CH634605A5 - Process for the preparation of coarsely crystalline and monocrystalline metal layers - Google Patents
Process for the preparation of coarsely crystalline and monocrystalline metal layers Download PDFInfo
- Publication number
- CH634605A5 CH634605A5 CH449578A CH449578A CH634605A5 CH 634605 A5 CH634605 A5 CH 634605A5 CH 449578 A CH449578 A CH 449578A CH 449578 A CH449578 A CH 449578A CH 634605 A5 CH634605 A5 CH 634605A5
- Authority
- CH
- Switzerland
- Prior art keywords
- metal
- metal layers
- substrate
- crystalline
- preparation
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
- C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
- C30B23/063—Heating of the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/52—Alloys
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2727659A DE2727659B2 (de) | 1977-06-20 | 1977-06-20 | Verfahren zur Herstellung grobkristalliner oder einkristalliner Metallschichten |
Publications (1)
Publication Number | Publication Date |
---|---|
CH634605A5 true CH634605A5 (en) | 1983-02-15 |
Family
ID=6011893
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH449578A CH634605A5 (en) | 1977-06-20 | 1978-04-26 | Process for the preparation of coarsely crystalline and monocrystalline metal layers |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS548129A (fr) |
CH (1) | CH634605A5 (fr) |
DE (1) | DE2727659B2 (fr) |
FR (1) | FR2395326A1 (fr) |
GB (1) | GB1576707A (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0241155A1 (fr) * | 1986-03-31 | 1987-10-14 | Unisys Corporation | Dépôt d'une base de vanadium pour films magnétiques |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2924920A1 (de) * | 1979-06-20 | 1981-01-22 | Siemens Ag | Verfahren zur herstellung grobkristalliner oder einkristalliner metalloder legierungsschichten |
DE3003136A1 (de) * | 1980-01-29 | 1981-07-30 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von thermisch stabilen, metallischen schichten |
DE3003285A1 (de) * | 1980-01-30 | 1981-08-06 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen niederohmiger, einkristalliner metall- oder legierungsschichten auf substraten |
DE3390522C2 (de) * | 1983-08-25 | 1987-10-15 | Vni Skij Instr Nyj I | Spanendes Werkzeug und Verfahren zu dessen Herstellung |
JPS63166966A (ja) * | 1986-12-27 | 1988-07-11 | Tokuda Seisakusho Ltd | スパツタリング装置 |
JP2000068230A (ja) | 1998-08-25 | 2000-03-03 | Mitsubishi Electric Corp | 半導体装置、その製造装置、および、その製造方法 |
DE19851167B4 (de) * | 1998-11-06 | 2005-10-20 | Herbert Kliem | Elektrischer Kondensator |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1285827B (de) * | 1963-03-26 | 1968-12-19 | Ibm | Verfahren zum Herstellen von duennen Schichten mit hoher Reinheit und Gleichmaessigkeit, durch Vakuumaufdampfen |
FR1459038A (fr) * | 1964-09-11 | 1966-04-29 | Ibm | Alliages amorphes |
-
1977
- 1977-06-20 DE DE2727659A patent/DE2727659B2/de not_active Ceased
-
1978
- 1978-04-26 CH CH449578A patent/CH634605A5/de not_active IP Right Cessation
- 1978-05-31 GB GB25267/78A patent/GB1576707A/en not_active Expired
- 1978-06-19 FR FR7818309A patent/FR2395326A1/fr active Granted
- 1978-06-20 JP JP7480378A patent/JPS548129A/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0241155A1 (fr) * | 1986-03-31 | 1987-10-14 | Unisys Corporation | Dépôt d'une base de vanadium pour films magnétiques |
Also Published As
Publication number | Publication date |
---|---|
DE2727659A1 (de) | 1979-01-04 |
GB1576707A (en) | 1980-10-15 |
FR2395326A1 (fr) | 1979-01-19 |
JPS548129A (en) | 1979-01-22 |
DE2727659B2 (de) | 1980-01-10 |
FR2395326B1 (fr) | 1984-05-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |