CH440227A - Verfahren zum Herstellen von Halbleiterkristallen, mit einstellbarer Fremdstoffkonzentration - Google Patents

Verfahren zum Herstellen von Halbleiterkristallen, mit einstellbarer Fremdstoffkonzentration

Info

Publication number
CH440227A
CH440227A CH1385064A CH1385064A CH440227A CH 440227 A CH440227 A CH 440227A CH 1385064 A CH1385064 A CH 1385064A CH 1385064 A CH1385064 A CH 1385064A CH 440227 A CH440227 A CH 440227A
Authority
CH
Switzerland
Prior art keywords
production
foreign matter
matter concentration
semiconductor crystals
adjustable
Prior art date
Application number
CH1385064A
Other languages
English (en)
Inventor
Dietrich Dr Eckart
Mentzel Fritz-Adolf
Reinke Heinz
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH440227A publication Critical patent/CH440227A/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/20—Controlling or regulating
    • C30B15/22—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal
    • C30B15/28—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal using weight changes of the crystal or the melt, e.g. flotation methods
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10—Crucibles or containers for supporting the melt
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D11/00—Control of flow ratio
    • G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
    • G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
    • G05D11/135—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by sensing at least one property of the mixture
    • G05D11/138—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by sensing at least one property of the mixture by sensing the concentration of the mixture, e.g. measuring pH value
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1004—Apparatus with means for measuring, testing, or sensing
    • Y10T117/1008—Apparatus with means for measuring, testing, or sensing with responsive control means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1032—Seed pulling
    • Y10T117/1052—Seed pulling including a sectioned crucible [e.g., double crucible, baffle]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
CH1385064A 1963-10-28 1964-10-26 Verfahren zum Herstellen von Halbleiterkristallen, mit einstellbarer Fremdstoffkonzentration CH440227A (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DES0088061 1963-10-28
DES0088062 1963-10-28
DES0091935 1964-07-08

Publications (1)

Publication Number Publication Date
CH440227A true CH440227A (de) 1967-07-31

Family

ID=27212856

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1385064A CH440227A (de) 1963-10-28 1964-10-26 Verfahren zum Herstellen von Halbleiterkristallen, mit einstellbarer Fremdstoffkonzentration

Country Status (6)

Country Link
US (1) US3342560A (de)
CH (1) CH440227A (de)
DE (3) DE1444541C3 (de)
GB (1) GB1029769A (de)
NL (1) NL6410933A (de)
SE (1) SE302446B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3637439A (en) * 1968-11-13 1972-01-25 Metallurgie Hoboken Process and apparatus for pulling single crystals of germanium
US4050905A (en) * 1975-05-27 1977-09-27 The Harshaw Chemical Company Growth of doped crystals
US5215620A (en) * 1989-09-19 1993-06-01 Shin-Etsu Handotai Co. Ltd. Method for pulling a silicon single crystal by imposing a periodic rotation rate on a constant rotation rate
JPH0777994B2 (ja) * 1989-11-16 1995-08-23 信越半導体株式会社 単結晶の酸素濃度コントロール方法及び装置
JPH0777995B2 (ja) * 1989-11-16 1995-08-23 信越半導体株式会社 単結晶の比抵抗コントロール方法
US5593498A (en) * 1995-06-09 1997-01-14 Memc Electronic Materials, Inc. Apparatus for rotating a crucible of a crystal pulling machine
WO1998035074A1 (en) * 1997-02-06 1998-08-13 Crysteco, Inc. Method and apparatus for growing crystals
US10125431B2 (en) 2013-06-21 2018-11-13 South Dakota Board Of Regents Method of growing germanium crystals

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2727839A (en) * 1950-06-15 1955-12-20 Bell Telephone Labor Inc Method of producing semiconductive bodies
DE1061527B (de) * 1953-02-14 1959-07-16 Siemens Ag Verfahren zum zonenweisen Umschmelzen von Staeben und anderen langgestreckten Werkstuecken
NL107897C (de) * 1953-05-18
US2944875A (en) * 1953-07-13 1960-07-12 Raytheon Co Crystal-growing apparatus and methods
US2809136A (en) * 1954-03-10 1957-10-08 Sylvania Electric Prod Apparatus and method of preparing crystals of silicon germanium group
US2892739A (en) * 1954-10-01 1959-06-30 Honeywell Regulator Co Crystal growing procedure
BE562704A (de) * 1956-11-28
NL105823C (de) * 1956-11-28
US2908004A (en) * 1957-05-10 1959-10-06 Levinson John Temperature control for crystal pulling
NL237834A (de) * 1958-04-09
NL238924A (de) * 1959-05-05
NL104644C (de) * 1959-09-18
US3241925A (en) * 1960-08-19 1966-03-22 Union Carbide Corp Apparatus for growing solid homogeneous compositions
US3198606A (en) * 1961-01-23 1965-08-03 Ibm Apparatus for growing crystals
FR1302043A (fr) * 1961-08-09 1962-08-24 Union Carbide Corp Appareil pour provoquer la croissance de compositions homogènes solides

Also Published As

Publication number Publication date
NL6410933A (de) 1965-04-29
DE1444541A1 (de) 1970-02-19
US3342560A (en) 1967-09-19
DE1544250B2 (de) 1973-12-20
DE1544250C3 (de) 1974-08-01
SE302446B (de) 1968-07-22
DE1444541C3 (de) 1974-01-31
GB1029769A (en) 1966-05-18
DE1444541B2 (de) 1973-06-20
DE1251721B (de) 1967-10-12
DE1544250A1 (de) 1970-02-26

Similar Documents

Publication Publication Date Title
AT259219B (de) Verfahren zum Herstellen von Holzspankörpern
CH444646A (de) Verfahren zum Herstellen von geklärten Säften
AT283716B (de) Vorrichtung zum kontinuierlichen Herstellen von Hohlkörpern
AT275569B (de) Verfahren zum Herstellen von Druckformen
CH515614A (de) Verfahren zum Herstellen von Halbleiterschaltkreisen mit Leitbahnen
AT241102B (de) Verfahren zum Herstellen von Polyamidformkörpern
CH440227A (de) Verfahren zum Herstellen von Halbleiterkristallen, mit einstellbarer Fremdstoffkonzentration
CH407962A (de) Vorrichtung zum Herstellen von Halbleiterstäben
CH420072A (de) Verfahren zum Herstellen von einkristallinen Halbleiterstäben
CH449590A (de) Verfahren zum Herstellen von III-V-Verbindungen in kristalliner Form
CH451680A (de) Verfahren zum Herstellen von Sauermilchprodukten
CH433191A (de) Verfahren zum Herstellen von einkristallinem Halbleitermaterial
AT254947B (de) Verfahren zum Serienfertigen von Halbleiterbauelementen
AT261003B (de) Verfahren zum Herstellen von homogenen Oxydschichten auf Halbleiterkristallen
AT338873B (de) Verfahren zum herstellen von kleinflachigen thyristoren
AT290116B (de) Verfahren zum Herstellen von Mischpolymerisaten des Äthylens
CH444828A (de) Verfahren zum Herstellen von Halbleiterbauelementen
CH421060A (de) Verfahren zum Herstellen von streifenfreien Festkörpern
AT244078B (de) Verfahren zum Herstellen von Magnetogrammträgern
CH533361A (de) Verfahren zum Herstellen von mit Gallium diffundierten Zonen in Halbleiterkristallen
CH407337A (de) Verfahren zum Herstellen von Halbleiterscheiben
CH470201A (de) Verfahren zum Herstellen von Kristallen
CH457371A (de) Verfahren zum Herstellen von hochreinem Silizium
CH401634A (de) Verfahren zum formgebenden Bearbeiten von Halbleiterkristallen
CH485788A (de) Verfahren zum Herstellen von Mischpolymerisaten