CH644722A5 - Schwingquarzmesskopf. - Google Patents
Schwingquarzmesskopf. Download PDFInfo
- Publication number
- CH644722A5 CH644722A5 CH555780A CH555780A CH644722A5 CH 644722 A5 CH644722 A5 CH 644722A5 CH 555780 A CH555780 A CH 555780A CH 555780 A CH555780 A CH 555780A CH 644722 A5 CH644722 A5 CH 644722A5
- Authority
- CH
- Switzerland
- Prior art keywords
- quartz
- housing
- plate
- quartz crystal
- measuring
- Prior art date
Links
- 239000010453 quartz Substances 0.000 title claims description 61
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 61
- 239000013078 crystal Substances 0.000 claims description 28
- 238000005259 measurement Methods 0.000 claims description 11
- 238000001816 cooling Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims 7
- 239000011248 coating agent Substances 0.000 claims 6
- 239000004020 conductor Substances 0.000 claims 2
- 239000000428 dust Substances 0.000 claims 2
- 239000002245 particle Substances 0.000 claims 2
- 238000001771 vacuum deposition Methods 0.000 claims 2
- 230000001419 dependent effect Effects 0.000 claims 1
- 238000009795 derivation Methods 0.000 claims 1
- 238000009776 industrial production Methods 0.000 claims 1
- 238000003780 insertion Methods 0.000 claims 1
- 230000037431 insertion Effects 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 230000008646 thermal stress Effects 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 description 29
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
- G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
- G01B7/063—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators
- G01B7/066—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators for measuring thickness of coating
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B17/00—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations
- G01B17/02—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness
- G01B17/025—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness for measuring thickness of coating
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH555780A CH644722A5 (de) | 1980-07-21 | 1980-07-21 | Schwingquarzmesskopf. |
| DE19813120443 DE3120443A1 (de) | 1980-07-21 | 1981-05-22 | "schwingquarzmesskopf" |
| NL8102585A NL8102585A (nl) | 1980-07-21 | 1981-05-26 | Meetkop met trillingskristal. |
| GB8121159A GB2080532B (en) | 1980-07-21 | 1981-07-09 | An oscillating crystal measuring head |
| US06/283,885 US4362125A (en) | 1980-07-21 | 1981-07-16 | Quartz oscillator measuring head |
| FR8113882A FR2493508B1 (fr) | 1980-07-21 | 1981-07-16 | Tete de mesure a cristal piezoelectrique |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH555780A CH644722A5 (de) | 1980-07-21 | 1980-07-21 | Schwingquarzmesskopf. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH644722A5 true CH644722A5 (de) | 1984-08-15 |
Family
ID=4295579
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH555780A CH644722A5 (de) | 1980-07-21 | 1980-07-21 | Schwingquarzmesskopf. |
Country Status (6)
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58217673A (ja) * | 1982-06-11 | 1983-12-17 | Anelva Corp | 膜厚制御方法 |
| CH662421A5 (de) * | 1983-07-13 | 1987-09-30 | Suisse Horlogerie Rech Lab | Piezoelektrischer kontaminationsdetektor. |
| DE3401140C1 (de) * | 1984-01-14 | 1985-08-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 8000 München | Vorrichtung zur kontinuierlichen Messung der Dicke |
| DE3412724A1 (de) * | 1984-04-04 | 1985-10-17 | Siemens AG, 1000 Berlin und 8000 München | Verfahren und anordnung zum messen der schichtdicke und/oder der konzentration von auf substraten abgeschiedenen duennen schichten waehrend ihrer herstellung |
| US4917499A (en) * | 1986-10-03 | 1990-04-17 | Hughes Aircraft Company | Apparatus for analyzing contamination |
| EP0315678A4 (en) * | 1987-05-27 | 1989-10-04 | Emkay Mfg Company | METHOD AND APPARATUS FOR PLACING LARGE VOLUME CRYSTALS. |
| DE3732594A1 (de) * | 1987-09-28 | 1989-04-06 | Leybold Ag | Einrichtung zum ermitteln der jeweiligen dicke von sich veraendernden material-schichten auf einem substrat |
| GB2215049B (en) * | 1988-02-02 | 1991-08-21 | Stc Plc | Acoustic devices |
| US5025664A (en) * | 1989-11-02 | 1991-06-25 | Leybold Inficon, Inc. | Multiple crystal head for deposition thickness monitor |
| DE4318423C2 (de) * | 1993-06-03 | 1995-11-16 | Theysohn Friedrich Fa | Vorrichtung zum Vermessen von langgestreckten Kunsststoffprofilen, insbesondere Rohren |
| US5424097A (en) * | 1993-09-30 | 1995-06-13 | Specialty Coating Systems, Inc. | Continuous vapor deposition apparatus |
| US5536317A (en) * | 1995-10-27 | 1996-07-16 | Specialty Coating Systems, Inc. | Parylene deposition apparatus including a quartz crystal thickness/rate controller |
| US5879808A (en) * | 1995-10-27 | 1999-03-09 | Alpha Metals, Inc. | Parylene polymer layers |
| US5806319A (en) * | 1997-03-13 | 1998-09-15 | Wary; John | Method and apparatus for cryogenically cooling a deposition chamber |
| US6051276A (en) * | 1997-03-14 | 2000-04-18 | Alpha Metals, Inc. | Internally heated pyrolysis zone |
| US5841005A (en) * | 1997-03-14 | 1998-11-24 | Dolbier, Jr.; William R. | Parylene AF4 synthesis |
| US5948983A (en) * | 1997-07-25 | 1999-09-07 | Leybold Inficon, Inc. | Wall deposition monitoring system |
| US6668618B2 (en) * | 2001-04-23 | 2003-12-30 | Agilent Technologies, Inc. | Systems and methods of monitoring thin film deposition |
| DE10204075B4 (de) * | 2002-02-01 | 2006-09-07 | Leybold Optics Gmbh | Vorrichtung für Einrichtungen zur Bestimmung von Eigenschaften aufgebrachter Schichten |
| CN101957297B (zh) * | 2009-07-16 | 2012-04-18 | 河南科瑞科技有限公司 | 一种石英晶体传感器检测池 |
| DE102010018748B4 (de) * | 2010-04-29 | 2014-09-25 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung zur differenzierten Schichtratenmessung von Neutralteilchen und Ionen, Verfahren sowie Verwendung der Vorrichtung |
| US9856563B2 (en) * | 2012-08-22 | 2018-01-02 | Uchicago Argonne, Llc | Micro-balance sensor integrated with atomic layer deposition chamber |
| US9182378B2 (en) | 2013-03-15 | 2015-11-10 | Inficon, Inc. | High capacity monitor crystal exchanger utilizing an organized 3-D storage structure |
| KR101957467B1 (ko) * | 2013-04-24 | 2019-03-12 | 주식회사 선익시스템 | 증착두께 측정장치 |
| JP2016153757A (ja) * | 2015-02-20 | 2016-08-25 | ピエゾパーツ株式会社 | 成膜センサーユニット |
| CN105603379B (zh) * | 2016-01-05 | 2019-04-02 | 京东方科技集团股份有限公司 | 一种检测真空蒸镀膜厚的检测装置和真空蒸镀装置 |
| CN105910530A (zh) * | 2016-04-26 | 2016-08-31 | 中国电子科技集团公司第二十六研究所 | 晶片平行度测试方法 |
| CN105675120A (zh) * | 2016-04-26 | 2016-06-15 | 中国电子科技集团公司第二十六研究所 | 晶片频率测试装置 |
| WO2019003499A1 (ja) * | 2017-06-28 | 2019-01-03 | 株式会社アルバック | 水晶発振式膜厚モニタ用のセンサヘッド |
| US10763143B2 (en) * | 2017-08-18 | 2020-09-01 | Applied Materials, Inc. | Processing tool having a monitoring device |
| EP4300029A1 (en) | 2023-10-20 | 2024-01-03 | Evatec AG | Measuring device for measuring a thickness of a film of material deposited on a substrate and film deposition apparatus with at least one such measuring device |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3383238A (en) * | 1965-05-27 | 1968-05-14 | Unzicker Arlyn Eugene | Method and apparatus of controlling thin film deposition in a vacuum |
| US3667424A (en) * | 1969-04-14 | 1972-06-06 | Stanford Research Inst | Multi-station vacuum apparatus |
| CH537987A (de) * | 1971-02-10 | 1973-06-15 | Balzers Patent Beteilig Ag | Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten |
| CH573586A5 (US06235095-20010522-C00021.png) * | 1973-11-22 | 1976-03-15 | Balzers Patent Beteilig Ag | |
| US4207863A (en) * | 1977-01-06 | 1980-06-17 | Les Industries Bfg Limitee | Door for pyrolytic range |
| GB2000882B (en) * | 1977-07-01 | 1982-04-07 | Hitachi Ltd | Vacuum vapour-deposition apparatus |
-
1980
- 1980-07-21 CH CH555780A patent/CH644722A5/de not_active IP Right Cessation
-
1981
- 1981-05-22 DE DE19813120443 patent/DE3120443A1/de active Granted
- 1981-05-26 NL NL8102585A patent/NL8102585A/nl not_active Application Discontinuation
- 1981-07-09 GB GB8121159A patent/GB2080532B/en not_active Expired
- 1981-07-16 FR FR8113882A patent/FR2493508B1/fr not_active Expired
- 1981-07-16 US US06/283,885 patent/US4362125A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| FR2493508A1 (fr) | 1982-05-07 |
| GB2080532B (en) | 1984-07-25 |
| DE3120443C2 (US06235095-20010522-C00021.png) | 1987-03-12 |
| GB2080532A (en) | 1982-02-03 |
| DE3120443A1 (de) | 1982-05-06 |
| FR2493508B1 (fr) | 1985-10-25 |
| US4362125A (en) | 1982-12-07 |
| NL8102585A (nl) | 1982-02-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |