature vapor delivery system and method
EP3900013B1 (en) * 2018-12-20 2023-11-15 Oerlikon Surface Solutions AG, Pfäffikon Cathodic arc ignition device

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1214851A (en) * 1967-12-05 1970-12-09 Rheinstahl Henschel Ag Method of producing materials from metal starting materials having different melting temperatures
FR1594668A (cg-RX-API-DMAC7.html) * 1968-10-15 1970-06-08
US3836451A (en) * 1968-12-26 1974-09-17 A Snaper Arc deposition apparatus
SU284883A1 (ru) * 1969-01-10 1976-05-15 А. А. Романов, А. А. Андреев , В. Н. Козлов Электродуговой испаритель
US3725238A (en) * 1969-07-28 1973-04-03 Gillette Co Target element
SU368807A1 (ru) * 1970-10-19 1978-05-29 Stupak R I Электродуговой испаритель
SU426540A1 (ru) * 1971-09-20 1975-10-05 Электроразр дное устройство дл нанесени покрытий в вакууме
US3854984A (en) * 1971-12-17 1974-12-17 Gen Electric Vacuum deposition of multi-element coatings and films with a single source
US3783231A (en) * 1972-03-22 1974-01-01 V Gorbunov Apparatus for vacuum-evaporation of metals under the action of an electric arc
DE2307649B2 (de) * 1973-02-16 1980-07-31 Robert Bosch Gmbh, 7000 Stuttgart Anordnung zum Aufstäuben verschiedener Materialien auf einem Substrat
US4001461A (en) * 1973-03-30 1977-01-04 David Grigorievich Bykhovsky Method of producing electrode units for plasmatrons
US3974058A (en) * 1974-09-16 1976-08-10 Basf Wyandotte Corporation Ruthenium coated cathodes
JPS54110988A (en) * 1978-01-31 1979-08-30 Nii Chiefunorogii Afutomobirin Coating vacuum evaporation apparatus
JPS5732370A (en) * 1980-07-31 1982-02-22 Matsushita Electric Ind Co Ltd Sputtering and vapor-depositing method and formation of magnetic gap by said method
ZA817441B (en) * 1980-11-21 1982-10-27 Imi Kynoch Ltd Anode
DE3149910A1 (de) * 1981-12-16 1983-06-23 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zur kathodenzerstaeubung von mindestens zwei verschiedenen materialien
CA1193227A (en) * 1982-11-18 1985-09-10 Kovilvila Ramachandran Magnetron sputtering apparatus
US4417968A (en) * 1983-03-21 1983-11-29 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus

Also Published As

Publication number Publication date
SE8205821L (sv) 1982-10-13
GB2106545B (en) 1985-06-26
WO1982002906A1 (en) 1982-09-02
SE8205821D0 (sv) 1982-10-13
NL8201806A (nl) 1983-12-01
FR2512270B1 (cg-RX-API-DMAC7.html) 1984-01-06
US4563262A (en) 1986-01-07
GB2106545A (en) 1983-04-13
DE3152736T1 (de) 1983-02-24
SE452030B (sv) 1987-11-09
JPS58500069A (ja) 1983-01-13
CA1179972A (en) 1984-12-27
FR2512270A1 (fr) 1983-03-04
DE3152736C2 (de) 1984-04-05
JPS6011103B2 (ja) 1985-03-23

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