CH404966A - Verfahren zur Herstellung von Einkristallen, insbesondere aus Halbleitermaterial - Google Patents

Verfahren zur Herstellung von Einkristallen, insbesondere aus Halbleitermaterial

Info

Publication number
CH404966A
CH404966A CH420662A CH420662A CH404966A CH 404966 A CH404966 A CH 404966A CH 420662 A CH420662 A CH 420662A CH 420662 A CH420662 A CH 420662A CH 404966 A CH404966 A CH 404966A
Authority
CH
Switzerland
Prior art keywords
semiconductor material
single crystals
producing single
producing
crystals
Prior art date
Application number
CH420662A
Other languages
German (de)
English (en)
Inventor
Fritz Dipl Ing Schleich
Original Assignee
United Aircraft Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Aircraft Corp filed Critical United Aircraft Corp
Publication of CH404966A publication Critical patent/CH404966A/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00—Liquid-phase epitaxial-layer growth
    • C30B19/08—Heating of the reaction chamber or the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/16—Heating of the molten zone
    • C30B13/22—Heating of the molten zone by irradiation or electric discharge
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00—Liquid-phase epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Recrystallisation Techniques (AREA)
CH420662A 1961-05-09 1962-04-05 Verfahren zur Herstellung von Einkristallen, insbesondere aus Halbleitermaterial CH404966A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEZ8732A DE1218411B (de) 1961-05-09 1961-05-09 Verfahren zur Herstellung eines duennen einkristallinen Plaettchens

Publications (1)

Publication Number Publication Date
CH404966A true CH404966A (de) 1965-12-31

Family

ID=7620604

Family Applications (1)

Application Number Title Priority Date Filing Date
CH420662A CH404966A (de) 1961-05-09 1962-04-05 Verfahren zur Herstellung von Einkristallen, insbesondere aus Halbleitermaterial

Country Status (4)

Country Link
CH (1) CH404966A (fr)
DE (1) DE1218411B (fr)
GB (1) GB958852A (fr)
NL (1) NL278170A (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5217564A (en) * 1980-04-10 1993-06-08 Massachusetts Institute Of Technology Method of producing sheets of crystalline material and devices made therefrom
US5588994A (en) * 1980-04-10 1996-12-31 Massachusetts Institute Of Technology Method of producing sheets of crystalline material and devices made therefrom
EP0049286B1 (fr) * 1980-04-10 1988-03-02 Massachusetts Institute Of Technology Procede de production de feuilles d'un materiau cristallin et dispositifs fabriques a partir de ces feuilles
US5362682A (en) * 1980-04-10 1994-11-08 Massachusetts Institute Of Technology Method of producing sheets of crystalline material and devices made therefrom
US5328549A (en) * 1980-04-10 1994-07-12 Massachusetts Institute Of Technology Method of producing sheets of crystalline material and devices made therefrom
US5273616A (en) * 1980-04-10 1993-12-28 Massachusetts Institute Of Technology Method of producing sheets of crystalline material and devices made therefrom

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE968581C (de) * 1952-02-24 1958-03-06 Siemens Ag Verfahren zur Herstellung von fuer Gleichrichter, Richtleiter, Transistoren od. dgl. bestimmten Kristallen
DE1040693B (de) * 1955-02-07 1958-10-09 Licentia Gmbh Verfahren zur Herstellung einer halbleitenden stoechiometrischen Verbindung aus Komponenten hoechster Reinheit fuer Halbleiteranordnungen
DE1029939B (de) * 1955-06-27 1958-05-14 Licentia Gmbh Verfahren zur Herstellung von elektrisch unsymmetrisch leitenden Halbleitersystemen
DE1098316B (de) * 1957-06-26 1961-01-26 Union Carbide Corp Verfahren zum Herstellen einkristalliner UEberzuege aus dotierten Halbleitergrundstoffen durch Aufdampfen im Vakuum

Also Published As

Publication number Publication date
DE1218411B (de) 1966-06-08
NL278170A (fr) 1900-01-01
GB958852A (en) 1964-05-27

Similar Documents

Publication Publication Date Title
CH409887A (de) Verfahren zur Herstellung von Halbleitervorrichtungen aus monokristallinen Halbleiterelementen
CH392768A (de) Verfahren zur Herstellung von geformten Gebilden, insbesondere Fäden und Drähte, aus Polycarbonaten
AT269243B (de) Verfahren zur Herstellung von insbesondere als Thermogenerator verwendbaren homogenen Körpern aus Germanium-Silicium
CH416608A (de) Verfahren zur Herstellung neuer 1,4-16a-Methylsteroide
CH381419A (de) Verfahren zur Herstellung von Formstücken aus Zellmaterial
CH432662A (de) Verfahren zur Herstellung von Gallium-Arsenid-Transistoren
CH404966A (de) Verfahren zur Herstellung von Einkristallen, insbesondere aus Halbleitermaterial
CH451172A (de) Verfahren zur Herstellung neuer substituierter Phenylamino-1,3-diazacyclopentene-(2)
CH458587A (de) Verfahren zur Herstellung von 8,9,10,11-Tetrahydro-12-phthaloperinon
CH428675A (de) Verfahren zur Gewinnung von reinstem Halbleitermaterial, insbesondere Silizium
CH439743A (de) Verfahren zur Herstellung von Formgebilden aus Polyglykolid
CH524039A (de) Verfahren zur Herstellung von Bauteilen, insbesondere von Mauerwerk, aus Bauelementen
CH414570A (de) Verfahren zur Gewinnung von reinstem Halbleitermaterial, insbesondere Silizium
AT270754B (de) Verfahren zur Herstellung von Kristallen, insbesondere für Halbleitervorrichtungen
CH408629A (de) Verfahren zur Herstellung von Flächengebilden aus Fasermaterial
CH433224A (de) Verfahren zur Herstellung von 1,1,1-Trifluoräthylalkohol
CH414059A (de) Verfahren zur Herstellung von Hydroxycobalamin aus Cyanocobalamin
CH376924A (de) Verfahren zur Herstellung von monomerem -Caprolactam aus Poly- -caprolactam
CH416572A (de) Verfahren zur Herstellung von Einkristallen aus Halbleitermaterial
AT255488B (de) Verfahren zur Herstellung von hochreinem, kristallinem, insbesondere einkristallinem Halbleitermaterial
CH397878A (de) Verfahren zur Herstellung von Halbleiteranordnungen
CH442323A (de) Verfahren zur Herstellung von O,S-Dialkoxycarbonylthiaminen
CH453353A (de) Verfahren zur Herstellung von 3B-Oxy- 1(10),5-19-nor-steroiden der Androstanreihe
CH428702A (de) Verfahren zur Herstellung neuer Guanidine
AT247848B (de) Verfahren zur Herstellung von 1, 3-Dioxo-2-alkylcyclopentanen