CH387805A - Verfahren zur Herstellung von Halbleitervorrichtungen mit aus Aluminium bestehenden Elektroden - Google Patents

Verfahren zur Herstellung von Halbleitervorrichtungen mit aus Aluminium bestehenden Elektroden

Info

Publication number
CH387805A
CH387805A CH1037160A CH1037160A CH387805A CH 387805 A CH387805 A CH 387805A CH 1037160 A CH1037160 A CH 1037160A CH 1037160 A CH1037160 A CH 1037160A CH 387805 A CH387805 A CH 387805A
Authority
CH
Switzerland
Prior art keywords
aluminum
semiconductor devices
manufacturing semiconductor
electrodes made
electrodes
Prior art date
Application number
CH1037160A
Other languages
German (de)
English (en)
Inventor
Lambertus Esseling Augustinus
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of CH387805A publication Critical patent/CH387805A/de

Links

Classifications

    • H10W72/00
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1851Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • C23C18/1872Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
    • C23C18/1875Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment only one step pretreatment
    • C23C18/1882Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers
    • H10P14/46
    • H10P95/00
    • H10W76/161
    • H10W72/5524

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Electrodes Of Semiconductors (AREA)
CH1037160A 1959-09-16 1960-09-13 Verfahren zur Herstellung von Halbleitervorrichtungen mit aus Aluminium bestehenden Elektroden CH387805A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL243410 1959-09-16

Publications (1)

Publication Number Publication Date
CH387805A true CH387805A (de) 1965-02-15

Family

ID=19751924

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1037160A CH387805A (de) 1959-09-16 1960-09-13 Verfahren zur Herstellung von Halbleitervorrichtungen mit aus Aluminium bestehenden Elektroden

Country Status (4)

Country Link
CH (1) CH387805A (cg-RX-API-DMAC10.html)
DE (1) DE1224841B (cg-RX-API-DMAC10.html)
GB (1) GB885137A (cg-RX-API-DMAC10.html)
NL (1) NL243410A (cg-RX-API-DMAC10.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1238103B (de) * 1962-06-05 1967-04-06 Siemens Ag Verfahren zum Herstellen eines Halbleiterbau-elementes
DE68928253T2 (de) * 1988-06-23 1998-01-15 Toshiba Kawasaki Kk Verfahren zur Herstellung von metallischen Verbindungen auf Halbleiterbauelemente

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL204361A (cg-RX-API-DMAC10.html) * 1955-04-22 1900-01-01

Also Published As

Publication number Publication date
DE1224841B (de) 1966-09-15
NL243410A (cg-RX-API-DMAC10.html) 1900-01-01
GB885137A (en) 1961-12-20

Similar Documents

Publication Publication Date Title
CH434481A (de) Verfahren zur Herstellung einer hermetisch abgeschlossenen Halbleitervorrichtung
CH431359A (de) Verfahren zur Herstellung von Keramikmaterial
CH350371A (de) Verfahren zur Herstellung von elektrischen Halbleitergeräten
CH423593A (de) Verfahren zur Herstellung von Keramikmaterial
CH409887A (de) Verfahren zur Herstellung von Halbleitervorrichtungen aus monokristallinen Halbleiterelementen
CH402194A (de) Verfahren zur Herstellung von Halbleitervorrichtungen
CH392704A (de) Verfahren zur Herstellung von mehrschichtigen Halbleiteranordnungen
CH370842A (de) Verfahren zur Herstellung von Halbleitervorrichtungen
CH349346A (de) Verfahren zur Herstellung von Halbleitereinrichtungen
CH357470A (de) Verfahren zur Herstellung von Halbleitervorrichtungen
CH403991A (de) Verfahren zur Herstellung einer Halbleitervorrichtung
CH486774A (de) Verfahren zur Herstellung von Halbleiterelementen
CH398804A (de) Verfahren zur Herstellung von elektrischen Halbleitervorrichtungen
CH398994A (de) Verfahren zur Herstellung von Magnetköpfen
CH394399A (de) Verfahren zur Herstellung von Halbleitervorrichtungen
CH481377A (de) Verfahren zur Herstellung einer Glaselektrode
CH512824A (de) Verfahren zur Herstellung von Halbleitervorrichtungen
CH351031A (de) Verfahren zur Herstellung von Halbleiter-Vorrichtungen
CH387805A (de) Verfahren zur Herstellung von Halbleitervorrichtungen mit aus Aluminium bestehenden Elektroden
AT268381B (de) Verfahren zur Herstellung von Halbleitervorrichtungen
CH380983A (de) Verfahren zur Herstellung einer Glaselektrode
CH420389A (de) Verfahren zur Herstellung von Halbleitereinrichtungen
AT290623B (de) Verfahren zur Herstellung von Halbleitervorrichtungen
AT283609B (de) Verfahren zur herstellung von neuen gonadienonen
CH497792A (de) Verfahren zur Herstellung von Halbleitervorrichtungen