CH392704A - Verfahren zur Herstellung von mehrschichtigen Halbleiteranordnungen - Google Patents

Verfahren zur Herstellung von mehrschichtigen Halbleiteranordnungen

Info

Publication number
CH392704A
CH392704A CH137762A CH137762A CH392704A CH 392704 A CH392704 A CH 392704A CH 137762 A CH137762 A CH 137762A CH 137762 A CH137762 A CH 137762A CH 392704 A CH392704 A CH 392704A
Authority
CH
Switzerland
Prior art keywords
production
semiconductor devices
multilayer semiconductor
multilayer
devices
Prior art date
Application number
CH137762A
Other languages
English (en)
Inventor
Goetz Dipl-Phys V Bernuth
Jaentsch Ottomar Dr Dipl-Ing
Krockow Dieter
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH392704A publication Critical patent/CH392704A/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3157Partial encapsulation or coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/16Fillings or auxiliary members in containers or encapsulations, e.g. centering rings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293Organic, e.g. plastic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Thyristors (AREA)
  • Bipolar Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
CH137762A 1961-03-29 1962-02-05 Verfahren zur Herstellung von mehrschichtigen Halbleiteranordnungen CH392704A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1961S0073228 DE1182353C2 (de) 1961-03-29 1961-03-29 Verfahren zum Herstellen eines Halbleiter-bauelements, wie Halbleiterstromtor oder Flaechentransistor, mit einer hochohmigen n-Zone zwischen zwei p-Zonen im Halbleiter-koerper

Publications (1)

Publication Number Publication Date
CH392704A true CH392704A (de) 1965-05-31

Family

ID=7503754

Family Applications (1)

Application Number Title Priority Date Filing Date
CH137762A CH392704A (de) 1961-03-29 1962-02-05 Verfahren zur Herstellung von mehrschichtigen Halbleiteranordnungen

Country Status (5)

Country Link
US (1) US3316465A (de)
CH (1) CH392704A (de)
DE (1) DE1182353C2 (de)
GB (1) GB1007598A (de)
SE (1) SE323748B (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1274245B (de) * 1965-06-15 1968-08-01 Siemens Ag Halbleiter-Gleichrichterdiode fuer Starkstrom
US3453508A (en) * 1967-10-18 1969-07-01 Int Rectifier Corp Pinch-off shunt for controlled rectifiers
DE1816841A1 (de) * 1968-12-04 1970-07-02 Siemens Ag Verfahren zum Stabilisieren der Kennlinie eines Halbleiterbauelements
US3628106A (en) * 1969-05-05 1971-12-14 Gen Electric Passivated semiconductor device with protective peripheral junction portion
US4040874A (en) * 1975-08-04 1977-08-09 General Electric Company Semiconductor element having a polymeric protective coating and glass coating overlay
US4017340A (en) * 1975-08-04 1977-04-12 General Electric Company Semiconductor element having a polymeric protective coating and glass coating overlay
GB1563421A (en) * 1975-12-18 1980-03-26 Gen Electric Polyimide-siloxane copolymer protective coating for semiconductor devices
US6388203B1 (en) 1995-04-04 2002-05-14 Unitive International Limited Controlled-shaped solder reservoirs for increasing the volume of solder bumps, and structures formed thereby
WO1996031905A1 (en) 1995-04-05 1996-10-10 Mcnc A solder bump structure for a microelectronic substrate
US6025767A (en) * 1996-08-05 2000-02-15 Mcnc Encapsulated micro-relay modules and methods of fabricating same
WO2002039802A2 (en) * 2000-11-10 2002-05-16 Unitive Electronics, Inc. Methods of positioning components using liquid prime movers and related structures
US6863209B2 (en) 2000-12-15 2005-03-08 Unitivie International Limited Low temperature methods of bonding components
US7531898B2 (en) * 2002-06-25 2009-05-12 Unitive International Limited Non-Circular via holes for bumping pads and related structures
US7547623B2 (en) * 2002-06-25 2009-06-16 Unitive International Limited Methods of forming lead free solder bumps
US6960828B2 (en) 2002-06-25 2005-11-01 Unitive International Limited Electronic structures including conductive shunt layers
TWI225899B (en) * 2003-02-18 2005-01-01 Unitive Semiconductor Taiwan C Etching solution and method for manufacturing conductive bump using the etching solution to selectively remove barrier layer
US7049216B2 (en) * 2003-10-14 2006-05-23 Unitive International Limited Methods of providing solder structures for out plane connections
JP4885426B2 (ja) * 2004-03-12 2012-02-29 ルネサスエレクトロニクス株式会社 半導体記憶装置、半導体装置及びその製造方法
US7358174B2 (en) 2004-04-13 2008-04-15 Amkor Technology, Inc. Methods of forming solder bumps on exposed metal pads
US20060205170A1 (en) * 2005-03-09 2006-09-14 Rinne Glenn A Methods of forming self-healing metal-insulator-metal (MIM) structures and related devices
US7674701B2 (en) 2006-02-08 2010-03-09 Amkor Technology, Inc. Methods of forming metal layers using multi-layer lift-off patterns
US7932615B2 (en) * 2006-02-08 2011-04-26 Amkor Technology, Inc. Electronic devices including solder bumps on compliant dielectric layers

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1043517B (de) * 1955-09-23 1958-11-13 Siemens Ag Verfahren zum Aufbringen eines Schutzueberzuges auf der Oberflaeche von Halbleiteranordnungen
US3145328A (en) * 1957-04-29 1964-08-18 Raytheon Co Methods of preventing channel formation on semiconductive bodies
NL231410A (de) * 1958-09-16
DE1097572B (de) * 1959-11-07 1961-01-19 Siemens Ag Verfahren zur Herstellung von Halbleiteranordnungen mit pn-UEbergang

Also Published As

Publication number Publication date
SE323748B (de) 1970-05-11
DE1182353B (de) 1964-11-26
US3316465A (en) 1967-04-25
GB1007598A (en) 1965-10-13
DE1182353C2 (de) 1973-01-11

Similar Documents

Publication Publication Date Title
CH430050A (de) Verfahren zur Herstellung von Lincomycin
CH437243A (de) Verfahren zur Herstellung von Äthylenoxyd
CH392704A (de) Verfahren zur Herstellung von mehrschichtigen Halbleiteranordnungen
CH402194A (de) Verfahren zur Herstellung von Halbleitervorrichtungen
CH423261A (de) Verfahren zur Herstellung von Terpolymeren
CH444352A (de) Verfahren zur Herstellung von Klebstoffen
CH425770A (de) Verfahren zur Herstellung von Sultonen
AT266219B (de) Verfahren zur Herstellung von Halbleiteranordnungen
AT247009B (de) Verfahren zur Herstellung von flächenförmigen Gebilden
CH409037A (de) Verfahren zur Herstellung von Supraleitern
CH414676A (de) Verfahren zur Herstellung von Phenyläthanolaminen
AT244289B (de) Verfahren zur Herstellung von metallisierten Flächengebilden
CH407110A (de) Verfahren zur Herstellung von Fluorsteroiden
LU42792A1 (de) Verfahren zur Herstellung von Polykondensaten
CH425774A (de) Verfahren zur Herstellung von 19-Nor-steroiden
CH430743A (de) Verfahren zur Herstellung von Diaminen
CH410251A (de) Verfahren zur Herstellung von Waschmitteln
CH397878A (de) Verfahren zur Herstellung von Halbleiteranordnungen
AT234662B (de) Verfahren zur Gewinnung von Reinstaromaten
CH437238A (de) Verfahren zur Herstellung von Chlorfluormethanen
CH420179A (de) Verfahren zur Herstellung von Hydroxocobalamin
CH397624A (de) Verfahren zur Herstellung von Äthanol
CH433311A (de) Verfahren zur Herstellung von Imiden
CH385780A (de) Verfahren zur Herstellung von Vliesstoffen
CH374620A (de) Verfahren zur Herstellung von frotteeartigen Vliesstoffen