CH621580A5 - - Google Patents
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- Publication number
- CH621580A5 CH621580A5 CH1212676A CH1212676A CH621580A5 CH 621580 A5 CH621580 A5 CH 621580A5 CH 1212676 A CH1212676 A CH 1212676A CH 1212676 A CH1212676 A CH 1212676A CH 621580 A5 CH621580 A5 CH 621580A5
- Authority
- CH
- Switzerland
- Prior art keywords
- crucible
- evaporator
- electron beam
- coolant
- connection piece
- Prior art date
Links
- 239000002826 coolant Substances 0.000 claims description 32
- 238000010894 electron beam technology Methods 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 11
- 238000001704 evaporation Methods 0.000 claims description 9
- 239000000126 substance Substances 0.000 claims description 9
- 230000008020 evaporation Effects 0.000 claims description 7
- 238000007740 vapor deposition Methods 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 2
- 239000011364 vaporized material Substances 0.000 claims description 2
- 238000006073 displacement reaction Methods 0.000 claims 2
- 239000000956 alloy Substances 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 claims 1
- 230000009191 jumping Effects 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 238000000926 separation method Methods 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000012254 powdered material Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000009420 retrofitting Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 210000001364 upper extremity Anatomy 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2544725A DE2544725C3 (de) | 1975-10-07 | 1975-10-07 | Elektronenstrahlverdampfer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH621580A5 true CH621580A5 (nl) | 1981-02-13 |
Family
ID=5958462
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1212676A CH621580A5 (nl) | 1975-10-07 | 1976-09-24 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US4115653A (nl) |
| JP (1) | JPS5246384A (nl) |
| BE (1) | BE847029A (nl) |
| CH (1) | CH621580A5 (nl) |
| DE (1) | DE2544725C3 (nl) |
| FR (1) | FR2327637A1 (nl) |
| GB (1) | GB1516773A (nl) |
| LU (1) | LU75884A1 (nl) |
| NL (1) | NL7611034A (nl) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58195438U (ja) * | 1982-06-22 | 1983-12-26 | 日本電気株式会社 | 集積回路の輸送車 |
| JPS59133663U (ja) * | 1983-02-23 | 1984-09-07 | 日本電気ホームエレクトロニクス株式会社 | 電子ビ−ム蒸着装置 |
| US4620081A (en) * | 1984-08-03 | 1986-10-28 | The United States Of America As Represented By The United States Department Of Energy | Self-contained hot-hollow cathode gun source assembly |
| JPH0417281Y2 (nl) * | 1984-08-31 | 1992-04-17 | ||
| CH663037A5 (de) * | 1985-02-05 | 1987-11-13 | Balzers Hochvakuum | Dampfquelle fuer vakuumbeschichtungsanlagen. |
| JPS6119502A (ja) * | 1985-06-19 | 1986-01-28 | Matsushita Electric Ind Co Ltd | スピンドル装置 |
| US4983806A (en) * | 1990-03-01 | 1991-01-08 | Harper James L | Method and device for cooling electron beam gun |
| US5473627A (en) * | 1992-11-05 | 1995-12-05 | Mdc Vacuum Products Corporation | UHV rotating fluid delivery system |
| US5338913A (en) * | 1992-12-28 | 1994-08-16 | Tfi Telemark | Electron beam gun with liquid cooled rotatable crucible |
| DE19623701A1 (de) | 1996-06-14 | 1997-12-18 | Leybold Systems Gmbh | Vorrichtung und Verfahren zum Elektronenstrahlverdampfen |
| TW591202B (en) * | 2001-10-26 | 2004-06-11 | Hermosa Thin Film Co Ltd | Dynamic film thickness control device/method and ITS coating method |
| DE102018108726B4 (de) * | 2018-04-12 | 2019-11-07 | VON ARDENNE Asset GmbH & Co. KG | Elektronenstrahlverdampfer und Verfahren zum Verdampfen eines Verdampfungsguts mittels eines Elektronenstrahls |
| CN111855579B (zh) * | 2019-04-28 | 2024-06-11 | 核工业理化工程研究院 | 一种碱金属原子蒸气吸收池及其光谱测量方法 |
| CN110797242B (zh) * | 2019-11-04 | 2022-06-10 | 中国航空制造技术研究院 | 一种用于镀膜的冷阴极电子枪装置 |
| EP3840012A1 (en) * | 2019-12-20 | 2021-06-23 | Essilor International | Optimized crucible assembly and method for physical vapor deposition |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2745773A (en) * | 1953-03-25 | 1956-05-15 | Rca Corp | Apparatus and method for forming juxtaposed as well as superimposed coatings |
| GB875399A (en) * | 1958-12-04 | 1961-08-16 | Ass Elect Ind | Electron beam furnace |
| US3250842A (en) * | 1963-01-15 | 1966-05-10 | Atomic Energy Commission | Electron beam zone refining |
| CH427744A (de) * | 1965-11-26 | 1967-01-15 | Balzers Patent Beteilig Ag | Verfahren für die thermische Verdampfung von Stoffgemischen im Vakuum |
| JPS4517178Y1 (nl) * | 1967-06-14 | 1970-07-15 | ||
| DE1797031A1 (de) * | 1968-08-06 | 1971-07-01 | Bosch Photokino Gmbh | Elektrisch angetriebene Laufbildkamera |
-
1975
- 1975-10-07 DE DE2544725A patent/DE2544725C3/de not_active Expired
-
1976
- 1976-09-24 CH CH1212676A patent/CH621580A5/de not_active IP Right Cessation
- 1976-09-28 LU LU75884A patent/LU75884A1/xx unknown
- 1976-10-01 GB GB40971/76A patent/GB1516773A/en not_active Expired
- 1976-10-04 US US05/729,575 patent/US4115653A/en not_active Expired - Lifetime
- 1976-10-06 NL NL7611034A patent/NL7611034A/nl not_active Application Discontinuation
- 1976-10-07 FR FR7630197A patent/FR2327637A1/fr active Granted
- 1976-10-07 BE BE171306A patent/BE847029A/xx not_active IP Right Cessation
- 1976-10-07 JP JP51120802A patent/JPS5246384A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5246384A (en) | 1977-04-13 |
| NL7611034A (nl) | 1977-04-13 |
| DE2544725A1 (de) | 1977-04-21 |
| US4115653A (en) | 1978-09-19 |
| GB1516773A (en) | 1978-07-05 |
| FR2327637A1 (fr) | 1977-05-06 |
| FR2327637B1 (nl) | 1982-04-09 |
| LU75884A1 (nl) | 1977-05-11 |
| DE2544725C3 (de) | 1981-01-08 |
| BE847029A (fr) | 1977-01-31 |
| DE2544725B2 (de) | 1980-04-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PFA | Name/firm changed |
Owner name: LEYBOLD AKTIENGESELLSCHAFT |
|
| PL | Patent ceased |