CH583969A5 - - Google Patents
Info
- Publication number
- CH583969A5 CH583969A5 CH398575A CH398575A CH583969A5 CH 583969 A5 CH583969 A5 CH 583969A5 CH 398575 A CH398575 A CH 398575A CH 398575 A CH398575 A CH 398575A CH 583969 A5 CH583969 A5 CH 583969A5
- Authority
- CH
- Switzerland
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68318—Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Jigs For Machine Tools (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7404364A NL7404364A (nl) | 1974-04-01 | 1974-04-01 | Werkwijze en inrichting voor het bewerken van vlakke voorwerpen. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH583969A5 true CH583969A5 (ru) | 1977-01-14 |
Family
ID=19821089
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH398575A CH583969A5 (ru) | 1974-04-01 | 1975-03-27 |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US4009540A (ru) |
| JP (1) | JPS50134574A (ru) |
| BE (1) | BE827435A (ru) |
| CA (1) | CA1010159A (ru) |
| CH (1) | CH583969A5 (ru) |
| DE (1) | DE2512400C2 (ru) |
| FR (1) | FR2266304B1 (ru) |
| GB (1) | GB1491938A (ru) |
| IT (1) | IT1049391B (ru) |
| NL (1) | NL7404364A (ru) |
| SE (1) | SE7503558L (ru) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5364463A (en) * | 1976-11-22 | 1978-06-08 | Nippon Telegr & Teleph Corp <Ntt> | Fixing tray of semiconductor wafers |
| US4132037A (en) * | 1977-02-28 | 1979-01-02 | Siltec Corporation | Apparatus for polishing semiconductor wafers |
| EP0013684A1 (de) * | 1979-01-26 | 1980-08-06 | Heinrich Wagner Maschinenfabrik GmbH & Co | Form- oder Rüttelformmaschine |
| US4519168A (en) * | 1979-09-18 | 1985-05-28 | Speedfam Corporation | Liquid waxless fixturing of microsize wafers |
| US4707201A (en) * | 1986-08-20 | 1987-11-17 | Canadian Instrumentation And Research Limited | Method of producing polished block type, single mode, evanscent wave directional couplers by means of mass production of the coupler halves |
| JPH04180650A (ja) * | 1990-11-15 | 1992-06-26 | Nec Kyushu Ltd | フルカットダイシング用テープ |
| JPH0828086B2 (ja) * | 1991-06-04 | 1996-03-21 | 富士通株式会社 | 磁気ヘッドスライダの製造装置及び製造方法 |
| US5220754A (en) * | 1992-03-02 | 1993-06-22 | Amad Tayebi | Recovered compact disk and a method and an apparatus for recovery thereof |
| US5267418A (en) * | 1992-05-27 | 1993-12-07 | International Business Machines Corporation | Confined water fixture for holding wafers undergoing chemical-mechanical polishing |
| DE69316849T2 (de) * | 1992-11-27 | 1998-09-10 | Toshiba Kawasaki Kk | Verfahren und Gerät zum Polieren eines Werkstückes |
| FR2715503B1 (fr) * | 1994-01-26 | 1996-04-05 | Commissariat Energie Atomique | Substrat pour composants intégrés comportant une couche mince et son procédé de réalisation. |
| US5733175A (en) * | 1994-04-25 | 1998-03-31 | Leach; Michael A. | Polishing a workpiece using equal velocity at all points overlapping a polisher |
| US5607341A (en) * | 1994-08-08 | 1997-03-04 | Leach; Michael A. | Method and structure for polishing a wafer during manufacture of integrated circuits |
| US5632667A (en) * | 1995-06-29 | 1997-05-27 | Delco Electronics Corporation | No coat backside wafer grinding process |
| US6159825A (en) | 1997-05-12 | 2000-12-12 | Silicon Genesis Corporation | Controlled cleavage thin film separation process using a reusable substrate |
| US6291313B1 (en) | 1997-05-12 | 2001-09-18 | Silicon Genesis Corporation | Method and device for controlled cleaving process |
| US6033974A (en) | 1997-05-12 | 2000-03-07 | Silicon Genesis Corporation | Method for controlled cleaving process |
| US20070122997A1 (en) | 1998-02-19 | 2007-05-31 | Silicon Genesis Corporation | Controlled process and resulting device |
| US6548382B1 (en) | 1997-07-18 | 2003-04-15 | Silicon Genesis Corporation | Gettering technique for wafers made using a controlled cleaving process |
| US6291326B1 (en) | 1998-06-23 | 2001-09-18 | Silicon Genesis Corporation | Pre-semiconductor process implant and post-process film separation |
| US6263941B1 (en) | 1999-08-10 | 2001-07-24 | Silicon Genesis Corporation | Nozzle for cleaving substrates |
| US6500732B1 (en) | 1999-08-10 | 2002-12-31 | Silicon Genesis Corporation | Cleaving process to fabricate multilayered substrates using low implantation doses |
| FR2828579B1 (fr) * | 2001-08-13 | 2004-01-30 | St Microelectronics Sa | Procede de manipulation d'une plaquette de silicium mince |
| US7018268B2 (en) * | 2002-04-09 | 2006-03-28 | Strasbaugh | Protection of work piece during surface processing |
| US8187377B2 (en) | 2002-10-04 | 2012-05-29 | Silicon Genesis Corporation | Non-contact etch annealing of strained layers |
| US8293619B2 (en) | 2008-08-28 | 2012-10-23 | Silicon Genesis Corporation | Layer transfer of films utilizing controlled propagation |
| US8993410B2 (en) | 2006-09-08 | 2015-03-31 | Silicon Genesis Corporation | Substrate cleaving under controlled stress conditions |
| US7811900B2 (en) | 2006-09-08 | 2010-10-12 | Silicon Genesis Corporation | Method and structure for fabricating solar cells using a thick layer transfer process |
| US9362439B2 (en) | 2008-05-07 | 2016-06-07 | Silicon Genesis Corporation | Layer transfer of films utilizing controlled shear region |
| US8330126B2 (en) | 2008-08-25 | 2012-12-11 | Silicon Genesis Corporation | Race track configuration and method for wafering silicon solar substrates |
| US8329557B2 (en) | 2009-05-13 | 2012-12-11 | Silicon Genesis Corporation | Techniques for forming thin films by implantation with reduced channeling |
| DE102009052744B4 (de) * | 2009-11-11 | 2013-08-29 | Siltronic Ag | Verfahren zur Politur einer Halbleiterscheibe |
| CN103258764B (zh) * | 2012-02-21 | 2016-06-15 | 欣兴电子股份有限公司 | 用于晶片薄化的载具及其制法 |
| FR3012257A1 (fr) * | 2013-10-21 | 2015-04-24 | Soitec Silicon On Insulator | Procede de prehension d'un substrat |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2353066A (en) * | 1943-11-03 | 1944-07-04 | Walter W Phillips | Safety razor blade sharpener |
| US2443987A (en) * | 1945-10-13 | 1948-06-22 | O H Calhoun | Work holder |
| US2855653A (en) * | 1955-10-07 | 1958-10-14 | Tile Council Of America | Apparatus for making tile panels |
| US3004766A (en) * | 1959-11-02 | 1961-10-17 | Andrew J Bryant | Vacuum chuck |
| US3330714A (en) * | 1962-03-08 | 1967-07-11 | Vari Products Co | Method of adhering adhesive backed light reflector unit to a mounting surface |
| US3131476A (en) * | 1963-03-21 | 1964-05-05 | Philco Corp | Production of semiconductor blanks |
| DE1982787U (de) * | 1968-01-13 | 1968-04-04 | Albert Fezer | Vorrichtung zum halten von insbesondere duennwandigen werkstuecken, z. b. duennen blechen, folien od. dgl. |
| US3681139A (en) * | 1969-10-16 | 1972-08-01 | Western Electric Co | Method for handling and maintaining the orientation of a matrix of miniature electrical devices |
| US3740900A (en) * | 1970-07-01 | 1973-06-26 | Signetics Corp | Vacuum chuck assembly for semiconductor manufacture |
| US3809050A (en) * | 1971-01-13 | 1974-05-07 | Cogar Corp | Mounting block for semiconductor wafers |
-
1974
- 1974-04-01 NL NL7404364A patent/NL7404364A/xx not_active Application Discontinuation
-
1975
- 1975-03-21 DE DE2512400A patent/DE2512400C2/de not_active Expired
- 1975-03-25 US US05/561,938 patent/US4009540A/en not_active Expired - Lifetime
- 1975-03-26 SE SE7503558A patent/SE7503558L/xx unknown
- 1975-03-27 CA CA223,604A patent/CA1010159A/en not_active Expired
- 1975-03-27 GB GB12923/75A patent/GB1491938A/en not_active Expired
- 1975-03-27 CH CH398575A patent/CH583969A5/xx not_active IP Right Cessation
- 1975-03-28 IT IT21829/75A patent/IT1049391B/it active
- 1975-03-29 JP JP50037441A patent/JPS50134574A/ja active Pending
- 1975-04-01 FR FR7510153A patent/FR2266304B1/fr not_active Expired
- 1975-04-01 BE BE154987A patent/BE827435A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE2512400C2 (de) | 1982-03-18 |
| DE2512400A1 (de) | 1975-10-02 |
| IT1049391B (it) | 1981-01-20 |
| NL7404364A (nl) | 1975-10-03 |
| JPS50134574A (ru) | 1975-10-24 |
| GB1491938A (en) | 1977-11-16 |
| FR2266304B1 (ru) | 1978-07-13 |
| FR2266304A1 (ru) | 1975-10-24 |
| BE827435A (fr) | 1975-10-01 |
| SE7503558L (ru) | 1975-10-02 |
| US4009540A (en) | 1977-03-01 |
| CA1010159A (en) | 1977-05-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |