CH351031A - Verfahren zur Herstellung von Halbleiter-Vorrichtungen - Google Patents

Verfahren zur Herstellung von Halbleiter-Vorrichtungen

Info

Publication number
CH351031A
CH351031A CH351031DA CH351031A CH 351031 A CH351031 A CH 351031A CH 351031D A CH351031D A CH 351031DA CH 351031 A CH351031 A CH 351031A
Authority
CH
Switzerland
Prior art keywords
semiconductor devices
manufacturing semiconductor
manufacturing
devices
semiconductor
Prior art date
Application number
Other languages
English (en)
Inventor
Oudemans Gillis
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of CH351031A publication Critical patent/CH351031A/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/288Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
    • H01L21/2885Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition using an external electrical current, i.e. electro-deposition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrodes Of Semiconductors (AREA)
CH351031D 1956-02-28 1957-02-26 Verfahren zur Herstellung von Halbleiter-Vorrichtungen CH351031A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL351031X 1956-02-28

Publications (1)

Publication Number Publication Date
CH351031A true CH351031A (de) 1960-12-31

Family

ID=19785041

Family Applications (1)

Application Number Title Priority Date Filing Date
CH351031D CH351031A (de) 1956-02-28 1957-02-26 Verfahren zur Herstellung von Halbleiter-Vorrichtungen

Country Status (5)

Country Link
BE (1) BE555335A (de)
CH (1) CH351031A (de)
DE (1) DE1154575B (de)
FR (1) FR1185444A (de)
NL (2) NL204955A (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1258518B (de) * 1962-06-29 1968-01-11 Plessey Co Ltd Verfahren zum Herstellen eines Halbleiterelements mit einer gelochten Isolierschicht ueber einer eingelassenen Zone
DE1292759B (de) * 1963-08-28 1969-04-17 Itt Ind Gmbh Deutsche Verfahren zum Herstellen einer Zuleitung zu einer diffundierten Halbleiterzone

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL255665A (de) * 1959-09-22
GB867559A (en) * 1959-12-24 1961-05-10 Standard Telephones Cables Ltd Improvements in or relating to the production of two or more stencils in mutual register
DE1154201B (de) * 1960-06-28 1963-09-12 Intermetall Verfahren zur gleichzeitigen Kontaktierung von zahlreichen Halbleiterbauelementen
NL295980A (de) * 1962-07-31
GB1070288A (en) * 1963-07-08 1967-06-01 Rca Corp Semiconductor devices

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2662957A (en) * 1949-10-29 1953-12-15 Eisler Paul Electrical resistor or semiconductor
NL83232C (de) * 1950-06-20
DE823470C (de) * 1950-09-12 1951-12-03 Siemens Ag Verfahren zum AEtzen eines Halbleiters

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1258518B (de) * 1962-06-29 1968-01-11 Plessey Co Ltd Verfahren zum Herstellen eines Halbleiterelements mit einer gelochten Isolierschicht ueber einer eingelassenen Zone
DE1292759B (de) * 1963-08-28 1969-04-17 Itt Ind Gmbh Deutsche Verfahren zum Herstellen einer Zuleitung zu einer diffundierten Halbleiterzone

Also Published As

Publication number Publication date
FR1185444A (fr) 1959-07-31
NL107347C (de)
BE555335A (de)
NL204955A (de)
DE1154575B (de) 1963-09-19

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