CH388459A - Verfahren zur Herstellung eines Transistors - Google Patents

Verfahren zur Herstellung eines Transistors

Info

Publication number
CH388459A
CH388459A CH1385060A CH1385060A CH388459A CH 388459 A CH388459 A CH 388459A CH 1385060 A CH1385060 A CH 1385060A CH 1385060 A CH1385060 A CH 1385060A CH 388459 A CH388459 A CH 388459A
Authority
CH
Switzerland
Prior art keywords
transistor
manufacturing
Prior art date
Application number
CH1385060A
Other languages
English (en)
Inventor
Anthony Beale Julian Robert
Francis Beer Andrew
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of CH388459A publication Critical patent/CH388459A/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/131—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/60—Wet etching
    • H10P50/61—Electrolytic etching
    • H10P50/613—Electrolytic etching of Group IV materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/69—Etching of wafers, substrates or parts of devices using masks for semiconductor materials
    • H10P50/691—Etching of wafers, substrates or parts of devices using masks for semiconductor materials for Group V materials or Group III-V materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/075—Connecting or disconnecting of bond wires
    • H10W72/07541—Controlling the environment, e.g. atmosphere composition or temperature
    • H10W72/07552—Controlling the environment, e.g. atmosphere composition or temperature changes in structures or sizes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/075—Connecting or disconnecting of bond wires
    • H10W72/07541—Controlling the environment, e.g. atmosphere composition or temperature
    • H10W72/07554—Controlling the environment, e.g. atmosphere composition or temperature changes in dispositions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/521—Structures or relative sizes of bond wires
    • H10W72/527—Multiple bond wires having different sizes
CH1385060A 1959-12-14 1960-12-12 Verfahren zur Herstellung eines Transistors CH388459A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB42433/59A GB940443A (en) 1959-12-14 1959-12-14 Improvements in and relating to semiconductor devices

Publications (1)

Publication Number Publication Date
CH388459A true CH388459A (de) 1965-02-28

Family

ID=10424389

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1385060A CH388459A (de) 1959-12-14 1960-12-12 Verfahren zur Herstellung eines Transistors

Country Status (6)

Country Link
US (1) US3160799A (de)
CH (1) CH388459A (de)
DE (1) DE1121224B (de)
ES (1) ES263136A1 (de)
GB (1) GB940443A (de)
NL (2) NL121714C (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1282190B (de) * 1964-03-12 1968-11-07 Kabusihiki Kaisha Hitachi Seis Verfahren zum Herstellen von Transistoren
US5896486A (en) * 1997-05-01 1999-04-20 Lucent Technologies Inc. Mass splice tray for optical fibers

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2829422A (en) * 1952-05-21 1958-04-08 Bell Telephone Labor Inc Methods of fabricating semiconductor signal translating devices
US2821493A (en) * 1954-03-18 1958-01-28 Hughes Aircraft Co Fused junction transistors with regrown base regions
GB807995A (en) * 1955-09-02 1959-01-28 Gen Electric Co Ltd Improvements in or relating to the production of semiconductor bodies
NL101253C (de) * 1955-09-12
BE556337A (de) * 1956-04-03
NL106110C (de) * 1956-08-24
US2842831A (en) * 1956-08-30 1958-07-15 Bell Telephone Labor Inc Manufacture of semiconductor devices
GB849477A (en) * 1957-09-23 1960-09-28 Nat Res Dev Improvements in or relating to semiconductor control devices
BE574814A (de) * 1958-01-16
NL241542A (de) * 1958-07-29
NL245567A (de) * 1958-11-20

Also Published As

Publication number Publication date
GB940443A (en) 1963-10-30
NL258921A (de)
NL121714C (de)
DE1121224B (de) 1962-01-04
ES263136A1 (es) 1961-05-01
US3160799A (en) 1964-12-08

Similar Documents

Publication Publication Date Title
CH365803A (de) Transistor und Verfahren zu dessen Herstellung
CH410008A (de) Verfahren zur Herstellung neuer Aminoalkohole
CH388842A (de) Verfahren zur Herstellung eines Ferritkörpers
CH393543A (de) Transistor und Verfahren zu dessen Herstellung
CH413111A (de) Verfahren zur Herstellung eines Transistors
CH417969A (de) Verfahren zur Herstellung eines Epoxypolybutadiens
CH347268A (de) Verfahren zur Herstellung einer Halbleitervorrichtung
CH357470A (de) Verfahren zur Herstellung von Halbleitervorrichtungen
CH341572A (de) Verfahren zur Herstellung eines Halbleitergerätes
AT278093B (de) Verfahren zur Herstellung eines Transistors
CH365144A (de) Feldeffekt-Transistor und Verfahren zur Herstellung eines solchen Transistors
CH448516A (de) Verfahren zur Herstellung eines Filmbildners
CH396854A (de) Verfahren zur Herstellung eines Siliciumfilms
CH351031A (de) Verfahren zur Herstellung von Halbleiter-Vorrichtungen
CH491886A (de) Verfahren zur Herstellung eines Pregnadiens
CH394399A (de) Verfahren zur Herstellung von Halbleitervorrichtungen
CH415632A (de) Verfahren zur Herstellung neuer 3-Pyrrolidylmethylamine
CH404810A (de) Verfahren zur Herstellung eines Transistors und durch dieses Verfahren hergestellter Transistor
CH388459A (de) Verfahren zur Herstellung eines Transistors
CH375799A (de) Verfahren zur Herstellung eines Halbleiterkörpers
CH350722A (de) Verfahren zur Herstellung einer Halbleiter-Vorrichtung
CH376602A (de) Verfahren zur Herstellung eines Schmiermittels
CH385349A (de) Verfahren zum Herstellen eines Transistors
CH350723A (de) Verfahren zur Herstellung einer Halbleitervorrichtung
CH381325A (de) Verfahren zur Herstellung einer Halbleitervorrichtung z. B. eines Transistors