CH454154A - Verfahren zur Herstellung von Bis-(2,4,5-triphenylimidazylen) - Google Patents

Verfahren zur Herstellung von Bis-(2,4,5-triphenylimidazylen)

Info

Publication number
CH454154A
CH454154A CH967763A CH967763A CH454154A CH 454154 A CH454154 A CH 454154A CH 967763 A CH967763 A CH 967763A CH 967763 A CH967763 A CH 967763A CH 454154 A CH454154 A CH 454154A
Authority
CH
Switzerland
Prior art keywords
triphenylimidazylene
bis
preparation
Prior art date
Application number
CH967763A
Other languages
English (en)
Inventor
Anthony Cescon Lawrence
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to NL296772D priority Critical patent/NL296772A/xx
Priority to BE635804D priority patent/BE635804A/xx
Priority to DE1963P0031373 priority patent/DE1470154B2/de
Priority to FR928603A priority patent/FR1351818A/fr
Priority to GB11331/63A priority patent/GB997396A/en
Application filed by Du Pont filed Critical Du Pont
Priority to CH967763A priority patent/CH454154A/de
Priority to US00622085A priority patent/US3784557A/en
Publication of CH454154A publication Critical patent/CH454154A/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
    • C07D233/64—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms, e.g. histidine
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • B32B17/10005—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
    • B32B17/10165—Functional features of the laminated safety glass or glazing
    • B32B17/10431—Specific parts for the modulation of light incorporated into the laminated safety glass or glazing
    • B32B17/10467—Variable transmission
    • B32B17/10486—Variable transmission photochromic
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Physics & Mathematics (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
CH967763A 1962-03-21 1963-08-05 Verfahren zur Herstellung von Bis-(2,4,5-triphenylimidazylen) CH454154A (de)

Priority Applications (7)

Application Number Priority Date Filing Date Title
NL296772D NL296772A (de) 1962-03-21
BE635804D BE635804A (de) 1962-03-21
DE1963P0031373 DE1470154B2 (de) 1962-03-21 1963-03-16 Verfahren zur herstellung von substituierten dimeren von 2,4,5-triphenylimidazolylverbindungen und ihre verwendung als fototropes material
FR928603A FR1351818A (fr) 1962-03-21 1963-03-20 Nouveaux composés bi-imidazoliques, leur préparation et leurs applications
GB11331/63A GB997396A (en) 1962-03-21 1963-03-21 2,4,5 - triphenylimidazole dimers
CH967763A CH454154A (de) 1962-03-21 1963-08-05 Verfahren zur Herstellung von Bis-(2,4,5-triphenylimidazylen)
US00622085A US3784557A (en) 1962-03-21 1967-03-10 Phototropic 2,4,5-triphenylimidazolyl radicals and dimers thereof

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US18147562A 1962-03-21 1962-03-21
CH967763A CH454154A (de) 1962-03-21 1963-08-05 Verfahren zur Herstellung von Bis-(2,4,5-triphenylimidazylen)
US62208567A 1967-03-10 1967-03-10

Publications (1)

Publication Number Publication Date
CH454154A true CH454154A (de) 1968-04-15

Family

ID=27176279

Family Applications (1)

Application Number Title Priority Date Filing Date
CH967763A CH454154A (de) 1962-03-21 1963-08-05 Verfahren zur Herstellung von Bis-(2,4,5-triphenylimidazylen)

Country Status (6)

Country Link
US (1) US3784557A (de)
BE (1) BE635804A (de)
CH (1) CH454154A (de)
DE (1) DE1470154B2 (de)
GB (1) GB997396A (de)
NL (1) NL296772A (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0363061A1 (de) * 1988-10-06 1990-04-11 Tanabe Seiyaku Co., Ltd. Imidazolin-Derivate und Verfahren zu deren Herstellung
US5700826A (en) * 1995-06-07 1997-12-23 Ontogen Corporation 1,2,4,5-tetra substituted imidazoles as modulators of multi-drug resistance
US5840721A (en) * 1997-07-09 1998-11-24 Ontogen Corporation Imidazole derivatives as MDR modulators

Families Citing this family (75)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4009040A (en) * 1974-06-18 1977-02-22 E. I. Du Pont De Nemours And Company Hexaarylbiimidazole polymers
DE2960506D1 (en) * 1978-04-24 1981-10-29 Dumex Ltd As Arylimidazoles, their synthesis and pharmaceutical or veterinary preparations containing them
US4424229A (en) 1979-04-23 1984-01-03 A/S Dumex (Dumex Ltd.) Fluorine containing 2,4,5-triphenylimidazoles
US4252887A (en) * 1979-08-14 1981-02-24 E. I. Du Pont De Nemours And Company Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators
US4311783A (en) * 1979-08-14 1982-01-19 E. I. Du Pont De Nemours And Company Dimers derived from unsymmetrical 2,4,5,-triphenylimidazole compounds as photoinitiators
US4369247A (en) * 1980-09-03 1983-01-18 E. I. Du Pont De Nemours And Company Process of producing relief structures using polyamide ester resins
US4414312A (en) * 1980-09-03 1983-11-08 E. I. Du Pont De Nemours & Co. Photopolymerizable polyamide ester resin compositions containing an oxygen scavenger
US4329419A (en) * 1980-09-03 1982-05-11 E. I. Du Pont De Nemours And Company Polymeric heat resistant photopolymerizable composition for semiconductors and capacitors
US4410612A (en) * 1980-09-03 1983-10-18 E. I. Du Pont De Nemours And Company Electrical device formed from polymeric heat resistant photopolymerizable composition
US4459349A (en) * 1981-03-27 1984-07-10 Toyo Boseki Kabushiki Kaisha Photosensitive resin composition
US4622286A (en) * 1985-09-16 1986-11-11 E. I. Du Pont De Nemours And Company Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer
JPH0680057B2 (ja) * 1986-04-28 1994-10-12 保土谷化学工業株式会社 トリフエニルイミダゾ−ル及びその二量体
US4732831A (en) * 1986-05-01 1988-03-22 E. I. Du Pont De Nemours And Company Xeroprinting with photopolymer master
US4894314A (en) * 1986-11-12 1990-01-16 Morton Thiokol, Inc. Photoinitiator composition containing bis ketocoumarin dialkylamino benzoate, camphorquinone and/or a triphenylimidazolyl dimer
US5288528A (en) * 1993-02-02 1994-02-22 E. I. Du Pont De Nemours And Company Process for producing thin polymer film by pulsed laser evaporation
US5557308A (en) 1994-07-08 1996-09-17 E. I. Du Pont De Nemours And Company Ink jet print head photoresist layer having durable adhesion characteristics
US5725970A (en) * 1994-11-07 1998-03-10 E. I. Du Pont De Nemours And Company Broad band reflection holograms and a dry process for making same
EP0762214A1 (de) 1995-09-05 1997-03-12 Agfa-Gevaert N.V. Lichtempfindliches Element, das eine Bildaufbauschicht und eine photopolymerisierbare Schicht enthält
JP3564836B2 (ja) * 1995-11-22 2004-09-15 Ｊｓｒ株式会社 カラーフィルタ用感放射線性組成物およびカラーフィルタ
TW466256B (en) 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
US5942368A (en) * 1996-04-23 1999-08-24 Konica Corporation Pigment dispersion composition
US20020064728A1 (en) * 1996-09-05 2002-05-30 Weed Gregory C. Near IR sensitive photoimageable/photopolymerizable compositions, media, and associated processes
US5858583A (en) * 1997-07-03 1999-01-12 E. I. Du Pont De Nemours And Company Thermally imageable monochrome digital proofing product with high contrast and fast photospeed
US5955224A (en) * 1997-07-03 1999-09-21 E. I. Du Pont De Nemours And Company Thermally imageable monochrome digital proofing product with improved near IR-absorbing dye(s)
US6251571B1 (en) 1998-03-10 2001-06-26 E. I. Du Pont De Nemours And Company Non-photosensitive, thermally imageable element having improved room light stability
US6627309B2 (en) 2001-05-08 2003-09-30 3M Innovative Properties Company Adhesive detackification
JP2004163904A (ja) * 2002-09-30 2004-06-10 Rohm & Haas Electronic Materials Llc 改善された光開始剤
US7462443B2 (en) * 2003-09-05 2008-12-09 Hewlett-Packard Development Company, L.P. Leuco dye-containing coating compositions
WO2005029187A1 (en) * 2003-09-22 2005-03-31 Agfa-Gevaert Photopolymerizable composition.
DE102004030019A1 (de) * 2004-06-22 2006-01-19 Xetos Ag Photopolymerisierbare Zusammensetzung
US7439537B2 (en) 2004-07-30 2008-10-21 Agfa Graphics, N.V. Divinylfluorenes
US7241557B2 (en) 2004-07-30 2007-07-10 Agfa Graphics Nv Photopolymerizable composition
JP4262164B2 (ja) * 2004-08-06 2009-05-13 キヤノン株式会社 情報処理装置及びその制御方法、プログラム
US20060154180A1 (en) 2005-01-07 2006-07-13 Kannurpatti Anandkumar R Imaging element for use as a recording element and process of using the imaging element
US7579134B2 (en) * 2005-03-15 2009-08-25 E. I. Dupont De Nemours And Company Polyimide composite coverlays and methods and compositions relating thereto
EP1757981B1 (de) 2005-08-26 2009-10-14 Agfa Graphics N.V. photopolymer Druckplattenvorläufer
ATE497192T1 (de) 2005-11-18 2011-02-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
ES2322908T3 (es) 2005-11-18 2009-07-01 Agfa Graphics N.V. Metodo de fabricacion de una plancha de impresion litografica.
PL1788450T3 (pl) 2005-11-18 2009-07-31 Agfa Nv Sposób wytwarzania kliszy do druku litograficznego
ES2347442T3 (es) 2005-11-18 2010-10-29 Agfa Graphics N.V. Metodo de fabricacion de una plancha de impresion litografica.
ATE426836T1 (de) 2005-11-18 2009-04-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
DE602005013399D1 (de) 2005-11-18 2009-04-30 Agfa Graphics Nv Verfahren zur Herstellung einer lithographischen Druckplatte
EP2772805A1 (de) 2005-11-18 2014-09-03 Agfa Graphics Nv Verfahren zur Herstellung einer Flachdruckplatte
ATE422066T1 (de) 2005-11-18 2009-02-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
DE602005014249D1 (de) 2005-11-21 2009-06-10 Agfa Graphics Nv Verfahren zur Herstellung einer Lithografiedruckform
EP1788449A1 (de) 2005-11-21 2007-05-23 Agfa Graphics N.V. Verfahren zur Herstellung einer Lithografiedruckform
DK1788435T3 (da) 2005-11-21 2013-06-17 Agfa Graphics Nv Fremgangsmåde til fremstilling af en litografisk trykplade
US7618766B2 (en) * 2005-12-21 2009-11-17 E. I. Du Pont De Nemours And Company Flame retardant photoimagable coverlay compositions and methods relating thereto
US7601482B2 (en) * 2006-03-28 2009-10-13 Az Electronic Materials Usa Corp. Negative photoresist compositions
US8283100B2 (en) * 2006-05-16 2012-10-09 Hewlett-Packard Development Company, L.P. Color forming compositions and associated methods
US7527915B2 (en) * 2006-07-19 2009-05-05 E. I. Du Pont De Nemours And Company Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto
DE602006009919D1 (de) 2006-08-03 2009-12-03 Agfa Graphics Nv Flachdruckplattenträger
EP1972460B1 (de) * 2007-03-19 2009-09-02 Agfa Graphics N.V. Verfahren zur Herstellung eines lithographischen Druckplattenträgers
JP5128838B2 (ja) * 2007-03-28 2013-01-23 富士フイルム株式会社 新規な光活性ビイミダゾール化合物と、これを含有してなる感光性組成物とその使用方法
US8445176B2 (en) 2007-05-25 2013-05-21 Agfa Graphics Nv Lithographic printing plate precursor
DE602007006822D1 (de) 2007-11-30 2010-07-08 Agfa Graphics Nv Verfahren zur Behandlung einer Lithografiedruckplatte
ES2430562T3 (es) 2008-03-04 2013-11-21 Agfa Graphics N.V. Método para la fabricación de un soporte de una plancha de impresión litográfica
EP2106924B1 (de) 2008-03-31 2011-06-29 Agfa Graphics N.V. Verfahren zur Behandlung einer lithografischen Druckplatte
CA2723846C (en) 2008-05-08 2017-02-07 Dentsply Detrey Gmbh Radical polymerisation initiators for light-curable dental materials
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BR112018009906B1 (pt) * 2015-11-18 2022-05-31 Monsanto Technology Llc Método para controle de pragas de inseto, semente tratada, e composição de tratamento
US20170176856A1 (en) 2015-12-21 2017-06-22 Az Electronic Materials (Luxembourg) S.A.R.L. Negative-working photoresist compositions for laser ablation and use thereof
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CN111258180B (zh) * 2018-11-30 2024-03-08 常州正洁智造科技有限公司 六芳基双咪唑类混合光引发剂及应用
CN111747897A (zh) * 2019-03-29 2020-10-09 常州格林感光新材料有限公司 一种六芳基双咪唑类光引发剂及其应用
EP4043502B1 (de) 2021-02-11 2023-10-04 Xetos AG Photopolymerisierbare hoe-zusammensetzung
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CN114790175B (zh) * 2022-05-23 2023-05-19 宁德师范学院 一种用于检测草铵膦的荧光探针及其制备方法与应用

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0363061A1 (de) * 1988-10-06 1990-04-11 Tanabe Seiyaku Co., Ltd. Imidazolin-Derivate und Verfahren zu deren Herstellung
US5051441A (en) * 1988-10-06 1991-09-24 Tanabe Seiyaku Co., Ltd. Imidazoline derivative
US5700826A (en) * 1995-06-07 1997-12-23 Ontogen Corporation 1,2,4,5-tetra substituted imidazoles as modulators of multi-drug resistance
US5840721A (en) * 1997-07-09 1998-11-24 Ontogen Corporation Imidazole derivatives as MDR modulators

Also Published As

Publication number Publication date
DE1470154A1 (de) 1972-01-20
NL296772A (de)
GB997396A (en) 1965-07-07
DE1470154B2 (de) 1977-04-28
BE635804A (de)
US3784557A (en) 1974-01-08

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