CH607233A5 - - Google Patents

Info

Publication number
CH607233A5
CH607233A5 CH1198075A CH1198075A CH607233A5 CH 607233 A5 CH607233 A5 CH 607233A5 CH 1198075 A CH1198075 A CH 1198075A CH 1198075 A CH1198075 A CH 1198075A CH 607233 A5 CH607233 A5 CH 607233A5
Authority
CH
Switzerland
Application number
CH1198075A
Inventor
Bernward Dipl Ing Roessler
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE2445137A external-priority patent/DE2445137C3/en
Priority claimed from DE19752505816 external-priority patent/DE2505816C3/en
Priority claimed from DE2513207A external-priority patent/DE2513207C2/en
Priority claimed from DE19752525062 external-priority patent/DE2525062C2/en
Priority claimed from DE19752525097 external-priority patent/DE2525097C3/en
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH607233A5 publication Critical patent/CH607233A5/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/788Field effect transistors with field effect produced by an insulated gate with floating gate
    • H01L29/7881Programmable transistors with only two possible levels of programmation
    • H01L29/7884Programmable transistors with only two possible levels of programmation charging by hot carrier injection
    • H01L29/7885Hot carrier injection from the channel
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/403Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh
    • G11C11/404Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh with one charge-transfer gate, e.g. MOS transistor, per cell
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0416Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a single floating gate transistor and no select transistor, e.g. UV EPROM
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0425Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a merged floating gate and select transistor
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • G11C16/14Circuits for erasing electrically, e.g. erase voltage switching circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • G11C16/14Circuits for erasing electrically, e.g. erase voltage switching circuits
    • G11C16/16Circuits for erasing electrically, e.g. erase voltage switching circuits for erasing blocks, e.g. arrays, words, groups
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C17/00Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Volatile Memory (AREA)
  • Read Only Memory (AREA)
  • Semiconductor Memories (AREA)
CH1198075A 1974-09-20 1975-09-16 CH607233A5 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
DE2445137A DE2445137C3 (en) 1974-09-20 1974-09-20 Method for operating an n-channel memory FET, n-channel memory FET for carrying out the method and applying the method to the n-channel memory FETs of a memory matrix
DE19752505816 DE2505816C3 (en) 1974-09-20 1975-02-12 Method for operating an n-channel memory FET, n-channel memory FET for carrying out the method and applying the method to the n-channel memory FETs of a memory matrix
DE2513207A DE2513207C2 (en) 1974-09-20 1975-03-25 n-channel memory FET
DE19752525062 DE2525062C2 (en) 1975-06-05 1975-06-05 N-channel memory FET array
DE19752525097 DE2525097C3 (en) 1975-06-05 1975-06-05 Method of operating an n-channel memory FET

Publications (1)

Publication Number Publication Date
CH607233A5 true CH607233A5 (en) 1978-11-30

Family

ID=27510366

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1198075A CH607233A5 (en) 1974-09-20 1975-09-16

Country Status (11)

Country Link
JP (1) JPS5157255A (en)
AT (1) AT365000B (en)
AU (1) AU498494B2 (en)
BE (1) BE833633A (en)
CA (1) CA1070427A (en)
CH (1) CH607233A5 (en)
DK (1) DK143923C (en)
FR (1) FR2285677A1 (en)
GB (1) GB1517927A (en)
IT (1) IT1042632B (en)
NL (1) NL175561C (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5391585A (en) * 1977-04-04 1978-08-11 Agency Of Ind Science & Technol Nonvolatile field effect transistor
US4173766A (en) * 1977-09-16 1979-11-06 Fairchild Camera And Instrument Corporation Insulated gate field-effect transistor read-only memory cell
SE7907193L (en) * 1978-09-28 1980-03-29 Rca Corp Permanent memory
JPS5560469U (en) * 1978-10-20 1980-04-24
JPS5571072A (en) * 1978-11-24 1980-05-28 Hitachi Ltd Semiconductor nonvolatile memory
JPS57160163A (en) * 1981-03-27 1982-10-02 Agency Of Ind Science & Technol Nonvolatile semiconductor memory
JPS5864068A (en) * 1981-10-14 1983-04-16 Agency Of Ind Science & Technol Non-volatile semiconductor memory
JPH04307974A (en) * 1991-04-05 1992-10-30 Sharp Corp Electrically erasable nonvolatile semiconductor storage device
CN111739572A (en) * 2019-03-25 2020-10-02 亿而得微电子股份有限公司 Low-voltage quick erasing method for electronic writing erasable read-only memory

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS526148B2 (en) * 1972-05-18 1977-02-19

Also Published As

Publication number Publication date
NL175561B (en) 1984-06-18
GB1517927A (en) 1978-07-19
DK143923B (en) 1981-10-26
BE833633A (en) 1976-03-19
DK143923C (en) 1982-04-19
FR2285677B1 (en) 1981-05-29
NL175561C (en) 1984-11-16
AU498494B2 (en) 1979-03-15
NL7511017A (en) 1976-03-23
JPS5157255A (en) 1976-05-19
ATA646575A (en) 1981-04-15
FR2285677A1 (en) 1976-04-16
CA1070427A (en) 1980-01-22
AU8479775A (en) 1977-03-17
DK419975A (en) 1976-03-21
IT1042632B (en) 1980-01-30
AT365000B (en) 1981-11-25

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Legal Events

Date Code Title Description
PL Patent ceased